Patents by Inventor Chung Chou

Chung Chou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250114909
    Abstract: A chemical mechanical polishing apparatus includes a platen to hold a polishing pad, a carrier to hold a substrate against a polishing surface of the polishing pad during a polishing process, a polishing liquid dispenser having a polishing liquid port positioned over the platen to deliver polishing liquid onto the polishing pad, a temperature control system including coolant liquid fluid reservoirs for containing coolant fluids, a thermal controller configured to control the temperature of the coolant fluid within the coolant fluid reservoirs, and a first dispenser having openings in fluid connection with the coolant fluid reservoirs, the openings positioned configured to spray an aerosolized coolant liquid directly onto the polishing pad, and a second dispenser having a coolant port in fluid connection with the coolant fluid reservoirs, the coolant port positioned over the platen and configured to flow a stream of coolant liquid directly onto the polishing pad.
    Type: Application
    Filed: October 5, 2023
    Publication date: April 10, 2025
    Inventors: Priscilla Diep LaRosa, Chih Chung Chou, Haosheng Wu, Taketo Sekine, Chen-Wei Chang, Elton Zhong, Jianshe Tang, Songling Shin
  • Patent number: 12260049
    Abstract: A touch light-emitting module having hallowed portion for incapsulation resin and a manufacturing method thereof are disclosed. The touch light-emitting module includes a printed circuit board and a touch-control conductor. The printed circuit board has a top surface on which a touch-control IC and a luminous unit that is electrically connected are disposed. The touch-control conductor includes a hollowed portion. The touch-control conductor is coated, on the bottom thereof, with a conductive material to combine with the top surface of the printed circuit board, so that the touch-control IC and the luminous unit are located in the hollowed portion. An encapsulation resin is then injected into a space between the printed circuit board and the hollowed portion to complete encapsulation. As such, the module offers a simplified structure to achieve an effect of minimization, and simplifies the manufacturing process and reduces the working time to thereby enhance the yield.
    Type: Grant
    Filed: January 29, 2024
    Date of Patent: March 25, 2025
    Assignee: LIGITEK ELECTRONICS CO., LTD.
    Inventors: Yi-Wen Chen, Wen-Chung Chou, I-Hsin Tung
  • Publication number: 20250080149
    Abstract: A phased array transmitter includes a plurality of signal couplers arranged to receive a radio frequency (RF) input signal, and a plurality of RF transmitters coupled to the signal couplers. Each RF transmitter includes a radiating element, a chip and a phase shifting circuit. The radiating element is arranged to receive a plurality of electrical signals to produce an RF output signal. An amplifier circuit of the chip is configured to amplify the RF input signal to generate a plurality of amplified signals at a plurality of output terminals, respectively. The phase shifting circuit is located outside the chip, and coupled to the output terminals and the radiating element. The phase shifting circuit is arranged to phase shift the amplified signals, and accordingly generate the electrical signals fed to the radiating element. Respective phase shifting circuits and respective radiating elements of the RF transmitters are formed on a same substrate.
    Type: Application
    Filed: November 19, 2024
    Publication date: March 6, 2025
    Inventors: YU-JIU WANG, LI HAN CHANG, HAO-CHUNG CHOU, TA-SHUN CHU
  • Publication number: 20250073850
    Abstract: A chemical mechanical polishing chamber may include a platen disposed within the chemical mechanical polishing chamber, the platen configured to support a polishing pad. The chamber may also include a slurry delivery arm configured to deliver a slurry to the polishing pad during a chemical mechanical polishing process. The chamber may include an arm may include one or more brackets, mechanically attached to an internal side of the chemical mechanical polishing chamber and positioned over the platen. The chamber may include a plurality of nozzles configured to deliver a gas to the polishing pad, the plurality of nozzles mechanically attached to the one or more brackets of the arm, each of the plurality of nozzles oriented such that an air gap is disposed between adjacent nozzles of the plurality of nozzles such that air may be pulled from the air gap and propelled with the gas towards the polishing pad.
    Type: Application
    Filed: August 21, 2024
    Publication date: March 6, 2025
    Applicant: Applied Materials, Inc.
    Inventors: Haosheng WU, Shou-Sung CHANG, Priscilla DIEP, Hui CHEN, Chih Chung CHOU, Jeonghoon OH, Jianshe TANG, Brian J. BROWN
  • Patent number: 12233505
    Abstract: A polishing pad includes a sensor assembly surrounded by a lower portion of the polishing pad, and an upper portion including a pad portion disposed on the assembly and at least a portion of a polishing layer disposed on the lower portion. The sensor assembly includes a lower body having a first pair of electrodes formed thereon, a polymer body having a second pair of electrodes formed thereon and aligned with the first pair of electrodes, and a pair of gaps between the first pair of electrodes and the second pair of electrodes.
    Type: Grant
    Filed: May 10, 2023
    Date of Patent: February 25, 2025
    Assignee: Applied Materials, Inc.
    Inventors: Nicholas A. Wiswell, Chih Chung Chou, Dominic J. Benvegnu
  • Patent number: 12230736
    Abstract: The present disclosure provides a semiconductor light-emitting device and a semiconductor light-emitting component. The semiconductor light-emitting device includes a substrate, a first semiconductor contact layer, a semiconductor light-emitting stack including an active layer, a first-conductivity-type contact structure, a second semiconductor contact layer, a second-conductivity-type contact structure and a first electrode pad. The first-conductivity-type contact structure is electrically connected to the first semiconductor contact layer. The second-conductivity-type contact structure is electrically connected to the second semiconductor contact layer. The first-conductivity-type contact structure has a first bottom surface and a first top surface, and the active layer has a second bottom surface and a second top surface.
    Type: Grant
    Filed: March 24, 2021
    Date of Patent: February 18, 2025
    Assignee: EPISTAR CORPORATION
    Inventors: Jian-Zhi Chen, Yen-Chun Tseng, Hui-Fang Kao, Yao-Ning Chan, Yi-Tang Lai, Yun-Chung Chou, Shih-Chang Lee, Chen Ou
  • Publication number: 20250047270
    Abstract: A delay calibration circuit includes a first delay chain, a second delay chain, and a calibration circuit. The first delay chain includes a plurality of first delay units and delays a clock signal with a first delay to generate a first delay signal. The supply current for each of the first delay units is a first current. The second delay chain includes a plurality of second delay units and a third delay unit. The second delay units delay a first signal with a second delay to generate a second delay signal. The third delay unit delays the second delay signal to generate the third delay signal. The supply current for each unit in the second delay chain is a second current. The calibration circuit adjusts a current ratio of the second current to the first current based on the second delay signal and the third delay signal.
    Type: Application
    Filed: December 30, 2023
    Publication date: February 6, 2025
    Inventors: Cheng-Chung CHOU, Tu-Hsiu WANG, Cheng-Tao LI
  • Patent number: 12174243
    Abstract: A method for manufacturing a first radio-frequency (RF) device, including: receiving a substrate having the first RF device, wherein the first RF device has a signal port for receiving or transmitting RF signals with an input impedance greater than ten times an input impedance of a testing tool; causing a probe assembly to connect to the signal port and the testing tool; and causing the probe assembly to connect to a first terminal of a resistive element having a resistance equal to the input impedance.
    Type: Grant
    Filed: December 14, 2022
    Date of Patent: December 24, 2024
    Assignee: TRON FUTURE TECH INC.
    Inventors: Yu-Jiu Wang, Hao-Chung Chou, Yue Ming Wu, Ta-Shun Chu
  • Publication number: 20240408650
    Abstract: A chemical mechanical polishing system includes a first polishing station including a first platen to support a first polishing pad, a transfer station to receive a substrate from a robot, a carrier head movable on a predetermined path from the polishing station to the transfer station, a gas flow regulator having an input for a carrier gas, a liquid flow regulator having an input for a cleaning liquid, and a fluid jet cleaner at a position along the predetermined path. The fluid jet cleaner includes an atomizer nozzle including an input port coupled to the gas flow regulator, an injection port coupled to the liquid flow regulator, and an output port positioned to spray the cleaning liquid entrained in the carrier gas onto the substrate held by the carrier head when the carrier head is located above the fluid jet cleaner.
    Type: Application
    Filed: June 6, 2023
    Publication date: December 12, 2024
    Inventors: Haosheng Wu, Shou-Sung Chang, Hui Chen, Chih Chung Chou, Sih-Ling Yeh, Emily Drauss, Elton Zhong, Chad Pollard, Songling Shin, Jianshe Tang, Jeonghoon Oh
  • Patent number: 12148647
    Abstract: An apparatus includes a substrate holder, a first actuator to rotate the substrate holder, a second actuator to move the substrate holder linearly, a first sensor to generate one or more first measurements or images of the substrate, a second sensor to generate one or more second measurements of target positions on the substrate, and a processing device. The processing device estimates a position of the substrate on the substrate holder and causes the first actuator to rotate the substrate holder about a first axis. The rotation causes an offset between a field of view of the second sensor and a target position on the substrate due to the substrate not being centered on the substrate holder. The processing device causes the second actuator to move the substrate holder linearly along a second axis to correct the offset. The processing device determines a profile across a surface of the substrate based on the one or more second measurements of the target positions.
    Type: Grant
    Filed: January 25, 2022
    Date of Patent: November 19, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Patricia Schulze, Gregory John Freeman, Michael Kutney, Arunkumar Ramachandraiah, Chih Chung Chou, Zhaozhao Zhu, Ozkan Celik
  • Publication number: 20240339347
    Abstract: An optical measurement device comprises a substrate holder to secure a substrate, a plurality of actuators to move the substrate holder relative to a plurality of axes, a first sensor to generate one or more first measurements or images of a first plurality of target positions on the substrate, and a second sensor to generate one or more second measurements of a second plurality of target positions on the substrate. The optical measurement device further comprises a plate, wherein the substrate holder, the plurality of actuators, the first sensor and the second sensor are each mounted to the plate, and wherein the plate provides vibration isolation from a factory interface to which the optical measurement device mounts. The optical measurement device further comprises a processing device that executes instructions to control the plurality of actuators and process the first measurements or images and the second measurements.
    Type: Application
    Filed: June 18, 2024
    Publication date: October 10, 2024
    Inventors: Patricia Schulze, Gregory John Freeman, Michael Kutney, Arunkumar Ramachandraiah, Chih Chung Chou, Zhaozhao Zhu, Ozkan Celik
  • Publication number: 20240307928
    Abstract: An apparatus for steam treatment of a conditioner head and/or conditioner disk in a chemical mechanical polishing system includes a conditioner cleaning cup, a boiler to generate steam, one or more nozzles positioned to direct steam inwardly into a cavity defined by the load cup, and a supply line running from the boiler to the one or more nozzles to supply steam to the one or more nozzles.
    Type: Application
    Filed: May 16, 2024
    Publication date: September 19, 2024
    Inventors: Haosheng Wu, Jianshe Tang, Hari Soundararajan, Shou-Sung Chang, Hui Chen, Chih Chung Chou, Alexander John Fisher, Paul D. Butterfield
  • Patent number: 12081056
    Abstract: A controller for managing a battery pack includes: a detection terminal, for transmitting an enable signal when values of battery parameters for the battery pack satisfy a sleep condition, where the enable signal enables the detection circuit to detect whether the battery pack is connected to a load and whether the battery pack is connected to the charger; and a receiving terminal, for receiving a detection result transmitted by the detection circuit. The detection result indicates whether the battery pack is connected to at least one of the load and charger. The controller controls the battery pack to enter a sleep mode of the sleep modes based on the detection result. The controller also includes a control terminal, for transmitting a control signal to control an on/off state of a charging switch and/or a discharging switch. The control signal is generated by the controller based on the detection result.
    Type: Grant
    Filed: May 25, 2023
    Date of Patent: September 3, 2024
    Assignee: O2Micro Inc.
    Inventors: Yingguo Zhang, Guoyan Qiao, Fu-Jen Hsieh, Chia-Ming Chang, Chih-Chung Chou, Hua-Yi Wang
  • Publication number: 20240291441
    Abstract: A bias voltage generating circuit includes an amplifier circuit and a negative feedback circuit. The amplifier circuit is configured to generate a bias voltage according to a first voltage input and a second voltage input. The negative feedback circuit is coupled to the amplifier circuit, and configured to control the first voltage input. The negative feedback circuit includes a first voltage generator and a second voltage generator. The first voltage generator, coupled to the amplifier circuit, is biased by the bias voltage and configured to amplify a third voltage input to generate the first voltage input. The second voltage generator, coupled to the first voltage generator, is configured to generate the third voltage input. A ratio of the first voltage input to the third voltage input is locked according to a ratio of the second voltage input to the third voltage input.
    Type: Application
    Filed: January 25, 2024
    Publication date: August 29, 2024
    Inventors: YU-JIU WANG, HAO-CHUNG CHOU, YUE MING WU, TA-SHUN CHU
  • Patent number: D1042519
    Type: Grant
    Filed: July 26, 2022
    Date of Patent: September 17, 2024
    Inventors: Jen-Chung Chou, Qingyun Chen
  • Patent number: D1043719
    Type: Grant
    Filed: July 25, 2022
    Date of Patent: September 24, 2024
    Inventors: Jen-Chung Chou, Qingyun Chen
  • Patent number: D1050157
    Type: Grant
    Filed: July 25, 2022
    Date of Patent: November 5, 2024
    Inventors: Jen-Chung Chou, Qingyun Chen
  • Patent number: D1051154
    Type: Grant
    Filed: March 23, 2023
    Date of Patent: November 12, 2024
    Inventors: Jen-Chung Chou, Qingyun Chen
  • Patent number: D1054436
    Type: Grant
    Filed: June 28, 2022
    Date of Patent: December 17, 2024
    Inventors: Jen-Chung Chou, Qingyun Chen
  • Patent number: D1062026
    Type: Grant
    Filed: October 28, 2022
    Date of Patent: February 11, 2025
    Assignee: EPISTAR CORPORATION
    Inventors: Hui-Fang Kao, Yao-Ning Chan, Yi-Tang Lai, Yun-Chung Chou, Shih-Chang Lee, Chen Ou