Patents by Inventor David R. Shafer

David R. Shafer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10481500
    Abstract: An imaging optical system has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The result is an imaging optical system that provides a combination of small imaging errors, manageable production and a good throughput for the imaging light.
    Type: Grant
    Filed: August 3, 2011
    Date of Patent: November 19, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Hans-Juergen Mann, Wilhelm Ulrich, Erik Loopstra, David R. Shafer
  • Publication number: 20190222298
    Abstract: An interface device configured to interface with one or more aircraft avionics data systems and an antenna. The interface device includes a radio and at least one computing device that are housed inside an enclosure. The radio is connected to the antenna. The radio is configured to transmit outgoing messages and to receive incoming messages via the antenna. The at least one computing device is configured to send the outgoing messages to the radio for transmission by the radio via the antenna and to receive the incoming messages from the radio. The radio may be a very high frequency (“VHF”) transceiver.
    Type: Application
    Filed: March 25, 2019
    Publication date: July 18, 2019
    Inventors: Ronald Abeel, Steinarr Bragason, Tony Monroe Bragg, Douglas W. Daman, Brian DeHart, James Dooley, Justin Grimes, David E. Hiney, Timothy Hong, Drew Johnson, Paul Newby, James A. Reynolds, Bryan L. Sammons, Thomas Ogle Shafer, Frank E. Hummel, Andy R. Hill
  • Patent number: 9535337
    Abstract: An imaging optics has a plurality of mirrors to image an object field in an object plane into an image field in an image plane. The imaging optics includes a first partial objective to image the object field onto an intermediate image, and the imaging optics includes a second partial objective to image the intermediate image onto the image field. The second partial objective includes a penultimate mirror in the beam path of imaging light between the object field and the image field, and the second partial objective includes a last mirror in the beam path. The penultimate mirror images the intermediate image onto a further intermediate image, and the last mirror images the further intermediate image onto the image field.
    Type: Grant
    Filed: March 19, 2015
    Date of Patent: January 3, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Hans-Juergen Mann, David R. Shafer
  • Publication number: 20160274343
    Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first Intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.
    Type: Application
    Filed: November 23, 2015
    Publication date: September 22, 2016
    Inventors: David R. Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Murai Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
  • Patent number: 9377414
    Abstract: Inspection of EUV patterned masks, blank masks, and patterned wafers generated by EUV patterned masks requires high magnification and a large field of view at the image plane. An EUV inspection system can include a light source directed to an inspected surface, a detector for detecting light deflected from the inspected surface, and an optic configuration for directing the light from the inspected surface to the detector. In particular, the detector can include a plurality of sensor modules. Additionally, the optic configuration can include a plurality of mirrors that provide magnification of at least 100× within an optical path less than 5 meters long. In one embodiment, the optical path is approximately 2-3 meters long.
    Type: Grant
    Filed: April 1, 2014
    Date of Patent: June 28, 2016
    Assignee: KLA-Tencor Corporation
    Inventors: Yung-Ho Chuang, Richard W. Solarz, David R. Shafer, Bin-Ming Benjamin Tsai, David L. Brown
  • Publication number: 20150219999
    Abstract: An imaging optics has a plurality of mirrors to image an object field in an object plane into an image field in an image plane. The imaging optics includes a first partial objective to image the object field onto an intermediate image, and the imaging optics includes a second partial objective to image the intermediate image onto the image field. The second partial objective includes a penultimate mirror in the beam path of imaging light between the object field and the image field, and the second partial objective includes a last mirror in the beam path. The penultimate mirror images the intermediate image onto a further intermediate image, and the last mirror images the further intermediate image onto the image field.
    Type: Application
    Filed: March 19, 2015
    Publication date: August 6, 2015
    Inventors: Hans-Juergen Mann, David R. Shafer
  • Publication number: 20150055214
    Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first Intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.
    Type: Application
    Filed: October 31, 2014
    Publication date: February 26, 2015
    Inventors: David R. Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Murai Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
  • Patent number: 8908269
    Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first Intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.
    Type: Grant
    Filed: December 30, 2013
    Date of Patent: December 9, 2014
    Assignee: Carl Zeiss SMT GmbH
    Inventors: David R. Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf M. von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
  • Publication number: 20140217299
    Abstract: Inspection of EUV patterned masks, blank masks, and patterned wafers generated by EUV patterned masks requires high magnification and a large field of view at the image plane. An EUV inspection system can include a light source directed to an inspected surface, a detector for detecting light deflected from the inspected surface, and an optic configuration for directing the light from the inspected surface to the detector. In particular, the detector can include a plurality of sensor modules. Additionally, the optic configuration can include a plurality of mirrors that provide magnification of at least 100× within an optical path less than 5 meters long. In one embodiment, the optical path is approximately 2-3 meters long.
    Type: Application
    Filed: April 1, 2014
    Publication date: August 7, 2014
    Applicant: KLA-Tencor Corporation
    Inventors: Yung-Ho Chuang, Richard W. Solarz, David R. Shafer, Bin-Ming Benjamin Tsai, David L. Brown
  • Publication number: 20140111787
    Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first Intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.
    Type: Application
    Filed: December 30, 2013
    Publication date: April 24, 2014
    Inventors: David R. Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf M. von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
  • Patent number: 8692986
    Abstract: Inspection of EUV patterned masks, blank masks, and patterned wafers generated by EUV patterned masks requires high magnification and a large field of view at the image plane. An EUV inspection system can include a light source directed to an inspected surface, a detector for detecting light deflected from the inspected surface, and an optic configuration for directing the light from the inspected surface to the detector. In particular, the detector can include a plurality of sensor modules. Additionally, the optic configuration can include a plurality of mirrors that provide magnification of at least 100× within an optical path less than 5 meters long. In one embodiment, the optical path is approximately 2-3 meters long.
    Type: Grant
    Filed: August 29, 2013
    Date of Patent: April 8, 2014
    Assignee: KLA-Tencor Corporation
    Inventors: Yung-Ho Chuang, Richard W. Solarz, David R. Shafer, Bin-Ming Benjamin Tsai, David L. Brown
  • Patent number: 8675276
    Abstract: A system and method for inspection is disclosed. The design includes an objective employed for use with light energy having a wavelength in various ranges, including approximately 266 to 1000 nm, 157 nm through infrared, and other ranges. The objective includes a focusing lens group having at least one focusing lens configured to receive light, a field lens oriented to receive focused light energy from said focusing lens group and provide intermediate light energy, and a Mangin mirror arrangement positioned to receive the intermediate light energy from the field lens and form controlled light energy. Each focusing lens has a reduced diameter, such as a diameter of less than approximately 100 mm, and a maximum corrected field size of approximately 0.15 mm. An immersion substance, such as oil, water, or silicone gel, may be employed prior to passing controlled light energy to the specimen inspected.
    Type: Grant
    Filed: August 22, 2003
    Date of Patent: March 18, 2014
    Assignee: KLA-Tencor Corporation
    Inventors: David R. Shafer, Yung-Ho Chuang, J. Joseph Armstrong
  • Publication number: 20140001370
    Abstract: Inspection of EUV patterned masks, blank masks, and patterned wafers generated by EUV patterned masks requires high magnification and a large field of view at the image plane. An EUV inspection system can include a light source directed to an inspected surface, a detector for detecting light deflected from the inspected surface, and an optic configuration for directing the light from the inspected surface to the detector. In particular, the detector can include a plurality of sensor modules. Additionally, the optic configuration can include a plurality of mirrors that provide magnification of at least 100× within an optical path less than 5 meters long. In one embodiment, the optical path is approximately 2-3 meters long.
    Type: Application
    Filed: August 29, 2013
    Publication date: January 2, 2014
    Applicant: KLA-Tencor Corporation
    Inventors: Yung-Ho Chuang, Richard W. Solarz, David R. Shafer, Bin-Ming Benjamin Tsai, David L. Brown
  • Patent number: 8553217
    Abstract: Inspection of EUV patterned masks, blank masks, and patterned wafers generated by EUV patterned masks requires high magnification and a large field of view at the image plane. An EUV inspection system can include a light source directed to an inspected surface, a detector for detecting light deflected from the inspected surface, and an optic configuration for directing the light from the inspected surface to the detector. In particular, the detector can include a plurality of sensor modules. Additionally, the optic configuration can include a plurality of mirrors that provide magnification of at least 100× within an optical path less than 5 meters long. In one embodiment, the optical path is approximately 2-3 meters long.
    Type: Grant
    Filed: June 18, 2010
    Date of Patent: October 8, 2013
    Assignee: KLA-Tencor Corporation
    Inventors: Yung-Ho Chuang, Richard W. Solarz, David R. Shafer, Bin-Ming Benjamin Tsai, David L. Brown
  • Publication number: 20120069312
    Abstract: An imaging optical system has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The result is an imaging optical system that provides a combination of small imaging errors, manageable production and a good throughput for the imaging light.
    Type: Application
    Filed: August 3, 2011
    Publication date: March 22, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Hans-Juergen Mann, Wilhelm Ulrich, Erik Loopstra, David R. Shafer
  • Publication number: 20110116077
    Abstract: Inspection of EUV patterned masks, blank masks, and patterned wafers generated by EUV patterned masks requires high magnification and a large field of view at the image plane. An EUV inspection system can include a light source directed to an inspected surface, a detector for detecting light deflected from the inspected surface, and an optic configuration for directing the light from the inspected surface to the detector. In particular, the detector can include a plurality of sensor modules. Additionally, the optic configuration can include a plurality of mirrors that provide magnification of at least 100× within an optical path less than 5 meters long. In one embodiment, the optical path is approximately 2-3 meters long.
    Type: Application
    Filed: June 18, 2010
    Publication date: May 19, 2011
    Applicant: KLA-Tencor Corporation
    Inventors: Yung-Ho Chuang, Richard W. Solarz, David R. Shafer, Bing-Ming Benjamin Tsai, David L. Brown
  • Patent number: 7869121
    Abstract: A relatively high NA objective employed for use in imaging a specimen is provided. The objective includes a lens group having at least one focusing lens configured to receive light energy and form an intermediate image, at least one field lens oriented to receive the intermediate image and provide intermediate light energy, and a Mangin mirror arrangement positioned to receive the intermediate light energy and apply light energy to the specimen. One or more elements may employ an aspheric surface. The objective may provide an uncorrected spectral bandwidth up to approximately 193 to 266 nanometers and numerical apertures in excess of 0.9. Elements are less than 100 millimeters in diameter and may fit within a standard microscope. The field lens may include more than one lens and may be formed of a material different from at least one other lens in the objective.
    Type: Grant
    Filed: March 13, 2006
    Date of Patent: January 11, 2011
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: David R. Shafer, J. Joseph Armstrong, Yung-Ho Chuang
  • Patent number: 7859748
    Abstract: A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnifying power, and a second substantially refractive optical group more image forward than the first optical group having a number of lenses. The second optical group has a negative overall magnifying power for providing image reduction. The first optical group provides compensative aberrative correction for the second optical group. The objective forms an image with a numerical aperture of at least substantially 0.65, and preferably greater than 0.70 or still more preferably greater than 0.75.
    Type: Grant
    Filed: March 14, 2007
    Date of Patent: December 28, 2010
    Assignee: Carl Zeiss SMT GmbH
    Inventors: David R. Shafer, Russell Hudyma, Wilhelm Ulrich
  • Patent number: 7773296
    Abstract: An ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability. The microscope system, which includes a catadioptric lens group and a zooming tube lens group, has high optical resolution in the deep UV wavelengths, continuously adjustable magnification, and a high numerical aperture. The system integrates microscope modules such as objectives, tube lenses and zoom optics to reduce the number of components, and to simplify the system manufacturing process. The preferred embodiment offers excellent image quality across a very broad deep ultraviolet spectral range, combined with an all-refractive zooming tube lens. The zooming tube lens is modified to compensate for higher-order chromatic aberrations that would normally limit performance.
    Type: Grant
    Filed: September 5, 2008
    Date of Patent: August 10, 2010
    Assignee: KLA-Tencor Corporation
    Inventors: David R. Shafer, Yung-Ho Chuang, Bin-Ming Benjamin Tsai
  • Patent number: RE41350
    Abstract: An objective comprising axial symmetry, at least one curved mirror and at least one lens and two intermediate images. The objective includes two refractive partial objectives and one catadioptric partial objective. The objective includes a first partial objective, a first intermediate a image, a second partial objective, a second intermediate image, and a third partial objective. At least one of the partial objectives is purely refractive. One of the partial objectives is purely refractive and one is purely catoptric.
    Type: Grant
    Filed: July 15, 2005
    Date of Patent: May 25, 2010
    Assignee: Carl Zeiss SMT AG
    Inventors: David R. Shafer, Alois Herkommer, Karl-Heinz Schuster, Gerd Füerter, Rudolph Von Büenau, Wilhelm Ulrich