Abstract: A display device includes a substrate; a first electrode and a second electrode arranged to be spaced apart from each other on the substrate; a first insulating layer on the substrate; a light emitting element on the first insulating layer, located between the first electrode and the second electrode, and including a first end portion and a second end portion; a third electrode on the substrate and electrically connected to the first electrode and the first end portion; a fourth electrode on the substrate and electrically connected to the second electrode and the second end portion; a second insulating layer on the substrate and covering the light emitting element, the third electrode, and the fourth electrode; and a light diffusion layer on the second insulating layer and including a light diffusion particle.

Abstract: A master mold for manufacturing a wire grid polarizer includes a mold substrate and a mold part disposed on the mold substrate, in which the mold part includes a plurality of embossed portions extending in a first direction substantially in parallel with one another, a plurality of debossed portions, at least some of which are disposed between adjacent embossed portions, extending in the first direction and separating adjacent embossed portions, and an embossed bridge portion arranged in a second direction intersecting the first direction and connecting the plurality of embossed portions separated by the debossed portions. A wire grid polarizer and a method of manufacturing a wire grid polarizer are also disclosed.

Abstract: Provided are a light-emitting element, a manufacturing method thereof, and a display device comprising the light-emitting element. The method for manufacturing the light-emitting element comprises the steps of: preparing a lower substrate including a substrate and a buffer material layer formed on the substrate, forming a separating layer disposed on the lower substrate and including at least one graphene layer, forming an element deposition structure by depositing a first conductivity type semiconductor layer, an active material layer, and a second conductivity type semiconductor layer on the separating layer, forming an element rod by etching the element deposition structure and the separating layer in a vertical direction; and separating the element rod from the lower substrate to form a light emitting element.

Abstract: A mold for a wire grid polarizer includes a hard mold and a soft mold, in which the hard mold includes a main body, an oxidization layer provided on the main body, and a SAM layer provided on the oxidization layer and including an additive, the soft mold includes a substrate, and a protrusions and depressions portion including a polymerized releasing agent, and a region that is hydrophobic in the polymerized releasing agent is arranged on a surface of the protrusions and depressions portion.

Abstract: A display device includes a substrate; a first electrode and a second electrode arranged to be spaced apart from each other on the substrate; a first insulating layer on the substrate; a light emitting element on the first insulating layer, located between the first electrode and the second electrode, and including a first end portion and a second end portion; a third electrode on the substrate and electrically connected to the first electrode and the first end portion; a fourth electrode on the substrate and electrically connected to the second electrode and the second end portion; a second insulating layer on the substrate and covering the light emitting element, the third electrode, and the fourth electrode; and a light diffusion layer on the second insulating layer and including a light diffusion particle.

Abstract: A method of manufacturing a wire grid pattern includes providing a laminate having a base member, a metal layer disposed on the base member, a mask layer disposed on the metal layer and containing a metal oxide, an adhesive layer disposed on the mask layer, and a patterned resin layer disposed on the adhesive layer and formed by irradiation of first light; and irradiating the laminate with second light. The adhesive layer may comprise a silane coupling agent.

Abstract: A display panel including a base substrate which includes a display area and a non-display area, a polarizing member disposed on a surface of the base substrate and including a plurality of grid patterns overlapping the display area and a reflective pattern overlapping the non-display area, and a pixel array layer which overlaps the polarizing member and is insulated from the polarizing member. A first height from the surface of the base substrate to an upper surface of the reflective pattern is different from a second height from the surface of the base substrate to upper surfaces of the grid patterns.

Abstract: A mold for a wire grid polarizer includes a hard mold and a soft mold, in which the hard mold includes a main body, an oxidization layer provided on the main body, and a SAM layer provided on the oxidization layer and including an additive, the soft mold includes a substrate, and a protrusions and depressions portion including a polymerized releasing agent, and a region that is hydrophobic in the polymerized releasing agent is arranged on a surface of the protrusions and depressions portion.

Abstract: A display panel including a base substrate which includes a display area and a non-display area, a polarizing member disposed on a surface of the base substrate and including a plurality of grid patterns overlapping the display area and a reflective pattern overlapping the non-display area, and a pixel array layer which overlaps the polarizing member and is insulated from the polarizing member. A first height from the surface of the base substrate to an upper surface of the reflective pattern is different from a second height from the surface of the base substrate to upper surfaces of the grid patterns.

Abstract: A method of manufacturing a wire grid pattern includes providing a laminate having a base member, a metal layer disposed on the base member, a mask layer disposed on the metal layer and containing a metal oxide, an adhesive layer disposed on the mask layer, and a patterned resin layer disposed on the adhesive layer and formed by irradiation of first light; and irradiating the laminate with second light. The adhesive layer may comprise a silane coupling agent.

Abstract: Provided is a display panel including a base substrate which includes a display area and a non-display area, a polarizing member disposed on a surface of the base substrate and including a plurality of grid patterns overlapping the display area and a reflective pattern overlapping the non-display area, and a pixel array layer which overlaps the polarizing member and is insulated from the polarizing member, wherein a first height from the surface of the base substrate to an upper surface of the reflective pattern is different from a second height from the surface of the base substrate to upper surfaces of the grid patterns.

Abstract: A method of manufacturing a wire grid pattern includes providing a laminate having a base member, a metal layer disposed on the base member, a mask layer disposed on the metal layer and containing a metal oxide, an adhesive layer disposed on the mask layer, and a patterned resin layer disposed on the adhesive layer and formed by irradiation of first light; and irradiating the laminate with second light. The adhesive layer may comprise a silane coupling agent.

Abstract: A master mold for manufacturing a wire grid polarizer includes a mold substrate and a mold part disposed on the mold substrate, in which the mold part includes a plurality of embossed portions extending in a first direction substantially in parallel with one another, a plurality of debossed portions, at least some of which are disposed between adjacent embossed portions, extending in the first direction and separating adjacent embossed portions, and an embossed bridge portion arranged in a second direction intersecting the first direction and connecting the plurality of embossed portions separated by the debossed portions. A wire grid polarizer and a method of manufacturing a wire grid polarizer are also disclosed.

Abstract: There is provided a cleaner composition for a process of manufacturing a semiconductor and a display. The cleaner composition includes 0.01 to 5.0 wt % of amino acid-based chelating agent, 0.01 to 1.5 wt % of organic acid, 0.01 to 1.0 wt % of inorganic acid, 0.01 to 5.0 wt % of alkali compound, and the balance of deionized water and is based on acidic water with pH levels of 1 to 5. The cleaner composition may enhance metal contaminants removal capability and have a function to remove particles and organic contaminants, and prevent corrosion of copper and reverse adsorption of copper. Thus, cleaner composition may be used for various purposes of etching copper, removing residues, and a cleaner by adjusting an etch rate.

Abstract: Provided is a display panel including a base substrate which includes a display area and a non-display area, a polarizing member disposed on a surface of the base substrate and including a plurality of grid patterns overlapping the display area and a reflective pattern overlapping the non-display area, and a pixel array layer which overlaps the polarizing member and is insulated from the polarizing member, wherein a first height from the surface of the base substrate to an upper surface of the reflective pattern is different from a second height from the surface of the base substrate to upper surfaces of the grid patterns.

Abstract: A method of manufacturing a wire grid pattern includes providing a laminate having a base member, a metal layer disposed on the base member, a mask layer disposed on the metal layer and containing a metal oxide, an adhesive layer disposed on the mask layer, and a patterned resin layer disposed on the adhesive layer and formed by irradiation of first light; and irradiating the laminate with second light. The adhesive layer may comprise a silane coupling agent.

Abstract: A photo mask includes a transparent substrate and a mask pattern. The mask pattern is disposed on the transparent substrate. The mask pattern includes a blocking portion for blocking light and a transmitting portion for transmitting the light. The transmitting portion is adjacent to the blocking portion. The blocking portion includes a first blocking layer, a photo guide layer and a second blocking layer. The first blocking layer is disposed on the transparent substrate. The first blocking layer transmits a portion of the light. The first blocking layer includes a plurality of blocking patterns including a first blocking material. The photo guide layer is disposed on the first blocking layer. The photoguide layer guides the transmitted portion of the light to a side surface of the photoguide layer. The second blocking layer reflects the transmitted portion of the light.

Abstract: A method for forming a fine pattern includes forming an etching target material layer on a substrate, forming a first photoresist layer on the etching target material layer, forming a metal pattern on the first photoresist layer, the metal pattern having a plurality of lines and thin film lines alternately arranged, the lines having predetermined linewidth and thickness and are spaced apart from each other by a predetermined distance, exciting surface plasmons in the metal pattern by light irradiation to produce a surface plasmon resonance that exposes a fine first pattern shape in the first photoresist layer, forming a first photoresist pattern by removing the metal pattern and developing the first photoresist layer, and etching the etching target material layer by using the first photoresist pattern as a mask.

Abstract: There is provided a cleaner composition for a process of manufacturing a semiconductor and a display. The cleaner composition includes 0.01 to 5.0 wt % of amino acid-based chelating agent, 0.01 to 1.5 wt % of organic acid, 0.01 to 1.0 wt % of inorganic acid, 0.01 to 5.0 wt % of alkali compound, and the balance of deionized water and is based on acidic water with pH levels of 1 to 5. The cleaner composition may enhance metal contaminants removal capability and have a function to remove particles and organic contaminants, and prevent corrosion of copper and reverse adsorption of copper. Thus, cleaner composition may be used for various purposes of etching copper, removing residues, and a cleaner by adjusting an etch rate.

Abstract: A phase shift device includes a phase shift mask which includes a transparent substrate, and a phase shift pattern which is provided on the transparent substrate, and includes a first area having a first thickness, a second area having a second thickness which is less than the first thickness, a first opening having a first opening width and defined at the first area, and a second opening having a second opening width and defined at the second area.