Abstract: A first embodiment of the present invention relates to a camera device comprising: a first substrate; a second substrate which is disposed on the first substrate; a first stiffener which is disposed at the second substrate; an image sensor which is disposed at the first stiffener; a connection substrate which connects the first substrate and the second substrate to each other; and a drive unit which moves the image sensor with respect to the first substrate, wherein the first stiffener comprises: a first surface at which the image sensor is disposed; a second surface which is opposite to the first surface; and a plurality of grooves which are formed at the second surface and spaced apart from each other.

Abstract: The present disclosure discloses a battery monitoring data management system. According to an embodiment, the system may comprise charge-discharge apparatuses to be connected to batteries and to collect state information of the batteries; charge-discharge apparatus controllers to control the charge-discharge apparatuses and to generate monitoring data from the collected state information; and a monitoring data management device to receive monitoring data generated by the charge-discharge apparatus controllers, to create message groups based on the received monitoring data, to extract alarm data from the message groups, to generate alarm messages based the extracted alarm data, and to transmit the generated alarm messages to at least one of a monitoring server and an administrator terminal.

Abstract: An apparatus for treating a substrate includes a process chamber having an inner space, a support unit supporting a substrate in the inner space, a processing gas supply unit for supplying a processing gas to the inner space, and a plasma source that excites the processing gas in a plasma state in the inner space. The processing gas supply unit includes a heater that heats the processing gas.

Abstract: A substrate treating apparatus and a substrate treating system including the same are disclosed, in which the number of heat treatment chambers such as anneal chambers may be varied. The substrate treating apparatus includes a first chamber heat-treating a substrate; and a second chamber treating the substrate in another way different from heat-treatment, wherein the number of the first chambers is varied depending on the number of the second chambers that need heat treatment for the substrate.

Abstract: A method for processing a substrate includes providing the substrate, a film being formed on the substrate, performing pretreatment to surface-treat the film formed on the substrate using a treatment gas in a plasma state, and performing, after the pretreatment, liquid treatment to remove the film from the substrate by supplying a treatment liquid onto the substrate.

Abstract: A substrate treatment apparatus includes a processing chamber including an upper chamber and a lower chamber having a treatment space for treating a substrate, a substrate support unit provided in the treatment space, the substrate support unit fixing the substrate, a gas supply unit supplying a process gas to the inside of the upper chamber and the treatment space, a plasma generation unit including an upper electrode provided in the upper chamber and a high-frequency power source connected to the upper electrode, the high-frequency power source supplying high-frequency power through an impedance matcher, and a filter unit connected to the upper electrode, the filter unit removing charges accumulated on one surface of the upper electrode.

Abstract: The present invention may provide, to quantize data including a definite value and an estimated value, a definite value and estimated value-based data quantization method comprising the steps of: a data quantization apparatus collecting, from at least two information manager-side apparatuses, data corresponding to a pre-set definite value for each period of a previous section pre-set on the basis of a current date, an estimated value and definite value for a current year on the basis of the current date, and an estimated value for each period of a subsequent section pre-set based on the current date; calculating at least one comparison reference value on the basis of a provision value after collecting the provision value that can be compared with the estimated value and the definite value; and quantizing the data for each period and for each section via a method for assigning a weight to the current year for each period, and each period of the previous section and subsequent section, by comparing the definite

Abstract: Provided is an amplification module with a gas moving passage and an extract moving passage, more particularly an amplification module in which, when an extract is input from a genome extraction device in which the amplification module is installed, a quantitative amount of the extract is input to each accommodating portion so that the accuracy of detection can be increased.

Abstract: A photobioreactor fabrication system is disclosed. According to a first embodiment, the photobioreactor fabrication system includes a first unwinder 10 continuously unwinding a first transparent film 1, a second unwinder 20 arranged parallel to the first unwinder 10 and continuously unwinding a second transparent film 2 such that the second film 2 faces the first film 1, a heat sealer 30 pressurizing and heat sealing the first 1 and second films 2 to a baffle 3 arranged between the first 1 and second films 2 facing each other, and a rewinder 40 simultaneously and continuously winding the first 1 and second films 2 having passed through the heat sealer 30.

Abstract: Provided is a genome extraction device to which a dual chamber structure of an outer chamber and a bead chamber is applied, more particularly a genome extraction device to which the above-described dual chamber structure is applied so that the performance of dry beads vulnerable to moisture can be maintained for a long time.

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes an electrode plate applied with a power; an ion blocker positioned at a bottom side of the electrode plate, which has a plurality of top holes formed thereon, and which is grounded; a shower head positioned at a bottom side of the ion blocker and which has a plurality of bottom holes formed thereon; and a turbulence generating unit configured to have a turbulence space therein, and which is positioned at a space between the ion blocker and the shower head, and wherein the top hole is positioned to overlap the turbulence space when seen from above, and the bottom hole is positioned at an outer side of the turbulence space, and which faces at least one of a bottom surface of the ion blocker and an outer wall of the turbulence generating unit when seen from below.

Abstract: A multilayer ceramic capacitor includes: a ceramic body in which dielectric layers and first and second internal electrodes are alternately stacked; and first and second external electrodes formed on an outer surface of the ceramic body and electrically connected to the first and second internal electrodes, respectively. In a microstructure of the dielectric layer, dielectric grains are divided by a dielectric grain size into sections each having an interval of 50 nm, respectively, a fraction of the dielectric grains in each of the sections within a range of 50 nm to 450 nm is within a range of 0.025 to 0.20, and a thickness of the dielectric layer is 0.8 ?m or less.

Abstract: A multilayer ceramic capacitor includes: a ceramic body in which dielectric layers and first and second internal electrodes are alternately stacked; and first and second external electrodes formed on an outer surface of the ceramic body and electrically connected to the first and second internal electrodes, respectively. In a microstructure of the dielectric layer, dielectric grains are divided by a dielectric grain size into sections each having an interval of 50 nm, respectively, a fraction of the dielectric grains in each of the sections within a range of 50 nm to 450 nm is within a range of 0.025 to 0.20, and a thickness of the dielectric layer is 0.8 ?m or less.

Abstract: A multilayer capacitor includes a body including a plurality of dielectric layers, and a plurality of internal electrodes stacked with one of the dielectric layers interposed therebetween, and external electrodes disposed on external surfaces of the body and connected to the internal electrodes, respectively. The plurality of dielectric layers include a dielectric expressed by empirical formula BaM1aTi1-xSnxM2bO3 (0.008?x?0.05, 0.006?a?0.03, and 0.0006?b<0.006) in which M1 includes a rare earth element, and M2 includes at least one of Mn or V.

Abstract: A substrate processing apparatus and method capable of maximizing plasma uniformity are provided.

Abstract: Provided are a substrate processing apparatus and method capable of improving line edge roughness (LER). The substrate processing apparatus comprises a plasma generating space disposed between an electrode and an ion blocker, a processing space disposed under the ion blocker and for processing a substrate, a first gas supply module for providing a first gas for generating plasma to the plasma generating space, and a second gas supply module for providing an unexcited second gas to the processing space, wherein the first gas is a hydrogen-containing gas, the second gas includes a nitrogen-containing gas, and the substrate includes a photoresist pattern including carbon.

Abstract: A communication cable composition, and a wire and a cable coated with same. the communication cable composition comprises 0.1-5 parts by weight of an antioxidant and 0.1-5 parts by weight of a lubricant with respect to 100 parts by weight of at least one polypropylene resin selected from among a thermoplastic olefin, a polypropylene block copolymer, and a polypropylene homopolymer. It A communication cable resin composition according to present disclosure has excellent communication performance, heat resistance, oil resistance, and chemical resistance by using a base resin and an antioxidant, wherein various polypropylene resins are used alone or, as appropriate, in combinations as the base resin. An insulated wire and a communication cable coated with such a composition improves the stability of the cable by increasing chemical resistance and oil resistance. In addition, the insulated wire and the communication cable increase heat resistance to the UL 105° C. level.

Abstract: A dielectric material includes a main component represented by (Ba1-xCax)(Ti1-yZry)O3, (Ba1-xCax)(Ti1-ySny)O3, or (Ba1-xCax)(Ti1-yHfy)O3 (0?x?1 and 0?y?0.05) and a subcomponent. When an angle corresponding to a maximum peak is referred to as ?0 and angles corresponding to a full width at half maximum (FWHM) are respectively referred to as ?1 and ?2 (?1<?2) in the peaks of (002) and (200) plane of an x-ray diffraction (XRD) pattern using Cu K?1 radiation (wavelength ?=1.5406 ?), (?2??0)/(?0??1) is greater than 0.54 to 1.0 or less.

Abstract: A cooking appliance includes a main body having a cooking chamber therein and open at a front side thereof, a door provided to the front side of the main body to open or close the cooking chamber, a door button capable of being pressed by user manipulation and to move to a pressed position to allow the door to be opened, and a locking mechanism selectively restricting movement of the door button. The locking mechanism includes a locking rod allowing change of a posture thereof to a locking posture restricting movement of the door button to the pressed position and an unlocking posture allowing movement of the door button to the pressed position; and a manipulation button capable of being pressed by user manipulation and changing the posture of the locking rod from the locking posture to the unlocking posture when pressed by user manipulation.

Abstract: According to one aspect of the present invention, a method of treating a substrate within a chamber includes performing a unit cycle at least one time, in which the unit cycle includes a substrate treatment step of supplying a reaction gas in which radicals constituting plasma of a first treatment gas are mixed with a second treatment gas onto the substrate, wherein the substrate includes a first thin film, and a second thin film having a lower reactivity to the reaction gas than the first thin film.