Patents by Inventor Ching Hsuan Lin

Ching Hsuan Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240136227
    Abstract: A method includes etching a dielectric layer of a substrate to form an opening in the dielectric layer, forming a metal layer extending into the opening, performing an anneal process, so that a bottom portion of the metal layer reacts with a semiconductor region underlying the metal layer to form a source/drain region, performing a plasma treatment process on the substrate using a process gas including hydrogen gas and a nitrogen-containing gas to form a silicon-and-nitrogen-containing layer, and depositing a metallic material on the silicon-and-nitrogen-containing layer.
    Type: Application
    Filed: January 3, 2024
    Publication date: April 25, 2024
    Inventors: Ching-Yi Chen, Sheng-Hsuan Lin, Wei-Yip Loh, Hung-Hsu Chen, Chih-Wei Chang
  • Patent number: 11952676
    Abstract: A silicon carbide crystal includes a seed layer, a bulk layer and a stress buffering structure formed between the seed layer and the bulk layer. The seed layer, the bulk layer and the stress buffering structure are each formed with a dopant that cycles between high and low dopant concentration. The stress buffering structure includes a plurality of stacked buffer layers and a transition layer over the buffer layers. The buffer layer closest to the seed layer has the same variation trend of the dopant concentration as the buffer layer closest to the transition layer, and the dopant concentration of the transition layer is equal to the dopant concentration of the seed layer.
    Type: Grant
    Filed: October 16, 2020
    Date of Patent: April 9, 2024
    Assignee: GLOBALWAFERS CO., LTD.
    Inventors: Ching-Shan Lin, Jian-Hsin Lu, Chien-Cheng Liou, Man-Hsuan Lin
  • Publication number: 20240069069
    Abstract: A probe pin cleaning pad including a foam layer, a cleaning layer, and a polishing layer is provided. The cleaning layer is disposed between the foam layer and the polishing layer. A cleaning method for a probe pin is also provided.
    Type: Application
    Filed: November 10, 2023
    Publication date: February 29, 2024
    Applicant: Alliance Material Co., Ltd.
    Inventors: Chun-Fa Chen, Yu-Hsuen Lee, Ching-Wen Hsu, Chao-Hsuan Yang, Ting-Wei Lin
  • Patent number: 11807716
    Abstract: An oligomer (2,6-dimethylphenylene ether) is provided. Its structure is shown as follows: which comprises separately independent hydrogen; alkyl or phenyl; separately independent —NR—, —CO—, —SO—, —CS—, —SO2—, —CH2—, —O—, null, —C(CH3)2—, or and a hydrogen, The features of the cured products include a high glass-transition temperature, a low dielectric feature, preferred thermal stability, and good flame retardancy. The present invention effectively controls the number-average molecular weight of the product to obtain excellent organic solubility.
    Type: Grant
    Filed: December 22, 2020
    Date of Patent: November 7, 2023
    Assignee: CPC Corporation, Taiwan
    Inventors: Sheng-De Li, Ching-Hsuan Lin, Yi-Hsuan Hsieh, Wei-Yen Chen, Way-Chih Hsu, Jui-Fu Kao, Ming-Yu Huang, Jann-Chen Lin, Yih-Ping Wang
  • Patent number: 11787904
    Abstract: A phosphinated (2,6-dimethylphenyl ether) oligomer, preparation method thereof and cured product. The phosphinated (2,6-dimethylphenyl ether) oligomer includes a structure represented by Formula (1): wherein X is a single bond, —CH2—, —O—, —C(CH3)2— or R?0, R0, R1, R2 and R3 are independently hydrogen, C1-C6 alkyl or phenyl; n and m are independently an integer from 0 to 300; p and q are independently an integer from 1 to 4; Y is hydrogen, U and V are independently an aliphatic structure.
    Type: Grant
    Filed: December 4, 2020
    Date of Patent: October 17, 2023
    Assignee: CPC CORPORATION, TAIWAN
    Inventors: Sheng-De Li, Ching-Hsuan Lin, Cheng-Liang Liu, Jun-Cheng Ye, You-Lin Shih, Yu An Lin, Wei-Yen Chen, Way-Chih Hsu, Jui-Fu Kao, Ming-Yu Huang, Jann-Chen Lin, Yih-Ping Wang
  • Publication number: 20230102899
    Abstract: A carbonate-containing epoxy resin and a manufacturing method for a carbonate-containing epoxy resin, an epoxy curable product and a method for degrading an epoxy curable product are provided. The carbonate-containing epoxy resin includes a structure represented by formula (I) or formula (II). Formula (I) and formula (II) are defined as in the specification.
    Type: Application
    Filed: September 6, 2022
    Publication date: March 30, 2023
    Inventors: Ching-Hsuan LIN, Ren-Yu YEH, Yi-Chun CHEN, Meng-Wei WANG, Wen-Chang CHEN
  • Publication number: 20230091989
    Abstract: A diamine monomer compound with reduced dielectric losses for better integrity and stability in digital transmissions is represented by a structural formula of wherein n1 is an integer greater than 1. A method for preparing the diamine monomer compound and a polyimide resin developed therefrom are disclosed. The diamine monomer compound introduces a long even numbered carbon chain and a liquid crystal unit structure, the long even numbered carbon chain giving flexibility, which reduces the regularity and rigidity of the molecular chain and facilitates film-forming processing. Dimensional stability is improved, and the coefficient of thermal expansion of the materials is reduced, the materials have good mechanical and heat-tolerant thermal properties, the loss factor and the coefficient of thermal expansion of the materials being reduced. A flexible film of the resin and an electronic device are also disclosed.
    Type: Application
    Filed: September 30, 2021
    Publication date: March 23, 2023
    Inventors: KUAN-WEI LEE, SZU-HSIANG SU, SHOU-JUI HSIANG, CHING-HSUAN LIN, WAN-LING HSIAO, REN-YU YEH
  • Publication number: 20230086746
    Abstract: A diamine monomer compound with a structural formula of wherein n1 is an integer greater than 1, forms the basis of a dielectric material with reduced dielectric losses for improved signals transmission. A method for preparing the compound, a polyimide resin made from the compound, a flexible film, and an electronic device including the polyimide resin are also disclosed. The compound has a long but flexible even numbered carbon chain and a liquid crystal unit structure. The reduced regularity and rigidity of the molecular chain make the polyimide resin convenient for film-forming. Dimensional stability is improved, the coefficient of thermal expansion of the materials is reduced, and the materials have good mechanical and thermal properties, the electron loss factor and coefficient of thermal expansion of the materials being reduced.
    Type: Application
    Filed: September 30, 2021
    Publication date: March 23, 2023
    Inventors: KUAN-WEI LEE, SZU-HSIANG SU, SHOU-JUI HSIANG, CHING-HSUAN LIN, WAN-LING HSIAO, REN-YU YEH
  • Publication number: 20220169792
    Abstract: The present disclosure provides a low-dissipation flexible copper clad laminate, which includes a copper foil and a polyimide film. The polyimide film is attached to the copper foil. The polyimide film includes a polyimide, and the polyimide has a structure represented by formula (I). Formula (I) is defined as in the specification.
    Type: Application
    Filed: November 24, 2021
    Publication date: June 2, 2022
    Inventors: Ching-Hsuan LIN, Wan-Ling HSIAO
  • Publication number: 20220056213
    Abstract: The present disclosure provides a low-dissipation flexible copper clad laminate, which includes a copper foil and a polyimide film. The polyimide film is attached to the copper foil. The polyimide film includes a polyimide, and the polyimide has a structure represented by formula (I). Formula (I) is defined as in the specification.
    Type: Application
    Filed: August 17, 2021
    Publication date: February 24, 2022
    Inventors: Ching-Hsuan LIN, Wen-Chang CHEN, Wan-Ling HSIAO, Sudhir Kumar Reddy KAMANI
  • Publication number: 20210403620
    Abstract: The invention discloses functionalized poly(2,6-dimethyl phenylene oxide oxide) oligomers containing dicyclopentadiene, a method of producing the same and use thereof. The cured products of the functionalized poly(2,6-dimethyl phenylene oxide oxide) oligomers of the invention exhibit low dielectric constant, low dissipation, and high glass transition temperature. As the functionalized poly(2,6-dimethyl phenylene oxide oxide) oligomers of the invention have number-average molecular weight ranging from 2500 to 6000 g/mol, the substrate made of theses functionalized poly(2,6-dimethyl phenylene oxide oxide) oligomers can pass the pressure cook test. Besides, the low dissipation factor characteristic the functionalized poly(2,6-dimethyl phenylene oxide oxide) oligomers of the invention can only be demonstrated at number-average molecular weight higher than 2500 g/mol.
    Type: Application
    Filed: September 14, 2021
    Publication date: December 30, 2021
    Inventors: Sheng-De Li, Ming-Yu Huang, Jui-Fu Kao, Way-Chih Hsu, Jann-Chen Lin, Yih-Ping Wang, Ching-Hsuan Lin
  • Publication number: 20210340321
    Abstract: A phosphinated (2,6-dimethylphenyl ether) oligomer, preparation method thereof and cured product are provided. The phosphinated (2,6-dimethylphenyl ether) oligomer includes a structure represented by Formula (1): wherein X is a single bond, —CH2—, —O—, —C(CH3)2— or R?0, R0, R1, R2 and R3 are independently hydrogen, C1-C6 alkyl or phenyl; n and m are independently an integer from 0 to 300; p and q are independently an integer from 1 to 4; Y is hydrogen, U and V are independently an aliphatic structure.
    Type: Application
    Filed: December 4, 2020
    Publication date: November 4, 2021
    Inventors: Sheng-De LI, Ching-Hsuan LIN, Cheng-Liang LIU, Jun-Cheng YE, You-Lin SHIH, Yu An LIN, Wei-Yen CHEN, Way-Chih HSU, Jui-Fu KAO, Ming-Yu HUANG, Jann-Chen LIN, Yih-Ping WANG
  • Publication number: 20210340320
    Abstract: An oligomer (2,6-dimethylphenylene ether) is provided. Its structure is shown as follows: which comprises separately independent hydrogen; alkyl or phenyl; separately independent —NR—, —CO—, —SO—, —CS—, —SO2—, —CH2—, —O—, null, —C(CH3)2—, or and a hydrogen, The features of the cured products include a high glass-transition temperature, a low dielectric feature, preferred thermal stability, and good flame retardancy. The present invention effectively controls the number-average molecular weight of the product to obtain excellent organic solubility.
    Type: Application
    Filed: December 22, 2020
    Publication date: November 4, 2021
    Inventors: Sheng-De Li, Ching-Hsuan Lin, Yi-Hsuan Hsieh, Wei-Yen Chen, Way-Chih Hsu, Jui-Fu Kao, Ming-Yu Huang, Jann-Chen Lin, Yih-Ping Wang
  • Patent number: 11028109
    Abstract: The present disclosure provides a phosphorus-containing compound, which includes a structure represented by formula (I). Formula (I) is defined as in the specification. The present disclosure further provides a flame-retardant thermoset made by the phosphorus-containing compound including the structure represented by formula (I). The present disclosure also provides a manufacturing method for the phosphorus-containing compound.
    Type: Grant
    Filed: May 21, 2019
    Date of Patent: June 8, 2021
    Assignee: National Chunghsing University
    Inventors: Ching-Hsuan Lin, Yu-Hsiang Lin, Po-Chun Yang, Yi-Ning Chiang, Wen-Chang Chen
  • Patent number: 10822522
    Abstract: A resin composition comprises a modified polyimide compound, an epoxy resin, and a solvent. The modified polyimide compound has a chemical structural formula of the Ar? represents a group selected from a group consisting of phenyl having a chemical structural formula of diphenyl ether having a chemical structural formula of biphenyl having a chemical structural formula of hexafluoro-2,2-diphenylpropane having a chemical structural formula of benzophenone having a chemical structural formula of and diphenyl sulfone having a chemical structural formula of and any combination thereof, the modified polyimide compound has a degree of polymerization n of about 1 to about 50, the epoxy resin and the modified polyimide compound are in a molar ratio of about 0.1:1 to about 1:1. A modified polyimide compound and a polyimide film are also provided.
    Type: Grant
    Filed: August 7, 2019
    Date of Patent: November 3, 2020
    Assignee: Zhen Ding Technology Co., Ltd.
    Inventors: Ming-Jaan Ho, Mao-Feng Hsu, Shou-Jui Hsiang, Nan-Kun Huang, Yu-Wen Kao, Chia-Yin Teng, Ching-Hsuan Lin
  • Patent number: 10711103
    Abstract: A low-k, non-flammable dicyclopentdiene (DCPD)-derived polyether and a method of producing the same are introduced. Incorporation of a phosphorus group and a DCPD derivative into a low-k, non-flammable dicyclopentdiene (DCPD)-derived polyether enable the DCPD-derived polyether to not only serve as an epoxy resin curing agent but also cure itself such that the cured product not only features satisfactory thermal properties and low-k characteristics but is also non-flammable.
    Type: Grant
    Filed: November 30, 2017
    Date of Patent: July 14, 2020
    Assignee: NATIONAL CHUNG SAN INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Wen-Chiung Su, Ching-Hsuan Lin, Wei-Feng Hsiao, Han-Ya Lin
  • Patent number: 10544261
    Abstract: The present invention relates to a phosphinated poly(2,6-dimethy phenylene oxide)oligomer, specifically an unsaturated group-containing phosphinated poly(2,6-dimethy phenylene oxide)oligomer, and processes for producing the same. A thermoset produced from the unsaturated group-containing phosphinated poly(2,6-dimethy phenylene oxide)oligomers according to the present invention exhibits flame retardancy and has a low dielectric constant and dissipation factor and a high glass transition temperature.
    Type: Grant
    Filed: October 7, 2016
    Date of Patent: January 28, 2020
    Assignee: Chang Chun Plastics Co., Ltd.
    Inventors: Ching Hsuan Lin, Ping-Chieh Wang, An-Pang Tu, Kuen-Yuan Hwang, Chun Yu Tseng
  • Patent number: 10526438
    Abstract: Method for producing flexographic printing plates from a photopolymerizable flexographic printing plate with a dimensionally stable support, photopolymerizable, relief-forming layer(s), and a digitally imagable layer. The method comprises (a) producing a mask by imaging the digitally imagable layer, (b) exposing the flexographic printing plate with a plurality of UV-LEDs on a UV-LED strip through the mask with actinic light, and photopolymerizing the image regions of the layer, and (c) developing the photopolymerized layer. In the UV-LED strip or in a separate strip, at least one ultrasonic sensor is arranged for determining the thickness of the flexographic printing plate for exposure. Depending on the measured thickness of the flexographic printing plate, the exposing of the flexographic printing plate is controlled in respect of: (i) number of exposure steps, exposure intensity, energy input per exposure step, duration of the individual exposure steps, and/or overall duration of exposure.
    Type: Grant
    Filed: July 19, 2017
    Date of Patent: January 7, 2020
    Assignee: Great Eastern Resins Industrial Co., Ltd.
    Inventors: Shenghong A. Dai, Ching Hsuan Lin, Wei Ming Nien, Wen Chen Pan, Kevin Liao
  • Publication number: 20190359852
    Abstract: A resin composition comprises a modified polyimide compound, an epoxy resin, and a solvent. The modified polyimide compound has a chemical structural formula of the Ar? represents a group selected from a group consisting of phenyl having a chemical structural formula of diphenyl ether having a chemical structural formula of biphenyl having a chemical structural formula of hexafluoro-2,2-diphenylpropane having a chemical structural formula of benzophenone having a chemical structural formula of and diphenyl sulfone having a chemical structural formula of and any combination thereof, the modified polyimide compound has a degree of polymerization n of about 1 to about 50, the epoxy resin and the modified polyimide compound are in a molar ratio of about 0.1:1 to about 1:1. A modified polyimide compound and a polyimide film are also provided.
    Type: Application
    Filed: August 7, 2019
    Publication date: November 28, 2019
    Inventors: MING-JAAN HO, MAO-FENG HSU, SHOU-JUI HSIANG, NAN-KUN HUANG, YU-WEN KAO, CHIA-YIN TENG, CHING-HSUAN LIN
  • Publication number: 20190352317
    Abstract: The present disclosure provides a phosphorus-containing compound, which includes a structure represented by formula (I). Formula (I) is defined as in the specification. The present disclosure further provides a flame-retardant thermoset made by the phosphorus-containing compound including the structure represented by formula (I). The present disclosure also provides a manufacturing method for the phosphorus-containing compound.
    Type: Application
    Filed: May 21, 2019
    Publication date: November 21, 2019
    Inventors: Ching-Hsuan LIN, Yu-Hsiang LIN, Po-Chun YANG, Yi-Ning CHIANG, Wen-Chang CHEN