Patents by Inventor Chul Kyu Kim

Chul Kyu Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11967269
    Abstract: A scan driver includes: a first transistor having a first electrode coupled to an output scan line, a second electrode coupled to a first power line, and a gate electrode coupled to a first node; a second transistor having a first electrode coupled to a first clock line, a second electrode coupled to the output scan line, and a gate electrode coupled to a second node; a third transistor having a first electrode coupled to the first node, a second electrode coupled to a first input scan line, and a gate electrode coupled to a second clock line; and a fourth transistor having a first electrode coupled to the second node and a second electrode and a gate electrode, which are coupled to a second input scan line, wherein the first input scan line and the second input scan line are different from each other.
    Type: Grant
    Filed: October 4, 2022
    Date of Patent: April 23, 2024
    Assignee: Samsung Display Co., Ltd.
    Inventors: Chul Kyu Kang, Sung Hwan Kim, Soo Hee Oh, Dong Sun Lee, Sang Moo Choi
  • Publication number: 20240126162
    Abstract: Disclosed is a blankmask for EUV lithography, including a reflective film, a capping film and a phase shift film which are sequentially formed on a substrate. The phase shift film includes a first layer containing niobium (Nb) and chrome (Cr), and a second layer containing tantalum (Ta) and silicon (Si). In the first layer, the content of niobium (Nb) ranges from 20 to 50 at %, and the content of chrome (Cr) content ranges from 10 to 40 at %. The blankmask can implement an excellent resolution and NILS, and implement a low DtC.
    Type: Application
    Filed: November 17, 2022
    Publication date: April 18, 2024
    Applicant: S&S TECH Co., Ltd.
    Inventors: Yong-Dae KIM, Jong-Hwa LEE, Chul-Kyu YANG
  • Publication number: 20240126163
    Abstract: Disclosed is a blankmask for EUV lithography, including a reflective film, a capping film, an etch stop film, a phase shift film, and a hard mask film which are sequentially formed on a substrate. The phase shift film contains ruthenium (Ru), and the etch stop film contains chrome (Cr) and niobium (Nb). In the etch stop film, the content of niobium (Nb) ranges from 20 to 50 at %, and the content of chrome (Cr) ranges from 10 to 40 at %. The hard mask film contains tantalum (Ta) and oxygen (O). The content of tantalum (Ta) in the hard mask film is higher than or equal to 50 at %. With the blankmask, it is possible to implement a high resolution and NILS during wafer printing, and implement DtC.
    Type: Application
    Filed: January 24, 2023
    Publication date: April 18, 2024
    Applicant: S&S TECH Co., Ltd.
    Inventors: Yong-Dae KIM, Chul-Kyu YANG, Mi-Kyung WOO
  • Publication number: 20240110031
    Abstract: The embodiments relate to a polyester film and a process for regenerating a polyester container using the same, which not only solve the environmental problems by improving the recyclability of polyester containers, but also are capable of enhancing the yield and productivity. The polyester film comprises a first layer comprising a first resin comprising a diol component and a dicarboxylic acid component; and a second layer laminated on one side of the first layer and comprising a second resin different from the first resin, wherein when the polyester film is cut with a polyethylene terephthalate container to form flakes and the flakes are thermally treated at a temperature of 200° C. to 220° C. for 60 minutes to 120 minutes, the clumping fraction is 8% or less.
    Type: Application
    Filed: December 14, 2023
    Publication date: April 4, 2024
    Applicants: SK microworks Co., Ltd., SK microworks America, Inc.
    Inventors: Chul Kyu KIM, Yongdeuk KIM, Joo Ho YANG
  • Patent number: 11940725
    Abstract: A blankmask for EUV lithography includes a substrate, a reflective layer, a capping layer, and a phase shift layer. The phase shift layer is made of a material containing ruthenium (Ru) and chromium (Cr), and a total content of ruthenium (Ru) and chromium (Cr) is 50 to 100 at %. The phase shift layer may further contain boron (B) or nitrogen (N). The phase shift layer of the present invention has a high relative reflectance (relative reflectance with respect to a reflectance of the reflective layer under the phase shift layer) with respect to a tantalum (Ta)-based phase shift layer and has a phase shift amount of 170 to 230°. It is possible to obtain excellent resolution when finally manufacturing a pattern of 7 nm or less by using a photomask manufactured using such a blankmask.
    Type: Grant
    Filed: December 6, 2021
    Date of Patent: March 26, 2024
    Assignee: S&S Tech Co., Ltd.
    Inventors: Cheol Shin, Yong-Dae Kim, Jong-Hwa Lee, Chul-Kyu Yang, Min-Kwang Park, Mi-Kyung Woo
  • Publication number: 20240099085
    Abstract: A display device includes a pixel. The pixel is electrically connected to a first power line, a second power line, and a data line. The pixel includes a first transistor, and a capacitor electrically connected between a gate electrode of the first transistor and an electrode of the first transistor. In a plan view, the data line extends in a second direction. The first power line extends in a first direction intersecting the second direction and overlaps the data line and the gate electrode of the first transistor. The second power line extends in the second direction, overlaps the data line, and overlaps the gate electrode of the first transistor.
    Type: Application
    Filed: August 8, 2023
    Publication date: March 21, 2024
    Applicant: Samsung Display Co., LTD.
    Inventors: Sung Chan HWANG, Dong Hyun KIM, Chul Kyu KANG, Hey Jin SHIN, Seo Won CHOE, Chae Han HYUN
  • Patent number: 11935471
    Abstract: An organic light emitting display device driven at a first driving frequency or a second driving frequency lower than the first driving frequency includes pixels coupled to first scan lines, second scan lines, and data lines, a first scan driver configured to supply scan signals to the first scan lines during a first period and a second period in one frame period, when the organic light emitting display device is driven at the second driving frequency, a second scan driver configured to supply scan signals to the second scan lines during the first period, when the organic light emitting display device is driven at the second driving frequency, and a data driver configured to supply a data signal to the data lines during the first period.
    Type: Grant
    Filed: March 7, 2022
    Date of Patent: March 19, 2024
    Assignee: Samsung Display Co., Ltd.
    Inventors: Yong Jae Kim, Jin Jeon, Chul Kyu Kang
  • Patent number: 11927880
    Abstract: A blankmask for extreme ultraviolet lithography includes a substrate, a reflective layer formed on the substrate, and a phase shift layer formed on the reflective layer. The phase shift layer contains niobium (Nb), and is made of a material containing one of tantalum (Ta), chromium (Cr), and ruthenium (Ru). A phase shift layer containing Nb and Ta has a relative reflectance of 5 to 20%, a phase shift layer containing Nb and Cr has a relative reflectance of 9 to 15%, and a phase shift layer containing Nb and Ru has a relative reflectance of 20% or more. The phase shift layer has a phase shift amount of 170 to 230°, and has a surface roughness of 0.5 nmRMS or less. It is possible to obtain excellent resolution when finally manufacturing a pattern of 7 nm or less by using a photomask manufactured using such a blankmask.
    Type: Grant
    Filed: January 10, 2022
    Date of Patent: March 12, 2024
    Assignee: S&S TECH Co., Ltd.
    Inventors: Yong-Dae Kim, Chul-Kyu Yang, Min-Kwang Park, Mi-Kyung Woo
  • Publication number: 20240002589
    Abstract: A polyester film according to an embodiment includes a polyester resin. The polyester resin includes a repeating unit having a cyclohexane skeleton and a repeating unit having a benzene ring. The polyester film has a base peak related to bending vibration of the benzene ring and a first peak related to C—O stretching vibration in a spectrum measured using a Fourier transform infrared spectrometer (FT-IR). The base peak is a peak at a wavenumber of 788 cm?1 to 798 cm?1. The first peak is a peak at a wavenumber of 1129 cm?1 to 1139 cm?1. The intensity of the base peak and the intensity of the first peak differ by ?0.05 to +0.05. According to an embodiment, a polyester resin having a controlled degree of crystallization can be applied to a film to impart excellent heat resistance, mechanical properties, and the like to the film.
    Type: Application
    Filed: June 30, 2023
    Publication date: January 4, 2024
    Applicant: SK microworks Co., Ltd.
    Inventors: Byeong Jae LIM, Young Min HEO, Chul Kyu KIM
  • Publication number: 20230416478
    Abstract: Disclosed is a polyester film comprising a polycyclohexylenedimethylene terephthalate resin having a degree of crystallinity of 36% or less as measured using a differential scanning calorimeter.
    Type: Application
    Filed: May 31, 2023
    Publication date: December 28, 2023
    Applicant: SK microworks Co., Ltd.
    Inventors: Byeong Jae LIM, Young Min HEO, Chul Kyu KIM, Ki Youn SONG
  • Publication number: 20230348662
    Abstract: A polyester film according to one embodiment uniformly shrinks during a heat-shrinking process as the shrinkage rate is adjusted for each temperature range, and thus after shrinkage the polyester film can be attached to a container without any defects in external appearance such as distortion or curling. Therefore, the polyester film according to said embodiment can be usefully applied, as a heat-shrinkable label or packaging material, to containers of various products comprising drinks or food.
    Type: Application
    Filed: September 30, 2021
    Publication date: November 2, 2023
    Inventors: Joo Ho YANG, Yong Deuk KIM, Chul Kyu KIM
  • Publication number: 20230331942
    Abstract: A polyester film according to an embodiment is characterized in that the shrinkage properties in a direction perpendicular to a main shrinkage direction are adjusted under certain heat treatment conditions, and thus further deformation of the polyester film can be suppressed even when the polyester film goes through a harsh retort process after being tightly adhered to a container by means of heat shrinkage. Thus, the polyester film according to the embodiment can be effectively applied, as a heat-shrinkable label or packing material, to containers of various products including retort food.
    Type: Application
    Filed: September 30, 2021
    Publication date: October 19, 2023
    Inventors: Joo Ho YANG, Yong Deuk KIM, Chul Kyu KIM
  • Patent number: 11711602
    Abstract: A camera module is provided. The camera module includes a lens module having at least one lens; a housing, configured to accommodate the lens module; and a driving unit, disposed between the lens module and the housing, and including a magnet portion and a coil portion, wherein the coil portion is disposed to surround the magnet portion.
    Type: Grant
    Filed: April 29, 2021
    Date of Patent: July 25, 2023
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Tae Ho Yun, Sang Jong Lee, Kyung Ho Lee, Chul Kyu Kim, Han Kim
  • Patent number: 11683569
    Abstract: An optical assembly includes: a camera module; at least one actuator configured to move the camera module; and a connection substrate having one end connected to the camera module such that at least a portion of the connection substrate is configured to move along with movement of the camera module. The connection substrate includes a rigidity reduction portion reducing rigidity of the connection substrate in a portion of the substrate in which distortion or warpage occurs according to the movement of the camera module.
    Type: Grant
    Filed: October 15, 2020
    Date of Patent: June 20, 2023
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Sung Han Kim, Han Kim, Young Bok Yoon, Seok Hwan Kim, Tae Ho Yun, Kyung Ho Lee, Jong Gil Won, Chul Kyu Kim, Jong Man Kim
  • Patent number: 11655062
    Abstract: A heat shrinkable film shows a heat shrinkage rate in the direction perpendicular to the main shrinkage direction that is not high even at high temperature and is printable thereon. The heat shrinkable film includes a polyester resin, wherein the heat shrinkage characteristics in the direction perpendicular to the main shrinkage direction satisfy the following Relationships 1 and 2: ?15??T70-65?0??Relationship 1 0??T100-95?5??Relationship 2 wherein ?TX-Y is a value obtained by subtracting heat shrinkage rate of the heat shrinkable film in the direction perpendicular to the main shrinkage direction after the heat shrinkable film is immersed in water bath for 10 seconds at Y° C. from heat shrinkage rate of the heat shrinkable film in the direction perpendicular to the main shrinkage direction after the heat shrinkable film is immersed in water bath for 10 seconds at X° C.
    Type: Grant
    Filed: March 31, 2021
    Date of Patent: May 23, 2023
    Assignee: SK microworks Co., Ltd.
    Inventors: Chul Kyu Kim, Yongdeuk Kim
  • Patent number: 11548996
    Abstract: The embodiments relate to a polyester film, which comprises a copolymerized polyester resin comprising a diol component and a dicarboxylic acid component and has a heat shrinkage rate of 30% or more in the main shrinkage direction upon thermal treatment at a temperature of 80° C. for 10 seconds and a melting point of 170° C. or higher as measured by differential scanning calorimetry, which not only solve the environmental problems by improving the recyclability of the polyester container, but also are capable of enhancing the yield and productivity, and a process for regenerating a polyester container using the same.
    Type: Grant
    Filed: April 30, 2019
    Date of Patent: January 10, 2023
    Assignees: SKC CO., LTD., SKC INC.
    Inventors: Dae Yong Shin, Yong Deuk Kim, Jung Kyu Lee, Jaehyong Son, Eugene Jung, Chul Kyu Kim, Joo Ho Yang
  • Publication number: 20230002574
    Abstract: The polyester film according to the embodiment prepared while the crystallinity of a copolymerized polyester film is controlled can be improved in thermal properties and chemical properties. Specifically, the polyester film has not only an excellent shrinkage rate with respect to temperature, but also excellent adhesive strength by a solvent even when applied to gravure printing, UV curing printing, and VSOP printing, making it suitable for a heat shrinkage process and a seaming process. In addition, the polyester film can be applied to a recycling process since it has an appropriate change in crystals during washing with an aqueous solution of NaOH, and the generation of fusion is suppressed even upon prolonged high-temperature drying.
    Type: Application
    Filed: May 27, 2022
    Publication date: January 5, 2023
    Inventors: Joo Ho YANG, Chul Kyu KIM, Yong Deuk KIM, Seung Kyun KIM
  • Patent number: 11466135
    Abstract: The embodiments relate to a polyester film, to a process for preparing the same, and to a process for regenerating a polyethylene terephthalate (PET) container using the same. The polyester film has excellent seaming characteristics and recyclability by virtue of controlled crystallinity, whereby clumping rarely occurs even if it is thermally treated for a long period of time in the regeneration process.
    Type: Grant
    Filed: May 3, 2021
    Date of Patent: October 11, 2022
    Assignees: SKC CO., LTD., SKC INC.
    Inventors: Joo Ho Yang, Chul Kyu Kim, Yong Deuk Kim
  • Publication number: 20220235187
    Abstract: The embodiments relate to a polyester film, to a process for preparing the same, and to a process for regenerating a polyethylene terephthalate (PET) container using the same. The polyester film has excellent seaming characteristics and recyclability by virtue of controlled crystallinity, whereby clumping rarely occurs even if it is thermally treated for a long period of time in the regeneration process.
    Type: Application
    Filed: May 3, 2021
    Publication date: July 28, 2022
    Inventors: Joo Ho YANG, Chul Kyu KIM, Yong Deuk KIM
  • Patent number: 11396577
    Abstract: Embodiments relate to a polyester-based film and a process for regenerating a polyester-based container using the same, which not only solve the environmental problems by enhancing the recyclability of polyester-based containers but also are capable of enhancing the quality, yield, and productivity. When the polyester-based film is cut into a size of 1 cm in width and 1 cm in length, immersed in an aqueous solution of sodium hydroxide (NaOH) having a concentration of 1% by weight, and stirred for 15 minutes at 85° C. at a speed of 240 m/minute, the average particle size of the component of the printing layer separated from the base layer satisfies 15 ?m or more. Thus, it is possible to enhance the quality of the regenerated polyester-based chips produced from the polyester-based container provided with the polyester-based film.
    Type: Grant
    Filed: October 22, 2020
    Date of Patent: July 26, 2022
    Assignees: SKC CO., LTD., SKC INC.
    Inventors: Chul Kyu Kim, Yong Deuk Kim, Joo Ho Yang, Eugene Jung, Hyuk Soo Lee