Patents by Inventor David Fenwick

David Fenwick has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210230070
    Abstract: A method of manufacturing a chamber component for a processing chamber comprises forming a green body using a Y2O3—ZrO2 powder consisting essentially of 55-65 mol % Y2O3 and 35-45 mol % ZrO2, and sintering the green body to produce a sintered ceramic body consisting essentially of one or more phase of Y2O3—ZrO2, the sintered ceramic body consisting essentially of 55-65 mol % Y2O3 and 35-45 mol % ZrO2.
    Type: Application
    Filed: April 15, 2021
    Publication date: July 29, 2021
    Inventors: Jennifer Y. Sun, David Fenwick
  • Patent number: 11061397
    Abstract: Apparatus and methods for controlling unmanned systems (UMSs), such as unmanned aircraft, are provided. A UMS can be provided that includes core systems, auxiliary systems, a payload, and a power system. The power system can provide uninterruptible power for a first power domain that includes the core systems. The power system can provide interruptible power for each of a second power domain and a third power domain. The second power domain can include the auxiliary systems, and the third power domain can include the payload. First circuitry of the power system can prevent a single overcurrent fault in the third power domain from causing an electrical fault in either the first power domain or the second power domain. Second circuitry of the power system can prevent a single overcurrent fault in the second power domain from causing an electrical fault in the first power domain.
    Type: Grant
    Filed: December 12, 2018
    Date of Patent: July 13, 2021
    Assignee: Insitu Inc.
    Inventors: Christopher Fenwick, Kenneth Hillen, Douglas Allyn Miller, David Rathbun
  • Patent number: 11014853
    Abstract: A chamber component for a processing chamber comprises a ceramic body consisting of a sintered ceramic material consisting essentially of one or more phase of Y2O3—ZrO2. The ceramic material consists essentially of 55-65 mol % Y2O3 and 35-45 mol % ZrO2.
    Type: Grant
    Filed: February 19, 2019
    Date of Patent: May 25, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Jennifer Y. Sun, David Fenwick
  • Patent number: 11008653
    Abstract: A multi-layer coating for a surface of an article comprises a diffusion barrier layer and an erosion resistant layer. The diffusion barrier layer may be a nitride film including but not limited to TiNx, TaNx, Zr3N4, and TiZrxNy. The erosion resistant layer may be a rare oxide film comprising YZrxOy. The diffusion barrier layer and the erosion resistant layer may be deposited on the article's surface using a thin film deposition technique including but not limited to, ALD, PVD, and CVD.
    Type: Grant
    Filed: December 15, 2017
    Date of Patent: May 18, 2021
    Assignee: Applied Materials, Inc.
    Inventors: David Fenwick, Xiaowei Wu, Jennifer Y. Sun
  • Publication number: 20210123143
    Abstract: Embodiments of the present disclosure relate to articles, coated articles, and methods of coating such articles with a corrosion resistant coating. The corrosion resistant coating can comprise hafnium aluminum oxide. The corrosion resistant coating may be deposited by a non-line of sight deposition, such as atomic layer deposition. Articles that may be coated may include chamber components, such as gas lines.
    Type: Application
    Filed: October 16, 2020
    Publication date: April 29, 2021
    Inventors: David Fenwick, Jennifer Y. Sun, Cheng-Hsuan Chou, Xiao-Ming He
  • Publication number: 20210100141
    Abstract: Disclosed in some embodiments is a chamber component (such as an end effector body) coated with an ultrathin electrically-dissipative material to provide a dissipative path from the coating to the ground. The coating may be deposited via a chemical precursor deposition to provide a uniform, conformal, and porosity free coating in a cost effective manner. In an embodiment wherein the chamber component comprises an end effector body, the end effector body may further comprise replaceable contact pads for supporting a substrate and the contact surface of the contact pads head may also be coated with an electrically-dissipative material.
    Type: Application
    Filed: June 2, 2020
    Publication date: April 1, 2021
    Inventors: Gayatri Natu, Geetika Bajaj, Prerna Goradia, Darshan Thakare, David Fenwick, XiaoMing He, Sanni Seppaelae, Jennifer Sun, Rajkumar Thanu, Jeff Hudgens, Karuppasamy Muthukamatchy, Arun Dhayalan
  • Publication number: 20210100087
    Abstract: Disclosed in some embodiments is a chamber component (such as an end effector body) coated with an ultrathin electrically-dissipative material to provide a dissipative path from the coating to the ground. The coating may be deposited via a chemical precursor deposition to provide a uniform, conformal, and porosity free coating in a cost effective manner. In an embodiment wherein the chamber component comprises an end effector body, the end effector body may further comprise replaceable contact pads for supporting a substrate and the contact surface of the contact pads head may also be coated with an electrically-dissipative material.
    Type: Application
    Filed: June 2, 2020
    Publication date: April 1, 2021
    Inventors: Gayatri Natu, Geetika Bajaj, Prerna Goradia, Darshan Thakare, David Fenwick, XiaoMing He, Sanni Seppaelae, Jennifer Sun, Rajkumar Thanu, Jeff Hudgens, Karuppasamy Muthukamatchy, Arun Dhayalan
  • Publication number: 20200185200
    Abstract: Described herein are articles, systems and methods where a plasma resistant coating is deposited onto a surface of a chamber component using an atomic layer deposition (ALD) process. The plasma resistant coating has a stress relief layer and a layer comprising a solid solution of Y2O3—ZrO2 and uniformly covers features, such as those having an aspect ratio of about 3:1 to about 300:1.
    Type: Application
    Filed: January 6, 2020
    Publication date: June 11, 2020
    Inventors: Xiaowei Wu, David Fenwick, Jennifer Y. Sun, Guodong Zhan
  • Publication number: 20200140996
    Abstract: An article comprises a body having a coating. The coating comprises a Y—O—F coating or other yttrium-based oxy-fluoride coating generated either by performing a fluorination process on a yttrium-based oxide coating or an oxidation process on a yttrium-based fluorine coating.
    Type: Application
    Filed: January 6, 2020
    Publication date: May 7, 2020
    Inventors: Xiaowei Wu, David Fenwick, Guodong Zhan, Jennifer Y. Sun, Michael R. Rice
  • Patent number: 10573497
    Abstract: Described herein are articles, systems and methods where a plasma resistant coating is deposited onto a surface of a chamber component using an atomic layer deposition (ALD) process. The plasma resistant coating has a stress relief layer and a layer comprising a solid solution of Y2O3—ZrO2 and uniformly covers features, such as those having an aspect ratio of about 3:1 to about 300:1.
    Type: Grant
    Filed: December 20, 2017
    Date of Patent: February 25, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Xiaowei Wu, David Fenwick, Jennifer Y. Sun, Guodong Zhan
  • Patent number: 10563303
    Abstract: An article comprises a body having a coating. The coating comprises a Y-O-F coating or other yttrium-based oxy-fluoride coating generated either by performing a fluorination process on a yttrium-based oxide coating or an oxidation process on a yttrium-based fluorine coating.
    Type: Grant
    Filed: April 27, 2018
    Date of Patent: February 18, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Xiaowei Wu, David Fenwick, Guodong Zhan, Jennifer Y. Sun, Michael R. Rice
  • Publication number: 20190376202
    Abstract: An enhanced anodization method includes forming a porous anodization layer comprising columns of anodization layer material with pores between adjacent columns. The method further includes sealing the porous layer by forming a sealing layer at a top of the porous layer. The sealing layer may be formed by using a hybrid sealing process that combines, in any order, two or more of de-ionized (DI) water seal, Ni sealing, and, PTFE sealing. Alternatively, the sealing layer is formed by conformally coating the columns in the porous layer with one or more layers of a coating material. Further, the coating material may be surface-fluorinated to improve plasma resistance.
    Type: Application
    Filed: June 6, 2019
    Publication date: December 12, 2019
    Inventors: Xiao-Ming HE, Jennifer Y. SUN, David FENWICK, Cheng-Hsuan CHOU, Xiaowei WU, Chidambara A. RAMALINGAM, Michael R. RICE
  • Patent number: 10443125
    Abstract: An article comprises a body having a coating. The coating comprises a Y—O—F coating or other yttrium-based oxy-fluoride coating generated either by performing a fluorination process on a yttrium-based oxide coating or an oxidation process on a yttrium-based fluorine coating.
    Type: Grant
    Filed: April 27, 2018
    Date of Patent: October 15, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Xiaowei Wu, David Fenwick, Guodong Zhan, Jennifer Y. Sun, Michael R. Rice
  • Publication number: 20190276366
    Abstract: A chamber component for a processing chamber comprises a ceramic body consisting of a sintered ceramic material consisting essentially of one or more phase of Y2O3—ZrO2. The ceramic material consists essentially of 55-65 mol % Y2O3 and 35-45 mol % ZrO2.
    Type: Application
    Filed: February 19, 2019
    Publication date: September 12, 2019
    Inventors: Jennifer Y. Sun, David Fenwick
  • Publication number: 20190271076
    Abstract: A multi-component coating composition for a surface of a semiconductor process chamber component comprising at least one first film layer of a yttrium oxide or a yttrium fluoride coated onto the surface of the semiconductor process chamber component using an atomic layer deposition process and at least one second film layer of an additional oxide or an additional fluoride coated onto the surface of the semiconductor process chamber component using an atomic layer deposition process, wherein the multi-component coating composition is selected from the group consisting of YOxFy, YxAlyO, YxZryO and YxZryAlzO.
    Type: Application
    Filed: May 14, 2019
    Publication date: September 5, 2019
    Inventors: David Fenwick, Jennifer Y. Sun
  • Publication number: 20190136372
    Abstract: Embodiments of the disclosure relate to articles, coated chamber components and methods of coating chamber components with a low volatile coating. The low volatile coating can include a rare earth metal-containing layer that coats all surfaces of a component (e.g., a high temperature heater).
    Type: Application
    Filed: August 10, 2018
    Publication date: May 9, 2019
    Inventors: Guodong Zhan, David Fenwick, Jennifer Y. Sun
  • Publication number: 20190131113
    Abstract: A semiconductor process chamber component including an article coated with a protective coating that may have Y2O3 at a concentration of about 10 molar % to about 65 molar % and SiO2 at a concentration of about 35 molar % to about 90 molar %.
    Type: Application
    Filed: October 31, 2018
    Publication date: May 2, 2019
    Inventors: David Fenwick, Jennifer Y. Sun
  • Publication number: 20190078206
    Abstract: An article comprises a body having a coating. The coating comprises a M-O-F coating having a molar O/F ratio that is customized to future processing that the article may be exposed to.
    Type: Application
    Filed: February 23, 2018
    Publication date: March 14, 2019
    Inventors: Xiaowei Wu, David Fenwick, Jennifer Y. Sun
  • Publication number: 20190078199
    Abstract: An article comprises a body having a coating. The coating comprises a M-O—F coating having a molar O/F ratio that is customized to future processing that the article may be exposed to.
    Type: Application
    Filed: August 22, 2018
    Publication date: March 14, 2019
    Inventors: Xiaowei Wu, David Fenwick, Jennifer Y. Sun, Michael R. Rice
  • Publication number: 20190078200
    Abstract: An article comprises a body having a coating. The coating comprises a M-O-F coating having a molar O/F ratio that is customized to future processing that the article may be exposed to.
    Type: Application
    Filed: February 23, 2018
    Publication date: March 14, 2019
    Inventors: Xiaowei Wu, David Fenwick, Jennifer Y. Sun