Patents by Inventor Dennis Miller

Dennis Miller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for forming deformed regions in a resin layer
    Patent number: 8102753
    Abstract: An approach is presented for designing a polymeric layer for nanometer scale thermo-mechanical storage devices. Cross-linked polyimide oligomers are used as the recording layers in atomic force data storage device, giving significantly improved performance when compared to previously reported cross-linked and linear polymers. The cross-linking of the polyimide oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles. Additionally, the cross-linked polyimide oligomers are suitable for use in nano-scale imaging.
    Type: Grant
    Filed: February 21, 2006
    Date of Patent: January 24, 2012
    Assignee: International Business Machines Corporation
    Inventors: Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade, Johannes Windeln
  • METHODS FOR MAKING 1,3-DIHYDROXYACETONE (DHA) FROM GLYCEROL
    Publication number: 20120014889
    Abstract: A method comprising reacting glycerol with acetaldehyde or 1,1-diethoxyethane to produce 1,3-dihydroxyacetone (DHA), without using fermentation or direct oxidation of the glycerol is provided. DHA is useful in various products, including as a sunless tanning agent.
    Type: Application
    Filed: July 14, 2011
    Publication date: January 19, 2012
    Inventors: Dennis Miller, Xi Hong, Carl Lira, Omar McGiveron
  • CARBOXYLIC ACID RECOVERY AND METHODS RELATED THERETO
    Publication number: 20110275851
    Abstract: A method of producing an alkyl ester of a carboxylic acid is provided, the method comprising: adding an alkanol and a mineral acid to a carboxylic acid salt to provide a carboxylic acid/alkanol solution and a precipitated mineral acid salt; separating the mineral acid salt from the carboxylic acid/alkanol solution; esterifying the carboxylic acid; and isolating an alkyl ester of the carboxylic acid.
    Type: Application
    Filed: December 2, 2010
    Publication date: November 10, 2011
    Inventors: Alvaro Orjuela, Abraham Yanez-Mckav, Carl Lira, Dennis Miller
  • POLYHEDRAL OLIGOMERIC SILSESQUIOXANE BASED IMPRINT MATERIALS AND IMPRINT PROCESS USING POLYHEDRAL OLIGOMERIC SILSESQUIOXANE BASED IMPRINT MATERIALS
    Publication number: 20110256713
    Abstract: A method of forming low dielectric contrast structures by imprinting a silsesquioxane based polymerizable composition. The imprinting composition including: one or more polyhedral silsesquioxane oligomers each having one or more polymerizable groups, wherein each of the one or more polymerizable group is bound to a different silicon atom of the one or more polyhedral silsesquioxane oligomers; and one or more polymerizable diluents, the diluents constituting at least 50% by weight of the composition.
    Type: Application
    Filed: June 28, 2011
    Publication date: October 20, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Robert David Allen, Richard Anthony DiPietro, Geraud Jean-Michel Dubois, Mark Whitney Hart, Robert Dennis Miller, Ratnam Sooriyakumaran
  • THERMALLY REVERSIBLE CROSS-LINKED POLY(ARYL ETHER KETONE) MEDIA AND METHOD FOR HIGH DENSITY DATA STORAGE
    Publication number: 20110257344
    Abstract: A composition of matter for a recording medium in atomic force data storage devices. The composition includes one or more poly(aryl ether ketone) copolymers, each of the one or more poly(aryl ether ketone) copolymers including (a) a first monomer including an aryl ether ketone and (b) a second monomer including an aryl ether ketone and a hydrogen bonding cross-linking moiety, the moiety capable of forming two or more hydrogen bonds at room temperature, each of the one or more poly(aryl ether ketone) copolymers having two terminal ends, each terminal end having a phenylethynyl moiety. The covalent and hydrogen bonding cross-linking of the poly(aryl ether ketone) oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles.
    Type: Application
    Filed: June 28, 2011
    Publication date: October 20, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, James Lipton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt
  • Nanoporous Media Templated from Unsymmetrical Amphiphilic Porogens
    Publication number: 20110245418
    Abstract: Substantially or roughly spherical micellar structures useful in the formation of nanoporous materials by templating are disclosed. A roughly spherical micellar structure is formed by organization of one or more spatially unsymmetric organic amphiphilic molecules. Each of those molecules comprises a branched moiety and a second moiety. The branched moiety can form part of either the core or the surface of the spherical micellar structure, depending on the polarity of the environment. The roughly spherical micellar structures form in a thermosetting polymer matrix. They are employed in a templating process whereby the amphiphilic molecules are dispersed in the polymer matrix, the matrix is cured, and the porogens are then removed, leaving nanoscale pores.
    Type: Application
    Filed: May 4, 2011
    Publication date: October 6, 2011
    Inventors: Geraud Jean-Michel Dubois, James Lupton Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Willi Volksen
  • Nanoporous Media Templated from Unsymmetrical Amphiphilic Porogens
    Publication number: 20110245433
    Abstract: Substantially or roughly spherical micellar structures useful in the formation of nanoporous materials by templating are disclosed. A roughly spherical micellar structure is formed by organization of one or more spatially unsymmetric organic amphiphilic molecules. Each of those molecules comprises a branched moiety and a second moiety. The branched moiety can form part of either the core or the surface of the spherical micellar structure, depending on the polarity of the environment. The roughly spherical micellar structures form in a thermosetting polymer matrix. They are employed in a templating process whereby the amphiphilic molecules are dispersed in the polymer matrix, the matrix is cured, and the porogens are then removed, leaving nanoscale pores.
    Type: Application
    Filed: May 4, 2011
    Publication date: October 6, 2011
    Inventors: Jennifer Nam Cha, James Lupton Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Willi Volksen
  • Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials
    Patent number: 8026293
    Abstract: A method of forming low dielectric contrast structures by imprinting a silsesquioxane based polymerizable composition. The imprinting composition including: one or more polyhedral silsesquioxane oligomers each having one or more polymerizable groups, wherein each of the one or more polymerizable group is bound to a different silicon atom of the one or more polyhedral silsesquioxane oligomers; and one or more polymerizable diluents, the diluents constituting at least 50% by weight of the composition.
    Type: Grant
    Filed: March 24, 2008
    Date of Patent: September 27, 2011
    Assignee: International Business Machines Corporation
    Inventors: Robert David Allen, Richard Anthony DiPietro, Geraud Jean-Michel Dubois, Mark Whitney Hart, Robert Dennis Miller, Ratnam Sooriyakumaran
  • Thermally reversible cross-linked poly (aryl ether ketone) media and method for high density data storage
    Patent number: 8012541
    Abstract: A method of storing information. The method including: applying a layer of one or more poly(aryl ether ketone) copolymers to a substrate and thermally curing the layer to form a resin layer, each of the one or more poly(aryl ether ketone) copolymers comprising (a) a first monomer including an aryl ether ketone and (b) a second monomer including an aryl ether ketone and a hydrogen bonding cross-linking moiety, each of the one or more poly(aryl ether ketone) copolymers having two terminal ends, each terminal end having a phenylethynyl moiety, and bringing a thermal-mechanical probe heated to a temperature of greater than 100° C. into proximity with the resin layer multiple times to induce deformed regions at points in the resin layer, the thermal-mechanical probe heating the points in the resin layer of the resin and thereby writing information in the resin layer.
    Type: Grant
    Filed: January 24, 2007
    Date of Patent: September 6, 2011
    Assignee: International Business Machines Corporation
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt
  • Nanoporous media templated from unsymmetrical amphiphilic porogens
    Patent number: 7960442
    Abstract: Substantially or roughly spherical micellar structures useful in the formation of nanoporous materials by templating are disclosed. A roughly spherical micellar structure is formed by organization of one or more spatially unsymmetric organic amphiphilic molecules. Each of those molecules comprises a branched moiety and a second moiety. The branched moiety can form part of either the core or the surface of the spherical micellar structure, depending on the polarity of the environment. The roughly spherical micellar structures form in a thermosetting polymer matrix. They are employed in a templating process whereby the amphiphilic molecules are dispersed in the polymer matrix, the matrix is cured, and the porogens are then removed, leaving nanoscale pores.
    Type: Grant
    Filed: April 20, 2005
    Date of Patent: June 14, 2011
    Assignee: International Business Machines Corporation
    Inventors: Jennifer Nam Cha, Geraud Jean-Michel Dubois, James Lupton Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Willi Volksen
  • POLY-OXYCARBOSILANE COMPOSITIONS FOR USE IN IMPRINT LITHOGRAPHY
    Publication number: 20110136928
    Abstract: The present invention relates to compositions comprising poly-oxycarbosilane and methods for using the compositions in step and flash imprint lithography. The imprinting compositions comprise a poly-oxycarbosilane polymer, a silanol, a reaction initiator and optionally a pore generator.
    Type: Application
    Filed: February 11, 2011
    Publication date: June 9, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Richard Anthony Dipietro, Geraud Jean-Michel Dubois, Robert Dennis Miller, Ratnam Sooriyakumaran
  • HIGH DENSITY DATA STORAGE MEDIUM, METHOD AND DEVICE
    Publication number: 20110128840
    Abstract: A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone polymers, each of the one or more polyaryletherketone polymers having two terminal ends, each terminal end having two or more phenylethynyl moieties. The one or more polyaryletherketone polymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layers in atomic force data storage devices.
    Type: Application
    Filed: January 28, 2011
    Publication date: June 2, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
  • High density data storage medium, method and device
    Patent number: 7939620
    Abstract: A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone polymers, each of the one or more polyaryletherketone polymers having two terminal ends, each terminal end having two or more phenylethynyl moieties. The one or more polyaryletherketone polymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layers in atomic force data storage devices.
    Type: Grant
    Filed: March 27, 2008
    Date of Patent: May 10, 2011
    Assignee: International Business Machines Corporation
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
  • System and Method for Treating Prolapse and Incontinence
    Publication number: 20110105836
    Abstract: A system and method of treating vaginal prolapse and incontinence comprises a kit. The kit includes a mesh graft configured for attachment to the anterior and posterior vaginal walls to thereby treat the vaginal prolapse. A graft delivery device is also provided for introducing and placing the mesh graft to a location deep within the peritoneal cavity and for attaching the graft thereto. A leg assembly is provided and coupled to an end of the mesh graft and cooperates with the graft delivery device to anchor and affix the mesh graft to the desired anatomical structures. The method according to the present invention contemplates a laparoscopic graft placement utilizing the components of the kit.
    Type: Application
    Filed: November 4, 2010
    Publication date: May 5, 2011
    Inventor: Dennis Miller
  • Low-K interlevel dielectric materials and method of forming low-K interlevel dielectric layers and structures
    Patent number: 7931829
    Abstract: A composition of matter and a structure fabricated using the composition. The composition comprising: a resin; polymeric nano-particles dispersed in the resin, each of the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscible with the resin; and a solvent, the solvent volatile at a first temperature, the resin cross-linkable at a second temperature, the polymeric nano-particle decomposable at a third temperature, the third temperature higher than the second temperature, the second temperature higher than the first temperature, wherein a thickness of a layer of the composition shrinks by less than about 3.5% between heating the layer from the second temperature to the third temperature.
    Type: Grant
    Filed: August 17, 2010
    Date of Patent: April 26, 2011
    Assignee: International Business Machines Corporation
    Inventors: Geraud Jean-Michel Dubois, James Lupton Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Muthumanickam Sankarapandian, Linda Karin Sundberg, Willi Volksen
  • Method of step-and-flash imprint lithography
    Patent number: 7927664
    Abstract: The present invention relates to a method for using compositions comprising poly-oxycarbosilane in step and flash imprint lithography. The imprinting compositions comprise a poly-oxycarbosilane polymer and a pore generator.
    Type: Grant
    Filed: August 28, 2006
    Date of Patent: April 19, 2011
    Assignee: International Business Machines Corporation
    Inventors: Richard Anthony Dipietro, Geraud Jean-Michel Dubois, Robert Dennis Miller, Ratnam Sooriyakumaran
  • PHOTO-PATTERNABLE DIELECTRIC MATERIALS CURABLE TO POROUS DIELECTRIC MATERIALS, FORMULATIONS, PRECURSORS AND METHODS OF USE THEREOF
    Publication number: 20110083887
    Abstract: Silsesquioxane polymers that cure to porous silsesquioxane polymers, silsesquioxane polymers that cure to porous silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers that cure to porous silsesquioxane polymers, structures containing porous silsesquioxane polymers and monomers and method of preparing monomers for silsesquioxane polymers that cure to porous silsesquioxane polymers.
    Type: Application
    Filed: October 8, 2009
    Publication date: April 14, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Phillip Joe Brock, Blake W. Davis, Qinghuang Lin, Robert Dennis Miller, Alshakim Nelson, Jitendra Singh Rathore, Ratnam Sooriyakumaran
  • Validating continuous signal phase matching in high-speed nets routed as differential pairs
    Patent number: 7926013
    Abstract: Methods and apparatus to validate continuous signal phase matching in high-speed nets routed as differential pairs are described. In one embodiment, a primary net of a differential pair may be traversed to determine whether a design rule violation has occurred based on comparison of calculated trace lengths of the primary net and a secondary net against a threshold value. Other embodiments are also described.
    Type: Grant
    Filed: December 31, 2007
    Date of Patent: April 12, 2011
    Assignee: Intel Corporation
    Inventors: Howard L. Elikan, Andrew McRonald, Dennis Miller
  • PHOTO-PATTERNABLE DIELECTRIC MATERIALS AND FORMULATIONS AND METHODS OF USE
    Publication number: 20110048787
    Abstract: Silsesquioxane polymers, silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers, and structures made from silsesquioxane polymers.
    Type: Application
    Filed: August 31, 2009
    Publication date: March 3, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Robert David Allen, Phillip Joe Brock, Blake W. Davis, Qinghuang Lin, Robert Dennis Miller, Alshakim Nelson, Ratnam Sooriyakumaran
  • LOW-K INTERLEVEL DIELECTRIC MATERIALS AND METHOD OF FORMING LOW-K INTERLEVEL DIELECTRIC LAYERS AND STRUCTURES
    Publication number: 20100311895
    Abstract: A composition of matter and a structure fabricated using the composition. The composition comprising: a resin; polymeric nano-particles dispersed in the resin, each of the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscible with the resin; and a solvent, the solvent volatile at a first temperature, the resin cross-linkable at a second temperature, the polymeric nano-particle decomposable at a third temperature, the third temperature higher than the second temperature, the second temperature higher than the first temperature, wherein a thickness of a layer of the composition shrinks by less than about 3.5% between heating the layer from the second temperature to the third temperature.
    Type: Application
    Filed: August 17, 2010
    Publication date: December 9, 2010
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Geraud Jean-Michel Dubois, James Lupton Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Muthumanickam Sankarapandian, Linda Karin Sundberg, Willi Volksen