Patents by Inventor Cornelius Adrianus Lambertus De Hoon
Cornelius Adrianus Lambertus De Hoon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11561479Abstract: The invention relates to an electronic system for an accelerometer having a piezoelectric element and a first mechanical resonance frequency, comprising: a) a damping circuit configured to: —receive an acceleration signal from the piezoelectric element; —electronically dampen an amplitude of the first mechanical resonance frequency; and—generate a damped acceleration signal, b) an extender configured to: —receive the damped acceleration signal; —extend the frequency response; and—output an extended damped acceleration signal, wherein the extender is configured to have a first electronic anti-resonance frequency matching the damped first mechanical resonance frequency, and to have a frequency response between the first electronic anti-resonance frequency and a higher second frequency that is substantially opposite to a corresponding frequency response of the combination of the accelerometer and the damping circuit.Type: GrantFiled: January 3, 2020Date of Patent: January 24, 2023Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Bas Jansen, Cornelius Adrianus Lambertus De Hoon
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Patent number: 11422477Abstract: The invention provides a vibration isolation system (IS), comprising a piston (402) to carry a payload, a connecting member (410), a spring (404) and a flexible member (408). The spring is arranged to support the piston along a direction with a positive stiffness. The flexible member is arranged to apply a force to the piston along the direction via the connecting member with a negative stiffness.Type: GrantFiled: April 23, 2019Date of Patent: August 23, 2022Assignee: ASML Netherlands B.V.Inventors: Roy Hendrikus Emilie Maria Jacobs, Cornelius Adrianus Lambertus De Hoon, Jeroen Pieter Starreveld, Johannes Petrus Martinus Bernardus Vermeulen
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Publication number: 20220113636Abstract: The invention relates to an electronic system for an accelerometer having a piezoelectric element and a first mechanical resonance frequency, comprising: a) a damping circuit configured to: —receive an acceleration signal from the piezoelectric element; —electronically dampen an amplitude of the first mechanical resonance frequency; and—generate a damped acceleration signal, b) an extender configured to: —receive the damped acceleration signal; —extend the frequency response; and—output an extended damped acceleration signal, wherein the extender is configured to have a first electronic anti-resonance frequency matching the damped first mechanical resonance frequency, and to have a frequency response between the first electronic anti-resonance frequency and a higher second frequency that is substantially opposite to a corresponding frequency response of the combination of the accelerometer and the damping circuit.Type: ApplicationFiled: January 3, 2020Publication date: April 14, 2022Applicant: ASML Netherlands B.V.Inventors: Hans BUTLER, Bas JANSEN, Cornelius Adrianus Lambertus DE HOON
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Patent number: 11269262Abstract: A lithographic apparatus or frame assembly, comprising: a first and second pneumatic support, being arranged to control position of a frame, each of said pneumatic supports accommodating a pressure chamber; a frame position control system, comprising; a first position sensor device, configured to generate measurement data relating to the position of the frame; a first pressure controller, configured to control the pressure in the pressure chamber of the first pneumatic support on the basis of the measurement data generated by the first position sensor device; a pressure differential sensor device, configured to generate data relating to the difference between the pressure in the pressure chambers of the first and the second pneumatic support; a second pressure controller, configured to control the pressure in the pressure chamber of the second pneumatic support on the basis of the measurement data from the pressure differential sensor device.Type: GrantFiled: April 4, 2019Date of Patent: March 8, 2022Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Joep Sander De Beer, Cornelius Adrianus Lambertus De Hoon, Jeroen Pieter Starreveld, Martinus Van Duijnhoven, Maurice Willem Jozef Etiënne Wijckmans
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Patent number: 11169450Abstract: The invention provides a pneumatic support device for a lithographic apparatus and a lithographic apparatus with such support device. The support device comprises a gas spring. The gas spring comprises a suspending part, a suspended part, and a pressure chamber configured for supporting the suspended part relative to the suspending part. The support device further comprises an actuator configured for positioning the suspended part relative to the suspending part, an acceleration sensor configured for generating a first sensor signal representative for the acceleration of the suspending part, a pressure sensor configured for generating a second sensor signal representative for the pressure in the pressure chamber, and a control unit.Type: GrantFiled: March 18, 2019Date of Patent: November 9, 2021Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Joep Sander De Beer, Cornelius Adrianus Lambertus De Hoon, Jeroen Pieter Starreveld, Martinus Van Duijnhoven, Maurice Willem Jozef Etiënne Wijckmans
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Publication number: 20210240090Abstract: A lithographic apparatus or frame assembly, comprising: a first and second pneumatic support, being arranged to control position of a frame, each of said pneumatic supports accommodating a pressure chamber; a frame position control system, comprising; a first position sensor device, configured to generate measurement data relating to the position of the frame; a first pressure controller, configured to control the pressure in the pressure chamber of the first pneumatic support on the basis of the measurement data generated by the first position sensor device; a pressure differential sensor device, configured to generate data relating to the difference between the pressure in the pressure chambers of the first and the second pneumatic support; a second pressure controller, configured to control the pressure in the pressure chamber of the second pneumatic support on the basis of the measurement data from the pressure differential sensor device.Type: ApplicationFiled: April 4, 2019Publication date: August 5, 2021Applicant: ASML Netherlands B.V.Inventors: Hans BUTLER, Joep Sander DE BEER, Cornelius Adrianus Lambertus DE HOON, Jeroen Pieter STARREVELD, Martinus VAN DUIJNHOVEN, Maurice Willem Jozef Etiënn WIJCKMANS
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Publication number: 20210080834Abstract: The invention provides a pneumatic support device for a lithographic apparatus and a lithographic apparatus with such support device. The support device comprises a gas spring. The gas spring comprises a suspending part, a suspended part, and a pressure chamber configured for supporting the suspended part relative to the suspending part. The support device further comprises an actuator configured for positioning the suspended part relative to the suspending part, an acceleration sensor configured for generating a first sensor signal representative for the acceleration of the suspending part, a pressure sensor configured for generating a second sensor signal representative for the pressure in the pressure chamber, and a control unit.Type: ApplicationFiled: March 18, 2019Publication date: March 18, 2021Applicant: ASML Netherlands B.V.Inventors: Hans BUTLER, Joep Sander DE BEER, Cornelius Adrianus Lambertus DE HOON, Jeroen Pieter STARREVELD, Martinus VAN DUIJNHOVEN, Maurice Willem Jozef Etiënn WIJCKMANS
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Publication number: 20210080835Abstract: The invention provides a vibration isolation system (IS), comprising a piston (402) to carry a payload, a connecting member (410), a spring (404) and a flexible member (408). The spring is arranged to support the piston along a direction with a positive stiffness. The flexible member is arranged to apply a force to the piston along the direction via the connecting member with a negative stiffness.Type: ApplicationFiled: April 23, 2019Publication date: March 18, 2021Applicant: ASML Netherlands B.V.Inventors: Roy Hendrikus Emilie Maria JACOBS, Cornelius Adrianus Lambertus DE HOON, Jeroen Pieter STARREVELD, Johannes Petrus Martinus Ber VERMEULEN
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Patent number: 10816910Abstract: The invention relates to a vibration isolator, comprising: a base; a coupling element to be coupled to a vibration sensitive object; a decoupling mass; a first vibration isolator part arranged between the base and the decoupling mass; and a second vibration isolator part arranged between the decoupling mass and the coupling element, and wherein at least one of the first and second vibration isolator part comprises a pneumatic isolator.Type: GrantFiled: February 3, 2017Date of Patent: October 27, 2020Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Cornelius Adrianus Lambertus De Hoon, Fransiscus Mathijs Jacobs, Pavel Kagan, Jeroen Pieter Starreveld, Maurice Willem Jozef Etienne Wijckmans
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Patent number: 10649347Abstract: An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.Type: GrantFiled: December 13, 2018Date of Patent: May 12, 2020Assignee: ASML Netherlands B.V.Inventors: Michael Johannes Christiaan Ronde, Lucas Kuindersma, Niels Johannes Maria Bosch, Hans Butler, Cornelius Adrianus Lambertus De Hoon, Marc Wilhelmus Maria Van Der Wijst, Thijs Verhees, Sander Kerssemakers
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Patent number: 10578983Abstract: A lithographic apparatus comprises a base frame constructed to form a supporting structure of the lithographic apparatus, an active base frame support arranged between the base frame and a ground floor. The active base frame support is configured to support the base frame on the ground floor. The active base frame support comprises an actuator configured to exert a force in a horizontal direction between the base frame and the ground plane. The lithographic apparatus further comprises a control device configured to drive the actuator, a signal representative of a disturbance force on the base frame being provided to the control device, the control device being configured to drive the actuator using the force sensor signal.Type: GrantFiled: November 17, 2016Date of Patent: March 3, 2020Assignee: ASML NETHERLANDS B.V.Inventors: Hans Butler, Björn Hubertus Maria Bukkems, Cornelius Adrianus Lambertus De Hoon, Maurice Willem Jozef Etiënne Wijckmans
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Patent number: 10503086Abstract: A lithographic apparatus is described, the lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a projection system configured to project the patterned radiation beam onto a target portion of a substrate, a stage assembly comprising: a substrate table constructed to hold the substrate; and a positioning device configured to displace the substrate table relative to the projection system; a base frame onto which stage assembly and the projection system are mounted; the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame.Type: GrantFiled: December 7, 2016Date of Patent: December 10, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Hans Butler, Cornelius Adrianus Lambertus De Hoon, Fransiscus Mathijs Jacobs, Pavel Kagan, Jeroen Pieter Starreveld, Maurice Willem Jozef Etiënne Wijckmans
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Patent number: 10409175Abstract: A lithographic apparatus includes a base frame, an illumination system configured to condition a radiation beam and supported by the base frame, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a positioning device configured to position the substrate table, the positioning device being supported by the base frame, a sensor configured to sense a vibration caused by a torque exerted on the base frame, and an actuator configured to exert a force on the illumination system or the base frame, in response to the sensed vibration, in order to at least partly dampen the vibration.Type: GrantFiled: October 22, 2014Date of Patent: September 10, 2019Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Cornelius Adrianus Lambertus De Hoon, Marc Wilhelmus Maria Van Der Wijst, Thijs Verhees, Sander Kerssemakers
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Publication number: 20190129317Abstract: An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.Type: ApplicationFiled: December 13, 2018Publication date: May 2, 2019Applicant: ASML Netherlands B.VInventors: Michael RONDE, Lucas KUINDERSMA, Niels BOSCH, Hans BUTLER, Cornelius Adrianus Lambertus DE HOON, Marc Wilhelmus Maria VAN DER WIJST, Thijs VERHEES, Sander KERSSEMAKERS
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Publication number: 20190049852Abstract: The invention relates to a vibration isolator, comprising: a base; a coupling element to be coupled to a vibration sensitive object; a decoupling mass; a first vibration isolator pan arranged between the base and the decoupling mass; and a second vibration isolator part arranged between the decoupling mass and the coupling element, and wherein at least one of the first and second vibration isolator part comprises a pneumatic isolator.Type: ApplicationFiled: February 3, 2017Publication date: February 14, 2019Inventors: Hans Butler, Cornelius Adrianus Lambertus De Hoon, Fransiscus Mathijs Jacobs, Pavel Kagan, Jeroen Pieter Starreveld, Maurice Willem Jozef Etienne Wijckmans
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Publication number: 20190011838Abstract: A lithographic apparatus is described, the lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a projection system configured to project the patterned radiation beam onto a target portion of a substrate, a stage assembly comprising: a substrate table constructed to hold the substrate; and a positioning device configured to displace the substrate table relative to the projection system; a base frame onto which stage assembly and the projection system are mounted; the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame.Type: ApplicationFiled: December 7, 2016Publication date: January 10, 2019Inventors: Hans BUTLER, Cornelius Adrianus Lambertus DE HOON, Fransiscus Mathijs JACOBS, Pavel KAGAN, Jeroen Pieter STARREVELD, Maurice Willem Jozef Etiënne WIJCKMANS
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Publication number: 20180373156Abstract: A lithographic apparatus comprises a base frame constructed to form a supporting structure of the lithographic apparatus, an active base frame support arranged between the base frame and a ground floor. The active base frame support is configured to support the base frame on the ground floor. The active base frame support comprises an actuator configured to exert a force in a horizontal direction between the base frame and the ground plane. The lithographic apparatus further comprises a control device configured to drive the actuator, a signal representative of a disturbance force on the base frame being provided to the control device, the control device being configured to drive the actuator using the force sensor signal.Type: ApplicationFiled: November 17, 2016Publication date: December 27, 2018Inventors: Hans BUTLER, Björn Hubertus Maria BUKKEMS, Cornelius Adrianus Lambertus DE HOON, Maurice Willem Jozef Etiënne WIJCKMANS
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Patent number: 9977349Abstract: A support device configured to support a first part relative to a second part, minimizing the transfer of vibration between the two parts, includes a supporting system configured to use gas under pressure to provide a support force between the first and second parts; a gas chamber connected to the supporting system and configured to contain the gas under pressure and provide the gas under pressure to the supporting system; and a section of acoustic damping material, arranged at a location within the gas chamber so as to separate a first gas containing region and a second gas containing region within the gas chamber, wherein the section of acoustic damping material has a first side and a second side, wherein the first gas containing region is on the first side and the second gas containing region is on the second side.Type: GrantFiled: December 18, 2014Date of Patent: May 22, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Hans Butler, Cornelius Adrianus Lambertus De Hoon, Ingmar August Kerp, Pieter Johannes Gertrudis Meijers, Jeroen Pieter Starreveld, Derk Ten Hoopen, Martinus Van Duijnhoven, Edward Hage, Evert Hendrik Jan Draaijer, Wesley Ooms
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Publication number: 20180101099Abstract: A lithographic apparatus has shield which protects a functional subsystem form acoustic disturbances. The shield comprises a locally resonant sonic material for implementing the protecting. In an embodiment the shield comprises a panel formed by a cell or a plurality of cells comprising: a frame; an elastic membrane whose edge is fixed to the frame; and a mass attached to a location at the membrane at a non-zero distance from the edge.Type: ApplicationFiled: March 8, 2016Publication date: April 12, 2018Applicant: ASML Netherlands B.V.Inventors: Günes NAKIBOGLU, Marc Wilhelmus Maria VAN DER WIJST, Martinus VAN DUIJNHOVEN, Cornelius Adrianus Lambertus DE HOON, Frank Johannes Jacobus VAN BOXTEL
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Patent number: 9715171Abstract: An imprint lithography apparatus includes an actuator configured to displace an imprint template holder relative to a substrate holder to perform an imprint process. The imprint template holder and/or the substrate holder being supported on a support structure, the support structure being mounted to a vibration isolation system that is mounted to a base of the apparatus. The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base. A control unit is configured to control the actuator during the imprint process. The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process.Type: GrantFiled: December 9, 2010Date of Patent: July 25, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Hans Butler, Johannes Petrus Martinus Bernardus Vermeulen, Marc Wilhelmus Maria Van Der Wijst, Jeroen Pieter Starreveld, Cornelius Adrianus Lambertus De Hoon, Francois Xavier Debiesme