Patents by Inventor Dae Youn

Dae Youn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140300598
    Abstract: Disclosed is a three-dimensional (3D) mesh compression apparatus and method. The 3D mesh compression apparatus may generate a base mesh through a mesh simplification, may separately compress the base mesh and vertices eliminated by the simplification, and may compress 3D mesh data based on the covariance matrix.
    Type: Application
    Filed: June 20, 2014
    Publication date: October 9, 2014
    Inventors: Min Su AHN, Jeong Hwan AHN, Jae Kyun AHN, Dae Youn LEE, Chang Su KIM
  • Patent number: 8805097
    Abstract: Disclosed is a three-dimensional (3D) mesh compression apparatus and method. The 3D mesh compression apparatus may generate a base mesh through a mesh simplification, may separately compress the base mesh and vertices eliminated by the simplification, may construct a covariance matrix based on a topological distance between the eliminated vertices, and may compress 3D mesh data based on the covariance matrix.
    Type: Grant
    Filed: October 15, 2010
    Date of Patent: August 12, 2014
    Assignees: Samsung Electronics Co., Ltd., Korea University Industrial & Academic Collaboration Foundation
    Inventors: Min Su Ahn, Jeong Hwan Han, Jae Kyun Ahn, Dae Youn Lee, Chang Su Kim
  • Publication number: 20140168360
    Abstract: Disclosed is a method and apparatus for encoding a three-dimensional (3D) mesh. The method for encoding the 3D mesh includes determining a priority of a gate configuring a 3D mesh corresponding to a 3D object, removing vertices configuring the 3D mesh using the determined priority of the gate, and simplifying the 3D mesh.
    Type: Application
    Filed: February 17, 2012
    Publication date: June 19, 2014
    Applicants: KOREA UNIVERSITY INDUSTRIAL & ACADEMIC COLLABORATION, SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Min Su Ahn, Chang Su Kim, Tae Hyun Rhee, Do Kyoon Kim, Dae Youn Lee, Jae Kyun Ahn
  • Publication number: 20140163836
    Abstract: The speed of a vehicle is automatically controlled in a speed bump area located in the vicinity of a speed bump. Information about a speed bump is received from a navigation device, and a distance between the vehicle and the speed bump is calculated. If the calculated is less than a preset reference distance, it is determined that the vehicle is entering or has entered an area of the speed bump. Upon determining that the vehicle is in the speed bump area, a speed difference between a safe speed bump crossing speed and a current speed of the vehicle is computed, a required acceleration value is calculated based on the calculated distance to the speed bump and the speed difference, and the speed of the vehicle is controlled so that the vehicle decelerates or accelerates in accordance with the required acceleration value.
    Type: Application
    Filed: March 18, 2013
    Publication date: June 12, 2014
    Inventors: Dae Youn Um, Jee Young Kim
  • Publication number: 20140163837
    Abstract: The speed of a vehicle is automatically controlled in a speed bump area located in the vicinity of a speed bump. Information about a speed bump is received from a navigation device, and a distance between the vehicle and the speed bump is calculated. If the calculated is less than a preset reference distance, it is determined that the vehicle is entering or has entered an area of the speed bump. Upon determining that the vehicle is in the speed bump area, a speed difference between a safe speed bump crossing speed and a current speed of the vehicle is computed, a required acceleration value is calculated based on the calculated distance to the speed bump and the speed difference, and the speed of the vehicle is controlled so that the vehicle decelerates or is accelerates in accordance with the required acceleration value.
    Type: Application
    Filed: March 16, 2013
    Publication date: June 12, 2014
    Inventors: DAE YOUN UM, Jee Young Kim
  • Publication number: 20140109832
    Abstract: In a deposition apparatus, as a plurality of plasma connection terminals that transfer plasma power to a plasma electrode are coupled in parallel to the plasma electrode, resistance caused by the plurality of plasma connection terminals is reduced and a current is distributed such that heat generated in the plurality of plasma connection terminals can be distributed. Therefore, even if high RF power is used, by preventing the plurality of plasma connection terminals from being oxidized, plasma is stably supplied and thus, stability of a deposition apparatus and the accuracy of a process can be enhanced.
    Type: Application
    Filed: October 18, 2013
    Publication date: April 24, 2014
    Applicant: ASM IP Holding B.V.
    Inventors: Ki Jong KIM, Dae Youn Kim, Hyun Soo Jang
  • Patent number: 8674624
    Abstract: A direct current to direct current converter includes: an input terminal; an output terminal having voltage higher than the input terminal; a coupled inductor boost cell including a coupled inductor connected to the input terminal, a switch connected to the coupled inductor, and an output diode connected to the output terminal; and a clamp and energy transfer cell including a clamp diode connected to the coupled inductor, a clamp capacitor connected to the clamp diode, and an energy transfer diode connected to the output diode.
    Type: Grant
    Filed: March 9, 2012
    Date of Patent: March 18, 2014
    Assignees: Samsung Display Co., Ltd., Korea Advanced Institute of Science and Technology
    Inventors: Won Sik Oh, Gun Woo Moon, Shin Young Cho, Dae Youn Cho
  • Patent number: 8660376
    Abstract: A data processing apparatus and method. A vertex grouping unit of the data processing apparatus may group, into at least one group, a plurality of vertices included in a three-dimensional (3D) object desired to be compressed. A prediction mode determination unit may determine a prediction mode for compressing a vertex position with respect to each of the at least one group. A coder may code a prediction error vector and an identification (ID) index of the prediction mode determined with respect to each of the at least one group.
    Type: Grant
    Filed: January 19, 2012
    Date of Patent: February 25, 2014
    Assignees: Samsung Electronics Co., Ltd., Korea University Industrial & Academic Collaboration Foundation
    Inventors: Min Su Ahn, Do Kyoon Kim, Tae Hyun Rhee, Chang Su Kim, Jae Kyun Ahn, Dae Youn Lee
  • Publication number: 20130332044
    Abstract: An apparatus for controlling a speed on a curved road in a smart cruise control system configured to obtain road coordinate information of a front portion of a vehicle from a navigation system based on a current location of the vehicle, calculate a curvature value of the curved road based on the road coordinate information, calculate a speed corresponding to the curvature value, and control a speed setting of the vehicle based on the speed corresponding to the curvature value when approaching the curved road.
    Type: Application
    Filed: December 14, 2012
    Publication date: December 12, 2013
    Applicants: KIA MOTORS CORPORATION, HYUNDAI MOTOR COMPANY
    Inventors: Dae Youn Um, Jee Young Kim
  • Publication number: 20130247822
    Abstract: In a deposition apparatus, a protecting member made of an elastic body is inserted into a pin hole where a fixed substrate supporting pin is inserted and the substrate supporting pin is fixed through the protecting member to prevent damages to the substrate and a decrease in yield due to damages to the substrate supporting pin by preventing the substrate supporting pin from being damaged by loading or unloading of the substrate or static electricity. Further, the deposition apparatus includes a substrate supporting pin guide member capable of preventing misalignment of an unfixed substrate supporting pin to prevent damages to the substrate and a decrease in the yield due to damages to the substrate supporting pin by preventing the substrate supporting pin from being damaged by loading or unloading of the substrate or static electricity.
    Type: Application
    Filed: March 14, 2013
    Publication date: September 26, 2013
    Applicant: ASM IP Holding B.V.
    Inventors: Hyun-Kyu CHO, Dong Rak JUNG, Dae-Youn KIM
  • Patent number: 8510873
    Abstract: An upper body support apparatus for toilets which enables a user to place his/her arms thereon when having a bowel movement. The upper body support apparatus includes a support board, which supports the arms of the user thereon, and a horizontal shaft, which provides a path, along which the support board slides relative to the horizontal shaft. The upper body support apparatus further includes a hinge unit, which supports a first end of the horizontal shaft such that the horizontal shaft is rotatable upwards or downwards within an angular range of 90° around the first end thereof, and a vertical frame, which supports the hinge unit and receives therein a drive unit, which rotates the hinge unit to the left or the right or moves the hinge unit upwards or downwards.
    Type: Grant
    Filed: May 30, 2008
    Date of Patent: August 20, 2013
    Inventors: Dae Youn Kim, Min Young Park
  • Publication number: 20130113390
    Abstract: A direct current to direct current converter includes: an input terminal; an output terminal having voltage higher than the input terminal; a coupled inductor boost cell including a coupled inductor connected to the input terminal, a switch connected to the coupled inductor, and an output diode connected to the output terminal; and a clamp and energy transfer cell including a clamp diode connected to the coupled inductor, a clamp capacitor connected to the clamp diode, and an energy transfer diode connected to the output diode.
    Type: Application
    Filed: March 9, 2012
    Publication date: May 9, 2013
    Applicants: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY, SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Won Sik OH, Gun Woo MOON, Shin Young CHO, Dae Youn CHO
  • Patent number: 8347813
    Abstract: A thin film deposition apparatus including a substrate mounting error detector, a chamber and a substrate support positioned in the chamber. The substrate support is configured to support a substrate. The substrate mounting error detector includes: a light source configured to provide a light beam to the substrate, such that the substrate reflects the light beam; a collimator configured to selectively pass at least a portion of the light beam reflected by the substrate; and an optical sensor configured to detect the at least a portion of the reflected light beam passed by the collimator. The detector is positioned and oriented to detect substrate position on a lowered support prior to raising the support into contact with an upper cover of a clamshell reactor arrangement. This configuration allows a thin film deposition process only if the substrate is correctly mounted on the substrate support. Thus, abnormal deposition due to a substrate mounting error is prevented in advance.
    Type: Grant
    Filed: December 10, 2008
    Date of Patent: January 8, 2013
    Assignee: ASM Genitech Korea Ltd.
    Inventors: Ki Jong Kim, Dae Youn Kim
  • Patent number: 8305332
    Abstract: A backlight unit of a liquid crystal display device supplies light to one or more corresponding pixels of a liquid crystal display panel. The backlight unit includes a plurality of blocks formed into a matrix shape. Each block includes a light emitting diode module. The blocks in a row of the matrix are driven by a same row driving signal and the blocks in a column of the matrix are driven by a same column driving signal, to adjust luminance of the light supplied to the corresponding pixels.
    Type: Grant
    Filed: August 8, 2008
    Date of Patent: November 6, 2012
    Assignees: Samsung Display Co., Ltd., Korea Advanced Institute Science & Technology
    Inventors: Mun-Soo Park, Gun-Woo Moon, Won-Sik Oh, Dae-Youn Cho, Kyu-Min Cho, Nam-Deog Kim, Seung-Hwan Moon
  • Publication number: 20120272900
    Abstract: A lateral flow atomic layer deposition device according to an exemplary embodiment of the present invention eliminates a gas flow control plate in a conventional lateral flow atomic layer deposition device and controls shapes of a gas input part and a gas output part in a reactor cover to make a gas flow path to a center of a substrate shorter than a gas flow path to an edge of the substrate and thereby increase the amount of gas per unit area flowing to the center of the substrate. Therefore, film thickness in the center of the substrate in the lateral flow reactor increases.
    Type: Application
    Filed: April 4, 2012
    Publication date: November 1, 2012
    Applicant: ASM GENITECH KOREA LTD.
    Inventors: Young-Seok CHOI, Dae-Youn KIM, Seung Woo CHOI, Yong Min YOO, Jung Soo KIM
  • Publication number: 20120189220
    Abstract: A data processing apparatus and method. A vertex grouping unit of the data processing apparatus may group, into at least one group, a plurality of vertices included in a three-dimensional (3D) object desired to be compressed. A prediction mode determination unit may determine a prediction mode for compressing a vertex position with respect to each of the at least one group. A coder may code a prediction error vector and an identification (ID) index of the prediction mode determined with respect to each of the at least one group.
    Type: Application
    Filed: January 19, 2012
    Publication date: July 26, 2012
    Applicants: Korea University Industrial & Academic Collaboration Foundation, Samsung Electronics Co., Ltd.
    Inventors: Min Su AHN, Do Kyoon Kim, Tae Hyun Rhee, Chang Su Kim, Jae Kyun Ahn, Dae Youn Lee
  • Patent number: 8215264
    Abstract: The present invention relates to an ALD apparatus, and particularly relates to an ALD apparatus that is suitable for rapidly depositing a thin film on a substrate having an actual area that is larger than a planar substrate. In the reaction chamber of the ALD apparatus according to an exemplary embodiment of the present invention, more gas is supplied to a portion where more gas is required by having differences in the space for gas to flow rather than supplying the gas in a constant flux and a constant flow velocity such that the time required for supplying reactant gases and waste of reactant gases may be minimized to increase productivity of the ALD apparatus. The ceiling of the reaction space is shaped to provide a nonuniform gap over the substrate.
    Type: Grant
    Filed: June 29, 2011
    Date of Patent: July 10, 2012
    Assignee: ASM Genitech Korea Ltd.
    Inventors: Kyung Il Hong, Dae Youn Kim, Hyung-Sang Park, Sang Jin Jeong, Wonyong Koh, Herbert Terhorst
  • Publication number: 20120013608
    Abstract: A scalable three-dimensional (3D) mesh encoding method includes dividing the 3D mesh into layers of complexity into a plurality of graduated levels and generating vertex position information and connectivity information of each of the plurality of levels. The vertex position information about the 3D mesh is encoded based on a weighting in each bit plane and vertex position information having a higher weighting in each bit plane is first encoded.
    Type: Application
    Filed: June 14, 2011
    Publication date: January 19, 2012
    Applicants: KOREA UNIVERSITY INDUSTRIAL & ACADEMIC COLLABORATION FOUNDATION, SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Min Su AHN, Chang Su Kim, Jae Kyun Ahn, Do Kyoon Kim, Dae Youn Lee
  • Publication number: 20110308460
    Abstract: The present invention relates to an ALD apparatus, and particularly relates to an ALD apparatus that is suitable for rapidly depositing a thin film on a substrate having an actual area that is larger than a planar substrate. In the reaction chamber of the ALD apparatus according to an exemplary embodiment of the present invention, more gas is supplied to a portion where more gas is required by having differences in the space for gas to flow rather than supplying the gas in a constant flux and a constant flow velocity such that the time required for supplying reactant gases and waste of reactant gases may be minimized to increase productivity of the ALD apparatus. The ceiling of the reaction space is shaped to provide a nonuniform gap over the substrate.
    Type: Application
    Filed: June 29, 2011
    Publication date: December 22, 2011
    Applicant: ASM GENITECH KOREA LTD.
    Inventors: Kyung Il Hong, Dae Youn Kim, Hyung-Sang Park, Sang Jin Jeong, Wonyong Koh, Herbert Terhorst
  • Patent number: D716742
    Type: Grant
    Filed: March 12, 2014
    Date of Patent: November 4, 2014
    Assignee: ASM IP Holding B.V.
    Inventors: Hyun Soo Jang, Dae Youn Kim, Jeong Ho Lee, Seung Seob Lee, Hak Yong Kwon