Patents by Inventor Chun-Ming Wang
Chun-Ming Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20250033965Abstract: A hypochlorous acid preparation system is provided. The hypochlorous acid preparation system includes: a hypochlorous acid preparation apparatus comprising: a first inlet, wherein sulfuric acid collected from a clean room located in a semiconductor fabrication plant enters the hypochlorous acid preparation apparatus through the first inlet; a second inlet, wherein sodium hypochlorite solution enters the hypochlorous acid preparation apparatus through the second inlet; a third inlet, wherein deionized water enters the hypochlorous acid preparation apparatus through the third inlet; and an outlet, wherein hypochlorous acid is produced in situ by mixing the sulfuric acid, the sodium hypochlorite solution, and the deionized water and exits the hypochlorous acid preparation apparatus through the outlet.Type: ApplicationFiled: July 28, 2023Publication date: January 30, 2025Inventors: Chun-Ming Wang, Hsien-Li He, Cheng-Chieh Chen, Po-Hsuan Huang, Wan-Yu Chao
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Patent number: 10638828Abstract: An adjustable container carrying strap structure includes a strip-shaped carrying strap and a container sleeving assembly. The strip-shaped carrying strap includes a first end, a second end, and a carrying strap body. The container sleeving assembly includes two sleeve ropes and an adjusting element, where each sleeve rope includes a first rope end, a second rope end, and a rope body, the first rope end of each sleeve rope is connected to the first end, the second rope end of each sleeve rope is connected to the second end, and the adjusting element is assembled on the two rope bodies of the two sleeve ropes, so that the adjusting element, the two rope bodies, and the first end of the strip-shaped carrying strap encircle a container sleeving hole. The adjusting element can slide relatively along the two rope bodies so as to adjust the size of the container sleeving hole.Type: GrantFiled: July 1, 2019Date of Patent: May 5, 2020Assignee: WLD PRODUCTION CO., LTD.Inventors: Chun-Ming Wang, Lee Lin
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Patent number: 10553537Abstract: A device structure includes an array of semiconductor devices located in an array region over a substrate, metal lines laterally extending from the device region to a peripheral interconnection region, and interconnect via structures located in the peripheral interconnection region, and contacting a portion of a respective one of the plurality of metal lines. The metal lines include a first metal line and a second metal line each having a serpentine region which contacts a respective interconnect via structure.Type: GrantFiled: February 17, 2018Date of Patent: February 4, 2020Assignee: SANDISK TECHNOLOGIES LLCInventors: Yuji Takahashi, Chenche Huang, Chun-Ming Wang, Vincent Shih
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Publication number: 20200008563Abstract: An adjustable container carrying strap structure includes a strip-shaped carrying strap and a container sleeving assembly. The strip-shaped carrying strap includes a first end, a second end, and a carrying strap body. The container sleeving assembly includes two sleeve ropes and an adjusting element, where each sleeve rope includes a first rope end, a second rope end, and a rope body, the first rope end of each sleeve rope is connected to the first end, the second rope end of each sleeve rope is connected to the second end, and the adjusting element is assembled on the two rope bodies of the two sleeve ropes, so that the adjusting element, the two rope bodies, and the first end of the strip-shaped carrying strap encircle a container sleeving hole. The adjusting element can slide relatively along the two rope bodies so as to adjust the size of the container sleeving hole.Type: ApplicationFiled: July 1, 2019Publication date: January 9, 2020Inventors: Chun-Ming Wang, Lee Lin
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Publication number: 20190259698Abstract: A device structure includes an array of semiconductor devices located in an array region over a substrate, metal lines laterally extending from the device region to a peripheral interconnection region, and interconnect via structures located in the peripheral interconnection region, and contacting a portion of a respective one of the plurality of metal lines. The metal lines include a first metal line and a second metal line each having a serpentine region which contacts a respective interconnect via structure.Type: ApplicationFiled: February 17, 2018Publication date: August 22, 2019Inventors: Yuji Takahashi, Chenche Huang, Chun-Ming Wang, Vincent Shih
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Patent number: 9859363Abstract: A method of dividing drain select gate electrodes in a three-dimensional vertical memory device is provided. An alternating stack of insulating layers and spacer material layers is formed over a substrate. A first insulating cap layer is formed over the alternating stack. A plurality of memory stack structures is formed through the alternating stack and the first insulating cap layer. The first insulating cap layer is vertically recessed, and a conformal material layer is formed over protruding portions of the memory stack structures. Spacer portions are formed by an anisotropic etch of the conformal material layer such that the sidewalls of the spacer portions having protruding portions. A self-aligned separator trench with non-uniform sidewalls having protruding portions is formed through an upper portion of the alternating stack by etching the upper portions of the alternating stack between the spacer portions.Type: GrantFiled: May 16, 2016Date of Patent: January 2, 2018Assignee: SANDISK TECHNOLOGIES LLCInventors: Zhenyu Lu, Kota Funayama, Chun-Ming Wang, Jixin Yu, Chenche Huang, Tong Zhang, Daxin Mao, Johann Alsmeier, Makoto Yoshida, Lauren Matsumoto
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Publication number: 20170236896Abstract: A method of dividing drain select gate electrodes in a three-dimensional vertical memory device is provided. An alternating stack of insulating layers and spacer material layers is formed over a substrate. A first insulating cap layer is formed over the alternating stack. A plurality of memory stack structures is formed through the alternating stack and the first insulating cap layer. The first insulating cap layer is vertically recessed, and a conformal material layer is formed over protruding portions of the memory stack structures. Spacer portions are formed by an anisotropic etch of the conformal material layer such that the sidewalls of the spacer portions having protruding portions. A self-aligned separator trench with non-uniform sidewalls having protruding portions is formed through an upper portion of the alternating stack by etching the upper portions of the alternating stack between the spacer portions.Type: ApplicationFiled: May 16, 2016Publication date: August 17, 2017Inventors: Zhenyu LU, Kota FUNAYAMA, Chun-Ming WANG, Jixin YU, Chenche HUANG, Tong ZHANG, Daxin MAO, Johann ALSMEIER, Makoto YOSHIDA, Lauren MATSUMOTO
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Patent number: 9690143Abstract: A system for displaying images including a display panel is provided. The display panel has a display area and a peripheral area. The display panel includes a metal layer disposed on a first substrate. A second substrate is disposed opposite to the first substrate. A seal is disposed at the peripheral area and between the first and the second substrates and at the peripheral area. A patterned planarization layer is disposed on the first substrate, including an opening and two sidewalls, wherein the opening is located between the two sidewalls and corresponding to the peripheral area. A passivation layer is disposed between the seal and the first substrate, and wherein a portion of the seal is disposed between the two sidewalls of the patterned planarization layer.Type: GrantFiled: May 25, 2016Date of Patent: June 27, 2017Assignees: INNOCOM TECHNOLOGY (SHENZHEN) CO., LTD., INNOLUX CORPORATIONInventors: Chun-Ming Wang, Hsixg-Ju Sung, Te-Yu Lee
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Patent number: 9613975Abstract: A structure is formed on a substrate, which includes a stack of alternating layers comprising insulating layers and electrically conductive layers and a plurality of memory stack structures extending through the stack. At least one bridge line structure is formed on top surfaces of a respective subset of the plurality of memory stack structures to provide local lateral electrical connection. At least one dielectric material layer is formed over the at least one bridge line structure and the plurality of memory stack structures. A plurality contact via structures is formed through the dielectric material layer. The plurality of contact via structures includes at least one first contact via structure contacting a top surface of a respective bridge line structure, and second contact via structures contacting a top surface of a respective memory stack structure.Type: GrantFiled: March 31, 2015Date of Patent: April 4, 2017Assignee: SANDISK TECHNOLOGIES LLCInventors: Chenche Huang, Chun-Ming Wang, Yuki Mizutani, Hiroaki Koketsu, Masayuki Hiroi, Masaaki Higashitani
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Publication number: 20160293621Abstract: A structure is formed on a substrate, which includes a stack of alternating layers comprising insulating layers and electrically conductive layers and a plurality of memory stack structures extending through the stack. At least one bridge line structure is formed on top surfaces of a respective subset of the plurality of memory stack structures to provide local lateral electrical connection. At least one dielectric material layer is formed over the at least one bridge line structure and the plurality of memory stack structures. A plurality contact via structures is formed through the dielectric material layer. The plurality of contact via structures includes at least one first contact via structure contacting a top surface of a respective bridge line structure, and second contact via structures contacting a top surface of a respective memory stack structure.Type: ApplicationFiled: March 31, 2015Publication date: October 6, 2016Inventors: Chenche Huang, Chun-Ming Wang, Yuki Mizutani, Hiroaki Koketsu, Masayuki Hiroi, Masaaki Higashitani
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Publication number: 20160266424Abstract: A system for displaying images including a display panel is provided. The display panel has a display area and a peripheral area. The display panel includes a metal layer disposed on a first substrate. A second substrate is disposed opposite to the first substrate. A seal is disposed at the peripheral area and between the first and the second substrates and at the peripheral area. A patterned planarization layer is disposed on the first substrate, including an opening and two sidewalls, wherein the opening is located between the two sidewalls and corresponding to the peripheral area. A passivation layer is disposed between the seal and the first substrate, and wherein a portion of the seal is disposed between the two sidewalls of the patterned planarization layer.Type: ApplicationFiled: May 25, 2016Publication date: September 15, 2016Inventors: Chun-Ming WANG, Hsixg-Ju SUNG, Te-Yu LEE
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Patent number: 9377654Abstract: A system for displaying images including a display panel is provided. The display panel has a display area and a peripheral area. The display panel includes a metal layer disposed on a first substrate. A second substrate is disposed opposite to the first substrate. A seal is disposed at the peripheral area and between the first and the second substrates and at the peripheral area. A patterned planarization layer is disposed on the first substrate. A passivation layer disposed between the seal and the first substrate, wherein the seal is in contact with a sidewall of the passivation layer.Type: GrantFiled: October 5, 2015Date of Patent: June 28, 2016Assignees: INNOCOM TECHNOLOGY(SHENZHEN) CO., LTD, INNOLUX CORPORATIONInventors: Chun-Ming Wang, Hsixg-Ju Sung, Te-Yu Lee
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Patent number: 9372367Abstract: A system for displaying images including a display panel is provided. The display panel has a display area and a peripheral area. The display panel includes a metal layer disposed on a first substrate. A patterned planarization layer is disposed on the metal layer, having at least one opening corresponding to the peripheral area, wherein a portion of the metal layer is disposed in the opening. A second substrate is disposed opposite to the first substrate. A seal is disposed at the peripheral area and between the first and the second substrates, wherein the seal covers the metal layer through the opening of the patterned planarization layer. A passivation layer disposed on the portion of the metal layer and covering a sidewall of the patterned planarization layer to form a first passivation sidewall, wherein the seal is in contact with the first passivation sidewall.Type: GrantFiled: October 5, 2015Date of Patent: June 21, 2016Assignees: INNOCOM TECHNOLOGY(SHENZHEN) CO., LTD, INNOLUX CORPORATIONInventors: Chun-Ming Wang, Hsixg-Ju Sung, Te-Yu Lee
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Publication number: 20160026020Abstract: A system for displaying images including a display panel is provided. The display panel has a display area and a peripheral area. The display panel includes a metal layer disposed on a first substrate. A patterned planarization layer is disposed on the metal layer, having at least one opening corresponding to the peripheral area, wherein a portion of the metal layer is disposed in the opening. A second substrate is disposed opposite to the first substrate. A seal is disposed at the peripheral area and between the first and the second substrates, wherein the seal covers the metal layer through the opening of the patterned planarization layer. A passivation layer disposed on the portion of the metal layer and covering a sidewall of the patterned planarization layer to form a first passivation sidewall, wherein the seal is in contact with the first passivation sidewall.Type: ApplicationFiled: October 5, 2015Publication date: January 28, 2016Inventors: Chun-Ming WANG, Hsixg-Ju SUNG, Te-Yu LEE
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Publication number: 20160026021Abstract: A system for displaying images including a display panel is provided. The display panel has a display area and a peripheral area. The display panel includes a metal layer disposed on a first substrate. A second substrate is disposed opposite to the first substrate. A seal is disposed at the peripheral area and between the first and the second substrates and at the peripheral area. A patterned planarization layer is disposed on the first substrate. A passivation layer disposed between the seal and the first substrate, wherein the seal is in contact with a sidewall of the passivation layer.Type: ApplicationFiled: October 5, 2015Publication date: January 28, 2016Inventors: Chun-Ming WANG, Hsixg-Ju SUNG, Te-Yu LEE
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Patent number: 9176345Abstract: A system for displaying images including a display panel is provided. The display panel has a display area and a peripheral area. The display panel includes a metal layer disposed on a first substrate. A patterned planarization layer is disposed on the metal layer, having at least one opening corresponding to the peripheral area, wherein a portion of the metal layer is exposed through the opening. A second substrate is disposed opposite to the first substrate. A seal is disposed at the peripheral area and between the first and the second substrates, wherein the seal covers the metal layer through the opening of the patterned planarization layer.Type: GrantFiled: May 18, 2015Date of Patent: November 3, 2015Assignees: INNOCOM TECHNOLOGY(SHENZHEN) CO., LTD., INNOLUX CORPORATIONInventors: Chun-Ming Wang, Hsixg-Ju Sung, Te-Yu Lee
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Publication number: 20150248028Abstract: A system for displaying images including a display panel is provided. The display panel has a display area and a peripheral area. The display panel includes a metal layer disposed on a first substrate. A patterned planarization layer is disposed on the metal layer, having at least one opening corresponding to the peripheral area, wherein a portion of the metal layer is exposed through the opening. A second substrate is disposed opposite to the first substrate. A seal is disposed at the peripheral area and between the first and the second substrates, wherein the seal covers the metal layer through the opening of the patterned planarization layer.Type: ApplicationFiled: May 18, 2015Publication date: September 3, 2015Inventors: Chun-Ming WANG, Hsixg-Ju SUNG, Te-Yu LEE
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Patent number: 9069463Abstract: An operating method for dynamically adjusting a touch apparatus is disclosed herein. The touch apparatus includes a storage component and a touch component. The storage component is configured to store at least one application, and a plurality of weights of touch motion modes and touch motion modes corresponding to the application. The operating method includes determining whether execution of the application has started. When execution of the application has started, a plurality of touch motions corresponding to the executed application are received through the touch component. At least one of the weights of touch motion modes corresponding to the executed application is adjusted according to the touch motions. At least one of touch parameters is adjusted according to the weights of touch motion modes corresponding to the executed application.Type: GrantFiled: September 18, 2013Date of Patent: June 30, 2015Assignee: COMPAL ELECTRONICS, INC.Inventors: Ming-Yu Chang, Chun-Ming Wang, Yun-Rui Chen, Chia-Hui Chen, Wen-Han Li, Fei-Zhi Guo, Ping-Hsien Niu
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Publication number: 20140285447Abstract: An operating method for dynamically adjusting a touch apparatus is disclosed herein. The touch apparatus includes a storage component and a touch component. The storage component is configured to store at least one application, and a plurality of weights of touch motion modes and touch motion modes corresponding to the application. The operating method includes determining whether execution of the application has started. When execution of the application has started, a plurality of touch motions corresponding to the executed application are received through the touch component. At least one of the weights of touch motion modes corresponding to the executed application is adjusted according to the touch motions. At least one of touch parameters is adjusted according to the weights of touch motion modes corresponding to the executed application.Type: ApplicationFiled: September 18, 2013Publication date: September 25, 2014Applicant: COMPAL ELECTRONICS, INC.Inventors: Ming-Yu CHANG, Chun-Ming WANG, Yun-Rui CHEN, Chia-Hui Chen, Wen-Han LI, Fei-Zhi GUO, Ping-Hsien NIU
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Patent number: 8658335Abstract: A lithography mask includes a plurality of patterning features formed on a mask substrate and a first plurality of sub-resolution assist features (SRAFs) formed substantially perpendicular to the patterning features on the mask substrate.Type: GrantFiled: October 16, 2012Date of Patent: February 25, 2014Assignee: SanDisk Technologies Inc.Inventors: Chen-Che Huang, Chun-Ming Wang, Masaaki Higashitani