Abstract: An apparatus and method for manufacturing a grilled seaweed includes the apparatus comprising a grilling unit having a first housing with a first inlet opening and a first outlet opening which communicate with each other; a first conveyor for transferring a sheet of seaweed from the first inlet opening to the first outlet opening; a first heating source installed over the first conveyor to discharge a flame onto a top surface of the seaweed being transferred by the first conveyor; and a second heating source installed on both sides of a lower portion of the first conveyor to apply a flame onto a bottom surface of the seaweed being transferred by the first conveyor.

Abstract: The present disclosure relates to a method for manufacturing a frozen block by mixing meat, salts, vegetables, and alpha starch.

Abstract: A method for fabricating a semiconductor device includes forming a bit line contact hole in a substrate; forming a first spacer on a sidewall of the bit line contact hole; forming a sacrificial spacer over the first spacer; forming a first conductive material that fills the bit line contact hole over the sacrificial spacer; forming a second conductive material over the first conductive material; forming a bit line by etching the second conductive material; and forming a bit line contact plug and a gap between the bit line contact plug and the first spacer by partially etching the first conductive material and the sacrificial spacer to be aligned with the bit line.

Abstract: A method for fabricating a semiconductor device includes forming a bit line contact hole in a substrate; forming a first spacer on a sidewall of the bit line contact hole; forming a sacrificial spacer over the first spacer; forming a first conductive material that fills the bit line contact hole over the sacrificial spacer; forming a second conductive material over the first conductive material; forming a bit line by etching the second conductive material; and forming a bit line contact plug and a gap between the bit line contact plug and the first spacer by partially etching the first conductive material and the sacrificial spacer to be aligned with the bit line.

Abstract: A solid dispersion of dutasteride for improving the solubility or dissolution rate of poorly soluble dutasteride, a method for preparing the solid dispersion, and a pharmaceutical composition including the solid dispersion are provided. The solid dispersion includes: a coprecipitate including dutasteride and a water-soluble polymeric carrier; and an adsorbent. The dutasteride and the water-soluble polymeric carrier are present in a weight ratio of 1:10-100 in the coprecipitate.

Abstract: A method for fabricating a semiconductor device includes forming a bit line contact hole in a substrate; forming a first spacer on a sidewall of the bit line contact hole; forming a sacrificial spacer over the first spacer; forming a first conductive material that fills the bit line contact hole over the sacrificial spacer; forming a second conductive material over the first conductive material; forming a bit line by etching the second conductive material; and forming a bit line contact plug and a gap between the bit line contact plug and the first spacer by partially etching the first conductive material and the sacrificial spacer to be aligned with the bit line.

Abstract: A solid dispersion of dutasteride for improving the solubility or dissolution rate of poorly soluble dutasteride, a method for preparing the solid dispersion, and a pharmaceutical composition including the solid dispersion are provided. The solid dispersion includes: a coprecipitate including dutasteride and a water-soluble polymeric carrier; and an adsorbent. The dutasteride and the water-soluble polymeric carrier are present in a weight ratio of 1:10-100 in the coprecipitate. The solid dispersion exhibits a dissolution rate equal to or higher than AVODART® soft capsules and contains a minimal amount of related substances, achieving good storage stability.

Abstract: A semiconductor device includes a substrate including a cell array region including a cell active region. An insulating pattern is on the substrate. The insulating pattern includes a direct contact hole which exposes the cell active region and extends into the cell active region. A direct contact conductive pattern is in the direct contact hole and is connected to the cell active region. A bit line is on the insulating pattern. The bit line is connected to the direct contact conductive pattern and extends in a direction orthogonal to an upper surface of the insulating pattern. The insulating pattern includes a first insulating pattern including a non-metal-based dielectric material and a second insulating pattern on the first insulating pattern. The second insulating pattern includes a metal-based dielectric material having a higher dielectric constant than a dielectric constant of the first insulating pattern.

Abstract: A semiconductor device includes a substrate including a cell active region and a peripheral active region, a direct contact arranged on a cell insulating pattern formed on the substrate and connected to the cell active region, a bit line structure including a thin conductive pattern, contacting a top surface of the direct contact and extending in one direction, and a peripheral gate structure in the peripheral active region. The peripheral gate structure include a stacked structure of a peripheral gate insulating pattern and a peripheral gate conductive pattern, the thin conductive pattern includes a first material and the peripheral gate conductive pattern include the first material, and a level of an upper surface of the thin conductive pattern is lower than a level of an upper surface of the peripheral gate conductive pattern.

Abstract: Disclosed are a method and an apparatus that reflect the quantity of wireless resources allocatable to a user terminal in a scheduling target cell to calculate the quantity of available wireless resources for quality of service (QoS) requirements for each kind of varied traffic of user terminals and a metric having a flexible weight for the QoS requirements and support efficient wireless resource scheduling among the user terminals.

Abstract: A semiconductor device includes: a first interconnection line and a second interconnection line which extend apart from each other on a first plane at a first level on a substrate; a bypass interconnection line that extends on a second plane at a second level on the substrate; and a plurality of contact plugs for connecting the bypass interconnection line to the first interconnection line and the second interconnection line. A method includes forming a bypass interconnection line spaced apart from a substrate and forming on a same plane a plurality of interconnection lines connected to the bypass interconnection line via a plurality of contact plugs.

Abstract: A method of providing a multicast service is provided by a terminal in a terminal-to-terminal direct communication. The terminal transmits a service start request message requesting a start of a multicast service to a multicast server, and receives a service start response message including a result of permitting a start request from the multicast server. The terminal receives, via a base station, resource information of a resource which a multicast coordinator allocates to the multicast service in accordance with a request of the multicast server, and transmits multicast service data based on the resource information.

Abstract: A semiconductor device includes a substrate including an active region, a plurality of conductive line structures separate from the substrate, a plurality of contact plugs between the plurality of conductive line structures, a plurality of landing pads connected to a corresponding contact plug of the plurality of contact plugs, a landing pad insulation pattern between the plurality of landing pads, and a first insulation spacer between the landing pad insulation pattern and first conductive line structures from among the plurality of conductive line structures.

Abstract: A method for controlling, by a base station, uplink transmission power of a mobile terminal. The base station receives an available transmission power amount of the mobile terminal from the mobile terminal. The base station determines a target channel quality value corresponding to a current location of the mobile terminal, on the basis of the available transmission power amount. The base station determines a received channel quality value using an uplink data channel received from the mobile terminal. Further, the base station determines a transmit power control (TPC) using a difference between the target channel quality value and the received channel quality value.

Abstract: A semiconductor device includes a substrate including a cell active region and a peripheral active region, a direct contact arranged on a cell insulating pattern formed on the substrate and connected to the cell active region, a bit line structure including a thin conductive pattern, contacting a top surface of the direct contact and extending in one direction, and a peripheral gate structure in the peripheral active region. The peripheral gate structure include a stacked structure of a peripheral gate insulating pattern and a peripheral gate conductive pattern, the thin conductive pattern includes a first material and the peripheral gate conductive pattern include the first material, and a level of an upper surface of the thin conductive pattern is lower than a level of an upper surface of the peripheral gate conductive pattern.

Abstract: A semiconductor device includes a substrate including a cell array region including a cell active region. An insulating pattern is on the substrate. The insulating pattern includes a direct contact hole which exposes the cell active region and extends into the cell active region. A direct contact conductive pattern is in the direct contact hole and is connected to the cell active region. A bit line is on the insulating pattern. The bit line is connected to the direct contact conductive pattern and extends in a direction orthogonal to an upper surface of the insulating pattern. The insulating pattern includes a first insulating pattern including a non-metal-based dielectric material and a second insulating pattern on the first insulating pattern. The second insulating pattern includes a metal-based dielectric material having a higher dielectric constant than a dielectric constant of the first insulating pattern.

Abstract: A method of forming a pattern includes forming a first level pattern layer on a feature layer on a substrate. The first level pattern layer includes a plurality of first line patterns and a plurality of first space burying patterns. The first line patterns extend parallel to one another in a first direction and the first space burying patterns extend parallel to one another in the first direction with first line patterns alternately disposed with first space burying patterns A portion of the plurality of first space burying patterns may be removed to form a second direction pattern space extending intermittently or continuously in the first level pattern layer. A second burying layer filling the second direction pattern space may be formed to form a network structure pattern. The feature layer may be etched with the network structure pattern as an etch mask to form a pattern of holes.

Abstract: A method of manufacturing a semiconductor device includes: forming bit line structures spaced apart from each other by first groove disposed in first direction, extending in first direction, and spaced apart from each other in second direction perpendicular to first direction, on substrate in which word line is buried; forming multilayer spacer on both sidewalls of bit line structure; forming sacrificial layer to fill first groove; forming second grooves spaced apart from each other in first direction and second direction, by patterning sacrificial layer; etching outermost spacer of multilayer spacer located in second groove; forming first supplementary spacer in second groove; forming insulating layer to fill second groove; and forming third grooves spaced apart from each other in first direction and second direction, on both sides of first supplementary spacer, by removing sacrificial layer and insulating layer.

Abstract: A method for controlling, by a base station, uplink transmission power of a mobile terminal. The base station receives an available transmission power amount of the mobile terminal from the mobile terminal. The base station determines a target channel quality value corresponding to a current location of the mobile terminal, on the basis of the available transmission power amount. The base station determines a received channel quality value using an uplink data channel received from the mobile terminal. Further, the base station determines a transmit power control (TPC) using a difference between the target channel quality value and the received channel quality value.

Abstract: Provided is a method of manufacturing a semiconductor device. The method includes forming isolated contact filling portions and an etch control portion, the isolated contact filling portions filling contact holes defined in a support layer and are spaced apart from each other in a first direction and a second direction perpendicular to the first direction and the etch control layer surrounding the isolated contact filling portions, forming an interconnection layer on the isolated contact filling portions and the etch control portion, and forming interconnection patterns by photo-etching the interconnection layer, the isolated contact patterns, and the etch control portion, the interconnection patterns being relatively narrow in the first direction and relatively wide in the second direction.