Patents by Inventor Cornelius Adrianus Lambertus De Hoon
Cornelius Adrianus Lambertus De Hoon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20160334718Abstract: A support device configured to support a first part relative to a second part, minimizing the transfer of vibration between the two parts, includes a supporting system configured to use gas under pressure to provide a support force between the first and second parts; a gas chamber connected to the supporting system and configured to contain the gas under pressure and provide the gas under pressure to the supporting system; and a section of acoustic damping material, arranged at a location within the gas chamber so as to separate a first gas containing region and a second gas containing region within the gas chamber, wherein the section of acoustic damping material has a first side and a second side, wherein the first gas containing region is on the first side and the second gas containing region is on the second side.Type: ApplicationFiled: December 18, 2014Publication date: November 17, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Hans BUTLER, Cornelius Adrianus Lambertus DE HOON, INgmar August KERP, Pieter Johannes Gertrudis MEIJERS, Jeroen Pieter STARREVELD, Derk TEN HOOPEN, Martinus VAN DUIJNHOVEN, Edward HAGE, Evert Hendrik Jan DRAAIJER, Wesley OOMS
-
Publication number: 20160238953Abstract: A lithographic apparatus includes a base frame, an illumination system configured to condition a radiation beam and supported by the base frame, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a positioning device configured to position the substrate table, the positioning device being supported by the base frame, a sensor configured to sense a vibration caused by a torque exerted on the base frame, and an actuator configured to exert a force on the illumination system or the base frame, in response to the sensed vibration, in order to at least partly dampen the vibration.Type: ApplicationFiled: October 22, 2014Publication date: August 18, 2016Applicant: ASML Netherlands B.V.Inventors: Hans BUTLER, Cornelius Adrianus Lambertus DE HOON, Marc Wilhelmus Maria VAN DER WIJST, Thijs VERHEES, Sander KERSSEMAKERS
-
Patent number: 8994919Abstract: A control system for controlling a position or position related quantity of an object is provided. A measurement system is configured to measure a position or position related quantity of the object. A controller is configured to provide a control signal on the basis of the measured position or position related quantity. A actuator actuates the object on the basis of the control signal. A filter unit, which may be a partial order filter unit, filters the measured position or position related quantity.Type: GrantFiled: October 2, 2008Date of Patent: March 31, 2015Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Marc Wilhelmus Maria Van Der Wijst, Cornelius Adrianus Lambertus De Hoon
-
Publication number: 20140293251Abstract: A projection system is provided that includes a sensor system that measures at least one parameter that relates to the physical deformation of a frame that supports the optical elements within the projection system, and a control system that, based on the measurements from the sensor system, determines an expected deviation of the position of the beam of radiation projected by the projection system that is caused by the physical deformation of the frame.Type: ApplicationFiled: June 16, 2014Publication date: October 2, 2014Applicant: ASML Netherlands B.V.Inventors: Hans Butler, Robertus Johannes Marinus De Jongh, Hendrik Koevoets, Marco Hendrikus Hermanu Oude Nijhuis, Robertus Leonardus Tousain, Marc Wilhelmus Maria Van Der Wijst, Cornelius Adrianus Lambertus De Hoon
-
Patent number: 8781775Abstract: A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.Type: GrantFiled: January 31, 2011Date of Patent: July 15, 2014Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Emiel Jozef Melanie Eussen, Willem Herman Gertruda Anna Koenen, Engelbertus Antonius Fransiscus Van Der Pasch, Harmen Klaas Van Der Schoot, Marc Wilhelmus Maria Van Der Wijst, Marcus Martinus Petrus Adrianus Vermeulen, Cornelius Adrianus Lambertus De Hoon
-
Patent number: 8743344Abstract: A cable connection between a first object and a second object includes a cable bundle of one or more cables having a certain length. One end of the cable bundle is fixed to the first object and another end of the bundle is fixed to the second object. A cable bundle holder configured to hold the cable bundle at a certain location along the length of the cable bundle, and a control system configured to control the position of the cable bundle holder with respect to the second object are presented. A control system for cable connection, and a method of reducing the transfer of vibrations from a first object to a second object via a cable connection are presented.Type: GrantFiled: May 22, 2009Date of Patent: June 3, 2014Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Martinus Van Duijnhoven, Johan Hendrik Geerke, Joost De Pee, Cornelius Adrianus Lambertus De Hoon
-
Patent number: 8245824Abstract: An active damping system to dampen a vibration of at least a part of the structure, including a device to determine a position quantity of the structure and an actuator to exert a force on the structure in dependency of the determined position quantity, wherein the device is a calculation device configured to calculate the position quantity of the structure on the basis of actuator signals.Type: GrantFiled: November 10, 2008Date of Patent: August 21, 2012Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Marc Wilhelmus Maria Van Der Wijst, Joost De Pee, Cornelius Adrianus Lambertus De Hoon, Stijn Boschker
-
Patent number: 8203694Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The lithographic apparatus further includes a substrate table constructed to hold a substrate; and a projection system configured to project the patterned beam onto a target portion of the substrate. An active damping system is provided to dampen a vibration of at least part of the projection system. The active damping system includes a combination of a sensor to measure a position quantity of the projection system and an actuator to exert a force on the projection system in dependency of a signal provided by the sensor. The active damping system is connected to a damping mass, the damping mass being connected to the projection system.Type: GrantFiled: October 3, 2008Date of Patent: June 19, 2012Assignee: ASML Netherlands B.V.Inventors: Marc Wilhelmus Maria Van Der Wijst, Erik Roelof Loopstra, Cornelius Adrianus Lambertus De Hoon
-
Patent number: 8164737Abstract: A lithographic apparatus includes a projection system to project a patterned radiation beam onto a substrate, and a damping system to dampen a vibration of at least part of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, and the active damping subsystem connected to the interface damping mass, the active damping subsystem including a sensor to measure a position quantity of the interface damping mass and an actuator to exert a force on the interface damping mass based on a signal provided by the sensor. The damping system further includes an interface damping device connected to the interface damping mass and configured to damp a movement of the interface damping mass at an eigenfrequency of the interface damping mass.Type: GrantFiled: October 10, 2008Date of Patent: April 24, 2012Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Erik Roelof Loopstra, Marc Wilhelmus Maria Van Der Wijst, Joost De Pee, Cornelius Adrianus Lambertus De Hoon, Stijn Boschker
-
Patent number: 8102505Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. At least one vibration isolation support device can be provided for supporting an object of the apparatus. The object can be rotatably supported at the vibration isolation support device by way of a rotational support having a center of rotation. The rotational support can have its center of rotation located substantially at the center of gravity of the vibration isolation support device.Type: GrantFiled: March 20, 2007Date of Patent: January 24, 2012Assignee: ASML Netherlands B.V.Inventor: Cornelius Adrianus Lambertus De Hoon
-
Patent number: 8059259Abstract: An active damping system assembly is configured to dampen a vibration of at least part of a structure. The assembly includes a plurality of active dampers each including a sensor configured to measure a position quantity of an interface mass mounted on the structure; and an actuator configured to exert a force on the interface mass in dependency of a signal provided by the sensor, wherein each of the plurality of active damping systems is connected to the interface mass. The structure may be a projection system of a lithographic apparatus.Type: GrantFiled: November 11, 2008Date of Patent: November 15, 2011Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Marc Wilhelmus Maria Van Der Wijst, Joost De Pee, Cornelius Adrianus Lambertus De Hoon, Stijn Boschker
-
Publication number: 20110208459Abstract: A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.Type: ApplicationFiled: January 31, 2011Publication date: August 25, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Hans Butler, Emiel Jozef Melanie Eussen, Willem Herman Gertruda Anna Koenen, Engelbertus Antonius Fransiscus Van Der Pasch, Harmen Klaas Van Der Schoot, Marc Wilhelmus Maria Van Der Wijst, Marcus Martinus Petrus Adrianus Vermeulen, Cornelius Adrianus Lambertus De Hoon
-
Publication number: 20110163477Abstract: An imprint lithography apparatus includes an actuator configured to displace an imprint template holder relative to a substrate holder to perform an imprint process. The imprint template holder and/or the substrate holder being supported on a support structure, the support structure being mounted to a vibration isolation system that is mounted to a base of the apparatus. The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base. A control unit is configured to control the actuator during the imprint process. The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process.Type: ApplicationFiled: December 9, 2010Publication date: July 7, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Hans Butler, Johannes Petrus Martinus Bernardus Vermeulen, Marc Wilhelmus Maria Van Der Wijst, Jeroen Pieter Starreveld, Cornelius Adrianus Lambertus De Hoon, Francois Xavier Debiesme
-
Publication number: 20100089712Abstract: A projection assembly includes a projection system to project a patterned radiation beam onto a substrate, a damping system to dampen a vibration of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, the active damping subsystem including a sensor to measure a position of the interface damping mass, an electromagnetic actuator to exert a force on the interface damping mass, and a controller to drive the electromagnetic actuator based on a signal provided by the sensor, the active damping subsystem including a reaction mass for the electromagnetic actuator to exert a counterforce upon based on the signal provided by the first sensor.Type: ApplicationFiled: October 6, 2009Publication date: April 15, 2010Applicant: ASML Netherlands B.V.Inventors: Hans Butler, Cornelius Adrianus,Lambertus De Hoon
-
Publication number: 20100020525Abstract: A cable connection between a first object and a second object includes a cable bundle of one or more cables having a certain length. One end of the cable bundle is fixed to the first object and another end of the bundle is fixed to the second object. A cable bundle holder configured to hold the cable bundle at a certain location along the length of the cable bundle, and a control system configured to control the position of the cable bundle holder with respect to the second object are presented. A control system for cable connection, and a method of reducing the transfer of vibrations from a first object to a second object via a cable connection are presented.Type: ApplicationFiled: May 22, 2009Publication date: January 28, 2010Applicant: ASML Netherlands B.V.Inventors: Hans BUTLER, Martinus Van Duijnhoven, Johan Hendrik Geerke, Joost De Pee, Cornelius Adrianus Lambertus De Hoon
-
Publication number: 20090207393Abstract: An active damping system assembly is configured to dampen a vibration of at least part of a structure. The assembly includes a plurality of active dampers each including a sensor configured to measure a position quantity of an interface mass mounted on the structure; and an actuator configured to exert a force on the interface mass in dependency of a signal provided by the sensor, wherein each of the plurality of active damping systems is connected to the interface mass. The structure may be a projection system of a lithographic apparatus.Type: ApplicationFiled: November 11, 2008Publication date: August 20, 2009Applicant: ASML Netherlands B.V.Inventors: Hans Butler, Marc Wilhelmus Maria Van Der Wijst, Joost De Pee, Cornelius Adrianus Lambertus De Hoon, Stijn Boschker
-
Publication number: 20090180092Abstract: An active damping system to dampen a vibration of at least a part of the structure, including a device to determine a position quantity of the structure and an actuator to exert a force on the structure in dependency of the determined position quantity, wherein the device is a calculation device configured to calculate the position quantity of the structure on the basis of actuator signals.Type: ApplicationFiled: November 10, 2008Publication date: July 16, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Hans BUTLER, Marc Wilhelmus Maria Van Der Wijst, Joost De Pee, Cornelius Adrianus Lambertus De Hoon, Stijn Boschker
-
Patent number: 7538273Abstract: A cable connection between a first object and a second object includes a cable bundle of one or more cables having a certain length. One end of the cable bundle is fixed to the first object and another end of the bundle is fixed to the second object. A cable bundle holder configured to hold the cable bundle at a certain location along the length of the cable bundle, and a control system configured to control the position of the cable bundle holder with respect to the second object are presented. A control system for cable connection, and a method of reducing the transfer of vibrations from a first object to a second object via a cable connection are also presented.Type: GrantFiled: August 8, 2006Date of Patent: May 26, 2009Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Martinus Van Duijnhoven, Johan Hendrik Geerke, Joost De Pee, Cornelius Adrianus Lambertus De Hoon
-
Publication number: 20090122284Abstract: A lithographic apparatus includes a projection system to project a patterned radiation beam onto a substrate, and a damping system to dampen a vibration of at least part of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, and the active damping subsystem connected to the interface damping mass, the active damping subsystem including a sensor to measure a position quantity of the interface damping mass and an actuator to exert a force on the interface damping mass based on a signal provided by the sensor. The damping system further includes an interface damping device connected to the interface damping mass and configured to damp a movement of the interface damping mass at an eigenfrequency of the interface damping mass.Type: ApplicationFiled: October 10, 2008Publication date: May 14, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Hans Butler, Erik Roelof Loopstra, Marc Wilhelmus Maria Van Der Wijst, Joost De Pee, Cornelius Adrianus Lambertus De Hoon, Stijn Boschker
-
Publication number: 20090103066Abstract: A control system for controlling a position or position related quantity of an object is provided. A measurement system is configured to measure a position or position related quantity of the object. A controller is configured to provide a control signal on the basis of the measured position or position related quantity. A actuator actuates the object on the basis of the control signal. A filter unit, which may be a partial order filter unit, filters the measured position or position related quantity.Type: ApplicationFiled: October 2, 2008Publication date: April 23, 2009Applicant: ASML Netherlands B.V.Inventors: Hans BUTLER, Marc Wilhelmus Maria Van Der Wijst, Cornelius Adrianus Lambertus De Hoon