Patents by Inventor Daniel J. W. Brown

Daniel J. W. Brown has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180184509
    Abstract: A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.
    Type: Application
    Filed: July 12, 2016
    Publication date: June 28, 2018
    Inventors: William N. Partlo, Richard L. Sandstrom, Daniel J.W. Brown, Igor V. Fomenkov
  • Publication number: 20180020532
    Abstract: A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.
    Type: Application
    Filed: July 12, 2016
    Publication date: January 18, 2018
    Inventors: William N. Partlo, Richard L. Sandstrom, Daniel J.W. Brown, Igor V. Fomenkov
  • Patent number: 9390827
    Abstract: A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.
    Type: Grant
    Filed: February 3, 2014
    Date of Patent: July 12, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: William N. Partlo, Richard L. Sandstrom, Daniel J. W. Brown, Igor V. Fomenkov
  • Patent number: 9380691
    Abstract: A system for an extreme ultraviolet (EUV) light source includes an optical amplifier including a gain medium positioned on a beam path, the optical amplifier configured to receive a light beam at an input and to emit an output light beam for an EUV light source at an output; a feedback system that measures a property of the output light beam and produces a feedback signal based on the measured property; and an adaptive optic positioned in the beam path and configured to receive the feedback signal and to adjust a property of the output light beam in response to the feedback signal.
    Type: Grant
    Filed: February 28, 2014
    Date of Patent: June 28, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Yezheng Tao, Daniel J. W. Brown, Alexander Schafgans, Michael David Caudill, Daniel J. Golich, Richard L. Sandstrom, Yoshiho Amada
  • Patent number: 9338870
    Abstract: A first remaining plasma that at least partially coincides with a target region is formed; a target including target material in a first spatial distribution to the target region is provided, the target material including material that emits EUV light when converted to plasma; the first remaining plasma and the initial target interact, the interaction rearranging the target material from the first spatial distribution to a shaped target distribution to form a shaped target in the target region, the shaped target including the target material arranged in the shaped spatial distribution; an amplified light beam is directed toward the target region to convert at least some of the target material in the shaped target to a plasma that emits EUV light; and a second remaining plasma is formed in the target region.
    Type: Grant
    Filed: December 8, 2014
    Date of Patent: May 10, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Yezheng Tao, John Tom Stewart, IV, Daniel J.W. Brown
  • Patent number: 9155179
    Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
    Type: Grant
    Filed: November 21, 2014
    Date of Patent: October 6, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Yezheng Tao, Robert J. Rafac, Igor V. Fomenkov, Daniel J. W. Brown, Daniel J. Golich
  • Publication number: 20150250045
    Abstract: A system for an extreme ultraviolet (EUV) light source includes an optical amplifier including a gain medium positioned on a beam path, the optical amplifier configured to receive a light beam at an input and to emit an output light beam for an EUV light source at an output; a feedback system that measures a property of the output light beam and produces a feedback signal based on the measured property; and an adaptive optic positioned in the beam path and configured to receive the feedback signal and to adjust a property of the output light beam in response to the feedback signal.
    Type: Application
    Filed: February 28, 2014
    Publication date: September 3, 2015
    Inventors: Yezheng Tao, Daniel J.W. Brown, Alexander Schafgans, Michael David Caudill, Daniel J. Golich, Richard L. Sandstrom, Yoshiho Amada
  • Publication number: 20150189728
    Abstract: A first remaining plasma that at least partially coincides with a target region is formed; a target including target material in a first spatial distribution to the target region is provided, the target material including material that emits EUV light when converted to plasma; the first remaining plasma and the initial target interact, the interaction rearranging the target material from the first spatial distribution to a shaped target distribution to form a shaped target in the target region, the shaped target including the target material arranged in the shaped spatial distribution; an amplified light beam is directed toward the target region to convert at least some of the target material in the shaped target to a plasma that emits EUV light; and a second remaining plasma is formed in the target region.
    Type: Application
    Filed: December 8, 2014
    Publication date: July 2, 2015
    Inventors: Yezheng Tao, John Tom Stewart, IV, Daniel J.W. Brown
  • Patent number: 9018561
    Abstract: An apparatus and method of operation for a high power broad band elongated thin beam laser annealing light source, which may comprise a gas discharge seed laser oscillator having a resonance cavity, providing a seed laser output pulse; a gas discharge amplifier laser amplifying the seed laser output pulse to provide an amplified seed laser pulse output; a divergence correcting multi-optical element optical assembly intermediate the seed laser and the amplifier laser. The divergence correcting optical assembly may adjust the size and/or shape of the seed laser output pulse within a discharge region of the amplifier laser in order to adjust an output parameter of the amplified seed laser pulse output. The divergence correcting optical assembly may comprise a telescope with an adjustable focus. The adjustable telescope may comprise an active feedback-controlled actuator based upon a sensed parameter of the amplified seed laser output from the amplifier laser.
    Type: Grant
    Filed: September 17, 2008
    Date of Patent: April 28, 2015
    Assignee: Cymer, LLC
    Inventors: Richard L Sandstrom, Daniel J. W. Brown, Thomas Hoffmann, Jason D Robinson, Craig W Unick
  • Publication number: 20150076374
    Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
    Type: Application
    Filed: November 21, 2014
    Publication date: March 19, 2015
    Inventors: Yezheng Tao, Robert J. Rafac, Igor V. Fomenkov, Daniel J.W. Brown, Daniel J. Golich
  • Patent number: 8958143
    Abstract: A device is described herein which may comprise an optical amplifier having a gain band including wavelengths ?1 and ?2, with ?1??2; a pre-pulse seed laser having a tuning module for tuning a pre-pulse output to wavelength ?1; a main pulse seed laser generating a laser output having wavelength, ?2; and a beam combiner for directing the pre-pulse output and the main pulse output on a common path through the optical amplifier.
    Type: Grant
    Filed: February 3, 2014
    Date of Patent: February 17, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Kai-Chung Hou, Richard L. Sandstrom, William N. Partlo, Daniel J. W. Brown, Igor V. Fomenkov
  • Patent number: 8912514
    Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
    Type: Grant
    Filed: June 20, 2014
    Date of Patent: December 16, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Yezheng Tao, Robert J. Rafac, Igor V. Fomenkov, Daniel J. W. Brown, Daniel J. Golich
  • Patent number: 8908735
    Abstract: A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.
    Type: Grant
    Filed: September 13, 2011
    Date of Patent: December 9, 2014
    Assignee: Cymer, LLC
    Inventors: Alexander I. Ershov, William N. Partlo, Daniel J. W. Brown, Igor V. Fomenkov
  • Patent number: 8866110
    Abstract: Techniques are described that enhance power from an extreme ultraviolet light source with feedback from a target material that has been modified prior to entering a target location into a spatially-extended target distribution or expanded target. The feedback from the spatially-extended target distribution provides a nonresonant optical cavity because the geometry of the path over which feedback occurs, such as the round-trip length and direction, can change in time, or the shape of the spatially-extended target distribution may not provide a smooth enough reflectance. However, it may be possible that the feedback from the spatially-extended target distribution provides a resonant and coherent optical cavity if the geometric and physical constraints noted above are overcome. In any case, the feedback can be generated using spontaneously emitted light that is produced from a non-oscillator gain medium.
    Type: Grant
    Filed: March 6, 2014
    Date of Patent: October 21, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Yezheng Tao, Robert Jay Rafac, Igor V. Fomenkov, Daniel J. W. Brown
  • Publication number: 20140299791
    Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
    Type: Application
    Filed: June 20, 2014
    Publication date: October 9, 2014
    Inventors: Yezheng Tao, Robert J. Rafac, Igor V. Fomenkov, Daniel J.W. Brown, Daniel J. Golich
  • Publication number: 20140264092
    Abstract: Techniques are described that enhance power from an extreme ultraviolet light source with feedback from a target material that has been modified prior to entering a target location into a spatially-extended target distribution or expanded target. The feedback from the spatially-extended target distribution provides a nonresonant optical cavity because the geometry of the path over which feedback occurs, such as the round-trip length and direction, can change in time, or the shape of the spatially-extended target distribution may not provide a smooth enough reflectance. However, it may be possible that the feedback from the spatially-extended target distribution provides a resonant and coherent optical cavity if the geometric and physical constraints noted above are overcome. In any case, the feedback can be generated using spontaneously emitted light that is produced from a non-oscillator gain medium.
    Type: Application
    Filed: March 6, 2014
    Publication date: September 18, 2014
    Inventors: Yezheng Tao, Robert Jay Rafac, Igor V. Fomenkov, Daniel J.W. Brown
  • Patent number: 8791440
    Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: July 29, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Yezheng Tao, Robert J. Rafac, Igor V. Fomenkov, Daniel J. W. Brown, Daniel J. Golich
  • Publication number: 20140145096
    Abstract: A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.
    Type: Application
    Filed: February 3, 2014
    Publication date: May 29, 2014
    Applicant: CYMER, LLC
    Inventors: William N. Partlo, Richard L. Sandstrom, Daniel J.W. Brown, Igor V. Fomenkov
  • Publication number: 20140146387
    Abstract: A device is described herein which may comprise an optical amplifier having a gain band including wavelengths ?1 and ?2, with ?1??2; a pre-pulse seed laser having a tuning module for tuning a pre-pulse output to wavelength ?1; a main pulse seed laser generating a laser output having wavelength, ?2; and a beam combiner for directing the pre-pulse output and the main pulse output on a common path through the optical amplifier.
    Type: Application
    Filed: February 3, 2014
    Publication date: May 29, 2014
    Applicant: CYMER, LLC
    Inventors: Kai-Chung Hou, Richard L. Sandstrom, William N. Partlo, Daniel J.W. Brown, Igor V. Fomenkov
  • Patent number: RE45957
    Abstract: A laser includes a regenerative ring resonator that includes a discharge chamber having electrodes and a gain medium between the electrodes for producing a laser beam; a partially-reflective optical coupler, and a beam modification optical system in the path of the laser beam. The beam modification optical system transversely expands a profile of the laser beam such that the near field laser beam profile uniformly fills each aperture within the laser and such that the regenerative ring resonator remains either conditionally stable or marginally unstable when operating the laser at powers that induce thermal lenses in optical elements inside the regenerative ring resonator.
    Type: Grant
    Filed: March 6, 2013
    Date of Patent: March 29, 2016
    Assignee: Cymer, LLC
    Inventors: Hong Ye, Richard L. Sandstrom, Rostislav Rokitski, Daniel J. W. Brown, Robert J. Rafac