Abstract: A plasma processing system for tuning a voltage setpoint for a multi-state pulsed RF signal, including: a chamber having an electrostatic chuck (ESC) disposed therein; an edge electrode that surrounds the ESC and is disposed below an edge ring surrounding the ESC; a first generator that applies a RF power to the ESC, defining a first multi-state pulsed RF signal; a second generator that applies a RF power to the edge electrode, defining a second multi-state pulsed RF signal having a first state and a second state, wherein for each state of the second multi-state pulsed RF signal, the second generator automatically introduces a phase adjustment to substantially match phase with a corresponding state of the first multi-state pulsed RF signal; and, wherein a voltage setpoint for the second state of the second multi-state pulsed RF signal is adjusted to tune the phase adjustment to a target phase adjustment setting.

Abstract: A system and method for improving the quality of video for virtual reality systems uses several different techniques to improve the quality of the video. The different techniques may include quantization parameter maps, gradient scaling, using analytics to identify most view scenes and encode the most viewed scenes with better quality and adaptively shaping the field of view.

Abstract: Method for tuning a voltage setpoint for a multi-state pulsed RF signal in a plasma processing system, including: applying RF power from a first generator to an ESC, the RF power from the first generator defining a first multi-state pulsed RF signal; applying RF power from a second generator to an edge electrode that surrounds the ESC and is disposed below an edge ring that surrounds the ESC, the RF power from the second generator defining a second multi-state pulsed RF signal having a first state and a second state, wherein for each state of the second multi-state pulsed RF signal, the second generator automatically introduces a phase adjustment to substantially match phase with a corresponding state of the first multi-state pulsed RF signal; adjusting a voltage setpoint for the second state of the second multi-state pulsed RF signal to tune the phase adjustment to a target phase adjustment setting.

Abstract: Distributions of on-chip inductors for monolithic voltage regulation are described. On-chip voltage regulation may be provided by integrated voltage regulators (IVRs), such as a buck converter with integrated inductors. On-chip inductors may be placed to ensure optimal voltage regulation for high power density applications. With this technology, integrated circuits may have many independent voltage domains for fine-grained dynamic voltage and frequency scaling that allows for higher overall power efficiency for the system.

Abstract: Distributions of on-chip inductors for monolithic voltage regulation are described. On-chip voltage regulation may be provided by integrated voltage regulators (IVRs), such as a buck converter with integrated inductors. On-chip inductors may be placed to ensure optimal voltage regulation for high power density applications. With this technology, integrated circuits may have many independent voltage domains for fine-grained dynamic voltage and frequency scaling that allows for higher overall power efficiency for the system.

Abstract: Herein is a universal anomaly threshold based on several labeled datasets and transformation of anomaly scores from one or more anomaly detectors. In an embodiment, a computer meta-learns from each anomaly detection algorithm and each labeled dataset as follows. A respective anomaly detector based on the anomaly detection algorithm is trained based on the dataset. The anomaly detector infers respective anomaly scores for tuples in the dataset. The following are ensured in the anomaly scores from the anomaly detector: i) regularity that an anomaly score of zero cannot indicate an anomaly and ii) normality that an inclusive range of zero to one contains the anomaly scores from the anomaly detector. A respective anomaly threshold is calculated for the anomaly scores from the anomaly detector. After all meta-learning, a universal anomaly threshold is calculated as an average of the anomaly thresholds. An anomaly is detected based on the universal anomaly threshold.

Abstract: An RF signal supply system for plasma generation includes an RF signal generator, an impedance matching system, and a control module. The RF signal generator includes a control system. The impedance matching system has an input connected to an output of the RF signal generator, an output connected to a plasma processing system, a gamma control capacitor, and a frequency control capacitor. The control module is connected in data communication with each of the RF signal generator and the impedance matching system. The control module is programmed to transmit control signals to the impedance matching system based on corresponding data received from the control system of the RF signal generator, where the control signals direct control of the gamma control capacitor and the frequency control capacitor. The control module is also programmed to transmit data received from the impedance matching system to the control system of the RF signal generator.

Abstract: A method for controlling reflected power in a plasma processing system is provided, including: applying RF power from a first generator to an ESC; applying RF power from a second generator to an edge electrode that surrounds the ESC and is disposed below an edge ring that surrounds the ESC, the RF power from the second generator having a voltage set based on the amount of use of the edge ring, wherein the second generator automatically introduces a phase adjustment so that a phase of the RF power from the second generator substantially matches a phase of the RF power from the first generator; and, adjusting a variable capacitor of a match circuit through which the RF power from the second generator is applied to tune the phase adjustment to a target phase adjustment setting.

Abstract: Method for tuning a voltage setpoint for a multi-state pulsed RF signal in a plasma processing system, including: applying RF power from a first generator to an ESC, the RF power from the first generator defining a first multi-state pulsed RF signal; applying RF power from a second generator to an edge electrode that surrounds the ESC and is disposed below an edge ring that surrounds the ESC, the RF power from the second generator defining a second multi-state pulsed RF signal having a first state and a second state, wherein for each state of the second multi-state pulsed RF signal, the second generator automatically introduces a phase adjustment to substantially match phase with a corresponding state of the first multi-state pulsed RF signal; adjusting a voltage setpoint for the second state of the second multi-state pulsed RF signal to tune the phase adjustment to a target phase adjustment setting.

Abstract: There is disclosed a system, apparatus and methods for optimizing photo selection. When a photographer takes photos as requested in a shot list, the photos are automatically assigned a quality score which correlates to how prominently the photo would be displayed in an online search. The photos and the quality scores are displayed to the photographer so that when the photographer has shot a sufficiently high quality photo then the photographer can stop shooting. Photos with the highest quality scores are optimal. The shot lists include reference photos, and if a new photo has a higher quality score than the corresponding reference photo, the new photo becomes the reference photo.

Abstract: There is disclosed a system, apparatus and methods for optimizing photo selection. When a photographer takes photos as requested in a shot list, the photos are automatically assigned a quality score which correlates to how prominently the photo would be displayed in an online search. The photos and the quality scores are displayed to the photographer so that when the photographer has shot a sufficiently high quality photo then the photographer can stop shooting. Photos with the highest quality scores are optimal. The shot lists include reference photos, and if a new photo has a higher quality score than the corresponding reference photo, the new photo becomes the reference photo.

Abstract: Described herein are cobalt compounds, processes for making cobalt compounds, cobalt compounds used as precursors for depositing cobalt-containing films (e.g., cobalt, cobalt oxide, cobalt nitride, cobalt silicide etc.); and cobalt films. Examples of cobalt precursor compounds are bis(diazadiene)cobalt compounds. Examples of surfaces for deposition of metal-containing films include, but are not limited to, metals, metal oxides, metal nitrides, and metal silicates; silicon, silicon oxide and silicon nitride. Alkylated diazadiene ligands are used to form cobalt complexes which are used for selective deposition on certain surfaces and/or superior film properties such as uniformity, continuity, and low resistance.

Abstract: There is disclosed a system, apparatus and methods for optimizing photo selection. When a photographer takes photos as requested in a shot list, the photos are automatically assigned a quality score which correlates to how prominently the photo would be displayed in an online search. The photos and the quality scores are displayed to the photographer so that when the photographer has shot a sufficiently high quality photo then the photographer can stop shooting. Photos with the highest quality scores are optimal. The shot lists include reference photos, and if a new photo has a higher quality score than the corresponding reference photo, the new photo becomes the reference photo.

Abstract: Distributions of on-chip inductors for monolithic voltage regulation are described. On-chip voltage regulation may be provided by integrated voltage regulators (IVRs), such as a buck converter with integrated inductors. On-chip inductors may be placed to ensure optimal voltage regulation for high power density applications. With this technology, integrated circuits may have many independent voltage domains for fine-grained dynamic voltage and frequency scaling that allows for higher overall power efficiency for the system.

Abstract: Distributions of on-chip inductors for monolithic voltage regulation are described. On-chip voltage regulation may be provided by integrated voltage regulators (IVRs), such as a buck converter with integrated inductors. On-chip inductors may be placed to ensure optimal voltage regulation for high power density applications. With this technology, integrated circuits may have many independent voltage domains for fine-grained dynamic voltage and frequency scaling that allows for higher overall power efficiency for the system.

Abstract: Systems and methods for reducing reflected towards a higher frequency radio frequency (RF) generator during a period of a lower frequency RF generator and for using a relationship to reduce reflected power are described. By tuning the higher frequency RF generator during the period of the lower frequency RF generator, precise control of the higher frequency RF generator is achieved for reducing power reflected towards the higher frequency RF generator. Moreover, by using the relationship to reduce the reflected power, time is saved during processing of a wafer.

Abstract: Systems and methods for tuning an impedance matching network in a step-wise fashion are described. By tuning the impedance matching network in a step-wise fashion instead of directly to achieve optimum values of a radio frequency (RF) and a combined variable capacitance, processing of a wafer using the tuned optimal values becomes feasible.

Abstract: There is disclosed herein a non-volatile machine-readable medium storing a program, a system and method for enabling proximity-based, peer-to-peer sharing of media in which a first device having a wireless communication surrounding the device detects other wireless devices within the region. Communication connections are formed between the wireless devices and a list of the authenticated connections is maintained. Without input from a user, media is shared between the individual devices on the authenticated connections list and a remote server, subject to permissions pre-set by the individual devices. Devices not included in the list of authenticated connections are blocked from accessing the media. Access to the media is available for a period of time, after which time access to the media is blocked for all devices.

Abstract: Managing connections for execution of a client software application. A client software application is analyzed before execution of the application using code analysis and, optionally non-functional metadata analysis, of the application to determine one or more classifications of operations of the application. A mapping of application operation classifications to server characteristics suited to the application operation classifications is maintained. Multiple servers currently available to process at least a portion of the client software application may be monitored, and each of the multiple servers may be characterized according to their performance and resources. The classifications of operations of the analyzed application may be compared to the characteristics of the multiple servers currently available using the mapping, and a server may be selected based on the comparison.

Abstract: Systems and methods for tuning an impedance matching network in a step-wise fashion are described. By tuning the impedance matching network in a step-wise fashion instead of directly to achieve optimum values of a radio frequency (RF) and a combined variable capacitance, processing of a wafer using the tuned optimal values becomes feasible.