Patents by Inventor Daisuke Kawamura

Daisuke Kawamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110039214
    Abstract: A pattern forming method includes forming a photo resist film on a film to be processed, forming a protective film for protecting the photo resist film from an immersion liquid on the photo resist film by coating method, performing immersion exposure selectively to a region of part of the photo resist film via the immersion liquid, the immersion liquid being supplied onto the photo resist film, removing a residual substance including an affinitive part for the immersion liquid from the protective film after the forming the protective film and before the performing immersion exposure selectively to the region of part of the photo resist film, removing the protective film, and forming a pattern comprising the photo resist film by selectively removing an exposed region or a non-exposed region of the photo resist film.
    Type: Application
    Filed: August 17, 2010
    Publication date: February 17, 2011
    Inventors: Shinichi ITO, Kentaro Matsunaga, Daisuke Kawamura, Yasunobu Onishi
  • Publication number: 20100257560
    Abstract: There is provided a TV set including a content-related information control section which transmits the one or plurality of pieces of viewed content identification information to an ECG server and receives, from the ECG server, content-related information related to content having a relationship with respect to viewed content identified by each of the transmitted one or plurality of pieces of viewed content identification information, and a display control section which causes the display section to display an image based on image data included in each of one or a plurality of pieces of content-related information corresponding to content tuning information the input of which is accepted by an input section from among respective pieces of content-related information that the content-related information control section have received.
    Type: Application
    Filed: March 23, 2010
    Publication date: October 7, 2010
    Applicant: Sony Corporation
    Inventors: Kazuhiro Fukuda, Daisuke Kawamura
  • Patent number: 7794922
    Abstract: A pattern forming method includes forming a photo resist film on a film to be processed, forming a protective film for protecting the photo resist film from an immersion liquid on the photo resist film by coating method, performing immersion exposure selectively to a region of part of the photo resist film via the immersion liquid, the immersion liquid being supplied onto the photo resist film, removing a residual substance including an affinitive part for the immersion liquid from the protective film after the forming the protective film and before the performing immersion exposure selectively to the region of part of the photo resist film, removing the protective film, and forming a pattern comprising the photo resist film by selectively removing an exposed region or a non-exposed region of the photo resist film.
    Type: Grant
    Filed: May 11, 2006
    Date of Patent: September 14, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Shinichi Ito, Kentaro Matsunaga, Daisuke Kawamura, Yasunobu Onishi
  • Patent number: 7794923
    Abstract: A substrate processing method including while a liquid is supplied between a processing target substrate to be applied with exposure treatment and a projection optical system of an exposure apparatus for carrying out the exposure treatment, prior to providing a resist film on a first main face of the processing target substrate that is provided for liquid immersion exposure for carrying out the exposure treatment at a side to be applied with the exposure treatment, selectively applying at least hydrophobic treatment with respect to a region in a predetermined range from a peripheral rim part of a second main face opposite to the first main face.
    Type: Grant
    Filed: January 18, 2007
    Date of Patent: September 14, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Eishi Shiobara, Kentaro Matsunaga, Daisuke Kawamura, Tomoyuki Takeishi, Kei Hayasaki, Shinichi Ito
  • Publication number: 20100220857
    Abstract: A secret key registration system which registers a secret key in a portable key device and vehicle. A first transformation equation is stored in a writer and the vehicle. A second transformation equation is stored in the portable key device and the vehicle. The writer transmits a registration code to the portable key device and generates intermediate data with the first transformation equation of the writer. The intermediate data is transmitted to the portable key device, which generates the secret key from the intermediate data with the second transformation equation. The portable key device transmits the registration code to the vehicle. The vehicle generates intermediate data from the registration code with the first transformation equation of the vehicle, and then generates the secret key from the intermediate data with the second transformation equation.
    Type: Application
    Filed: November 5, 2009
    Publication date: September 2, 2010
    Applicant: KABUSHIKI KAISHA TOKAI RIKA DENKI SEISAKUSHO
    Inventors: Daisuke KAWAMURA, Hiroaki IWASHITA, Kouhei KISHIMOTO, Yuuki NAWA, Yoshiyuki MIZUNO, Hiromitsu MIZUNO, Shinichi KOGA, Kota NISHIDA, Tomohiro ITO, Hideki KAWAI
  • Publication number: 20100196828
    Abstract: A film which becomes an outgassing generation source under reduced pressure or in a vacuum is formed on a substrate. A resist film an outgassing generation amount per unit area of which is smaller than the film under reduced pressure or in a vacuum is formed on the film in such a manner that the film is not exposed. The resist film is exposed by using pattern light of extreme ultraviolet (EUV) light. The resist film is developed. The substrate is processed by using the resist film and the film as a mask or by using the film as a mask.
    Type: Application
    Filed: February 2, 2010
    Publication date: August 5, 2010
    Inventor: Daisuke Kawamura
  • Patent number: 7749665
    Abstract: A method of generating a writing pattern is disclosed, which generates, from pattern data, writing pattern data to write a mask pattern in a photomask used in an exposure tool comprising a projection optical system to transfer the mask pattern to a resist film formed on a substrate, an immersion mechanism which forms a liquid film in a local region, and a movement mechanism which moves the substrate with respect to the projection optical system and the immersion mechanism, the method comprising obtaining a typical distribution of contact history values between the resist film and the liquid film in the unit exposure region, dividing a pattern which corresponds to the pattern data into a plurality of regions according to the typical distribution of the contact history values, and carrying out correction of a pattern included in each of the divided regions under a rule according to the contact history values.
    Type: Grant
    Filed: April 19, 2005
    Date of Patent: July 6, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Daisuke Kawamura, Shinichi Ito
  • Patent number: 7742150
    Abstract: A manufacturing method of a semiconductor device including a liquid immersion movement exposure of interposing a liquid between an exposure target substrate and a projection optical system of an exposure apparatus, and carrying out an exposure processing with respect to a plurality of exposure regions set on a surface of the substrate while relatively moving the substrate with respect to the system, a first liquid immersion movement of relatively moving the substrate with respect to the system while interposing the liquid between the substrate and the system, in adjacent exposure regions of said each exposure region, and a second liquid immersion movement of relatively moving the substrate with respect to the system at a speed lower than a movement speed in the first movement, while interposing the liquid between the substrate and the system, in a distance that is longer than a movement distance in the first movement.
    Type: Grant
    Filed: January 18, 2007
    Date of Patent: June 22, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Shinichi Ito, Kentaro Matsunaga, Daisuke Kawamura
  • Publication number: 20100116204
    Abstract: A film forming apparatus which forms a film on a substrate by utilizing a chemical solution, including: a correlation data creating unit which creates a correlation data that is related to the quality of a chemical solution, from data that is related to the properties of the chemical solution including at least one of data on storage temperature for the chemical solution to be loaded and data on pressure applied to the chemical solution to be loaded; and a determining unit which determines whether or not the chemical solution holds expected quality thereof on the bases of the correlation data.
    Type: Application
    Filed: November 10, 2009
    Publication date: May 13, 2010
    Applicant: Kabushiki Kaisha Toshiba
    Inventor: Daisuke Kawamura
  • Publication number: 20100099036
    Abstract: A pattern forming method includes forming a resist film on a substrate, coating the resist film with a coating solution which forms a cover film on the resist film to form the cover film on the resist film, transferring a pattern onto the resist film by an immersion lithography method using a liquid immersion fluid to form a latent image on the resist film, removing the cover film after the formation of the latent image, conducting a first inspection to inspect whether or not the cover film has a defect between said forming the latent image and said removing the cover film, performing predetermined processing when the defect is found in the first inspection, and developing the resist film to form a resist pattern on the substrate after said removing the cover film.
    Type: Application
    Filed: December 16, 2009
    Publication date: April 22, 2010
    Inventors: Daisuke Kawamura, Shinichi Ito
  • Publication number: 20100081091
    Abstract: According to an aspect of the present invention, there is provided a method for manufacturing a semiconductor device, the method including; sequentially forming a first film and a second film on a base film; processing the second film, thereby forming a second pattern; processing the first film with the second pattern, thereby forming a first pattern; removing the second pattern; depositing a third film on the base film and the first pattern; processing the third film, thereby forming a third pattern on side walls of the first pattern; removing the first pattern; and processing the base film with the third pattern; wherein, when processing the third film, a process condition is adjusted based on at least one information of a size of the second pattern and a size of the first pattern.
    Type: Application
    Filed: September 9, 2009
    Publication date: April 1, 2010
    Inventors: Koji HASHIMOTO, Daisuke Kawamura, Kentaro Matsunaga, Iwao Higashikawa
  • Patent number: 7687227
    Abstract: According to an aspect of the invention, there is provided a resist pattern forming method of forming a resist pattern by immersion exposure, comprising forming a resist film on a substrate to be treated, a contact angle between the resist film and an immersion liquid being a first angle, forming a first cover film on the resist film, a contact angle between the first cover film and the immersion liquid being a second angle which is larger than the first angle, forming a second cover film on the first cover film, a contact angle between the second cover film and the immersion liquid being a third angle which is smaller than the second angle, and forming a latent image on the resist film by the immersion exposure.
    Type: Grant
    Filed: December 27, 2005
    Date of Patent: March 30, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Eishi Shiobara, Daisuke Kawamura, Yasunobu Onishi, Shinichi Ito
  • Patent number: 7685556
    Abstract: According to an aspect of the invention, there is provided a mask data correction method used when forming a photomask used in a photolithography process, comprising correcting mask data on the basis of simulation performed by using information including nonuniformity of an illumination luminance distribution in an exposure apparatus which uses the photomask formed by using the mask data obtained by the correction result.
    Type: Grant
    Filed: February 23, 2005
    Date of Patent: March 23, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kazuya Fukuhara, Daisuke Kawamura, Shoji Mimotogi
  • Publication number: 20100048506
    Abstract: The present invention provides compositions and methods for treating a joint disease containing as an active ingredient thereof a monovalent metal salt of alginic acid for which the endotoxin level thereof has been lowered to an extent that does not substantially induce inflammation or fever. As a result, it is possible to provide a composition for treating a joint disease which has the effects of protecting cartilage from mechanical irritation, inhibiting degenerative changes in cartilage caused by wear and inflammation, repairing cartilage injuries, suppressing inflammation and pain of joint tissue, inhibiting degeneration of synovial tissue, and inhibiting osteochondral destruction.
    Type: Application
    Filed: August 19, 2009
    Publication date: February 25, 2010
    Inventors: Norimasa Iwasaki, Akio Minami, Yasuhiko Kasahara, Tatsuya Igarashi, Daisuke Kawamura, Nobuo Ohzawa, Mariko Imai
  • Patent number: 7662546
    Abstract: A heating apparatus for a substrate to be processed with a coating film has a chamber with an inner space, a heating plate heating the substrate to be processed in the inner space, and a partition member. The heating plate has a support surface which supports the substrate to be processed within the chamber. The partition member is arranged in the chamber so as to face the support surface. The partition member partitions the inner space into first and second spaces, and has a plurality of pores which allow the first and second spaces to communicate with each other. The support surface of the heating plate is set in the first space. An air stream formation mechanism forming an air stream is arranged in the second space. This mechanism discharges a substance evaporated from the photoresist film.
    Type: Grant
    Filed: December 16, 2005
    Date of Patent: February 16, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kenji Kawano, Shinichi Ito, Eishi Shiobara, Daisuke Kawamura, Kei Hayasaki
  • Patent number: 7662543
    Abstract: A pattern forming method includes forming a resist film on a substrate, coating the resist film with a coating solution which forms a cover film on the resist film to form the cover film on the resist film, transferring a pattern onto the resist film by an immersion lithography method using a liquid immersion fluid to form a latent image on the resist film, removing the cover film after the formation of the latent image, conducting a first inspection to inspect whether or not the cover film has a defect between said forming the latent image and said removing the cover film, performing predetermined processing when the defect is found in the first inspection, and developing the resist film to form a resist pattern on the substrate after said removing the cover film.
    Type: Grant
    Filed: February 9, 2006
    Date of Patent: February 16, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Daisuke Kawamura, Shinichi Ito
  • Patent number: 7652747
    Abstract: This invention discloses an immersion exposure method which executes immersion exposure for an exposure target film by transferring an image of a pattern formed on a mask onto the exposure target film through an immersion medium. A first vapor pressure as the target value in an immersion exposure atmosphere which surrounds the immersion medium is set. A second vapor pressure in the immersion exposure atmosphere is measured. The first vapor pressure is compared with the second vapor pressure. Whether to adjust the vapor pressure in the immersion exposure atmosphere is selected in accordance with the comparison result.
    Type: Grant
    Filed: June 26, 2006
    Date of Patent: January 26, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Takuya Kono, Kazuya Fukuhara, Daisuke Kawamura
  • Publication number: 20100015102
    Abstract: The present invention provides a composition for regenerating cartilage or treating a cartilage disease containing a monovalent metal salt of alginic acid for which the endotoxin level thereof has been lowered to an extent that does not substantially induce inflammation or fever. As a result, it is possible to provide a composition for regenerating cartilage that improves cartilage regenerative action and ease of application to a cartilage injury lesion, and a composition for treating a cartilage disease, which has the effects of protecting cartilage from mechanical irritation, inhibiting degenerative changes in cartilage caused by wear and inflammation, repairing a cartilage injury lesion, and inhibiting inflammation and pain of joint tissue.
    Type: Application
    Filed: February 21, 2008
    Publication date: January 21, 2010
    Inventors: Norimasa Iwasaki, Akio Minami, Yasuhiko Kasahara, Tatsuya Igarashi, Daisuke Kawamura, Fumiyoshi Kasahara, Chihiro Miyajima, Nobuo Ohzawa, Mariko Imai
  • Patent number: 7638001
    Abstract: A film forming apparatus which forms a film on a substrate by utilizing a chemical solution, including: a correlation data creating unit which creates a correlation data that is related to the quality of a chemical solution, from data that is related to the properties of the chemical solution including at least one of data on storage temperature for the chemical solution to be loaded and data on pressure applied to the chemical solution to be loaded; and a determining unit which determines whether or not the chemical solution holds expected quality thereof on the bases of the correlation data.
    Type: Grant
    Filed: May 6, 2005
    Date of Patent: December 29, 2009
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Daisuke Kawamura
  • Patent number: 7630053
    Abstract: A method of manufacturing a semiconductor device is disclosed. The manufacturing method includes the following steps in a period from a liquid immersion lithography step to a step in which a film structure of at least an edge of a wafer changes from a timing of the liquid immersion lithography step. At least one of a side surface of an edge of the wafer and an upper surface of the edge of the wafer is inspected. On the basis of an inspection result, at least one of the presence/absence of film peeling and the presence/absence of particle adhesion is determined on at least one of the side surface of the edge of the wafer and the upper surface of the edge of the wafer. A predetermined coping process is performed when it is determined that at least one of the film peeling and the particle adhesion has occurred.
    Type: Grant
    Filed: March 27, 2007
    Date of Patent: December 8, 2009
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Daisuke Kawamura