Patents by Inventor Dong Seon Uh

Dong Seon Uh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10141084
    Abstract: An anisotropic conductive film, the anisotropic conductive film including an insulating layer and a conductive layer laminated on the insulating layer, the conductive layer containing conductive particles, wherein after glass substrates are positioned to face each other on the upper and lower surface of the anisotropic conductive film and are pressed against the anisotropic conductive film at 3 MPa (based on the sample area) and 160° C. (based on the detection temperature of the anisotropic conductive film) for 5 sec, a ratio of the area of the insulating layer to that of the conductive layer is from about 1.3:1 to about 3.0:1.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: November 27, 2018
    Assignee: Cheil Industries, Inc.
    Inventors: Kyoung Soo Park, Woo Suk Lee, Woo Jun Lim, Kyung Jin Lee, Bong Yong Kim, Jin Seong Park, Dong Seon Uh, Youn Jo Ko, Jang Hyun Cho, Sang Sik Bae, Jin Kyu Kim
  • Patent number: 9589696
    Abstract: A semiconductor device bonded by an anisotropic conductive adhesive composition, the anisotropic conductive adhesive composition having a solid content ratio between a polymer binder system and a curing system of about 40:60 to about 60:40, and a coefficient of thermal expansion of about 150 ppm/° C. or less at about 100° C. or less.
    Type: Grant
    Filed: November 2, 2012
    Date of Patent: March 7, 2017
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Hyun Hee Namkung, Jae Sun Han, Hyun Wook Kim, Jin Young Seo, Kwang Jin Jung, Dong Seon Uh
  • Patent number: 9540549
    Abstract: A semiconductor device bonded by an anisotropic conductive film and an anisotropic conductive film composition, the anisotropic conductive film including a reactive monomer having an epoxy equivalent weight of about 120 to about 180 g/eq; a hydrogenated epoxy resin; and a sulfonium cation curing catalyst.
    Type: Grant
    Filed: December 18, 2012
    Date of Patent: January 10, 2017
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Kyung Il Sul, Dong Seon Uh, Nam Ju Kim, Kyoung Soo Park, Young Woo Park, Joon Mo Seo, Arum Yu, Hyun Min Choi
  • Patent number: 9534154
    Abstract: An electronic device includes an anisotropic conductive adhesive film as a connection material, wherein the anisotropic conductive adhesive film has a flowability of 50% or more after preliminary pressing at 80° C. and 1 MPa for 1 second and final pressing at 180° C. and 3 MPa for 5 seconds, and a connection resistance increment greater than 0% but not greater than 25%, as calculated by Expression 1: Connection resistance increment (%)=|(A?B)/A|×100??(Expression 1) where A is a connection resistance measured after preliminary pressing at 80° C. and 1 MPa for 1 second and final pressing at 180° C. and 3 MPa for 5 seconds, and B is a connection resistance measured after reliability evaluation at a temperature of 85° C. and a humidity of 85% for 250 hours following preliminary pressing and final pressing.
    Type: Grant
    Filed: December 21, 2012
    Date of Patent: January 3, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Jin Young Seo, Hyun Wook Kim, Hyun Hee Namkung, Kyung Il Sul, Dong Seon Uh, Kwang Jin Jung, Jae Sun Han
  • Patent number: 9389338
    Abstract: An optical member includes an anisotropic conductive film that has a multilayer structure having a bonding layer containing an epoxy resin as a curing part and a bonding layer containing a (meth)acrylate resin as a curing part.
    Type: Grant
    Filed: October 14, 2011
    Date of Patent: July 12, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Dong Seon Uh, Hyun Hee Namkung, Kwang Jin Jung, Jin Seong Park, Jae Sun Han
  • Patent number: 9390831
    Abstract: An electronic device includes a connection material formed from an adhesive composition that includes: a polymer resin; a cationic polymerization catalyst represented by Formula 1; and an organic base, where, in Formula 1, R1 may be selected from the group of hydrogen, C1-C6 alkyl, C6-C14 aryl, —C(?O)R4, —C(?O)OR5, and —C(?O)NHR6 (in which R4, R5, and R6 may each independently be selected from C1-C6 alkyl and C6-C14 aryl), R2 may be C1-C6 alkyl, and R3 may be selected from the group of a nitrobenzyl group, a dinitrobenzyl group, a trinitrobenzyl group, a benzyl group, a C1-C6 alkyl-substituted benzyl group, and a naphthylmethyl group.
    Type: Grant
    Filed: November 19, 2012
    Date of Patent: July 12, 2016
    Assignee: CHEIL INDUSTRIES INC.
    Inventors: Kyoung Soo Park, Nam Ju Kim, Young Woo Park, Joon Mo Seo, Kyung Il Sul, Dong Seon Uh, Arum Yu, Hyun Min Choi, Jae Sun Han
  • Patent number: 9384869
    Abstract: An anisotropic conductive film includes a binder part, a curing part, an initiator, and conductive particles, wherein the binder part includes at least one of a nitrile butadiene rubber (NBR) resin and a urethane resin, wherein the anisotropic conductive film has an electrical conductivity of more than 0 ?S/cm to about 100 ?S/cm.
    Type: Grant
    Filed: October 10, 2013
    Date of Patent: July 5, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Youn Jo Ko, Dong Seon Uh, Jang Hyun Cho, Jin Seong Park, Sang Sik Bae, Jin Kyu Kim
  • Publication number: 20160075920
    Abstract: An adhesive film for semiconductor devices, the adhesive film including a base film having a coefficient of linear expansion of about 50 to about 150 ?m/m•° C. at 0 to 5° C.
    Type: Application
    Filed: November 24, 2015
    Publication date: March 17, 2016
    Inventors: Dong Seon UH, Gyu Seok SONG, Min Kyu HWANG, Ki Tae SONG, Dae Ho SEO
  • Patent number: 9281097
    Abstract: An anisotropic conductive film includes a binder part, a curing part, an initiator, and conductive particles, wherein the binder part includes at least one of a nitrile butadiene rubber (NBR) resin and a urethane resin, the anisotropic conductive film has a halogen ion content of more than 0 ppm to about 100 ppm.
    Type: Grant
    Filed: October 18, 2013
    Date of Patent: March 8, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Youn Jo Ko, Dong Seon Uh, Jang Hyun Cho, Jin Seong Park, Sang Sik Bae, Jin Kyu Kim
  • Patent number: 9263372
    Abstract: A semiconductor device bonded by an anisotropic conductive film, the anisotropic conductive film including a phenoxy resin including a fluorene-substituted phenoxy resin; and a radically polymerizable resin including a fluorene-substituted acrylate.
    Type: Grant
    Filed: December 20, 2012
    Date of Patent: February 16, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Jae Sun Han, Hyun Wook Kim, Hyun Hee Namkung, Jin Young Seo, Kwang Jin Jung, Dong Seon Uh
  • Patent number: 9173303
    Abstract: An apparatus includes a first member including a plurality of first electrodes on a first substrate, a second member including a plurality of second electrodes on a second substrate, the second electrodes facing the first electrodes of the first member, and an anisotropic conductive film (ACF) between the first member and the second member, the ACF having a double-layered structure and electrically connecting the first member and the second member, the ACF including an epoxy resin with a polycyclic aromatic ring and exhibiting a minimum melt viscosity of about 3,000 Pa·s to about 10,000 Pa·s at about 30° C. to about 200° C.
    Type: Grant
    Filed: December 6, 2011
    Date of Patent: October 27, 2015
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Young Woo Park, Arum Amy Yu, Nam Ju Kim, Hyun Min Choi, Jin Seong Park, Dong Seon Uh
  • Patent number: 9109147
    Abstract: An adhesive composition for a semiconductor has two exothermic peaks between 65° C. and 350° C. and has an area ratio of voids of less than 10%, measured after curing at 150° C. for 10 minutes and then at 150° C. for 30 minutes, and then molding at 175° C. for 60 seconds. A first exothermic peak appears between 65° C. and 185° C. and a second exothermic peak appears between 155° C. and 350° C.
    Type: Grant
    Filed: June 24, 2013
    Date of Patent: August 18, 2015
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Baek Soung Park, Ki Tae Song, Dong Seon Uh, In Hwan Kim
  • Patent number: 9048240
    Abstract: An electronic device includes an anisotropic conductive film as a connection material, the anisotropic conductive film being formed from an anisotropic conductive film-forming composition. The anisotropic conductive film-forming composition includes a polycyclic aromatic ring-containing epoxy resin, a fluorene epoxy resin, nano silica and conductive particles.
    Type: Grant
    Filed: December 27, 2012
    Date of Patent: June 2, 2015
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Young Woo Park, Nam Ju Kim, Kyoung Soo Park, Joon Mo Seo, Kyung Il Sul, Dong Seon Uh, Arum Yu, Hyun Min Choi
  • Patent number: 9035192
    Abstract: An anisotropic conductive adhesive composite and film include a binder and conductive particles dispersed in the binder. The conductive particles include a copper core particle and a metal coating layer coated on a surface of the corresponding copper core particle.
    Type: Grant
    Filed: December 21, 2010
    Date of Patent: May 19, 2015
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Gyu Ho Lee, Young Woo Park, Il Rae Cho, Young Hun Kim, Kyoung Soo Park, Jin Seong Park, Dong Seon Uh, Kyung Jin Lee, Kwang Jin Jung
  • Publication number: 20150041959
    Abstract: A hardmask composition for forming a resist underlayer film, a process for producing a semiconductor integrated circuit device, and a semiconductor integrated circuit device, the hardmask composition including an organosilane polymer, a stabilizer, the stabilizer including methyl acetoacetate, ethyl-2-ethylacetoacetate, nonanol, decanol, undecanol, dodecanol, acetic acid, phenyltrimethoxysilane, diphenylhexamethoxydisiloxane, diphenylhexaethoxydisiloxane, dioctyltetramethyldisiloxane, tetramethyldisiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, hexamethyldisiloxane, or mixtures thereof, and a solvent, wherein the solvent includes acetone, tetrahydrofuran, benzene, toluene, diethyl ether, chloroform, dichloromethane, ethyl acetate, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate, ethyl lactate, ? butyrolactone, methyl isobutyl ketone, or mixtures thereof, the solvent is present in an amount of about 70 to about 99.
    Type: Application
    Filed: October 24, 2014
    Publication date: February 12, 2015
    Inventors: Sang Ran KOH, Sang Kyun KIM, Sang Hak LIM, Mi Young KIM, Hui Chan YUN, Do Hyeon KIM, Dong Seon UH, Jong Seob KIM
  • Publication number: 20150001441
    Abstract: The present invention relates to a getter composition and to an organic EL display device comprising same. More specifically, the present invention relates to: a getter composition comprising a hygroscopic agent and a silicone copolymer having one or more functional groups selected from the group consisting of the carboxylic acid group and the polyalkylene oxide group; and a display device comprising same.
    Type: Application
    Filed: August 1, 2012
    Publication date: January 1, 2015
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Joon Mo Seo, Dong Seon Uh, Kwang Won Seo
  • Patent number: 8916329
    Abstract: A hardmask composition for processing a resist underlayer film includes a solvent and an organosilane polymer, wherein the organosilane polymer is represented by Formula 6: In Formula 6, R is methyl or ethyl, R? is substituted or unsubstituted cyclic or acyclic alkyl, Ar is an aromatic ring-containing functional group, x, y and z satisfy the relations x+y=4, 0.4?x?4, 0?y?3.6, and 4×10?4?z?1, and n is from about 3 to about 500.
    Type: Grant
    Filed: February 6, 2009
    Date of Patent: December 23, 2014
    Assignee: Cheil Industries, Inc.
    Inventors: Sang Kyun Kim, Sang Hak Lim, Mi Young Kim, Sang Ran Koh, Hui Chan Yun, Do Hyeon Kim, Dong Seon Uh, Jong Seob Kim
  • Patent number: 8896117
    Abstract: A semiconductor device bonded by an anisotropic conductive film, the anisotropic conductive film including a conductive adhesive layer and an insulating adhesive layer stacked thereon, an amount of reactive monomers in the conductive adhesive layer being higher than an amount of reactive monomers in the insulating adhesive layer.
    Type: Grant
    Filed: November 16, 2012
    Date of Patent: November 25, 2014
    Assignee: Cheil Industries, Inc.
    Inventors: Youn Jo Ko, Jin Kyu Kim, Dong Seon Uh, Kil Yong Lee, Jang Hyun Cho
  • Patent number: 8766443
    Abstract: An anisotropic conductive film composition for bonding an electronic device may include a hydrogenated bisphenol A epoxy monomer represented by Formula 1 or a hydrogenated bisphenol A epoxy oligomer represented by Formula 2: where n may be an integer from 1 to about 50.
    Type: Grant
    Filed: December 11, 2012
    Date of Patent: July 1, 2014
    Assignee: Cheil Industries, Inc.
    Inventors: Arum Yu, Nam Ju Kim, Kyoung Soo Park, Young Woo Park, Joon Mo Seo, Kyung Il Sul, Dong Seon Uh, Hyun Min Choi
  • Patent number: 8722158
    Abstract: Disclosed is a liquid crystal photo-alignment agent and a liquid crystal photo-alignment film manufactured using the same. The liquid crystal photo-alignment agent includes an epoxy compound represented by Chemical Formula 1, and a polymer including a polyamic acid, a polyimide, or a mixture thereof.
    Type: Grant
    Filed: June 2, 2011
    Date of Patent: May 13, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Hyo-Ju Seo, Tae-Hyoung Kwak, Dong-Seon Uh, Jae-Deuk Yang