Patents by Inventor Daisuke Kawamura

Daisuke Kawamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130059090
    Abstract: According to one embodiment, an resist material for imprinting comprises a first resin component nonvolatile at a substrate on which to form an imprinting pattern, a second resin component volatile at the substrate, and a coupling reaction initiator that promotes curing of the first resin component.
    Type: Application
    Filed: March 20, 2012
    Publication date: March 7, 2013
    Inventor: Daisuke KAWAMURA
  • Patent number: 8372394
    Abstract: The present invention provides a composition for regenerating cartilage or treating a cartilage disease containing a monovalent metal salt of alginic acid for which the endotoxin level thereof has been lowered to an extent that does not substantially induce inflammation or fever. As a result, it is possible to provide a composition for regenerating cartilage that improves cartilage regenerative action and ease of application to a cartilage injury lesion, and a composition for treating a cartilage disease, which has the effects of protecting cartilage from mechanical irritation, inhibiting degenerative changes in cartilage caused by wear and inflammation, repairing a cartilage injury lesion, and inhibiting inflammation and pain of joint tissue.
    Type: Grant
    Filed: February 21, 2008
    Date of Patent: February 12, 2013
    Assignees: Mochida Pharmaceutical Co., Ltd., National University Corporation Hokkaido University
    Inventors: Norimasa Iwasaki, Akio Minami, Yasuhiko Kasahara, Tatsuya Igarashi, Daisuke Kawamura, Fumiyoshi Kasahara, Chihiro Miyajima, Nobuo Ohzawa, Mariko Imai
  • Patent number: 8367637
    Abstract: The present invention provides compositions and methods for treating a joint disease containing as an active ingredient thereof a monovalent metal salt of alginic acid for which the endotoxin level thereof has been lowered to an extent that does not substantially induce inflammation or fever. As a result, it is possible to provide a composition for treating a joint disease which has the effects of protecting cartilage from mechanical irritation, inhibiting degenerative changes in cartilage caused by wear and inflammation, repairing cartilage injuries, suppressing inflammation and pain of joint tissue, inhibiting degeneration of synovial tissue, and inhibiting osteochondral destruction.
    Type: Grant
    Filed: August 19, 2009
    Date of Patent: February 5, 2013
    Assignees: Mochida Pharmaceutical Co., Ltd., National University Corporation Hokkaido University
    Inventors: Norimasa Iwasaki, Akio Minami, Yasuhiko Kasahara, Tatsuya Igarashi, Daisuke Kawamura, Nobuo Ohzawa, Mariko Imai
  • Patent number: 8347332
    Abstract: There is provided a TV set including a content-related information control section which transmits the one or plurality of pieces of viewed content identification information to an ECG server and receives, from the ECG server, content-related information related to content having a relationship with respect to viewed content identified by each of the transmitted one or plurality of pieces of viewed content identification information, and a display control section which causes the display section to display an image based on image data included in each of one or a plurality of pieces of content-related information corresponding to content tuning information the input of which is accepted by an input section from among respective pieces of content-related information that the content-related information control section have received.
    Type: Grant
    Filed: March 23, 2010
    Date of Patent: January 1, 2013
    Assignee: Sony Corporation
    Inventors: Kazuhiro Fukuda, Daisuke Kawamura
  • Patent number: 8275130
    Abstract: A secret key registration system which registers a secret key in a portable key device and vehicle. A first transformation equation is stored in a writer and the vehicle. A second transformation equation is stored in the portable key device and the vehicle. The writer transmits a registration code to the portable key device and generates intermediate data with the first transformation equation of the writer. The intermediate data is transmitted to the portable key device, which generates the secret key from the intermediate data with the second transformation equation. The portable key device transmits the registration code to the vehicle. The vehicle generates intermediate data from the registration code with the first transformation equation of the vehicle, and then generates the secret key from the intermediate data with the second transformation equation.
    Type: Grant
    Filed: November 5, 2009
    Date of Patent: September 25, 2012
    Assignee: Kabushiki Kaisha Tokai Rika Denki Seisakusho
    Inventors: Daisuke Kawamura, Hiroaki Iwashita, Kouhei Kishimoto, Yuuki Nawa, Yoshiyuki Mizuno, Hiromitsu Mizuno, Shinichi Koga, Kota Nishida, Tomohiro Ito, Hideki Kawai
  • Publication number: 20120113033
    Abstract: A display device includes a display section displaying instruction information to be instructed to users in an instruction information display region provided corresponding to the instruction information, a touch panel capturing an instruction represented by the instruction information displayed in the instruction information display region, in response to a users' touch operation to a touch detection region provided corresponding to the instruction information display region, and a control section performing a predetermined operation control based on the instruction information inputted through the touch panel. The instruction information display region is provided in an upward zone within the touch detection region.
    Type: Application
    Filed: November 1, 2011
    Publication date: May 10, 2012
    Applicant: SONY CORPORATION
    Inventors: Daisuke Kawamura, Takahiro Ushioda, Shingo Utsuki
  • Patent number: 8122848
    Abstract: A film forming apparatus which forms a film on a substrate by utilizing a chemical solution, including: a correlation data creating unit which creates a correlation data that is related to the quality of a chemical solution, from data that is related to the properties of the chemical solution including at least one of data on storage temperature for the chemical solution to be loaded and data on pressure applied to the chemical solution to be loaded; and a determining unit which determines whether or not the chemical solution holds expected quality thereof on the bases of the correlation data.
    Type: Grant
    Filed: November 10, 2009
    Date of Patent: February 28, 2012
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Daisuke Kawamura
  • Publication number: 20120036431
    Abstract: [Object] To lead a user to various types of information easily with an electronic book as a starting point. [Solving Means] A server apparatus includes a storage, a communication section, and a controller. The storage stores an electronic book obtained by digitizing a book having at least one page in which at least one information item is represented, and associated information that is associated with the information item. The communication section communicates with an external electronic apparatus. The controller generates, when the electronic book is displayed by the external electronic apparatus and the information item of the electronic book is designated, an electronic book unit by adding first metadata to the information item so that display processing of the associated information is executed on the external electronic apparatus, and controls the communication section to transmit the generated electronic book unit to the external electronic apparatus.
    Type: Application
    Filed: April 20, 2010
    Publication date: February 9, 2012
    Applicant: Sony Corporation
    Inventors: Akihiko Ito, Daisuke Kawamura, Kazuhiro Fukuda
  • Publication number: 20110229826
    Abstract: This invention discloses a method to form a resist pattern on a to-be-processed substrate by immersion exposure. A resist film is formed on the central portion of the upper surface of the to-be-processed substrate, on a bevel portion of the upper surface, which is obtained by chamfering the peripheral portion of the to-be-processed substrate, and on the end portion of the to-be-processed substrate. Pattern exposure for forming the latent image of a desired pattern on the resist film is executed while a liquid whose refractive index is higher than that of air exists between the resist film and a constituent element of a projection optical system of an exposure apparatus, which is nearest to the to-be-processed substrate. The resist film formed on the end portion of the to-be-processed substrate is removed by supplying a rinse solution to the end portion of the to-be-processed substrate after executing pattern exposure.
    Type: Application
    Filed: May 31, 2011
    Publication date: September 22, 2011
    Inventors: Daisuke KAWAMURA, Eishi Shiobara, Tomoyuki Takeishi, Kei Hayasaki, Yasunobu Onishi, Shinichi Ito, Tatsuhiko Higashiki
  • Patent number: 7973907
    Abstract: A method for treating a substrate before exposing the substrate to which a resist is applied, includes, rinsing the substrate to which a resist is applied, and holding the rinsed substrate in an atmosphere. The atmosphere substantially contains no moisture until conveying the substrate to an exposure apparatus.
    Type: Grant
    Filed: October 30, 2008
    Date of Patent: July 5, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kentaro Matsunaga, Daisuke Kawamura, Seiro Miyoshi, Eishi Shiobara
  • Patent number: 7968272
    Abstract: This invention discloses a method to form a resist pattern on a to-be-processed substrate by immersion exposure. A resist film is formed on the central portion of the upper surface of the to-be-processed substrate, on a bevel portion of the upper surface, which is obtained by chamfering the peripheral portion of the to-be-processed substrate, and on the end portion of the to-be-processed substrate. Pattern exposure for forming the latent image of a desired pattern on the resist film is executed while a liquid whose refractive index is higher than that of air exists between the resist film and a constituent element of a projection optical system of an exposure apparatus, which is nearest to the to-be-processed substrate. The resist film formed on the end portion of the to-be-processed substrate is removed by supplying a rinse solution to the end portion of the to-be-processed substrate after executing pattern exposure.
    Type: Grant
    Filed: November 16, 2006
    Date of Patent: June 28, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Daisuke Kawamura, Eishi Shiobara, Tomoyuki Takeishi, Kei Hayasaki, Yasunobu Onishi, Shinichi Ito, Tatsuhiko Higashiki
  • Publication number: 20110102755
    Abstract: According to embodiments, a substrate coated with a resist film is carried into a first pressure adjustment mechanism. Then, a peripheral atmosphere of the substrate is decompressed from an atmospheric pressure by the first pressure adjustment mechanism to measure a physical quantity correlated with an outgassing amount from the substrate. Then, whether to subject the substrate to an EUV exposure is determined based on a measurement result of the physical quantity. If determined not to subject the substrate to the EUV exposure, the substrate is transported into a second pressure adjustment mechanism without the substrate being subjected to the EUV exposure. Then, the substrate is carried out of the second pressure adjustment mechanism.
    Type: Application
    Filed: November 3, 2010
    Publication date: May 5, 2011
    Inventor: Daisuke KAWAMURA
  • Publication number: 20110039214
    Abstract: A pattern forming method includes forming a photo resist film on a film to be processed, forming a protective film for protecting the photo resist film from an immersion liquid on the photo resist film by coating method, performing immersion exposure selectively to a region of part of the photo resist film via the immersion liquid, the immersion liquid being supplied onto the photo resist film, removing a residual substance including an affinitive part for the immersion liquid from the protective film after the forming the protective film and before the performing immersion exposure selectively to the region of part of the photo resist film, removing the protective film, and forming a pattern comprising the photo resist film by selectively removing an exposed region or a non-exposed region of the photo resist film.
    Type: Application
    Filed: August 17, 2010
    Publication date: February 17, 2011
    Inventors: Shinichi ITO, Kentaro Matsunaga, Daisuke Kawamura, Yasunobu Onishi
  • Publication number: 20100257560
    Abstract: There is provided a TV set including a content-related information control section which transmits the one or plurality of pieces of viewed content identification information to an ECG server and receives, from the ECG server, content-related information related to content having a relationship with respect to viewed content identified by each of the transmitted one or plurality of pieces of viewed content identification information, and a display control section which causes the display section to display an image based on image data included in each of one or a plurality of pieces of content-related information corresponding to content tuning information the input of which is accepted by an input section from among respective pieces of content-related information that the content-related information control section have received.
    Type: Application
    Filed: March 23, 2010
    Publication date: October 7, 2010
    Applicant: Sony Corporation
    Inventors: Kazuhiro Fukuda, Daisuke Kawamura
  • Patent number: 7794922
    Abstract: A pattern forming method includes forming a photo resist film on a film to be processed, forming a protective film for protecting the photo resist film from an immersion liquid on the photo resist film by coating method, performing immersion exposure selectively to a region of part of the photo resist film via the immersion liquid, the immersion liquid being supplied onto the photo resist film, removing a residual substance including an affinitive part for the immersion liquid from the protective film after the forming the protective film and before the performing immersion exposure selectively to the region of part of the photo resist film, removing the protective film, and forming a pattern comprising the photo resist film by selectively removing an exposed region or a non-exposed region of the photo resist film.
    Type: Grant
    Filed: May 11, 2006
    Date of Patent: September 14, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Shinichi Ito, Kentaro Matsunaga, Daisuke Kawamura, Yasunobu Onishi
  • Patent number: 7794923
    Abstract: A substrate processing method including while a liquid is supplied between a processing target substrate to be applied with exposure treatment and a projection optical system of an exposure apparatus for carrying out the exposure treatment, prior to providing a resist film on a first main face of the processing target substrate that is provided for liquid immersion exposure for carrying out the exposure treatment at a side to be applied with the exposure treatment, selectively applying at least hydrophobic treatment with respect to a region in a predetermined range from a peripheral rim part of a second main face opposite to the first main face.
    Type: Grant
    Filed: January 18, 2007
    Date of Patent: September 14, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Eishi Shiobara, Kentaro Matsunaga, Daisuke Kawamura, Tomoyuki Takeishi, Kei Hayasaki, Shinichi Ito
  • Publication number: 20100220857
    Abstract: A secret key registration system which registers a secret key in a portable key device and vehicle. A first transformation equation is stored in a writer and the vehicle. A second transformation equation is stored in the portable key device and the vehicle. The writer transmits a registration code to the portable key device and generates intermediate data with the first transformation equation of the writer. The intermediate data is transmitted to the portable key device, which generates the secret key from the intermediate data with the second transformation equation. The portable key device transmits the registration code to the vehicle. The vehicle generates intermediate data from the registration code with the first transformation equation of the vehicle, and then generates the secret key from the intermediate data with the second transformation equation.
    Type: Application
    Filed: November 5, 2009
    Publication date: September 2, 2010
    Applicant: KABUSHIKI KAISHA TOKAI RIKA DENKI SEISAKUSHO
    Inventors: Daisuke KAWAMURA, Hiroaki IWASHITA, Kouhei KISHIMOTO, Yuuki NAWA, Yoshiyuki MIZUNO, Hiromitsu MIZUNO, Shinichi KOGA, Kota NISHIDA, Tomohiro ITO, Hideki KAWAI
  • Publication number: 20100196828
    Abstract: A film which becomes an outgassing generation source under reduced pressure or in a vacuum is formed on a substrate. A resist film an outgassing generation amount per unit area of which is smaller than the film under reduced pressure or in a vacuum is formed on the film in such a manner that the film is not exposed. The resist film is exposed by using pattern light of extreme ultraviolet (EUV) light. The resist film is developed. The substrate is processed by using the resist film and the film as a mask or by using the film as a mask.
    Type: Application
    Filed: February 2, 2010
    Publication date: August 5, 2010
    Inventor: Daisuke Kawamura
  • Patent number: 7749665
    Abstract: A method of generating a writing pattern is disclosed, which generates, from pattern data, writing pattern data to write a mask pattern in a photomask used in an exposure tool comprising a projection optical system to transfer the mask pattern to a resist film formed on a substrate, an immersion mechanism which forms a liquid film in a local region, and a movement mechanism which moves the substrate with respect to the projection optical system and the immersion mechanism, the method comprising obtaining a typical distribution of contact history values between the resist film and the liquid film in the unit exposure region, dividing a pattern which corresponds to the pattern data into a plurality of regions according to the typical distribution of the contact history values, and carrying out correction of a pattern included in each of the divided regions under a rule according to the contact history values.
    Type: Grant
    Filed: April 19, 2005
    Date of Patent: July 6, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Daisuke Kawamura, Shinichi Ito
  • Patent number: D682842
    Type: Grant
    Filed: December 28, 2010
    Date of Patent: May 21, 2013
    Assignee: Sony Corporation
    Inventors: Tohru Kurata, Wataru Tajika, Masayuki Ebisawa, Goro Takaki, Daisuke Kawamura, Ryuji Nakayama