Patents by Inventor Chun Che Lin

Chun Che Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210043670
    Abstract: An image sensor device includes a semiconductor device, a plurality of photo sensitive regions, a dielectric layer, a grid structure, and a plurality of convex dielectric lenses. The plurality of photo sensitive regions are in the semiconductor substrate. The dielectric layer is on a backside surface of the semiconductor substrate facing away from the plurality of photo sensitive regions. The grid structure is on a backside surface of the dielectric layer facing away from the semiconductor substrate. The grid structure includes a plurality of grid lines spaced from each other. The plurality of convex dielectric lenses are alternately arranged with the plurality of grid lines of the grid structure on the backside surface of the dielectric layer. Apexes of the plurality of convex dielectric lenses are lower than top ends of the plurality of grid lines of the grid structure.
    Type: Application
    Filed: October 23, 2020
    Publication date: February 11, 2021
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Shiu-Ko JANGJIAN, Chih-Nan WU, Chun-Che LIN, Yu-Ku LIN
  • Publication number: 20210043632
    Abstract: A method for fabricating a buried word line (BWL) of a dynamic random access memory (DRAM) includes the steps of: forming a first doped region in a substrate; removing part of the first doped region to form a trench in the substrate; forming a gate structure in the trench; and forming a barrier structure between the gate structure and the first doped region.
    Type: Application
    Filed: October 26, 2020
    Publication date: February 11, 2021
    Inventors: Feng-Yi Chang, Chun-Hsien Lin, Fu-Che Lee
  • Patent number: 10868063
    Abstract: A method comprises forming an image sensor adjacent to a first side of a substrate, thinning a second side of the substrate, performing a halogen treatment on the second side of the substrate and forming a backside illumination layer on the second side of the substrate.
    Type: Grant
    Filed: April 18, 2018
    Date of Patent: December 15, 2020
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Shiu-Ko JangJian, Chin-Nan Wu, Chun Che Lin
  • Patent number: 10866658
    Abstract: An indicator device is suitable for a mixed reality device. The indicator device includes a body, a light source unit, at least two positioning elements, a triggering unit and a control unit. The light source unit is disposed on the body and generates a light source. The two elements are disposed separately on the body, wherein the light source unit and the positioning elements are disposed on different axes. The triggering unit is disposed on the body and generates a trigger signal. The control unit is disposed inside the body and is connected to the light source unit and the triggering unit. The control unit receives the trigger signal to generate a first control signal, thereby controlling the light-emitting state of the light source.
    Type: Grant
    Filed: December 20, 2018
    Date of Patent: December 15, 2020
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Shih-Bin Luo, Chun-Chuan Lin, Wen-Hung Cheng, Ming-Che Wang
  • Patent number: 10861701
    Abstract: A semiconductor device includes a substrate, at least one layer, a metal adhesive, and a metal structure. The layer is disposed on the substrate. The layer has an opening, and the opening has a bottom surface and at least one sidewall. The metal adhesive is disposed on the bottom surface of the opening while leaving at least a portion of the sidewall of the opening exposed. The metal structure is disposed in the opening and on the metal adhesive.
    Type: Grant
    Filed: June 29, 2015
    Date of Patent: December 8, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Jia-Ming Lin, Shiu-Ko Jangjian, Chun-Che Lin
  • Patent number: 10854613
    Abstract: A method for fabricating a buried word line (BWL) of a dynamic random access memory (DRAM) includes the steps of: forming a first doped region in a substrate; removing part of the first doped region to form a trench in the substrate; forming a gate structure in the trench; and forming a barrier structure between the gate structure and the first doped region.
    Type: Grant
    Filed: May 8, 2019
    Date of Patent: December 1, 2020
    Assignees: UNITED MICROELECTRONICS CORP., Fujian Jinhua Integrated Circuit Co., Ltd.
    Inventors: Feng-Yi Chang, Chun-Hsien Lin, Fu-Che Lee
  • Patent number: 10854713
    Abstract: A method includes forming a flowable dielectric layer in a trench of a substrate; curing the flowable dielectric layer; and annealing the cured flowable dielectric layer to form an insulation structure and a liner layer. The insulation structure is formed in the trench, the liner layer is formed between the insulation structure and the substrate, and the liner layer includes nitrogen.
    Type: Grant
    Filed: January 8, 2018
    Date of Patent: December 1, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Jia-Ming Lin, Shiu-Ko Jangjian, Chun-Che Lin, Ying-Lang Wang, Wei-Ken Lin, Chuan-Pu Liu
  • Publication number: 20200350244
    Abstract: An integrated circuit structure includes a dielectric layer and an etch stop layer. The etch stop layer includes a first sub layer including a metal nitride over the first dielectric layer, and a second sub layer overlying or underlying the first sub layer. The second sub layer includes a metal compound comprising an element selected from carbon and oxygen, and is in contact with the first sub layer.
    Type: Application
    Filed: July 20, 2020
    Publication date: November 5, 2020
    Inventors: Shiu-Ko JangJian, Tsung-Hsuan Hong, Chun Che Lin, Chih-Nan Wu
  • Patent number: 10818716
    Abstract: An image sensor device includes a substrate, a pixel circuit, a dielectric structure, a photo sensitive element, a grid, and a convex dielectric lens. The substrate has a first side and a second side opposite to the first side. The pixel circuit is disposed on the first side of the substrate. The dielectric structure is disposed on the second side of the substrate. The photo sensitive element is disposed between the pixel circuit and the dielectric structure. The grid is disposed on the dielectric structure. The convex dielectric lens is disposed on the dielectric structure. The convex dielectric lens has a convex side. A topmost of the convex side is above an interface between the dielectric structure and the grid.
    Type: Grant
    Filed: July 29, 2019
    Date of Patent: October 27, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Shiu-Ko Jangjian, Chih-Nan Wu, Chun-Che Lin, Yu-Ku Lin
  • Patent number: 10797176
    Abstract: An improved conductive feature for a semiconductor device and a technique for forming the feature are provided. In an exemplary embodiment, the semiconductor device includes a substrate having a gate structure formed thereupon. The gate structure includes a gate dielectric layer disposed on the substrate, a growth control material disposed on a side surface of the gate structure, and a gate electrode fill material disposed on the growth control material. The gate electrode fill material is also disposed on a bottom surface of the gate structure that is free of the growth control material. In some such embodiments, the gate electrode fill material contacts a first surface and a second surface that are different in composition.
    Type: Grant
    Filed: October 22, 2018
    Date of Patent: October 6, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chih-Nan Wu, Shiu-Ko JangJian, Chun Che Lin, Wen-Cheng Hsuku
  • Publication number: 20200236768
    Abstract: An extreme ultra-violet (EUV) lithography system includes an EUV source and EUV scanner. A droplet generator provides a droplet stream in the EUV source. A gas shield is configured to surround the droplet stream. When a laser reacts a droplet in the stream EUV radiation and ionized particles are produced. The gas shield can reduce contamination resulting from the ionized particles by conveying the ionized particles to a droplet catcher. Components of the EUV source may be biased with a voltage to repel or attract ionized particles to reduce contamination from the ionized particles.
    Type: Application
    Filed: April 3, 2020
    Publication date: July 23, 2020
    Inventors: Ming-Fa Wu, Tzung-Chi Fu, Chun Che Lin, Po-Chung Cheng, Huai-Tei Yang
  • Patent number: 10720386
    Abstract: An integrated circuit structure includes a dielectric layer and an etch stop layer. The etch stop layer includes a first sub layer including a metal nitride over the first dielectric layer, and a second sub layer overlying or underlying the first sub layer. The second sub layer includes a metal compound comprising an element selected from carbon and oxygen, and is in contact with the first sub layer.
    Type: Grant
    Filed: October 1, 2018
    Date of Patent: July 21, 2020
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Shiu-Ko JangJian, Tsung-Hsuan Hong, Chun Che Lin, Chih-Nan Wu
  • Patent number: 10699119
    Abstract: Methods and systems for detecting objects from aerial imagery are disclosed. The method includes obtaining an image of an area, obtaining a plurality of regional aerial images from the image of the area, classifying the plurality of regional aerial images as a first class or a second class by a classifier, wherein: the first class indicates a regional aerial image contains a target object, the second class indicates a regional aerial image does not contain a target object, and the classifier is trained by first and second training data, wherein the first training data include first training images containing target objects, and the second training data include second training images containing target objects obtained by adjusting at least one of brightness, contrast, color saturation, resolution, or a rotation angle of the first training images; and recognizing a target object in a regional aerial image in the first class.
    Type: Grant
    Filed: December 20, 2019
    Date of Patent: June 30, 2020
    Assignee: GEOSAT AEROSPACE & TECHNOLOGY
    Inventors: Cheng-Fang Lo, Zih-Siou Chen, Chang-Rong Ko, Chun-Yi Wu, Ya-Wen Cheng, Kuang-Yu Chen, Hsiu-Hsien Wen, Te-Che Lin, Ting-Jung Chang
  • Publication number: 20200201452
    Abstract: An indicator device is suitable for a mixed reality device. The indicator device includes a body, a light source unit, at least two positioning elements, a triggering unit and a control unit. The light source unit is disposed on the body and generates a light source. The two elements are disposed separately on the body, wherein the light source unit and the positioning elements are disposed on different axes. The triggering unit is disposed on the body and generates a trigger signal. The control unit is disposed inside the body and is connected to the light source unit and the triggering unit. The control unit receives the trigger signal to generate a first control signal, thereby controlling the light-emitting state of the light source.
    Type: Application
    Filed: December 20, 2018
    Publication date: June 25, 2020
    Applicant: Industrial Technology Research Institute
    Inventors: Shih-Bin LUO, Chun-Chuan LIN, Wen-Hung CHENG, Ming-Che WANG
  • Patent number: 10658252
    Abstract: A semiconductor structure with a stop layer for planarization process therein and a method for forming the same is disclosed. The method includes the steps of: forming a trench in a substrate and between active areas; filling the trench with isolation layer; doping the isolation layer with an element to form a doped isolation region; annealing the doped isolation region; and planarizing the annealed and doped isolation region and measuring a planarization depth thereof. The coefficients of thermal expansion (CTEs) of the stop layer, the dielectric layer, and the active area are different.
    Type: Grant
    Filed: April 22, 2019
    Date of Patent: May 19, 2020
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Jia-Ming Lin, Wei-Ken Lin, Shiu-Ko JangJian, Chun-Che Lin
  • Patent number: 10637071
    Abstract: A catalyst composition and a use thereof are provided. The catalyst composition includes a support and at least one RuXMY alloy attached to the surface of the support, wherein M is a transition metal and X?Y. The catalyst composition is used in an alkaline electrochemical energy conversion reaction, and can improve the energy conversion efficiency for an electrochemical energy conversion device and significantly reduce material costs.
    Type: Grant
    Filed: December 27, 2016
    Date of Patent: April 28, 2020
    Assignee: Industrial Technology Research Institute
    Inventors: Chiu-Ping Huang, Li-Duan Tsai, Bing-Joe Hwang, Chun-Jern Pan, Hao-Sheng Cheng, Yu-Hsiang Mao, Meng-Che Tsai, Jiunn-Nan Lin
  • Publication number: 20200125823
    Abstract: Methods and systems for detecting objects from aerial imagery are disclosed. The method includes obtaining an image of an area, obtaining a plurality of regional aerial images from the image of the area, classifying the plurality of regional aerial images as a first class or a second class by a classifier, wherein: the first class indicates a regional aerial image contains a target object, the second class indicates a regional aerial image does not contain a target object, and the classifier is trained by first and second training data, wherein the first training data include first training images containing target objects, and the second training data include second training images containing target objects obtained by adjusting at least one of brightness, contrast, color saturation, resolution, or a rotation angle of the first training images; and recognizing a target object in a regional aerial image in the first class.
    Type: Application
    Filed: December 20, 2019
    Publication date: April 23, 2020
    Applicant: GEOSAT Aerospace & Technology
    Inventors: Cheng-Fang LO, Zih-Siou CHEN, Chang-Rong KO, Chun-Yi WU, Ya-Wen CHENG, Kuang-Yu CHEN, Hsiu-Hsien WEN, Te-Che LIN, Ting-Jung CHANG
  • Patent number: 10631392
    Abstract: An extreme ultra-violet (EUV) lithography system includes an EUV source and EUV scanner. A droplet generator provides a droplet stream in the EUV source. A gas shield is configured to surround the droplet stream. When a laser reacts a droplet in the stream, EUV radiation and ionized particles are produced. The gas shield can reduce contamination resulting from the ionized particles by conveying the ionized particles to a droplet catcher. Components of the EUV source may be biased with a voltage to repel or attract ionized particles to reduce contamination from the ionized particles.
    Type: Grant
    Filed: April 30, 2018
    Date of Patent: April 21, 2020
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Ming-Fa Wu, Tzung-Chi Fu, Chun-Che Lin, Po-Chung Cheng, Huai-Tei Yang
  • Patent number: 10613297
    Abstract: An image capturing assembly includes six lens elements, the six lens elements being, in order from an object side to an image side, a first lens element, a second lens element, a third lens element, a fourth lens element, a fifth lens element and a sixth lens element. The first lens element has positive refractive power. The fourth lens element with positive refractive power has an image-side surface being convex. The fifth lens element has an image-side surface being concave. The sixth lens element has an image-side surface being concave, wherein the image-side surface of the sixth lens element includes at least one inflection point.
    Type: Grant
    Filed: August 15, 2017
    Date of Patent: April 7, 2020
    Assignee: LARGAN PRECISION CO., LTD.
    Inventors: Tung-Yi Hsieh, Cheng-Chen Lin, Chun-Che Hsueh, Chun-Yen Chen, Hsin-Hsuan Huang
  • Publication number: 20200107396
    Abstract: A user equipment (UE) and a base station (BS) for a mobile communication system are provided. The UE performs a random access (RA) procedure with the BS in a radio resource control (RRC) idle mode. The UE transmits a preconfigured uplink resource request message to the BS and receives a configuration message indicating a preconfigured uplink resource from the BS. The UE starts a time alignment timer (TAT) which is used for the RRC idle mode in response to the RA procedure. When the UE determines that there exists an uplink message to be transmitted in the RRC idle mode and determines that the current timing advance (TA) value is valid, the UE transmits the uplink message on the preconfigured uplink resource.
    Type: Application
    Filed: September 26, 2019
    Publication date: April 2, 2020
    Inventors: Hai-Han WANG, Yi-Ting LIN, Chun-Che CHIEN, Chiu-Wen CHEN