Abstract: A laterally diffused metal-oxide-semiconductor (LDMOS) transistor with a vertical channel region is provided. A first semiconductor region is formed over a second semiconductor region and with a first doping type. The second semiconductor region has a second doping type different than the first doping type. A gate electrode is formed laterally adjacent to the first semiconductor region and extending along a side boundary of the first semiconductor region. A first source/drain contact region and a second source/drain contact region are respectively formed on opposite sides of the gate electrode and with the second doping type. The first source/drain contact region is further formed over the first semiconductor region. A method for manufacturing the LDMOS transistor is also provided.

Abstract: Some embodiments relate to a system that includes write circuitry, read circuitry, and comparison circuitry. The write circuitry is configured to attempt to write an expected multi-bit word to a memory location in a memory device. The read circuitry is configured to read an actual multi-bit word from the memory location. The comparison circuitry is configured to compare the actual multi-bit word read from the memory location with the expected multi-bit word which was previously written to the memory location to distinguish between a number of erroneous bits in the actual multi-bit word and a number of correct bits in the actual multi-bit word. The write circuitry is further configured to re-write the number of erroneous bits to the memory location without attempting to re-write the number of correct bits to the memory location.

Abstract: The present disclosure relates a method for manufacturing an integrated circuit. In some embodiments, a semiconductor substrate is provided and made up of a memory array region and a boundary region surrounding the memory array region. A hard mask layer is formed over the memory array region and the boundary region. The hard mask layer is patterned to form a boundary hard mask having one or more slots to expose some portions of the boundary region while the remaining regions of the boundary region are covered by the boundary hard mask. A floating gate layer is formed within the memory array region and extending over the hard mask layer. Then, a planarization is performed to reduce a height of the floating gate layer and form a plurality of floating gates.

Abstract: The present disclosure relates to an integrated circuit (IC). The IC includes a substrate, which includes a periphery region having a first substrate surface and a memory cell region having a second substrate surface. The second substrate surface is recessed within the substrate relative to the first substrate surface. A high k metal gate (HKMG) transistor is disposed on the first substrate surface and includes a HKMG gate. Two neighboring flash memory cells are disposed on the second substrate surface and include a pair of flash memory cell control gates. Top surfaces of the HKMG gate and flash memory cell control gates are co-planar.

Abstract: The present disclosure relates an integrated circuit (IC) for an embedded flash memory device. In some embodiments, the IC includes a memory array region and a boundary region surrounding the memory array region disposed over a semiconductor substrate. A hard mask is disposed at the memory array region comprising a plurality of discrete portions. The hard mask is disposed under a control dielectric layer of the memory array region.

Abstract: The present disclosure relates to a method of embedding an ESF3 memory in a HKMG integrated circuit that utilizes a replacement gate technology. The ESF3 memory is formed over a recessed substrate which prevents damage of the memory control gates during the CMP process performed on the ILD layer. An asymmetric isolation zone is also formed in the transition region between the memory cell and the periphery circuit boundary.

Abstract: A subtitle processing method includes a subtitle parsing step and a subtitle reading step. The subtitle parsing step includes: dividing a subtitle file into a plurality of subtitle blocks, each of the subtitle blocks including a plurality of subtitle contents, each of the subtitle contents corresponding to a subtitle time; generating an index table that records characteristic times of the subtitle blocks. The subtitle reading step, for reading a target subtitle content corresponding to a current time, includes: identifying a target subtitle block corresponding to the current time and the characteristic times recorded in the index table; and reading the target subtitle content of the target subtitle block according to the current time.

Abstract: An integrated circuit structure includes a plurality of flash memory cells forming a memory array, wherein each of the plurality of flash memory cells includes a select gate and a memory gate. A select gate electrode includes a first portion including polysilicon, wherein the first portion forms select gates of a column of the memory array, and a second portion electrically connected to the first portion, wherein the second portion includes a metal. A memory gate electrode has a portion forming memory gates of the column of the memory array.

Abstract: The present disclosure relates an integrated circuit (IC) for an embedded flash memory device. In some embodiments, the IC includes a memory array region and a boundary region surrounding the memory array region disposed over a semiconductor substrate. A hard mask is disposed at the memory array region comprising a plurality of discrete portions. The hard mask is disposed under a control dielectric layer of the memory array region.

Abstract: An integrated circuit structure includes a plurality of flash memory cells forming a memory array, wherein each of the plurality of flash memory cells includes a select gate and a memory gate. A select gate electrode includes a first portion including polysilicon, wherein the first portion forms select gates of a column of the memory array, and a second portion electrically connected to the first portion, wherein the second portion includes a metal. A memory gate electrode has a portion forming memory gates of the column of the memory array.

Abstract: A subtitle processing method includes a subtitle parsing step and a subtitle reading step. The subtitle parsing step includes: dividing a subtitle file into a plurality of subtitle blocks, each of the subtitle blocks including a plurality of subtitle contents, each of the subtitle contents corresponding to a subtitle time; generating an index table that records characteristic times of the subtitle blocks. The subtitle reading step, for reading a target subtitle content corresponding to a current time, includes: identifying a target subtitle block corresponding to the current time and the characteristic times recorded in the index table; and reading the target subtitle content of the target subtitle block according to the current time.

Abstract: Some embodiments relate to a system that includes write circuitry, read circuitry, and comparison circuitry. The write circuitry is configured to attempt to write an expected multi-bit word to a memory location in a memory device. The read circuitry is configured to read an actual multi-bit word from the memory location. The comparison circuitry is configured to compare the actual multi-bit word read from the memory location with the expected multi-bit word which was previously written to the memory location to distinguish between a number of erroneous bits in the actual multi-bit word and a number of correct bits in the actual multi-bit word. The write circuitry is further configured to re-write the number of erroneous bits to the memory location without attempting to re-write the number of correct bits to the memory location.

Abstract: This invention relates to stable formulations of multiple antibodies comprising a plurality of antibodies and an effective amount of a succinate buffer wherein the pH of the formulation is between about 4.5 and about 7.0.

Abstract: The present disclosure relates to a method of embedding an ESF3 memory in a HKMG integrated circuit that utilizes a replacement gate technology. The ESF3 memory is formed over a recessed substrate which prevents damage of the memory control gates during the CMP process performed on the ILD layer. An asymmetric isolation zone is also formed in the transition region between the memory cell and the periphery circuit boundary.

Abstract: Some aspects of the present disclosure relate a method. The method attempts to write an expected multi-bit word to a memory location in memory. After writing of the multi-bit word has been attempted, an actual multi-bit word is read from the memory location. The actual multi-bit word is then compared with the expected multi-bit word to identify a number of erroneous bits and a number of correct bits stored in the memory location. The number of erroneous bits is re-written to the memory location without attempting to re-write the correct bits to the memory location.

Abstract: An integrated circuit structure includes a plurality of flash memory cells forming a memory array, wherein each of the plurality of flash memory cells includes a select gate and a memory gate. A select gate electrode includes a first portion including polysilicon, wherein the first portion forms select gates of a column of the memory array, and a second portion electrically connected to the first portion, wherein the second portion includes a metal. A memory gate electrode has a portion forming memory gates of the column of the memory array.

Abstract: A semiconductor arrangement is provided comprising a guard region. The semiconductor arrangement comprises an active region disposed on a first side of the guard region. The active region comprises an active device. The guard region of the semiconductor arrangement comprises residue from the active region. A method of forming a semiconductor arrangement is also provided.

Abstract: Magneto-resistive memory bit cells in an array have high or low resistance states storing logic values. During read operations, a bias source is coupled to an addressed memory word, coupling a parameter related to cell resistance to a sense amplifier at each bit position. The sense amplifiers determine whether the parameter value is greater or less than a reference value between the high and low resistance states. The reference value is derived by averaging or splitting a difference of resistances of reference cells at high and/or low resistance states. Bias current is conducted over address lines with varying resistance, due to different distances between the sense amplifiers and addressed memory words, which is canceled by inserting into the comparison circuit a resistance from a dummy addressing array, equal to the resistance of the conductor addressing the selected word line and bit position.

Abstract: Some aspects of the present disclosure relate a method. The method attempts to write an expected multi-bit word to a memory location in memory. After writing of the multi-bit word has been attempted, an actual multi-bit word is read from the memory location. The actual multi-bit word is then compared with the expected multi-bit word to identify a number of erroneous bits and a number of correct bits stored in the memory location. The number of erroneous bits is re-written to the memory location without attempting to re-write the correct bits to the memory location.

Abstract: Magneto-resistive memory bit cells in an array have high or low resistance states storing logic values. During read operations, a bias source is coupled to an addressed memory word, coupling a parameter related to cell resistance to a sense amplifier at each bit position. The sense amplifiers determine whether the parameter value is greater or less than a reference value between the high and low resistance states. The reference value is derived by averaging or splitting a difference of resistances of reference cells at high and/or low resistance states. Bias current is conducted over address lines with varying resistance, due to different distances between the sense amplifiers and addressed memory words, which is canceled by inserting into the comparison circuit a resistance from a dummy addressing array, equal to the resistance of the conductor addressing the selected word line and bit position.