Patents by Inventor Daisuke Adachi

Daisuke Adachi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060145623
    Abstract: The plasma display panel disclosed has a front substrate and a rear substrate positioned to face each other. The front substrate includes display electrodes provided with scan electrodes and sustain electrodes, and a light-shield provided on a non-discharge area between display electrodes. A rear substrate includes phosphor layers to emit light by discharge. The display electrodes are composed of transparent electrodes, and bus electrodes. The bus electrodes are composed of a plurality of electrode layers and at least one of the electrodes is composed of a black layer having a product of the resistivity and layer thickness of not larger than 2 ?cm2. A light-shield is composed of a black layer with the resistivity of not smaller than 1×106 ?cm.
    Type: Application
    Filed: December 10, 2004
    Publication date: July 6, 2006
    Inventors: Daisuke Adachi, Hiroyuki Yonehara
  • Publication number: 20050215161
    Abstract: The present invention provides a method of manufacturing a PDP that prevents defects due to dust adhering to a photomask, for example, from occurring in a structure of the PDP. In photolithography, exposure is performed twice in a same process, and photomask (22) is moved within an allowable range of displacement in an exposure pattern, between a first and a second exposures. Photomask (22) is exposed twice in total before and after moving photomask (22). Region (21a), an unexposed region due to interruption of dust (22b) attached to photomask (22), can be suppressed, enabling pattern exposure on photosensitive Ag paste film (21) to be favorably performed.
    Type: Application
    Filed: February 23, 2004
    Publication date: September 29, 2005
    Inventor: Daisuke Adachi
  • Publication number: 20050215162
    Abstract: The present invention provides a method of manufacturing a PDP that prevents a defect from occurring in a structure of the PDP; and also suppresses retroflexion, exfoliation, and the like, of the structure. In photolithography, exposure is performed twice with a first and a second photomasks, each having a different aperture width, but the same exposure pattern. The amount of exposure is different between first exposure region (A?) through the first photomask; and second exposure region (B?) through the second photomask.
    Type: Application
    Filed: February 23, 2004
    Publication date: September 29, 2005
    Inventor: Daisuke Adachi
  • Publication number: 20050160768
    Abstract: The present invention provides a manufacturing method of a glass substrate for an image display device having high picture quality. Reducing force in a float furnace is controlled to be decreased so that Sn++ content on a surface of the glass substrate forming an Ag electrode is a predetermined value or less. When the resultant Sn++ content on the surface of the glass substrate forming the Ag electrode exceeds the predetermined value, the surface is partially removed to decrease the Sn++ content to the predetermined value or less to suppress occurrence of yellowing of the glass substrate.
    Type: Application
    Filed: November 27, 2003
    Publication date: July 28, 2005
    Applicant: Matsushita Electric Industrial Co., Ltd.
    Inventors: Daisuke Adachi, Hiroyasu Tsuji, Keisuke Sumida
  • Publication number: 20050073475
    Abstract: The present invention provides an image display device capable of displaying a good image by suppressing yellowing of a glass substrate, and a high-yield manufacturing method of the glass substrate. The image display device is formed of a front-side glass substrate and a back-side glass substrate. In this manufacturing method, a glass substrate is used as the front-side glass substrate when Sn++ content in the glass substrate is a predetermined value or less, and the glass substrate is used as the back-side glass substrate when the Sn++ content exceeds the predetermined value.
    Type: Application
    Filed: November 27, 2003
    Publication date: April 7, 2005
    Inventors: Daisuke Adachi, Hiroyasu Tsuji, Keisuke Sumida
  • Publication number: 20050062416
    Abstract: The present invention provides an image display device capable of displaying a good image by suppressing yellowing of a glass substrate, and an evaluating method of the glass substrate. The image display device is formed using the glass substrate where reflectance at wavelength of 220 nm is 5% or lower. In the evaluating method of the glass substrate for the image display device, Sn++ content in the glass substrate is analyzed using reflectance at wavelength of 220 nm.
    Type: Application
    Filed: November 27, 2003
    Publication date: March 24, 2005
    Inventors: Daisuke Adachi, Hiroyasu Tsuji, Keisuke Sumida
  • Publication number: 20040242113
    Abstract: A method of manufacturing a plasma display panel, whose glass substrate is not tinged and luminance is high, is provided, even when silver material is used. A layer including silver compounds, which include sulfur generated on a surface of an electrode by reacting on sulfur in air, is removed before a forming process of a dielectric layer. Then decomposition of the compound is restricted in a firing process of the dielectric layer. Even when the electrode having the silver material with high electrical conductivity is used, yellow coloration on the glass substrate is prevented. As a result, a high quality plasma display panel which does not decrease in luminance is provided.
    Type: Application
    Filed: January 30, 2004
    Publication date: December 2, 2004
    Inventors: Daisuke Adachi, Keisuke Sumida, Hideki Ashida, Morio Fujitani
  • Publication number: 20040080270
    Abstract: An object of the present invention is to provide a technique for relatively easily suppressing the yellowing of a Plasma Display Panel in which electrodes comprising silver are disposed on the substrates, and thus render image displays with high luminance and high quality.
    Type: Application
    Filed: December 8, 2003
    Publication date: April 29, 2004
    Inventors: Morio Fujitani, Hiroyuki Yonehara, Masaki Aoki, Keisuke Sumida, Hideki Asida, Junichi Hibino, Daisuke Adachi
  • Publication number: 20030079981
    Abstract: A distilling apparatus and method use a two step distillation and purification process for processing a waste liquid, such as an impure sulfuric acid solution, to form a highly concentrated sulfuric acid solution. First, the waste liquid is stored in a concentrating column, where it is heated. A condenser, which uses the waste liquid as a cooling medium, condenses the vapor generated by the heater. The condensed vapor is passed through a filter, which separates impurities out of the waste liquid, prior to feeding the waste liquid back into the concentrating column. Water is then removed from the waste liquid via a distilling process. The resulting concentrated liquid is then fed to a purifying column, where it is again heated, to remove residue, and condensed, resulting in a highly pure waste liquid.
    Type: Application
    Filed: November 22, 2002
    Publication date: May 1, 2003
    Applicant: FUJITSU LIMITED
    Inventors: Hiroshi Osuda, Toru Matoba, Daisuke Adachi, Masataka Fukuizumi
  • Patent number: 6508915
    Abstract: A distilling apparatus and method use a two step distillation and purification process for processing a waste liquid, such as an impure sulfuric acid solution, to form a highly concentrated sulfuric acid solution. First, the waste liquid is stored in a concentrating column, where it is heated. A condenser, which uses the waste liquid as a cooling medium, condenses the vapor generated by the heater. The condensed vapor is passed through a filter, which separates impurities out of the waste liquid, prior to feeding the waste liquid back into the concentrating column. Water is then removed from the waste liquid via a distilling process. The resulting concentrated liquid is then fed to a purifying column, where it is again heated, to remove residue, and condensed, resulting in a highly pure waste liquid.
    Type: Grant
    Filed: December 17, 1997
    Date of Patent: January 21, 2003
    Assignee: Fujitsu Limited
    Inventors: Hiroshi Osuda, Toru Matoba, Daisuke Adachi, Masataka Fukuizumi