Abstract: The present invention relates to an ALD apparatus, and particularly relates to an ALD apparatus that is suitable for rapidly depositing a thin film on a substrate having an actual area that is larger than a planar substrate. In the reaction chamber of the ALD apparatus according to an exemplary embodiment of the present invention, more gas is supplied to a portion where more gas is required by having differences in the space for gas to flow rather than supplying the gas in a constant flux and a constant flow velocity such that the time required for supplying reactant gases and waste of reactant gases may be minimized to increase productivity of the ALD apparatus. The ceiling of the reaction space is shaped to provide a nonuniform gap over the substrate.

Abstract: Disclosed is a control method for use in a system for controlling a distance between vehicles. The method comprises a) controlling, in response to the leading vehicle's deceleration, deceleration of the control vehicle; b) controlling stop speed of the control vehicle so that the control vehicle approaches the leading vehicle at a constant speed without stopping; c) controlling the control vehicle to stop smoothly exactly at a position spaced from the leading vehicle by a predetermined stop distance; and d) controlling the start of the control vehicle after determining whether the leading vehicle has started or moved forward.

Abstract: The present invention relates to an ALD apparatus, and particularly relates to an ALD apparatus that is suitable for rapidly depositing a thin film on a substrate having an actual area that is larger than a planar substrate. In the reaction chamber of the ALD apparatus according to an exemplary embodiment of the present invention, more gas is supplied to a portion where more gas is required by having differences in the space for gas to flow rather than supplying the gas in a constant flux and a constant flow velocity such that the time required for supplying reactant gases and waste of reactant gases may be minimized to increase productivity of the ALD apparatus. The ceiling of the reaction space is shaped to provide a nonuniform gap over the substrate.

Abstract: Disclosed herein is a forward vehicle sensing system for a vehicle. The system includes a sensor and a control unit. The sensor monitors conditions of a road ahead of the vehicle. The control unit detects stationary objects placed on edges of the road, calculates an imaginary line from the consecutive stationary objects, and recognize a prior transverse position of a forward vehicle as a current transverse position of the forward vehicle when determining that an absolute value of a transverse position of the forward vehicle detected on the road is greater than an absolute value of a transverse position of the imaginary line. Therefore, the system of the present invention can prevent the forward vehicle from being incorrectly sensed in such a way as to determine the imaginary line from the stationary objects and compare the transverse position of the forward vehicle to that of the imaginary line.

Abstract: An apparatus and method for fabricating a semiconductor device using a 4-way valve with improved purge efficiency by improving a gas valve system by preventing dead volume from occurring are provided. The apparatus includes a reaction chamber in which a substrate is processed to fabricate a semiconductor device; a first processing gas supply pipe supplying a first processing gas into the reaction chamber; a 4-way valve having a first inlet, a second inlet, a first outlet, and a second outlet and installed at the first processing gas supply pipe such that the first inlet and the first outlet are connected to the first processing gas supply pipe; a second processing gas supply pipe connected to the second inlet of the 4-way valve to supply a second processing gas; a bypass connected to the second outlet of the 4-way valve; and a gate valve installed at the bypass.

Abstract: Disclosed is a three-dimensional (3D) mesh compression apparatus and method. The 3D mesh compression apparatus may generate a base mesh through a mesh simplification, may separately compress the base mesh and peaks eliminated by the simplification, may construct a covariance matrix based on a topological distance between the eliminated peaks, and may compress 3D mesh data based on the covariance matrix.

Abstract: The preset invention provides an upper body support apparatus for toilets which enables a user to place his/her arms thereon when having a bowel movement. The upper body support apparatus (1) includes a support board (11), which supports the arms of the user thereon, and a horizontal shaft (13), which provides a path, along which the support board slides relative to the horizontal shaft. The upper body support apparatus further includes a hinge unit (15), which supports a first end of the horizontal shaft such that the horizontal shaft is rotatable upwards or downwards within an angular range of 90° around the first end thereof, and a vertical frame (17), which supports the hinge unit and receives therein a drive unit (19), which rotates the hinge unit to the left or the right or moves the hinge unit upwards or downwards.

Abstract: In a deposition apparatus according to an embodiment of the present invention, a buffer unit is provided between a vaporizer and a reactor of a vaporization supply system to temporarily store source gas, thus, before and when the source gas is supplied to the reactor, the variations of the internal pressure of the vaporizer can be reduced to supply the constant amount of source gas of to reaction spaces, thereby depositing a thin film having a uniform thin-film thickness.

Abstract: An upper body support apparatus for toilets is disclosed. The upper body support apparatus includes a support board (11), which supports the arms of the user thereon. The support board is rotated downwards or upwards between a wall and the front of the upper body of the user. Therefore, the present invention enables a user to place his/her arms on the support board (11). Furthermore, free movement of the user is ensured, and the upper body support apparatus is prevented from impeding the opening or closing of a door of the lavatory. In addition, when washing the lavatory, the upper body support apparatus is prevented from impeding the washing operation. As well, the present invention has a function of providing heat to maintain the body temperature of the user in the winter and a vibration function to stimulate the abdomen of the user to promote bowel evacuation.

Abstract: In a method and an apparatus for forming metal oxide on a substrate, a source gas including metal precursor flows along a surface of the substrate to form a metal precursor layer on the substrate. An oxidizing gas including ozone flows along a surface of the metal precursor layer to oxidize the metal precursor layer so that the metal oxide is formed on the substrate. A radio frequency power is applied to the oxidizing gas flowing along the surface of the metal precursor layer to accelerate a reaction between the metal precursor layer and the oxidizing gas. Acceleration of the oxidation reaction may improve electrical characteristics and uniformity of the metal oxide.

Abstract: In a method and an apparatus for forming metal oxide on a substrate, a source gas including metal precursor flows along a surface of the substrate to form a metal precursor layer on the substrate. An oxidizing gas including ozone flows along a surface of the metal precursor layer to oxidize the metal precursor layer so that the metal oxide is formed on the substrate. A radio frequency power is applied to the oxidizing gas flowing along the surface of the metal precursor layer to accelerate a reaction between the metal precursor layer and the oxidizing gas. Acceleration of the oxidation reaction may improve electrical characteristics and uniformity of the metal oxide.

Abstract: A thin film deposition apparatus including a substrate mounting error detector, a chamber and a substrate support positioned in the chamber. The substrate support is configured to support a substrate. The substrate mounting error detector includes: a light source configured to provide a light beam to the substrate, such that the substrate reflects the light beam; a collimator configured to selectively pass at least a portion of the light beam reflected by the substrate; and an optical sensor configured to detect the at least a portion of the reflected light beam passed by the collimator. The detector is positioned and oriented to detect substrate position on a lowered support prior to raising the support into contact with an upper cover of a clamshell reactor arrangement. This configuration allows a thin film deposition process only if the substrate is correctly mounted on the substrate support. Thus, abnormal deposition due to a substrate mounting error is prevented in advance.

Abstract: A backlight unit of a liquid crystal display device supplies light to one or more corresponding pixels of a liquid crystal display panel. The backlight unit includes a plurality of blocks formed into a matrix shape. Each block includes a light emitting diode module. The blocks in a row of the matrix are driven by a same row driving signal and the blocks in a column of the matrix are driven by a same column driving signal, to adjust luminance of the light supplied to the corresponding pixels.

Abstract: A beverage can with a small external sweet reservoir is provided. The reservoir is rotate-ably attached to the bottom of the beverage can. A hole for introducing the sweets is developed a he bottom of the beverage can. The reservoir is a shallow cylindrical can, which is divided into pluralities of sections of same internal volume by pluralities of dividers that are installed inside of the reservoir and are extending radially from the center thereof. Each section is filled with sugar solution, except first section. Face of the reservoir toward the main can body is open. Rubber gaskets are attached at each end of the dividers and the open end of the reservoir, which contacts with the beverage can, to prevent leak of the sugar solution. As a customer turns the reservoir, additional sugar solution is introduced to the beverage can through the hole and the user can adjust sweetness or the beverage.

Abstract: A deposition apparatus and deposition method for forming a film on a substrate are disclosed. A film is deposited on a substrate by exposing the substrate to different flow directions of reactant gases. In one embodiment, the substrate is rotated in the reaction chamber after a film having an intermediate thickness is formed on the substrate. In other embodiments, the substrate is transferred from one reaction chamber to another after a film having an intermediate thickness is formed on the substrate. Accordingly, a film having a uniform thickness is deposited, averaging out depletion effect.

Abstract: A snow vehicle according to the present invention takes a shape streamlined from a front part 110 to a rear part 130, which makes the snow vehicle look like a chamfered rhombus or a diamond in overall. Herein, the snow vehicle comprises: a main body 100 formed with a pair of lower body holders 140 protruding upward on opposite sides of the main body 100 on a portion where the user's lower body touches the main body 100 and being streamlined in shape of letter “U”; and a pair of sliders 200 contacting the ground and being extended from a first end, which is coupled with the main body 100 by a coupling means 210 vertically connected to the front part 110 of the main body 100, to a second end. The snow vehicle according to the present invention has an advantage that an inexperienced novice, a handicapped person, and a skilled person can enjoy thrilling speeding experience with conveniency, by combining advantages of the ski and the sled.

Abstract: A reactor configured to subject a substrate to alternately repeated surface reactions of vapor-phase reactants is disclosed. The reactor includes a reaction chamber, one or more inlets, and an exhaust outlet. The reaction chamber includes a reaction space. The reactor also includes a gas flow control guide structure within the reaction chamber. The gas flow control guide structure resides over the reaction space and is interposed between the inlets and the reaction space such that a laminar flow is generated in the reaction space. The gas flow control guide structure includes one or more channels. Each of the channels extends from a respective one of the inlets to a first portion of a periphery of the reaction space. Each of the channels defines a flow path extending from the respective one of the inlets to the reaction space.

Abstract: The present invention relates to an ALD apparatus, and particularly relates to an ALD apparatus that is suitable for rapidly depositing a thin film on a substrate having an actual area that is larger than a planar substrate. In the reaction chamber of the ALD apparatus according to an exemplary embodiment of the present invention, more gas is supplied to a portion where more gas is required by having differences in the space for gas to flow rather than supplying the gas in a constant flux and a constant flow velocity such that the time required for supplying reactant gases and waste of reactant gases may be minimized to increase productivity of the ALD apparatus. The ceiling of the reaction space is shaped to provide a nonuniform gap over the substrate.

Abstract: In a method and an apparatus for forming metal oxide on a substrate, a source gas including metal precursor flows along a surface of the substrate to form a metal precursor layer on the substrate. An oxidizing gas including ozone flows along a surface of the metal precursor layer to oxidize the metal precursor layer so that the metal oxide is formed on the substrate. A radio frequency power is applied to the oxidizing gas flowing along the surface of the metal precursor layer to accelerate a reaction between the metal precursor layer and the oxidizing gas. Acceleration of the oxidation reaction may improve electrical characteristics and uniformity of the metal oxide.

Abstract: A semiconductor processing apparatus comprises a pyrophoric source vessel within an enclosure, the vessel containing a pyrophoric material. An air intake labyrinth extends away from the enclosure and has an inlet and an outlet. The inlet is in fluid communication with an exterior of the enclosure, and the outlet is in fluid communication with an interior of the enclosure. The labyrinth defines a tortuous path between the inlet and the outlet. In order to thermally isolate the enclosure, it can be surrounded by an air gap of at least 10 mm separating the enclosure from other components of the processing apparatus, to prevent damage to such other components. The thermal isolation can also be achieved by forming the enclosure from double walls with a 10 mm gap therebetween. The pyrophoric enclosure can have a separate exhaust duct and/or scrubber than those of a semiconductor processing reactor associated with the enclosure.