Patents by Inventor Daniel Marie

Daniel Marie has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10836901
    Abstract: According to the present disclosure, a hydrophobic polymeric composite comprising a hydrophobic polymer matrix with hydrophobically modified particles dispersed therein is provided. The hydrophobically modified particles may be derived from hydrophilic particles modified with organic moieties. The hydrophobically modified particles may also take in the form of core-shell fibers with hydrophilic particles encapsulated inside the core of said fibers or in the form of monolithic fibers embedded with hydrophilic particles. The method for making hydrophobic polymeric composite comprising each of the various hydrophobically modified particles is also provided. The hydrophobic polymer matrix can be chosen from poly(alpha-hydroxyesters), of carbonates, polyurethanes or polyalkanoates. For example, hydrophilic particles, such as barium sulphate, zirconium oxide, tantalum oxide or bismuth oxide, are dispersed in the hydrophobic biodegradable polymers, such as poly-(L-lactide) (PLLA).
    Type: Grant
    Filed: February 13, 2017
    Date of Patent: November 17, 2020
    Assignees: SINGAPORE HEALTH SERVICES PTE LTD, NANYANG TECHNOLOGICAL UNIVERSITY
    Inventors: Subramanian Venkatraman, Yingying Huang, Hui Ying Ang, Nicolas Daniel Marie Foin, En Hou Philip Wong
  • Patent number: 10648356
    Abstract: A bypass turbine engine is described. The engine includes a system for bleeding gas from a primary stream to a secondary stream. The system may include two coaxial rings extending one around the other. A perforated internal first ring may be situated at the level of an outer casing and may extend substantially in a continuation of the outer casing. A perforated external second ring may be mounted such that it slides circumferentially on the first ring between a first position in which the perforations of the rings do not communicate with one another and a second bleed position in which the perforations of the rings communicate with one another.
    Type: Grant
    Filed: November 16, 2017
    Date of Patent: May 12, 2020
    Assignee: SAFRAN AIRCRAFT ENGINES
    Inventors: Eric Pierre Georges Le Marechal, Xavier Jean Yves Alain Agneray, Thierry Georges Paul Papin, Mathieu Daniel Marie Van Gansen, Cédric Zaccardi
  • Publication number: 20200079942
    Abstract: The present invention is directed to a polyolefin composition suitable for producing a non-oriented film with improved oxygen barrier property, and to such a non-oriented film. The polyolefin composition comprises a propylene homo-or copolymer, a hydrocarbon resin and optionally a nucleating agent. The present invention is also directed to the use of a hydrocarbon resin in a non-oriented film comprising a propylene homo- or copolymer for improving oxygen barrier property of said non-oriented film. The present invention allows the application of a polypropylene based non-oriented film like a cast film (CPP) for packaging of sensitive food.
    Type: Application
    Filed: November 30, 2017
    Publication date: March 12, 2020
    Inventors: Daniel Marie Andre Van Houcke, Senthil Kumar Kaliappan, Umesh Balkrishna Gadgoli
  • Publication number: 20190368372
    Abstract: A bypass turbine engine is described. The engine includes a system for bleeding gas from a primary stream to a secondary stream. The system may include two coaxial rings extending one around the other. A perforated internal first ring may be situated at the level of an outer casing and may extend substantially in a continuation of the outer casing. A perforated external second ring may be mounted such that it slides circumferentially on the first ring between a first position in which the perforations of the rings do not communicate with one another and a second bleed position in which the perforations of the rings communicate with one another.
    Type: Application
    Filed: November 16, 2017
    Publication date: December 5, 2019
    Applicant: SAFRAN AIRCRAFT ENGINES
    Inventors: Eric Pierre Georges Le Marechal, Xavier Jean Yves Alain Agneray, Thierry Georges Paul Papin, Mathieu Daniel Marie Van Gansen, Cédric Zaccardi
  • Publication number: 20190216735
    Abstract: According to the present disclosure, a liposomal formulation comprising at least one uncharged phospholipid without cholesterol and at least one pharmaceutical agent, wherein the at least one uncharged phospholipid forms one or more lipid bilayers without cholesterol encapsulating the at least one pharmaceutical agent, is provided. The use(s) of such a liposomal formulation and method of producing such a liposomal formulation are also provided.
    Type: Application
    Filed: September 14, 2017
    Publication date: July 18, 2019
    Inventors: Subramanian VENKATRAMAN, Yingying HUANG, Amrita NAGLE, Jayaganesh V. NATARAJAN, Nicolas Daniel Marie FOIN, Tze Tec CHONG, Jie Liang PHUA
  • Publication number: 20190142590
    Abstract: The present invention relates to a device for cardiac valve repair, the device comprising: at least one upstream anchoring means adapted to anchor to at least one tissue site, the tissue site located upstream with respect to a heart valve of a patient; and a coaptation structure arranged to extend from the upstream anchoring means, the coaptation structure comprising a free end, wherein the coaptation structure is operable to extend across the heart valve and locate the free end downstream from the heart valve and the coaptation structure operable to coapt with at least one heart valve leaflet of the patient's heart to prevent and/or minimize a backflow of blood. The present invention is suitable for the treatment of heart valves using minimally invasive approaches. Additionally, the present invention is directed to a method of implanting a device for cardiac valve repair in a patient's heart.
    Type: Application
    Filed: June 12, 2017
    Publication date: May 16, 2019
    Applicant: SINGAPORE HEALTH SERVICES PTE. LTD.
    Inventors: Khung Keong YEO, Nicolas Daniel Marie FOIN
  • Publication number: 20190048182
    Abstract: According to the present disclosure, a hydrophobic polymeric composite comprising a hydrophobic polymer matrix with hydrophobically modified particles dispersed therein is provided. The hydrophobically modified particles may be derived from hydrophilic particles modified with organic moieties. The hydrophobically modified particles may also take in the form of core-shell fibers with hydrophilic particles encapsulated inside the core of said fibers or in the form of monolithic fibers embedded with hydrophilic particles. The method for making hydrophobic polymeric composite comprising each of the various hydrophobically modified particles is also provided. The hydrophobic polymer matrix can be chosen from poly(alpha-hydroxyesters), of carbonates, polyurethanes or polyalkanoates. For example, hydrophilic particles, such as barium sulphate, zirconium oxide, tantalum oxide or bismuth oxide, are dispersed in the hydrophobic biodegradable polymers, such as poly-(L-lactide) (PLLA).
    Type: Application
    Filed: February 13, 2017
    Publication date: February 14, 2019
    Inventors: Subramanian VENKATRAMAN, Yingying HUANG, Hui Ying ANG, Nicolas Daniel Marie FOIN, En Hou Philip WONG
  • Patent number: 9454084
    Abstract: A method to determine the usefulness of an alignment mark of a first pattern in transferring a second pattern to a substrate relative to the first pattern already present on the substrate includes measuring the position of the alignment mark, modeling the position of the alignment mark, determining the model error between measured and modeled position, measuring a corresponding overlay error between first and second pattern and comparing the model error with the overlay error to determine the usefulness of the alignment mark. Subsequently this information can be used when processing next substrates thereby improving the overlay for these substrates. A lithographic apparatus and/or overlay measurement system may be operated in accordance with the method.
    Type: Grant
    Filed: April 23, 2013
    Date of Patent: September 27, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Irina Lyulina, Franciscus Godefridus Casper Bijnen, Remi Daniel Marie Edart, Antoine Gaston Marie Kiers, Michael Kubis
  • Patent number: 9291916
    Abstract: A substrate is loaded onto a substrate support of a lithographic apparatus, after which the apparatus measures locations of substrate alignment marks. These measurements define first correction information allowing the apparatus to apply a pattern at one or more desired locations on the substrate. Additional second correction information is used to enhance accuracy of pattern positioning, in particular to correct higher order distortions of a nominal alignment grid. The second correction information may be based on measurements of locations of alignment marks made when applying a previous pattern to the same substrate. The second correction information may alternatively or in addition be based on measurements made on similar substrates that have been patterned prior to the current substrate.
    Type: Grant
    Filed: February 4, 2015
    Date of Patent: March 22, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Stefan Cornelis Theodorus Van Der Sanden, Richard Johannes Franciscus Van Haren, Hubertus Johannes Gertrudus Simons, Remi Daniel Marie Edart, Xiuhong Wei, Irina Lyulina, Michael Kubis
  • Publication number: 20150153656
    Abstract: A substrate is loaded onto a substrate support of a lithographic apparatus, after which the apparatus measures locations of substrate alignment marks. These measurements define first correction information allowing the apparatus to apply a pattern at one or more desired locations on the substrate. Additional second correction information is used to enhance accuracy of pattern positioning, in particular to correct higher order distortions of a nominal alignment grid. The second correction information may be based on measurements of locations of alignment marks made when applying a previous pattern to the same substrate. The second correction information may alternatively or in addition be based on measurements made on similar substrates that have been patterned prior to the current substrate.
    Type: Application
    Filed: February 4, 2015
    Publication date: June 4, 2015
    Applicant: ASML Netherlands B.V.
    Inventors: Stefan Cornelis Theodorus VAN DER SANDEN, Richard Johanne Franciscus VAN HAREN, Hubertus Johannes Gertrudus SIMONS, Remi Daniel Marie EDART, Xiuhong WEI, Irina LYULINA, Michael KUBIS
  • Publication number: 20150146188
    Abstract: A method to determine the usefulness of an alignment mark of a first pattern in transferring a second pattern to a substrate relative to the first pattern already present on the substrate includes measuring the position of the alignment mark, modeling the position of the alignment mark, determining the model error between measured and modeled position, measuring a corresponding overlay error between first and second pattern and comparing the model error with the overlay error to determine the usefulness of the alignment mark. Subsequently this information can be used when processing next substrates thereby improving the overlay for these substrates. A lithographic apparatus and/or overlay measurement system may be operated in accordance with the method.
    Type: Application
    Filed: April 23, 2013
    Publication date: May 28, 2015
    Inventors: Irina Lyulina, Franciscus Godefridus Casper Bijnen, Remi Daniel Marie Edart, Antoine Gaston Marie Kiers, Michael Kubis
  • Patent number: 8982347
    Abstract: A method is used to estimate a value representative for a level of alignment mark deformation on a processed substrate using an alignment system. The alignment sensor system is able to emit light at different measuring frequencies to reflect from an alignment mark on the substrate and to detect a diffraction pattern in the reflected light in order to measure an alignment position of the alignment mark. The two or more measuring frequencies are used to measure an alignment position deviation per alignment mark associated with each of the two or more measuring frequencies relative to an expected predetermined alignment position of the alignment mark. A value is determined representative for the spread in the determined alignment position deviations per alignment mark in order to estimate the level of alignment mark deformation.
    Type: Grant
    Filed: November 2, 2012
    Date of Patent: March 17, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Xiuhong Wei, Franciscus Godefridus Casper Bijnen, Richard Johannes Franciscus Van Haren, Marcus Adrianus Van De Kerkhof, Everhardus Cornelis Mos, Hubertus Johannes Gertrudus Simons, Remi Daniel Marie Edart, David Deckers, Nicole Schoumans, Irina Lyulina
  • Patent number: 8976355
    Abstract: A substrate is loaded onto a substrate support of a lithographic apparatus, after which the apparatus measures locations of substrate alignment marks. These measurements define first correction information allowing the apparatus to apply a pattern at one or more desired locations on the substrate. Additional second correction information is used to enhance accuracy of pattern positioning, in particular to correct higher order distortions of a nominal alignment grid. The second correction information may be based on measurements of locations of alignment marks made when applying a previous pattern to the same substrate. The second correction information may alternatively or in addition be based on measurements made on similar substrates that have been patterned prior to the current substrate.
    Type: Grant
    Filed: August 29, 2012
    Date of Patent: March 10, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Stefan Cornelis Theodorus Van Der Sanden, Richard Johannes Franciscus Van Haren, Hubertus Johannes Gertrudus Simons, Remi Daniel Marie Edart, Xiuhong Wei, Michael Kubis, Irina Lyulina
  • Publication number: 20140181903
    Abstract: The present invention relates to a method for making specific task information available via a mobile station, preferably comprising a PDA, tablet or a mobile phone, to a user such as personnel on duty, wherein the method comprises steps for:—compiling the task information by means of a server,—transmitting the task information from the server to the mobile station of the user,—determining an availability time period for the task information for the users,—making the task information retrievable in readable manner on the mobile station within the availability time period.
    Type: Application
    Filed: January 23, 2012
    Publication date: June 26, 2014
    Applicant: MI GROUP B.V.
    Inventor: Job Daniel Marie Heimerikx
  • Patent number: 8655033
    Abstract: An improved iterative reconstruction method to reconstruct a first image includes generating an imaging beam, receiving said imaging beam on a detector array, generating projection data based on said imaging beams received by said detector array, providing said projection data to an image reconstructor, enlarging one of a plurality of voxels and a plurality of detectors of the provided projection data, reconstructing portions of the first image with the plurality of enlarged voxels or detectors, and iteratively reconstructing the portions of the first image to create a reconstructed image.
    Type: Grant
    Filed: October 28, 2009
    Date of Patent: February 18, 2014
    Assignees: General Electric Company, University of Notre Dame Du Lac, Purdue Research Foundation
    Inventors: Kai Zeng, Charles Addison Bouman, Jr., Bruno Kristiaan Bernard De Man, Jiang Hsieh, Ken David Sauer, Jean-Baptiste Daniel Marie Thibault, Zhou Yu
  • Patent number: 8576374
    Abstract: According to a first aspect of the invention, there is provided a lithographic method of providing an alignment mark on a layer provided on a substrate, the method including providing the alignment mark on an area of the layer which is oriented within a certain range of angles with respect to a surface of the substrate on which the layer is provided.
    Type: Grant
    Filed: February 26, 2009
    Date of Patent: November 5, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Keith Frank Best, Henricus Wilhelmus Maria Van Buel, Cheng-Qun Gui, Johannes Onvlee, Rudy Jan Maria Pellens, Remi Daniel Marie Edart, Oleg Viacheslavovich Voznyi, Pascale Anne Maury
  • Publication number: 20130230797
    Abstract: A substrate is loaded onto a substrate support of a lithographic apparatus, after which the apparatus measures locations of substrate alignment marks. These measurements define first correction information allowing the apparatus to apply a pattern at one or more desired locations on the substrate. Additional second correction information is used to enhance accuracy of pattern positioning, in particular to correct higher order distortions of a nominal alignment grid. The second correction information may be based on measurements of locations of alignment marks made when applying a previous pattern to the same substrate. The second correction information may alternatively or in addition be based on measurements made on similar substrates that have been patterned prior to the current substrate.
    Type: Application
    Filed: August 29, 2012
    Publication date: September 5, 2013
    Applicant: ASML Netherlands B.V.
    Inventors: Stefan Cornelis Theodorus VAN DER SANDEN, Richard Johannes Franciscu VAN HAREN, Hubertus Johannes Gertrudus SIMONS, Remi Daniel Marie EDART, Xiuhong WEI, Michael KUBIS, Irina LYULINA
  • Patent number: 8233682
    Abstract: A method of improving a resolution of an image using image reconstruction is provided. The method includes acquiring scan data of an object and forward projecting a current image estimate of the scan data to generate calculated projection data. The method also includes applying a data-fit term and a regularization term to the scan data and the calculated projection data and modifying at least one of the data fit term and the regularization term to accommodate spatio-temporal information to form a reconstructed image from the scan data and the calculated projection data.
    Type: Grant
    Filed: June 5, 2007
    Date of Patent: July 31, 2012
    Assignees: General Electric Company, The University of Notre Dame du Lac, The Regents of the University of Michigan, Purdue Research Foundation
    Inventors: Jeffrey Allen Fessler, Charles Addison Bouman, Jiang Hsieh, Jean-Baptiste Daniel Marie Thibault, Ken David Sauer, Samit Kumar Basu, Bruno Kristiaan Bernard De Man
  • Patent number: 8175115
    Abstract: A method for reconstructing an image of an object, the image comprising a plurality of image elements, is disclosed. The method includes accessing image data associated with the plurality of image elements, applying a first algorithm to the plurality of image elements, selecting a spatially non-homogenous set of the plurality of image elements, and applying an iterative algorithm to the set of image elements to reduce an amount of time necessary for reconstructing the image, or to improve an image quality at a fixed computation time, or both.
    Type: Grant
    Filed: November 17, 2006
    Date of Patent: May 8, 2012
    Assignees: General Electric Company, Purdue Research Foundation, The University of Notre Dame du Lac
    Inventors: Jean-Baptiste Daniel Marie Thibault, Jiang Hsieh, Bruno Kristiaan Bernard De Man, Samit Kumar Basu, Zhou Yu, Charles Addison Bouman, Ken David Sauer
  • Publication number: 20110097007
    Abstract: An improved iterative reconstruction method to reconstruct a first image includes generating an imaging beam, receiving said imaging beam on a detector array, generating projection data based on said imaging beams received by said detector array, providing said projection data to an image reconstructor, enlarging one of a plurality of voxels and a plurality of detectors of the provided projection data, reconstructing portions of the first image with the plurality of enlarged voxels or detectors, and iteratively reconstructing the portions of the first image to create a reconstructed image.
    Type: Application
    Filed: October 28, 2009
    Publication date: April 28, 2011
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Kai Zeng, Charles Addison Bouman, JR., Bruno Kristiaan Bernard De Man, Jiang Hsieh, Ken David Sauer, Jean-Baptiste Daniel Marie Thibault, Zhou Yu