Patents by Inventor Ching Chiun Wang

Ching Chiun Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210132104
    Abstract: A visualization device for a flow field includes a chamber, a power supply, at least one pair of electrodes, and at least one flow field observation module. The flow field observation module includes a high-speed camera, a light detecting component, and a light filter component. The power supply outputs a voltage to generate a plasma, and the pair of electrodes is disposed in the chamber. The flow field observation module is disposed outside the chamber and captures an image of a fluid particle excited by the plasma toward the chamber. The light filter component is disposed between the high-speed camera and the chamber. The light detecting component obtains a light information within the chamber and sends the light information to the light filter component.
    Type: Application
    Filed: December 2, 2019
    Publication date: May 6, 2021
    Applicant: Industrial Technology Research Institute
    Inventors: Chih-Yung Huang, Yao-Hsien Liu, Kuan-Chou Chen, Yi-Jiun Lin, Shih-Chin Lin, Ching-Chiun Wang
  • Publication number: 20200154555
    Abstract: A flow field visualization device includes a chamber, a power supply, at least one pair of electrodes, and at least two high-speed cameras. The power supply outputs a voltage for plasma generation, and the pair of electrodes is disposed in the chamber. The pair of electrodes includes a first electrode and a second electrode. The first electrode has a plurality of first tips, the second electrode has a plurality of second tips, and the first tips and the second tips are aligned with each other. The pair of electrodes generates a periodically densely distributed plasma by exciting a gas in the chamber through the voltage from the power supply. The high-speed cameras are disposed outside the chamber and are positioned in different directions corresponding to the pair of electrodes in order to capture images of different dimensions.
    Type: Application
    Filed: December 17, 2018
    Publication date: May 14, 2020
    Applicant: Industrial Technology Research Institute
    Inventors: Chih-Yung Huang, Kuan-Chou Chen, Shih-Chin Lin, Yi-Jiun Lin, Ching-Chiun Wang
  • Patent number: 10458019
    Abstract: A gas shower device having gas curtain comprises a first gas shower unit for injecting a reaction gas, thereby forming a reaction gas region, and a second gas shower unit. The second gas shower unit arranged around a periphery of the first gas shower unit comprises a buffer gas chamber for providing a buffer gas, and a curtain distribution plate. The curtain distribution plate further comprises a plurality through holes for injecting the buffer gas, thereby forming a gas curtain around a periphery of the reaction gas region. In another embodiment, an apparatus for depositing film is provided by utilizing the gas shower device having gas curtain, wherein the gas curtain prevents the reaction gas in the reaction gas region from being affected directly by a vacuum pressure so that a residence time of reaction gas can be extended thereby increasing the utilization of reaction gas and film-forming efficiency.
    Type: Grant
    Filed: July 5, 2013
    Date of Patent: October 29, 2019
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Ching-Chiun Wang, Chih-Yung Huang, Kung-Liang Lin, Jung-Chen Chien, Chen-Der Tsai, Chien-Chih Chen
  • Publication number: 20180119273
    Abstract: The disclosure is an evaporation apparatus and a method of evaporation using the same. The evaporation apparatus includes an evaporation chamber, an evaporation source, a carrying device, and a fluid disturbance device. The evaporation chamber has an evaporation space, the evaporation source is disposed at a lower part in the evaporation space, and the evaporation source is suitable for accommodating an evaporation source material. The carrying device is disposed to be rotatable about a reference axis as the center at an upper part in the evaporation space and is opposite to the evaporation source; the carrying device is suitable for carrying a substrate and positions the substrate between the evaporation source and the carrying device. The fluid disturbance device is suitable for injecting a disturbed fluid towards the carrying device in the evaporation space.
    Type: Application
    Filed: December 20, 2016
    Publication date: May 3, 2018
    Applicant: Industrial Technology Research Institute
    Inventors: Chih-Yung Huang, Shih-Chin Lin, Ching-Chiun Wang
  • Patent number: 9957607
    Abstract: An evaporation method in this disclosure is adapted for performing an evaporation process upon a surface of an evaporation target substrate. In an embodiment, an evaporation source plate is arranged to be heated by a heater so as to evaporate an evaporation material to its gaseous state, and then enable the gaseous evaporation material to travel passing through holes of a shutter device and thus spread toward the surface of the evaporation target substrate for depositing a film. Moreover, the evaporation method uses a transmission device for controlling the opening/closing of the holes, and there is a heating area formed at a position between the shutter device and the evaporation source plate for allowing the evaporation source plate, the plural holes, the heating area, the evaporation material and the heater to be arranged parallel to one another from the top to bottom.
    Type: Grant
    Filed: February 14, 2017
    Date of Patent: May 1, 2018
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Fu-Ching Tung, Ching-Chiun Wang, Shih-Hsiang Lai
  • Publication number: 20170159171
    Abstract: An evaporation method in this disclosure is adapted for performing an evaporation process upon a surface of an evaporation target substrate. In an embodiment, an evaporation source plate is arranged to be heated by a heater so as to evaporate an evaporation material to its gaseous state, and then enable the gaseous evaporation material to travel passing through holes of a shutter device and thus spread toward the surface of the evaporation target substrate for depositing a film. Moreover, the evaporation method uses a transmission device for controlling the opening/closing of the holes, and there is a heating area formed at a position between the shutter device and the evaporation source plate for allowing the evaporation source plate, the plural holes, the heating area, the evaporation material and the heater to be arranged parallel to one another from the top to bottom.
    Type: Application
    Filed: February 14, 2017
    Publication date: June 8, 2017
    Inventors: FU-CHING TUNG, Ching-Chiun Wang, Shih-Hsiang Lai
  • Patent number: 9373789
    Abstract: A resistive random access memory and a method for fabricating the same are provided. The method includes forming a bottom electrode on a substrate; forming a metal oxide layer on the bottom electrode; forming an oxygen atom gettering layer on the metal oxide layer; forming a first top electrode sub-layer on the oxygen atom gettering layer; forming a second top electrode sub-layer on the first top electrode sub-layer, wherein the first top electrode sub-layer and the second top electrode sub-layer comprise a top electrode; and subjecting the metal oxide layer and the oxygen atom gettering layer to a thermal treatment, driving the oxygen atoms of the metal oxide layer to migrate into and react with the oxygen atom gettering layer, resulting in a plurality of oxygen vacancies within the metal oxide layer.
    Type: Grant
    Filed: October 22, 2014
    Date of Patent: June 21, 2016
    Assignee: Industrial Technology Research Institute
    Inventors: Heng-Yuan Lee, Pang-Shiu Chen, Tai-Yuan Wu, Ching-Chiun Wang
  • Publication number: 20160122866
    Abstract: An evaporation system and an evaporation method are disclosed, which are adapted for performing an evaporation process upon a surface of an evaporation target substrate. In an embodiment, the evaporation system comprises an evaporation material and an evaporation source plate, whereas the evaporation source plate is arranged to be heated by a heater so as to evaporate the evaporation material form its solid state into its gaseous state, and then enable the gaseous state evaporation material to travel passing through holes by the use of a shutter device so as to spread toward the surface of the evaporation target substrate for forming a film thereon. In addition, the evaporation system further comprises a transmission device, which is to be used for controlling the opening/closing of the holes of the shutter device.
    Type: Application
    Filed: September 11, 2015
    Publication date: May 5, 2016
    Inventors: FU-CHING TUNG, CHING-CHIUN WANG, SHIH-HSIANG LAI
  • Publication number: 20150280122
    Abstract: A resistive random access memory and a method for fabricating the same are provided. The method includes providing a structure comprising a substrate, a bottom electrode disposed on the substrate, a metal oxide layer disposed on the bottom electrode, and an oxygen atom gettering layer disposed on the metal oxide layer; and subjecting the structure to a thermal treatment, driving the oxygen atoms of the metal oxide layer to migrate into and react with the oxygen atom gettering layer, resulting in a plurality of oxygen vacancies within the metal oxide layer.
    Type: Application
    Filed: June 9, 2015
    Publication date: October 1, 2015
    Inventors: Heng-Yuan LEE, Pang-Shiu CHEN, Tai-Yuan WU, Ching-Chiun WANG
  • Patent number: 9142776
    Abstract: A resistive random access memory and a method for fabricating the same are provided. The method includes forming a bottom electrode on a substrate; forming a metal oxide layer on the bottom electrode; forming an oxygen atom gettering layer on the metal oxide layer; forming a first top electrode sub-layer on the oxygen atom gettering layer; forming a second top electrode sub-layer on the first top electrode sub-layer, wherein the first top electrode sub-layer and the second top electrode sub-layer comprise a top electrode; and subjecting the metal oxide layer and the oxygen atom gettering layer to a thermal treatment, driving the oxygen atoms of the metal oxide layer to migrate into and react with the oxygen atom gettering layer, resulting in a plurality of oxygen vacancies within the metal oxide layer.
    Type: Grant
    Filed: December 20, 2012
    Date of Patent: September 22, 2015
    Assignee: Industrial Technology Research Institute
    Inventors: Heng-Yuan Lee, Pang-Shiu Chen, Tai-Yuan Wu, Ching-Chiun Wang
  • Publication number: 20150044851
    Abstract: A resistive random access memory and a method for fabricating the same are provided. The method includes forming a bottom electrode on a substrate; forming a metal oxide layer on the bottom electrode; forming an oxygen atom gettering layer on the metal oxide layer; forming a first top electrode sub-layer on the oxygen atom gettering layer; forming a second top electrode sub-layer on the first top electrode sub-layer, wherein the first top electrode sub-layer and the second top electrode sub-layer comprise a top electrode; and subjecting the metal oxide layer and the oxygen atom gettering layer to a thermal treatment, driving the oxygen atoms of the metal oxide layer to migrate into and react with the oxygen atom gettering layer, resulting in a plurality of oxygen vacancies within the metal oxide layer.
    Type: Application
    Filed: October 22, 2014
    Publication date: February 12, 2015
    Inventors: HENG-YUAN LEE, PANG-SHIU CHEN, TAI-YUAN WU, CHING-CHIUN WANG
  • Patent number: 8896135
    Abstract: Disclosed is an encapsulation film. An inorganic oxide film is formed on an organic sealing layer by an atomic layer deposition (ALD) to form the encapsulation film, wherein the organic sealing layer is a polymer containing hydrophilic groups. The organic sealing layer and the inorganic oxide layer have covalent bondings therebetween. The encapsulation film can solve the moisture absorption problem of conventional organic sealing layers, thereby being suitable for use as a package of optoelectronic devices.
    Type: Grant
    Filed: January 4, 2011
    Date of Patent: November 25, 2014
    Assignee: Industrial Technology Research Institute
    Inventors: Ching-Chiun Wang, Kang-Feng Lee, Feng-Yu Tsai, Ming Horn Zheng, Chih-Yung Huang, Shih-Chin Lin, Jen-Rong Huang
  • Publication number: 20140123900
    Abstract: A gas shower device having gas curtain comprises a first gas shower unit for injecting a reaction gas, thereby forming a reaction gas region, and a second gas shower unit. The second gas shower unit arranged around a periphery of the first gas shower unit comprises a buffer gas chamber for providing a buffer gas, and a curtain distribution plate. The curtain distribution plate further comprises a plurality through holes for injecting the buffer gas, thereby forming a gas curtain around a periphery of the reaction gas region. In another embodiment, an apparatus for depositing film is provided by utilizing the gas shower device having gas curtain, wherein the gas curtain prevents the reaction gas in the reaction gas region from being affected directly by a vacuum pressure so that a residence time of reaction gas can be extended thereby increasing the utilization of reaction gas and film-forming efficiency.
    Type: Application
    Filed: July 5, 2013
    Publication date: May 8, 2014
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Ching-Chiun WANG, Chih-Yung Huang, Kung-Liang Lin, Jung-Chen Chien, Chen-Der Tsai, Chien-Chih Chen
  • Patent number: 8672501
    Abstract: The present disclosure provides a mirror device with illumination comprising a transparent conductive substrate, an isolation layer, a mirror layer and a light emitting diode (LED) layer. The isolation layer, formed on a surface of the transparent conductive substrate, divides the surface of the transparent conductive substrate into at least one first region and at least one second region. The mirror layer formed on the transparent conductive substrate within the at least one first region, while the LED layer is formed on the transparent conductive substrate within the at least one second region, wherein the mirror layer and the LED layer are electrically isolated from each other. In another embodiment, the present disclosure further provides a mirror box having the mirror device with illumination disposed therein so that the mirror device can be easily carried and kept in the pocket, or purse of user.
    Type: Grant
    Filed: April 27, 2012
    Date of Patent: March 18, 2014
    Assignee: Industrial Technology Research Institute
    Inventors: Ching-Chiun Wang, Chien-Chih Chen, Chih-Yung Huang, Szu-Hao Chen, Yi-Shan Wang
  • Publication number: 20130188339
    Abstract: The present disclosure provides a mirror device with illumination comprising a transparent conductive substrate, an isolation layer, a mirror layer and a light emitting diode (LED) layer. The isolation layer, formed on a surface of the transparent conductive substrate, divides the surface of the transparent conductive substrate into at least one first region and at least one second region. The mirror layer formed on the transparent conductive substrate within the at least one first region, while the LED layer is formed on the transparent conductive substrate within the at least one second region, wherein the mirror layer and the LED layer are electrically isolated from each other. In another embodiment, the present disclosure further provides a mirror box having the mirror device with illumination disposed therein so that the mirror device can be easily carried and kept in the pocket, or purse of user.
    Type: Application
    Filed: April 27, 2012
    Publication date: July 25, 2013
    Inventors: Ching-Chiun WANG, Chien-Chih Chen, Chih-Yung Huang, Szu-Hao Chen, Yi-Shan Wang
  • Publication number: 20130095658
    Abstract: A metal organic chemical vapor deposition (MOCVD) method and apparatus are provided. The MOCVD method includes: providing a substrate, in which a metal-based material layer is disposed on a first surface of the substrate; putting the substrate on a base in a chamber, in which the metal-based material layer is between the substrate and the base; and performing a MOCVD process on a second surface opposite to the first surface. The difference in thermal conductivity between the metal-based material layer and the substrate is in the range of 1 W/m° C. to 20 W/m° C., and the thermal expansion coefficients of the metal-based material layer and the substrate are of the same order.
    Type: Application
    Filed: May 13, 2012
    Publication date: April 18, 2013
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chih-Yung Huang, Szu-Hao Chen, Ching-Chiun Wang, Chien-Chih Chen
  • Publication number: 20130068160
    Abstract: An evaporation device and an evaporation apparatus applying the same are adapted to performing evaporation process to an object to be coated. The evaporation device includes a tape carrier and a mask. The tape carrier has a heating region. The object to be coated is located over the heating region and is adapted to move along a feeding direction. The tape carrier is adapted to carry a coating material to pass through the heating region. The coating material is heated in the heating region and evaporated. The mask having an opening between the heating region and the object to be coated is disposed in the periphery of the heating region. The evaporated coating material is adapted to pass through the opening and coated on the object.
    Type: Application
    Filed: May 15, 2012
    Publication date: March 21, 2013
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Ching-Chiun Wang, Chih-Yung Huang, Chien-Chih Chen, Szu-Hao Chen, Fu-Ching Tung, Atsushi Oda
  • Patent number: 8362454
    Abstract: A resistive random access memory and a method for fabricating the same are provided. The method includes providing a bottom electrode formed on a substrate. A metal oxide layer is formed on the bottom electrode. An oxygen atom gettering layer is formed on the metal oxide layer. A top electrode is formed on the oxygen atom gettering layer. The previous mentioned structure is subjected to a thermal treatment, driving the oxygen atoms of the metal oxide layer to migrate into and react with the oxygen atom gettering layer, thus leaving a plurality of oxygen vacancies of the metal oxide layer.
    Type: Grant
    Filed: December 12, 2008
    Date of Patent: January 29, 2013
    Assignee: Industrial Technology Research Institute
    Inventors: Hengyuan Lee, Pang-Hsu Chen, Tai-Yuan Wu, Ching-Chiun Wang
  • Publication number: 20120313113
    Abstract: A photovoltaic organic light emitting diodes (PV-OLED) device and manufacturing method thereof are introduced. The PV-OLED device includes a substrate, a solar cell module, and a plurality of organic light emitting diodes. The solar cell module is disposed on a surface of the substrate. The organic light emitting diodes are disposed on the same surface of the substrate that the solar cell module is disposed on. The organic light emitting diode is electrically isolated from the solar cell module. The solar cell module can apply power to the organic light emitting diodes for emitting light.
    Type: Application
    Filed: September 9, 2011
    Publication date: December 13, 2012
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chien-Chih Chen, Ching-Chiun Wang, Chih-Yung Huang, Szu-Hao Chen, Chan-Hsing Lo, Chung-Ping Chiang
  • Publication number: 20120235121
    Abstract: According to an embodiment of the disclosure, an organic light emitting device is provided, which includes: an inflexible tube comprising an external surface and an internal surface; a transparent conductive layer on the internal surface of the inflexible tube; an organic light emitting layer disposed in the inflexible tube and on the transparent conductive layer; and a conductive layer disposed in the inflexible tube and on the organic light emitting layer. According to an embodiment of the disclosure, a method for forming an organic light emitting device is also provided.
    Type: Application
    Filed: September 19, 2011
    Publication date: September 20, 2012
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chien-Chih CHEN, Ching-Chiun WANG, Chih-Yung HUANG, Jwo-Huei JOU, Fu-Ching TUNG