Patents by Inventor Dirk Beyer

Dirk Beyer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180293720
    Abstract: A pattern inspection apparatus includes: an optical image acquiring mechanism to acquire optical image data of a corresponding divided pattern for each of masks for multiple patterning has been formed; a position deviation map generating processing circuitry to generate position deviation maps regarding the corresponding divided pattern; a difference position value map generating processing circuitry to generate one difference position value map defining a difference value between relative position deviation amounts of the each minimum element of the position deviation maps; a region specifying processing circuitry to specify at least one region having the difference value exceeding a threshold of distance between patterns laying side-by-side by using the difference position value map; and an output mechanism to output at least coordinates, a type of defect, and information of a reference image of each region specified for the each region specified.
    Type: Application
    Filed: April 7, 2017
    Publication date: October 11, 2018
    Applicant: NuFlare Technology, Inc.
    Inventors: Shusuke YOSHITAKE, Manabu ISOBE, Thomas SCHERUEBL, Dirk BEYER, Sven HEISIG
  • Patent number: 10061192
    Abstract: The invention relates to a method for correcting at least one error on wafers processed by at least one photolithographic mask, the method comprises: (a) measuring the at least one error on a wafer at a wafer processing site, and (b) modifying the at least one photolithographic mask by introducing at least one arrangement of local persistent modifications in the at least one photolithographic mask.
    Type: Grant
    Filed: August 5, 2016
    Date of Patent: August 28, 2018
    Assignees: Carl Zeiss SMT GmbH, Carl Zeiss SMS Ltd.
    Inventors: Dirk Beyer, Vladimir Dmitriev, Ofir Sharoni, Nadav Wertsman
  • Publication number: 20180068323
    Abstract: A computer implemented system and process to determine a model for a domain includes identifying a schema that defines a possible causal element of a particular type of behavior. One or more concepts are determined, as well as one or more sub-concepts for each concept, where each concept and sub-concept are associated with a logical relationship. Multiple models are determined from the one or more concepts and the one or more sub-concepts. The multiple models may be calibrated using representative data collected from a real-world source. An optimal model is determined amongst a plurality of calibrated models.
    Type: Application
    Filed: September 3, 2016
    Publication date: March 8, 2018
    Inventors: Robert Stratton, Dirk Beyer
  • Publication number: 20160342080
    Abstract: The invention relates to a method for correcting at least one error on wafers processed by at least one photolithographic mask, the method comprises: (a) measuring the at least one error on a wafer at a wafer processing site, and (b) modifying the at least one photolithographic mask by introducing at least one arrangement of local persistent modifications in the at least one photolithographic mask.
    Type: Application
    Filed: August 5, 2016
    Publication date: November 24, 2016
    Inventors: Dirk Beyer, Vladimir Dmitriev, Ofir Sharoni, Nadav Wertsman
  • Patent number: 9436080
    Abstract: The invention relates to a method for correcting at least one error on wafers processed by at least one photolithographic mask, the method comprises: (a) measuring the at least one error on a wafer at a wafer processing site, and (b) modifying the at least one photolithographic mask by introducing at least one arrangement of local persistent modifications in the at least one photolithographic mask.
    Type: Grant
    Filed: December 2, 2011
    Date of Patent: September 6, 2016
    Assignees: Carl Zeiss SMS GmbH, Carl Zeiss SMS Ltd.
    Inventors: Dirk Beyer, Vladimir Dmitriev, Ofir Sharoni, Nadav Wertsman
  • Patent number: 9431212
    Abstract: The invention relates to a method for determining a performance of a photolithographic mask at an exposure wavelength with the steps of scanning at least one electron beam across at least one portion of the photolithographic mask, measuring signals generated by the at least one electron beam interacting with the at least one portion of the photolithographic mask, and determining the performance of the at least one portion of the photolithographic mask at the exposure wavelength based on the measured signals.
    Type: Grant
    Filed: April 29, 2011
    Date of Patent: August 30, 2016
    Assignee: Carl Zeiss SMS GmbH
    Inventors: Markus Waiblinger, Michael Budach, Thomas ScherĂ¼bl, Dirk Beyer
  • Patent number: 8731273
    Abstract: A method for measuring the relative local position error of one of the sections of an object that is exposed section by section, in particular of a lithography mask or of a wafer, is provided, each exposed section having a plurality of measurement marks, wherein a) a region of the object which is larger than the one section is imaged in magnified fashion and is detected as an image, b) position errors of the measurement marks contained in the detected image are determined on the basis of the detected image, c) corrected position errors are derived by position error components which are caused by the magnified imaging and detection being extracted from the determined position errors of the measurement marks, d) the relative local position error of the one section is derived on the basis of the corrected position errors of the measurement marks.
    Type: Grant
    Filed: November 28, 2009
    Date of Patent: May 20, 2014
    Assignee: Carl Zeiss SMS GmbH
    Inventors: Michael Arnz, Dirk Beyer, Wolfgang Harnisch, Thomas Scheruebl
  • Publication number: 20140036243
    Abstract: The invention relates to a method for correcting at least one error on wafers processed by at least one photolithographic mask, the method comprises: (a) measuring the at least one error on a wafer at a wafer processing site, and (b) modifying the at least one photolithographic mask by introducing at least one arrangement of local persistent modifications in the at least one photolithographic mask.
    Type: Application
    Filed: December 2, 2011
    Publication date: February 6, 2014
    Applicants: CARL ZEISS SMS LTD., CARL ZEISS SMS GMBH
    Inventors: Dirk Beyer, Vladimir Dmitriev, Ofir Sharoni, Nadav Wertsman
  • Patent number: 8639551
    Abstract: A method and system of workforce related resource planning is disclosed. The method includes receiving workforce related resource data wherein the workforce related resource data includes demand data and supply data, disaggregating the demand data and the supply data and creating a probability distribution of a workforce gap between the demand data and supply data to quantify risk associated with workforce related resource planning.
    Type: Grant
    Filed: July 31, 2006
    Date of Patent: January 28, 2014
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Qi Feng, Cipriano Santos, Dirk Beyer
  • Patent number: 8467894
    Abstract: A method of managing product end of life over an end of life horizon includes the step of selecting an objective of either maximizing gross profit or minimizing writeoff costs for a selected plurality of products being discontinued. The products may have parts in common. A subset of all possible combinations of product demand levels is selected. Each combination is associated with a probability. A procurement plan that optimizes the selected objective is generated based on the selected subset of demand levels given a non-zero pre-existing inventory of at least some parts of the selected products.
    Type: Grant
    Filed: January 6, 2001
    Date of Patent: June 18, 2013
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Cipriano A. Santos, Fereydoon Safai, Dirk Beyer, Shailendra Jain
  • Publication number: 20130126728
    Abstract: The invention relates to a method for determining a performance of a photolithographic mask at an exposure wavelength with the steps of scanning at least one electron beam across at least one portion of the photolithographic mask, measuring signals generated by the at least one electron beam interacting with the at least one portion of the photolithographic mask, and determining the performance of the at least one portion of the photolithographic mask at the exposure wavelength based on the measured signals.
    Type: Application
    Filed: April 29, 2011
    Publication date: May 23, 2013
    Applicant: CARL ZEISS SMS GMBH
    Inventors: Markus Waiblinger, Michael Budach, Thomas ScherĂ¼bl, Dirk Beyer
  • Patent number: 8281313
    Abstract: An embodiment of a method of scheduling computer processing begins with a first step of receiving job properties for a plurality of jobs to be processed in a multi-processor computing environment. At least some of the jobs each comprise a plurality of stages, one or more tasks for each stage, and precedence constraints among the stages. The method continues with a second step of determining a schedule for processing at least a subset of the plurality of jobs on processors within the multi-processor computing environment from a solution of a mathematical program that provides a near maximal completion reward. The schedule comprises a sequence of tasks for each processor. In a third step, the computer processing jobs are processed on the processors according to the sequence of tasks for each processor.
    Type: Grant
    Filed: September 29, 2005
    Date of Patent: October 2, 2012
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Cipriano A. Santos, Dirk Beyer, Yunhong Zhou, Terence P. Kelly
  • Publication number: 20120154773
    Abstract: A method for correcting errors on a wafer processed by a photolithographic mask at a wafer processing site is provided. The method comprises measuring errors on the wafer, and modifying a pattern placement on the photolithographic mask by locally applying femtosecond light pulses of a laser system to the photolithographic mask at the wafer processing site.
    Type: Application
    Filed: December 2, 2011
    Publication date: June 21, 2012
    Inventor: Dirk Beyer
  • Patent number: 8185348
    Abstract: Systems and methods for detecting an interesting event in a data stream. More specifically, a monitoring system is configured to monitor a data stream and establish a sensitivity parameter based on sequences generated from values in a first portion of the data stream. A detector may be trained using the sensitivity parameter to detect the occurrence of an interesting event in the data stream.
    Type: Grant
    Filed: October 31, 2003
    Date of Patent: May 22, 2012
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Jerry Z. Shan, Evan R. Kirshenbaum, Henri J. Suermondt, Dirk Beyer, Chao Chen
  • Publication number: 20110229010
    Abstract: A method for measuring the relative local position error of one of the sections of an object that is exposed section by section, in particular of a lithography mask or of a wafer, is provided, each exposed section having a plurality of measurement marks, wherein a) a region of the object which is larger than the one section is imaged in magnified fashion and is detected as an image, b) position errors of the measurement marks contained in the detected image are determined on the basis of the detected image, c) corrected position errors are derived by position error components which are caused by the magnified imaging and detection being extracted from the determined position errors of the measurement marks, d) the relative local position error of the one section is derived on the basis of the corrected position errors of the measurement marks.
    Type: Application
    Filed: November 28, 2009
    Publication date: September 22, 2011
    Applicant: Carl Zeiss SMS GMBH
    Inventors: Michael Arnz, Dirk Beyer, Wolfgang Harnisch, Thomas Scheruebl
  • Patent number: 8015564
    Abstract: An embodiment of a method of dispatching tasks in a multi-processor computing environment begins with a step of a dispatcher within the multi-processor computing environment receiving job properties for a plurality of jobs to be processed in the multi-processor computing environment. Each job comprises at least one task. In a second step, the dispatcher employs an initial dispatching rule to assign an initial subset of tasks to processors within the multi-processor computing environment. The method continues with a third step of the dispatcher monitoring system status of the multi-processor computing environment. In a fourth step, the dispatcher selects a second dispatching rule from a plurality of dispatching rules in response to a change in the system status. In a fifth step, the dispatcher employs the second dispatching rule to assign a second subset of tasks to the processors.
    Type: Grant
    Filed: April 27, 2005
    Date of Patent: September 6, 2011
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Dirk Beyer, Janet Wiener, Terence Kelly
  • Patent number: 7958507
    Abstract: In at least some embodiments, a method comprises computing an initial schedule of jobs to be run on a computing system using a mathematical program and monitoring the computing system. The method also comprises, based on the monitoring, determining, using the mathematical program used to compute the initial schedule, whether the initial schedule should be re-computed.
    Type: Grant
    Filed: June 16, 2005
    Date of Patent: June 7, 2011
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Cipriano A. Santos, Dirk Beyer
  • Patent number: 7865582
    Abstract: Embodiments of the present invention relate to a system and method for allocating resources to applications. One embodiment of the present invention may include identifying a plurality of applications and a plurality of application components, and determining available resources of a networked computing system for potentially storing the applications and application components. Additionally, the embodiment may include determining required resources for each application component, assigning a subset of available resources for each application component based on the required resources of the application component and the available resources. The embodiment may also include associating the application components with the subsets of available resources and storing more than one application component of the plurality of application components on a single available resource.
    Type: Grant
    Filed: August 11, 2004
    Date of Patent: January 4, 2011
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Cipriano Santos, Xiaoyun Zhu, Dirk Beyer, Sharad Singhal
  • Patent number: 7861247
    Abstract: Embodiments of the present invention relate to a system and method for assigning resources to an application component. One embodiment of the present invention includes identifying an application component, and determining available resources of a networked computing system for running the application component. Additionally, the embodiment includes determining required resources for the application component, assigning a subset of available resources for the application component taking into account the required resources of the application component, the available resources, and one or more operator policies. These operator policies generally include preferences of operators, administrators, users, or the like, and could also include business rules. Additionally, the embodiment includes associating the application component with the subset of available resources.
    Type: Grant
    Filed: January 31, 2005
    Date of Patent: December 28, 2010
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Cipriano A. Santos, Akhil Sahai, Sharad Singhal, Dirk Beyer, Xiaoyun Zhu
  • Patent number: 7827557
    Abstract: A method, system, and apparatus is disclosed for allocating resources to applications. Available resources of a networked computing system may be determined. For each application, required resources of the application may be determined. An assigned subset of the available resources for each application is determined as a function of the required resources of the application and the available resources. The function reduces communication delays between resources of the subset of the available resources in conformance with bandwidth capacity requirements of the application and in conformance with network bandwidth limitations. The applications may then be associated with the assigned subsets of resources.
    Type: Grant
    Filed: March 24, 2004
    Date of Patent: November 2, 2010
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Xiaoyun Zhu, Ciprianos Santos, Julie Ward Drew, Dirk Beyer, Sharad Singhal