Abstract: A pumping system includes a first pump for delivering a fluid. The pumping system also includes a flow hose for receiving the fluid from the first pump. The pumping system further includes a compression mechanism disposed proximate to the flow hose for partially compressing the flow hose. The compression mechanism includes at least one of a hydraulic compression system and a mechanical compression system. The pumping system includes a controller communicably coupled with the first pump. The controller is configured to detect a flow reduction of the fluid exiting the first pump. The controller is also configured to activate the compression mechanism for partially compressing the flow hose in order to reduce a volume of the flow hose during the flow reduction of the fluid exiting the first pump. The partial compression of the flow hose provides a constant fluid flow at an outlet of the flow hose.

Abstract: A method for selectively etching layers of a first material with respect to layers of a second material in a stack is provided. The layers of the first material are partially etched with respect to the layers of the second material. A deposition layer is selectively deposited on the stack, wherein portions of the deposition layer covering the layers of the second material are thicker than portions covering the layers of the first material, the selective depositing comprising providing a first reactant, purging some of the first reactant, wherein some undeposited first reactant is not purged, and providing a second reactant, wherein the undeposited first reactant combines with the second reactant and selectively deposits on the layers of the second material with respect to the layers of the first material. The layers of the first material are selectively etched with respect to the layers of the second material.

Abstract: A container body has a neck defining an opening with an axis. The neck includes a projection that projects radially away from the axis. A cap includes a wall that defines at least part of an exterior of the cap. The wall includes an aperture extending therethrough. The cap is removably attached to the neck and supported for movement on the neck between a first position and a second position. The wall is resiliently flexible for radial movement between a retained position and an unretained position with respect to the neck. In the retained position the projection retains the cap in the first position. The wall, in the unretained position, allows movement of the cap from the first position toward the second position.

Abstract: A container having a pressurized chamber containing a fluidic material and a dispensing assembly coupled thereto. The dispensing assembly includes a dispensing passageway for discharging the fluidic material from the container. A dispensing valve, a tilt valve, and a pump assembly are all operably coupled to the dispensing passageway. The tilt valve is alterable between a closed state in which the pressurized chamber is scaled and an open state in which the dispensing passageway is fluidly coupled to the pressurized chamber. The pump assembly is alterable between a first state in which a variable volume of the dispensing passageway in at a first volume and a second state in which the variable volume is at a second volume that is less than the first volume. Thus, the pump assembly creates a negative pressure behind the dispensing valve to prevent excess fluidic material from being dispensed.

Abstract: An support structure of an article that has a tamper deterrent structure. The support structure, such as a handle, includes segments that are connected by a series of connectors. Both the segments and the connectors, on their own, are designed to prevent their use as a weapon. The connectors provide structure to the segments when the support structure is used as intended but are positioned so the support structure will fail upon intentional manipulation. This manipulation causes the support structure to break into smaller pieces in the event the support structure is attempted to be fashioned into or used as a weapon.

Abstract: A component pair is provided. The component pairs includes a first component comprising a first mating surface defining a first geometry associated with a geometric key, and a second component comprising a second mating surface defining a second geometry, the second geometry being determined using the geometric key and being complementary to the first geometry. The first component and the second component may be properly mated together only when the first geometry is received by the second geometry.

Abstract: A metal-containing photoresist film may be deposited on a semiconductor substrate using a dry deposition technique. Unintended metal-containing photoresist material may form on internal surfaces of a process chamber during deposition, bevel and backside cleaning, baking, development, or etch operations. An in situ dry chamber clean may be performed to remove the unintended metal-containing photoresist material by exposure to an etch gas. The dry chamber clean may be performed at elevated temperatures without striking a plasma. In some embodiments, the dry chamber clean may include pumping/purging and conditioning operations.

Abstract: Rivet dispenser systems and methods of use thereof are provided. In a non-limiting embodiment, the rivet dispenser system comprises a rivet receiving member defining a channel therein, and a seat member. The channel includes a curved region. The rivet receiving member comprises a first port and a second port. The first port communicates with the channel and is configured to receive rivets. The second port communicates with the channel and is configured to dispense rivets. The channel extends between the first port and the second port and is configured to transport rivets from the first port to the second port in a series arrangement and in a preselected orientation. The seat member communicates with the second port and is configured to selectively engage with a rivet holder of a resistance spot rivet welding apparatus and introduce a single rivet to the rivet holder at one time.

Abstract: A container for dispensing a liquid includes a body and a piercing device. The body includes an interior storage volume, an outlet through the first wall for dispensing the liquid, a first track disposed in a first side wall of the body, and a second track disposed in a second side wall of the body, the second side wall opposite the first side wall. The piercing device can be slidably coupled to the body and includes a first rail configured to slide within the first track, a second rail configured to slide within the second track, and a piercer that includes a piercing end. The piercer can slide from a first position to a second position to pierce the body and create a vent opening.

Abstract: A container for dispensing a liquid that includes a body, a closure, and an overcap. The body includes an interior storage volume, a neck finish on a first wall of the body, and a protrusion on a second wall of the body. The neck finish defined outlet through the first wall for dispensing the liquid. The closure for sealing the outlet and coupled to the neck finish. The overcap is removably coupled to the closure and includes a first end including a recess configured to receive a portion of the closure when the overcap is coupled to the closure and a second end including a shield defining a shield recess and a piercer. The shield is configured is configured to at least partially surround the protrusion of the body such that the piercer pierces the protrusion to create a vent opening when the shield at least partially surrounds the protrusion.

Abstract: A method for selectively etching a first region of a structure with respect to a second region of the structure is provided. The method comprises at least one cycle. Each cycle comprises selectively depositing an inhibitor layer on the first region of the structure, providing an atomic layer deposition over the structure, wherein the atomic layer deposition selectively deposits a mask on the second region of the structure with respect to the inhibitor layer, and selectively etching the first region of the structure with respect to the mask. The selectively depositing an inhibitor layer on the first region of the structure comprises providing an inhibitor layer gas and forming the inhibitor layer gas into inhibitor layer radicals, wherein the inhibitor layer radicals selectively deposit on the first region of the structure with respect to the second region of the structure.

Abstract: An assembly includes an attachment arm having an axle extending from a first end of the attachment arm. The attachment arm of the detachable wheel assembly further includes a securing portion forming a second end of the attachment arm, the securing portion of the attachment arm including a pin positioned to extend above a first frame member of a gantry truss and to secure the first frame member between the pin and a portion of the attachment arm. The attachment arm also includes a frame support corresponding to a second frame member of the gantry truss such that the frame support supports the second frame member when the assembly is secured to the gantry truss, and the assembly includes a wheel rotatably attached to the axle of the attachment arm.

Abstract: A container for dispensing a composition comprises a container body extending along a longitudinal axis from a bottom end to a top end, the container body defining an internal cavity for holding the composition. The container body comprises a neck having a container opening open to the internal cavity, a front wall, a rear wall and a pair of side walls extending between the front and rear wall, and a shoulder comprising a pair of first shoulder walls extending between the neck and a respective side wall of the container body, the first shoulder walls extending at a first non-perpendicular angle with respect to the longitudinal axis. The container also comprises a shoulder fitting attached to the neck, the shoulder fitting extending over the first and second shoulders of the container body and including a nozzle extending therethrough, the nozzle open to the opening.

Abstract: A gantry carriage assembly includes a support plate having a first end and a second end. The gantry carriage assembly further includes first guide wheels secured to a first end of the support plate, the first guide wheels including a first pair of guide wheels configured to accommodate a longitudinal member of a gantry truss therebetween, where the first pair of guide wheels are disposed opposite from one another across the longitudinal member. The gantry carriage assembly also includes second guide wheels secured to a second end of the support plate opposite the first end, the second guide wheels including a second pair of guide wheels configured to accommodate the longitudinal member of the gantry truss therebetween, wherein the second pair of guide wheels are disposed opposite from one another across the longitudinal member.

Abstract: A delay device includes a tuning network including first and second tuning components having frequency responses that overlap in an intermediate frequency band to provide a group delay response. A delay modifier is in communication with the tuning network and configured to provide an offset frequency as an input to the tuning network, and to electronically adjust a group delay value associated with the group delay response by varying the offset frequency. The difference between a frequency of an input reference signal and a local oscillator frequency produced by the delay modifier is substantially equal to an intermediate frequency of the tuning network. The tuning network and the delay modifier cooperate to transpose the reference signal at the reference frequency down to the IF band before passing through the first and second delay lines, and back up to the RF band after passing through the first and second delay lines.