Patents by Inventor Chun-Ming Wang

Chun-Ming Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11937932
    Abstract: An acute kidney injury predicting system and a method thereof are proposed. A processor reads the data to be tested, the detection data, the machine learning algorithm and the risk probability comparison table from a main memory. The processor trains the detection data according to the machine learning algorithm to generate an acute kidney injury prediction model, and inputs the data to be tested into the acute kidney injury prediction model to generate an acute kidney injury characteristic risk probability and a data sequence table. The data sequence table lists the data to be tested in sequence according to a proportion of each of the data to be tested in the acute kidney injury characteristics. The processor selects one of the medical treatment data from the risk probability comparison table according to the acute kidney injury characteristic risk probability.
    Type: Grant
    Filed: July 8, 2022
    Date of Patent: March 26, 2024
    Assignees: TAICHUNG VETERANS GENERAL HOSPITAL, TUNGHAI UNIVERSITY
    Inventors: Chieh-Liang Wu, Chun-Te Huang, Cheng-Hsu Chen, Tsai-Jung Wang, Kai-Chih Pai, Chun-Ming Lai, Min-Shian Wang, Ruey-Kai Sheu, Lun-Chi Chen, Yan-Nan Lin, Chien-Lun Liao, Ta-Chun Hung, Chien-Chung Huang, Chia-Tien Hsu, Shang-Feng Tsai
  • Patent number: 11935932
    Abstract: In an embodiment, a device includes: a gate electrode; a epitaxial source/drain region adjacent the gate electrode; one or more inter-layer dielectric (ILD) layers over the epitaxial source/drain region; a first source/drain contact extending through the ILD layers, the first source/drain contact connected to the epitaxial source/drain region; a contact spacer surrounding the first source/drain contact; and a void disposed between the contact spacer and the ILD layers.
    Type: Grant
    Filed: July 21, 2022
    Date of Patent: March 19, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chun-Han Chen, Chen-Ming Lee, Fu-Kai Yang, Mei-Yun Wang
  • Patent number: 11913472
    Abstract: A centrifugal heat dissipation fan including a housing and an impeller disposed in the housing on an axis is provided. The housing has at least one inlet on the axis and has a plurality of outlets in different radial directions. A heat dissipation system of an electronic device is also provided.
    Type: Grant
    Filed: April 6, 2021
    Date of Patent: February 27, 2024
    Assignee: Acer Incorporated
    Inventors: Tsung-Ting Chen, Wen-Neng Liao, Cheng-Wen Hsieh, Yu-Ming Lin, Wei-Chin Chen, Chun-Chieh Wang, Shu-Hao Kuo
  • Patent number: 10638828
    Abstract: An adjustable container carrying strap structure includes a strip-shaped carrying strap and a container sleeving assembly. The strip-shaped carrying strap includes a first end, a second end, and a carrying strap body. The container sleeving assembly includes two sleeve ropes and an adjusting element, where each sleeve rope includes a first rope end, a second rope end, and a rope body, the first rope end of each sleeve rope is connected to the first end, the second rope end of each sleeve rope is connected to the second end, and the adjusting element is assembled on the two rope bodies of the two sleeve ropes, so that the adjusting element, the two rope bodies, and the first end of the strip-shaped carrying strap encircle a container sleeving hole. The adjusting element can slide relatively along the two rope bodies so as to adjust the size of the container sleeving hole.
    Type: Grant
    Filed: July 1, 2019
    Date of Patent: May 5, 2020
    Assignee: WLD PRODUCTION CO., LTD.
    Inventors: Chun-Ming Wang, Lee Lin
  • Patent number: 10553537
    Abstract: A device structure includes an array of semiconductor devices located in an array region over a substrate, metal lines laterally extending from the device region to a peripheral interconnection region, and interconnect via structures located in the peripheral interconnection region, and contacting a portion of a respective one of the plurality of metal lines. The metal lines include a first metal line and a second metal line each having a serpentine region which contacts a respective interconnect via structure.
    Type: Grant
    Filed: February 17, 2018
    Date of Patent: February 4, 2020
    Assignee: SANDISK TECHNOLOGIES LLC
    Inventors: Yuji Takahashi, Chenche Huang, Chun-Ming Wang, Vincent Shih
  • Publication number: 20200008563
    Abstract: An adjustable container carrying strap structure includes a strip-shaped carrying strap and a container sleeving assembly. The strip-shaped carrying strap includes a first end, a second end, and a carrying strap body. The container sleeving assembly includes two sleeve ropes and an adjusting element, where each sleeve rope includes a first rope end, a second rope end, and a rope body, the first rope end of each sleeve rope is connected to the first end, the second rope end of each sleeve rope is connected to the second end, and the adjusting element is assembled on the two rope bodies of the two sleeve ropes, so that the adjusting element, the two rope bodies, and the first end of the strip-shaped carrying strap encircle a container sleeving hole. The adjusting element can slide relatively along the two rope bodies so as to adjust the size of the container sleeving hole.
    Type: Application
    Filed: July 1, 2019
    Publication date: January 9, 2020
    Inventors: Chun-Ming Wang, Lee Lin
  • Publication number: 20190259698
    Abstract: A device structure includes an array of semiconductor devices located in an array region over a substrate, metal lines laterally extending from the device region to a peripheral interconnection region, and interconnect via structures located in the peripheral interconnection region, and contacting a portion of a respective one of the plurality of metal lines. The metal lines include a first metal line and a second metal line each having a serpentine region which contacts a respective interconnect via structure.
    Type: Application
    Filed: February 17, 2018
    Publication date: August 22, 2019
    Inventors: Yuji Takahashi, Chenche Huang, Chun-Ming Wang, Vincent Shih
  • Patent number: 9859363
    Abstract: A method of dividing drain select gate electrodes in a three-dimensional vertical memory device is provided. An alternating stack of insulating layers and spacer material layers is formed over a substrate. A first insulating cap layer is formed over the alternating stack. A plurality of memory stack structures is formed through the alternating stack and the first insulating cap layer. The first insulating cap layer is vertically recessed, and a conformal material layer is formed over protruding portions of the memory stack structures. Spacer portions are formed by an anisotropic etch of the conformal material layer such that the sidewalls of the spacer portions having protruding portions. A self-aligned separator trench with non-uniform sidewalls having protruding portions is formed through an upper portion of the alternating stack by etching the upper portions of the alternating stack between the spacer portions.
    Type: Grant
    Filed: May 16, 2016
    Date of Patent: January 2, 2018
    Assignee: SANDISK TECHNOLOGIES LLC
    Inventors: Zhenyu Lu, Kota Funayama, Chun-Ming Wang, Jixin Yu, Chenche Huang, Tong Zhang, Daxin Mao, Johann Alsmeier, Makoto Yoshida, Lauren Matsumoto
  • Publication number: 20170236896
    Abstract: A method of dividing drain select gate electrodes in a three-dimensional vertical memory device is provided. An alternating stack of insulating layers and spacer material layers is formed over a substrate. A first insulating cap layer is formed over the alternating stack. A plurality of memory stack structures is formed through the alternating stack and the first insulating cap layer. The first insulating cap layer is vertically recessed, and a conformal material layer is formed over protruding portions of the memory stack structures. Spacer portions are formed by an anisotropic etch of the conformal material layer such that the sidewalls of the spacer portions having protruding portions. A self-aligned separator trench with non-uniform sidewalls having protruding portions is formed through an upper portion of the alternating stack by etching the upper portions of the alternating stack between the spacer portions.
    Type: Application
    Filed: May 16, 2016
    Publication date: August 17, 2017
    Inventors: Zhenyu LU, Kota FUNAYAMA, Chun-Ming WANG, Jixin YU, Chenche HUANG, Tong ZHANG, Daxin MAO, Johann ALSMEIER, Makoto YOSHIDA, Lauren MATSUMOTO
  • Patent number: 9690143
    Abstract: A system for displaying images including a display panel is provided. The display panel has a display area and a peripheral area. The display panel includes a metal layer disposed on a first substrate. A second substrate is disposed opposite to the first substrate. A seal is disposed at the peripheral area and between the first and the second substrates and at the peripheral area. A patterned planarization layer is disposed on the first substrate, including an opening and two sidewalls, wherein the opening is located between the two sidewalls and corresponding to the peripheral area. A passivation layer is disposed between the seal and the first substrate, and wherein a portion of the seal is disposed between the two sidewalls of the patterned planarization layer.
    Type: Grant
    Filed: May 25, 2016
    Date of Patent: June 27, 2017
    Assignees: INNOCOM TECHNOLOGY (SHENZHEN) CO., LTD., INNOLUX CORPORATION
    Inventors: Chun-Ming Wang, Hsixg-Ju Sung, Te-Yu Lee
  • Patent number: 9613975
    Abstract: A structure is formed on a substrate, which includes a stack of alternating layers comprising insulating layers and electrically conductive layers and a plurality of memory stack structures extending through the stack. At least one bridge line structure is formed on top surfaces of a respective subset of the plurality of memory stack structures to provide local lateral electrical connection. At least one dielectric material layer is formed over the at least one bridge line structure and the plurality of memory stack structures. A plurality contact via structures is formed through the dielectric material layer. The plurality of contact via structures includes at least one first contact via structure contacting a top surface of a respective bridge line structure, and second contact via structures contacting a top surface of a respective memory stack structure.
    Type: Grant
    Filed: March 31, 2015
    Date of Patent: April 4, 2017
    Assignee: SANDISK TECHNOLOGIES LLC
    Inventors: Chenche Huang, Chun-Ming Wang, Yuki Mizutani, Hiroaki Koketsu, Masayuki Hiroi, Masaaki Higashitani
  • Publication number: 20160293621
    Abstract: A structure is formed on a substrate, which includes a stack of alternating layers comprising insulating layers and electrically conductive layers and a plurality of memory stack structures extending through the stack. At least one bridge line structure is formed on top surfaces of a respective subset of the plurality of memory stack structures to provide local lateral electrical connection. At least one dielectric material layer is formed over the at least one bridge line structure and the plurality of memory stack structures. A plurality contact via structures is formed through the dielectric material layer. The plurality of contact via structures includes at least one first contact via structure contacting a top surface of a respective bridge line structure, and second contact via structures contacting a top surface of a respective memory stack structure.
    Type: Application
    Filed: March 31, 2015
    Publication date: October 6, 2016
    Inventors: Chenche Huang, Chun-Ming Wang, Yuki Mizutani, Hiroaki Koketsu, Masayuki Hiroi, Masaaki Higashitani
  • Publication number: 20160266424
    Abstract: A system for displaying images including a display panel is provided. The display panel has a display area and a peripheral area. The display panel includes a metal layer disposed on a first substrate. A second substrate is disposed opposite to the first substrate. A seal is disposed at the peripheral area and between the first and the second substrates and at the peripheral area. A patterned planarization layer is disposed on the first substrate, including an opening and two sidewalls, wherein the opening is located between the two sidewalls and corresponding to the peripheral area. A passivation layer is disposed between the seal and the first substrate, and wherein a portion of the seal is disposed between the two sidewalls of the patterned planarization layer.
    Type: Application
    Filed: May 25, 2016
    Publication date: September 15, 2016
    Inventors: Chun-Ming WANG, Hsixg-Ju SUNG, Te-Yu LEE
  • Patent number: 9377654
    Abstract: A system for displaying images including a display panel is provided. The display panel has a display area and a peripheral area. The display panel includes a metal layer disposed on a first substrate. A second substrate is disposed opposite to the first substrate. A seal is disposed at the peripheral area and between the first and the second substrates and at the peripheral area. A patterned planarization layer is disposed on the first substrate. A passivation layer disposed between the seal and the first substrate, wherein the seal is in contact with a sidewall of the passivation layer.
    Type: Grant
    Filed: October 5, 2015
    Date of Patent: June 28, 2016
    Assignees: INNOCOM TECHNOLOGY(SHENZHEN) CO., LTD, INNOLUX CORPORATION
    Inventors: Chun-Ming Wang, Hsixg-Ju Sung, Te-Yu Lee
  • Patent number: 9372367
    Abstract: A system for displaying images including a display panel is provided. The display panel has a display area and a peripheral area. The display panel includes a metal layer disposed on a first substrate. A patterned planarization layer is disposed on the metal layer, having at least one opening corresponding to the peripheral area, wherein a portion of the metal layer is disposed in the opening. A second substrate is disposed opposite to the first substrate. A seal is disposed at the peripheral area and between the first and the second substrates, wherein the seal covers the metal layer through the opening of the patterned planarization layer. A passivation layer disposed on the portion of the metal layer and covering a sidewall of the patterned planarization layer to form a first passivation sidewall, wherein the seal is in contact with the first passivation sidewall.
    Type: Grant
    Filed: October 5, 2015
    Date of Patent: June 21, 2016
    Assignees: INNOCOM TECHNOLOGY(SHENZHEN) CO., LTD, INNOLUX CORPORATION
    Inventors: Chun-Ming Wang, Hsixg-Ju Sung, Te-Yu Lee
  • Publication number: 20160026021
    Abstract: A system for displaying images including a display panel is provided. The display panel has a display area and a peripheral area. The display panel includes a metal layer disposed on a first substrate. A second substrate is disposed opposite to the first substrate. A seal is disposed at the peripheral area and between the first and the second substrates and at the peripheral area. A patterned planarization layer is disposed on the first substrate. A passivation layer disposed between the seal and the first substrate, wherein the seal is in contact with a sidewall of the passivation layer.
    Type: Application
    Filed: October 5, 2015
    Publication date: January 28, 2016
    Inventors: Chun-Ming WANG, Hsixg-Ju SUNG, Te-Yu LEE
  • Publication number: 20160026020
    Abstract: A system for displaying images including a display panel is provided. The display panel has a display area and a peripheral area. The display panel includes a metal layer disposed on a first substrate. A patterned planarization layer is disposed on the metal layer, having at least one opening corresponding to the peripheral area, wherein a portion of the metal layer is disposed in the opening. A second substrate is disposed opposite to the first substrate. A seal is disposed at the peripheral area and between the first and the second substrates, wherein the seal covers the metal layer through the opening of the patterned planarization layer. A passivation layer disposed on the portion of the metal layer and covering a sidewall of the patterned planarization layer to form a first passivation sidewall, wherein the seal is in contact with the first passivation sidewall.
    Type: Application
    Filed: October 5, 2015
    Publication date: January 28, 2016
    Inventors: Chun-Ming WANG, Hsixg-Ju SUNG, Te-Yu LEE
  • Patent number: 9176345
    Abstract: A system for displaying images including a display panel is provided. The display panel has a display area and a peripheral area. The display panel includes a metal layer disposed on a first substrate. A patterned planarization layer is disposed on the metal layer, having at least one opening corresponding to the peripheral area, wherein a portion of the metal layer is exposed through the opening. A second substrate is disposed opposite to the first substrate. A seal is disposed at the peripheral area and between the first and the second substrates, wherein the seal covers the metal layer through the opening of the patterned planarization layer.
    Type: Grant
    Filed: May 18, 2015
    Date of Patent: November 3, 2015
    Assignees: INNOCOM TECHNOLOGY(SHENZHEN) CO., LTD., INNOLUX CORPORATION
    Inventors: Chun-Ming Wang, Hsixg-Ju Sung, Te-Yu Lee
  • Publication number: 20150248028
    Abstract: A system for displaying images including a display panel is provided. The display panel has a display area and a peripheral area. The display panel includes a metal layer disposed on a first substrate. A patterned planarization layer is disposed on the metal layer, having at least one opening corresponding to the peripheral area, wherein a portion of the metal layer is exposed through the opening. A second substrate is disposed opposite to the first substrate. A seal is disposed at the peripheral area and between the first and the second substrates, wherein the seal covers the metal layer through the opening of the patterned planarization layer.
    Type: Application
    Filed: May 18, 2015
    Publication date: September 3, 2015
    Inventors: Chun-Ming WANG, Hsixg-Ju SUNG, Te-Yu LEE
  • Patent number: 9069463
    Abstract: An operating method for dynamically adjusting a touch apparatus is disclosed herein. The touch apparatus includes a storage component and a touch component. The storage component is configured to store at least one application, and a plurality of weights of touch motion modes and touch motion modes corresponding to the application. The operating method includes determining whether execution of the application has started. When execution of the application has started, a plurality of touch motions corresponding to the executed application are received through the touch component. At least one of the weights of touch motion modes corresponding to the executed application is adjusted according to the touch motions. At least one of touch parameters is adjusted according to the weights of touch motion modes corresponding to the executed application.
    Type: Grant
    Filed: September 18, 2013
    Date of Patent: June 30, 2015
    Assignee: COMPAL ELECTRONICS, INC.
    Inventors: Ming-Yu Chang, Chun-Ming Wang, Yun-Rui Chen, Chia-Hui Chen, Wen-Han Li, Fei-Zhi Guo, Ping-Hsien Niu