Abstract: A free form touch device includes a substrate, a first switching device, a first touch electrode, a second switching device, and a second touch electrode. The first switching device includes a first channel layer, a first gate, a first source, and a first drain. An overlapping width of the first gate and the first channel layer is W1, and an overlapping length of the first gate and the first channel layer is L1. The first touch electrode is electrically connected with the first switching device. An area of the first touch electrode is A1. The second switching device includes a second channel layer, a second gate, a second source, and a second drain. An overlapping width of the second gate and the second channel layer is W2, and an overlapping length of the second gate and the second channel layer is L2, W1/L1>W2/L2. The second touch electrode is electrically connected with the second switching device. An area of the second touch electrode is A2, and A1>A2.

Abstract: The present disclosure, in some embodiments, relates to a method of performing a photolithography process. The method includes forming a photosensitive material over a substantially flat upper surface of a substrate. The substantially flat upper surface of the substrate extends between opposing sides of the substrate. The photosensitive material is exposed to electromagnetic radiation at a plurality of depths of focus that are centered at different heights over the substrate. The photosensitive material is developed to remove a part of the photosensitive material.

Abstract: A touch display panel is provided, including a common electrode ring, a first and a second common electrode pattern, pixel structures, an edge common signal line, and common signal lines disposed on a substrate. The first and second common electrode patterns and the pixel structures are located in a region surrounded by the common electrode ring. The first common electrode pattern is spaced from the second common electrode pattern by a gap. The first and the second common electrode patterns respectively overlap some of the pixel structures. The edge common signal line is disposed on the substrate, traces along the gap, and extends toward the common electrode ring to be electrically connected to the common electrode ring. The first common electrode pattern overlaps and is electrically connected to one common signal line. The second common electrode pattern overlaps and is electrically connected to another common signal line.

Abstract: An adjustable leakage inductance transformer includes a magnetic core, a primary side coil and a secondary side coil. The magnetic core includes a magnetic core column structure, which has a central column, a first outer column and a second outer column. The primary side coil is wound on the first outer column and the second outer column by a first primary side coil loop number and a second primary side coil loop number, respectively. The secondary side coil is wound on the first outer column and the second outer column by a first secondary side coil loop number and a second secondary side coil loop number, respectively, the first primary side coil loop number is not equal to the first secondary side coil loop number, and the second primary side coil loop number is not equal to the second secondary side coil loop number.

Abstract: A measuring device for measuring a volume variation of liquid received in a bottle includes a bottle sleeve and a weight detecting module. A first accommodating space, a second accommodating space and a first opening are formed on the bottle sleeve. The first opening is communicated with the first accommodating space. The bottle sleeve is elastic. An inner diameter of at least one portion of the first accommodating space is less than an outer diameter of the bottle. The bottle sleeve holds the bottle when the bottle is inserted into the first accommodating space via the first opening. The weight detecting module is disposed inside the second accommodating space to measure weights of the bottle and the liquid at different time points and to determine the volume variation of the liquid according to a difference of the weights of the bottle and the liquid at different time points.

Abstract: A semiconductor device includes a substrate; a first thermoelectric conduction leg, disposed on the substrate, and doped with a first type of dopant; a second thermoelectric conduction leg, disposed on the substrate, and doped with a second type of dopant, wherein the first and second thermoelectric conduction legs are spatially spaced from each other but disposed along a common row on the substrate; and a first intermediate thermoelectric conduction structure, disposed on a first end of the second thermoelectric conduction leg, and doped with the first type of dopant.

Abstract: The present disclosure, in some embodiments, relates to a photolithography tool. The photolithography tool includes an illumination source configured to generate electromagnetic radiation and projection optics configured to focus the electromagnetic radiation onto a photosensitive material overlying a substrate according to a pattern on a photomask. A dynamic focal element is configured to dynamically change positions at which the electromagnetic radiation is focused over the substrate during exposure of the photosensitive material. The positions at which the electromagnetic radiation is focused define a plurality of depths of focus. The plurality of depths of focus respectively span a different spatial region within the photosensitive material that is smaller than a thickness of the photosensitive material.

Abstract: A measuring device includes a first body, a second body slidably combined with the first body, a first pressure sensing component, and a control unit. The first body is for supporting a cup receiving liquid. The first pressure sensing component is disposed between the first body and the second body for sensing weight of the cup and the liquid and generating a signal corresponding to the weight. The control unit is electrically connected to the first pressure sensing component. The control unit determines a volume variation of the liquid according to a weight variation of the cup and the liquid calculated based on a difference between signals transmitted from the first pressure sensing component at different time points.

Abstract: A touch display panel includes a touch circuit, a touch electrode layer and a plurality of multiplexers. The touch electrode layer includes a plurality of first electrodes. Each of the multiplexers is electrically connected to the touch circuit and the first electrodes. Each of the multiplexers is configured to output a touch sensing signal, a first guarding signal and a second guarding signal according to a first guarding control signal, a second guarding control signal, a first touch control signal, and a second touch control signal.

Abstract: A touch display panel includes a first sensing matrix and a second sensing matrix. The first sensing matrix includes a plurality of grid units and a first switch unit. The grid units are arranged in matrix, wherein each grid unit includes at least one first electrode. The first switch unit includes a plurality of switches, and the switches are disposed between adjacent grid units. Wherein, the control end of the switches is configured to receive a first controlling signal, and one end of each of the switches is configured to output a sensing signal. The second sensing matrix includes at least one second electrode, and is configured to receive a common signal. The second sensing matrix includes a plurality of opening units, and each opening unit overlaps with the open area of each pixel circuit in a vertical projection direction of the first substrate.

Abstract: A touch panel including a first substrate, a plurality of touch electrodes and a plurality of active components is provided. The first substrate has an active region. The touch electrodes are disposed on the active region. Each of the touch electrodes includes a network structure having a solid portion and a plurality of opening portions defined by the solid portion. Each of the active components includes a semiconductor pattern substantially shielded by the solid portion of one corresponding touch electrode.

Abstract: A free form touch device includes a substrate, a first switching device, a first touch electrode, a second switching device, and a second touch electrode. The first switching device includes a first channel layer, a first gate, a first source, and a first drain. An overlapping width of the first gate and the first channel layer is W1, and an overlapping length of the first gate and the first channel layer is L1. The first touch electrode is electrically connected with the first switching device. An area of the first touch electrode is A1. The second switching device includes a second channel layer, a second gate, a second source, and a second drain. An overlapping width of the second gate and the second channel layer is W2, and an overlapping length of the second gate and the second channel layer is L2, W1/L1>W2/L2. The second touch electrode is electrically connected with the second switching device. An area of the second touch electrode is A2, and A1>A2.

Abstract: Disclosed herein is a method of regenerating a sorbent of gas in a capture process of said gas, wherein the capture process comprises recirculating the sorbent between a gas capturing system and regenerating reactor system, the method comprising the regenerating reactor system performing the steps of: receiving a solid sorbent to be regenerated, wherein the sorbent is a sorbent of carbon dioxide gas; generating heat by combusting a fuel with an oxidising agent in the presence of a catalyst; regenerating the sorbent by using the generated heat to indirectly heat the sorbent so that the sorbent releases carbon dioxide gas; outputting the regenerated sorbent; and outputting the released carbon dioxide gas. Advantages of the gas capture system include a higher efficiency than known techniques.

Abstract: The present disclosure relates to a dynamic lithographic exposure method, and an associated apparatus, which exposes a photosensitive material over a plurality of depths of focus respectively spanning a different region of the photosensitive material. By exposing the photosensitive material over a plurality of depths of focus, the exposure of the photosensitive material is improved resulting in a larger lithographic process window. In some embodiments, the dynamic lithographic exposure method is performed by forming a photosensitive material over a substrate. The photosensitive material is exposed to electromagnetic radiation at a plurality of depths of focus that respectively span a different region within the photosensitive material. Exposing the photosensitive material to the electromagnetic radiation modifies a solubility of an exposed region within the photosensitive material. The photosensitive material is then developed to remove the soluble region.

Abstract: Assays for detecting antibodies to pharmaceutical preparations, food allergens and environmental allergens are described.

Abstract: The present disclosure, in some embodiments, relates to a photolithography tool. The photolithography tool includes an illumination source configured to generate electromagnetic radiation and projection optics configured to focus the electromagnetic radiation onto a photosensitive material overlying a substrate according to a pattern on a photomask. A dynamic focal element is configured to dynamically change positions at which the electromagnetic radiation is focused over the substrate during exposure of the photosensitive material. The positions at which the electromagnetic radiation is focused define a plurality of depths of focus.

Abstract: A method for treating a micro electro-mechanical system (MEMS) component is disclosed. In one example, the method includes the steps of providing a first wafer, treating the first wafer to form cavities and at least an oxide layer on a top surface of the first wafer using a first chemical vapor deposition (CVD) process, providing a second wafer, bonding the second wafer on a top surface of the at least one oxide layer, treating the second wafer to form a first plurality of structures, depositing a layer of Self-Assembling Monolayer (SAM) to a surface of the MEMS component using a second CVD process.