Abstract: A multifunctional opener includes a main body having two opposite sides formed with two upright clamping portions and having an inside formed with an engaging recess located between the two clamping portions. Thus, the clamping groove and the engaging recess of the main body are used to open seal caps of different sizes, thereby enhancing the versatility of the opener. In addition, the clamping groove or the engaging recess of the main body is engaged with the periphery of the seal cap so that the seal cap is closely clamped by the main body, thereby facilitating a user opening the seal cap.

Abstract: A method for in-line monitoring of via/contact etching process based on a test structure is described. The test structure is comprised of via/contact holes of different sizes and densities in a layout such that, for a certain process, the microloading or RIE lag induced non-uniform etch rate produce under-etch in some regions and over-etch in others. A scanning electron microscope is used to distinguish these etching differences in voltage contrast images. Image processing and simple calibration convert these voltage contrast images into a “fingerprint” image characterizing the etching process in terms of thickness over-etched or under-etched. Tolerance of shifting or deformation of this image can be set for validating the process uniformity. This image can also be used as a measure to monitor long-term process parameter shifting, as well as wafer-to-wafer or lot-to-lot variations.

Abstract: A method for in-line monitoring of via/contact etching process based on a test structure is described. The test structure is comprised of via/contact holes of different sizes and densities in a layout such that, for a certain process, the microloading or RIE lag induced non-uniform etch rate produce under-etch in some regions and over-etch in others. A scanning electron microscope is used to distinguish these etching differences in voltage contrast images. Image processing and simple calibration convert these voltage contrast images into a “fingerprint” image characterizing the etching process in terms of thickness over-etched or under-etched. Tolerance of shifting or deformation of this image can be set for validating the process uniformity. This image can also be used as a measure to monitor long-term process parameter shifting, as well as wafer-to-wafer or lot-to-lot variations.

Abstract: The subject invention provides a system and/or method that facilitates prescribing a navigation within an application utilizing a topology and a navigation path. The topology is created based upon received metadata and is a network of node objects and link objects. The navigation path is a sequential list over the topology that represents a sub-graph thereof. A prescribing component can create the topology and navigation path such that a prescribed navigation can be utilized by an application during navigation (e.g., exploration) during runtime.

Abstract: A pulse duty cycle automatic correction device has a pulse width detector for detecting the high, low level pulse widths of the input cycle pulse so as to generate high, low level signals; a comparator encoder for comparing the high, low level signals, calculating out a correction delay time, and generating a correction delay signal and an output selection signal; a delay circuit for generating a delay cycle pulse; a compensation circuit for compensating the input cycle pulse so as to generate an input compensation pulse; a logic circuit for generating two cycle pulses according to the delay cycle pulse and the input compensation pulse; and a multiplexer for receiving the two cycle pulses and the input cycle pulse, and generating the output cycle pulse with duty cycle of 50% according to the output selection signal.

Abstract: A system is designed to fix and recuperate the deformed vertebrae and is formed of a vertebrae-clamping device and an intervertebral fixation block. The vertebrae-clamping device includes two fixation hooks, and a connection portion for use in connecting the two fixation hooks. The intervertebral fixation block comprises a block body, and a joining part for use in joining the block body with the connection portion of the vertebrae-clamping device.

Abstract: A bias circuit is provided for improving linearity of a radio frequency power amplifier. The bias circuit includes a bias transistor having a collector, an emitter, and a base. The collector is connected to a DC voltage source, the emitter is connected to a radio frequency transistor, and the base is connected to a bias voltage source. A capacitor and an inductor are connected in series and are coupled either between the emitter of the bias transistor and ground or between the base of the bias transistor and ground, thereby constructing an LC series-connected resonator circuit. The LC series-connected resonator circuit directly conducts the part of the radio frequency input signal, which is coupled back to the bias transistor, into the ground, thereby improving linearity of the radio frequency power amplifier. Preferably, the LC series-connected resonator circuit is designed to have a resonant frequency, which is equal to a frequency of a second harmonic component of the radio frequency input signal.

Abstract: A method for in-line monitoring of via/contact etching process based on a test structure is described. The test structure is comprised of via/contact holes of different sizes and densities in a layout such that, for a certain process, the microloading or RIE lag induced non-uniform etch rate produce under-etch in some regions and over-etch in others. A scanning electron microscope is used to distinguish these etching differences in voltage contrast images. Image processing and simple calibration convert these voltage contrast images into a “fingerprint” image characterizing the etching process in terms of thickness over-etched or under-etched. Tolerance of shifting or deformation of this image can be set for validating the process uniformity. This image can also be used as a measure to monitor long-term process parameter shifting, as well as wafer-to-wafer or lot-to-lot variations.

Abstract: A bias circuit is provided for improving linearity of a radio frequency power amplifier. The bias circuit includes a bias transistor having a collector, an emitter, and a base. The collector is connected to a DC voltage source, the emitter is connected to a radio frequency transistor, and the base is connected to a bias voltage source. A capacitor and an inductor are connected in series and are coupled either between the emitter of the bias transistor and ground or between the base of the bias transistor and ground, thereby constructing an LC series-connected resonator circuit. The LC series-connected resonator circuit directly conducts the part of the radio frequency input signal, which is coupled back to the bias transistor, into the ground, thereby improving linearity of the radio frequency power amplifier. Preferably, the LC series-connected resonator circuit is designed to have a resonant frequency, which is equal to a frequency of a second harmonic component of the radio frequency input signal.

Abstract: A method of forming a silicon oxide, shallow trench isolation (STI) region, featuring a silicon rich, silicon oxide layer used to protect the STI region from a subsequent wet etch procedure, has been developed. The method features depositing a silicon oxide layer via PECVD procedures, without RF bias, using a high silane to oxygen ratio, resulting in a silicon rich, silicon oxide layer, located surrounding the STI region. The low etch rate of the silicon rich, silicon oxide layer, protect the silicon oxide STI region from buffered hydrofluoric wet etch procedures, used for removal of a dioxide pad layer.

Abstract: An amelioration of a side-beam reflecting billboard structure includes a solid transparent acrylic board of an appropriate thickness having at least one light source at one of the sides thereof and at least one text-and-graphic surface at the front side thereof; and the characteristics of the invention are that at least one reflecting board applied with guiding ink is provided within the interior of the acrylic board and the reflecting board crisscrosses with the traveling direction of the light beams from the light source to the acrylic board, so that the light beams are thoroughly reflected on the guiding ink of reflecting board.

Abstract: A spinal column fixation device includes a support member, a top seat fastened at the top end with the support member, and a bottom seat fastened at the bottom end with the support member. The top seat and the support member are fastened by an angle adjusting mechanism such that the angle between the top seat and the support member is adjustable. The bottom seat and the support member are fastened by an angle adjusting mechanism such that the angle between the bottom seat and the support member is adjustable.

Abstract: A method for in-line monitoring of via/contact etching process based on a test structure is described. The test structure is comprised of via/contact holes of different sizes and densities in a layout such that, for a certain process, the microloading or RIE lag induced non-uniform etch rate produce under-etch in some regions and over-etch in others. A scanning electron microscope is used to distinguish these etching differences in voltage contrast images. Image processing and simple calibration convert these voltage contrast images into a “fingerprint” image characterizing the etching process in terms of thickness over-etched or under-etched. Tolerance of shifting or deformation of this image can be set for validating the process uniformity. This image can also be used as a measure to monitor long-term process parameter shifting, as well as wafer-to-wafer or lot-to-lot variations.

Abstract: A spinal fixation and retrieval device has a solid main body including a cone-like body at one end thereof and a column-like body connected to a base of the cone-like body. The cone-like body has a length which is less than one third of the length of the main body. The column-like body is provided with at least two threads which are separated from each other by a distance which is at least two times the width of the base of the threads.

Abstract: A spinal column fixation device includes a support member, a top seat fastened at the top end with the support member, and a bottom seat fastened at the bottom end with the support member. The top seat and the support member are fastened by an angle adjusting mechanism such that the angle between the top seat and the support member is adjustable. The bottom seat and the support member are fastened by an angle adjusting mechanism such that the angle between the bottom seat and the support member is adjustable.

Abstract: A skull post-surgical fixation device includes an adjustment pull bar, a lower fixation piece, an upper fixation piece and an adjustment ferrule. The lower fixation piece is connected with the bottom end of the adjustment pull bar. The adjustment pull bar is provided near the bottom end thereof with a first uniting part. The upper fixation piece has a through hole for receiving the adjustment pull bar. The through hole is provided with a second uniting part cooperating with the first uniting part of the adjustment pull bar. The first uniting part of the adjustment pull bar and the second uniting part of the upper fixation piece form a ratcheting mechanism allowing advance of the upper fixation piece only.

Abstract: A spinal fixation retrieval device includes a fixation seat, a rod-shaped object, one or more fixation hooks, and one or more fixation elements. The fixation seat is provided with at least two through holes. The rod-shaped object is put through one of the through holes of the fixation seat. The fixation hooks comprise an extension rod and a hooked portion. The extension rod is put through the through hole of the fixation seat. The fixation elements are intended to fix the rod-shaped object and the fixation hook in the through holes of the fixation seat.

Abstract: A system is designed to fix and recuperate the deformed vertebrae and is formed of a vertebrae-clamping device and an intervertebral fixation block. The vertebrae-clamping device includes two fixation hooks, and a connection portion for use in connecting the two fixation hooks. The intervertebral fixation block comprises a block body, and a joining part for use in joining the block body with the connection portion of the vertebrae-clamping device.

Abstract: The present invention relates to a display rack primarily including a main frame made of light-weight plastic corrugated board and a number of movable partitions supported by a number of supporting pieces fixed on the main frame so that the main frame is divided by the partitions into a number of holding rooms. The present invention is characterized in that the corrugated board of the main frame has a plurality of grooved rails longitudinally disposed in parallel. The supporting pieces are made of hard material and include at least one blocking extension strip at one side thereof which is vertical to the surface of the supporting pieces. The surface of the supporting piece is fitted with a locking groove near the bottom end of the blocking extension strip in order that the protruding blocking extension strip of the supporting piece is able to be inserted into the grooved rails while the locking groove near the bottom end of the blocking extension strip is fixed on the surface of the main frame.

Abstract: A method of forming a short channel field effect transistor is disclosed. The method includes the steps of providing a semiconductor substrate having a well region of a first conductivity type; forming a gate electrode on the well region; implanting first impurities into the well region and adjacent to the gate electrode, the first implant step being at a first dose and a second conductivity type; forming sidewall spacers on edges of the gate electrode; implanting second impurities into the well region and adjacent to the gate electrode, the second implant step being at a second dose and at the second conductivity type; and implanting third impurities into the well region and adjacent the gate electrode, the third implant step being at a third dose and at the first conductivity type.