Patents by Inventor Dong YUAN

Dong YUAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6734930
    Abstract: A structure of an organic light-emitting TFT LCD and the method for making the same are disclosed. The invention provides a glass substrate on which a TFT IC is formed. A metal layer forms the top layer of the TFT. Afterwards, a white light-emitting organic material layer is deposited thereon. A cover layer is then used to flatten the surface of the organic material layer. Finally, a photo mask pattern and a color filter plate are formed, completing the assembly of the TFT LCD.
    Type: Grant
    Filed: June 10, 2002
    Date of Patent: May 11, 2004
    Assignee: Allied Material Corp.
    Inventors: Zon-Zer Yu, Dong-Yuan Goang, Huang-Chung Cheng
  • Patent number: 6731366
    Abstract: Liquid crystal display (LCD) structures and methods for forming the same. The black matrix and the color filter layer of the LCD are moved from color filter substrate to TFT substrate to form a color filter on TFT (COT) structure. Besides, the spacers are composed of photoresist or color photoresist can be located on portions of areas covered by the black matrix to maximize the aperture ratio.
    Type: Grant
    Filed: October 25, 2000
    Date of Patent: May 4, 2004
    Assignee: Allied Material Technology Corp.
    Inventors: Dong-Yuan Goang, Chich-Jung Wu, Dou-I Chen
  • Publication number: 20030227582
    Abstract: A structure of an organic light-emitting TFT LCD and the method for making the same are disclosed. The invention provides a glass substrate on which a TFT IC is formed. A metal layer forms the top layer of the TFT. Afterwards, a white light-emitting organic material layer is deposited thereon. A cover layer is then used to flatten the surface of the organic material layer. Finally, a photo mask pattern and a color filter plate are formed, completing the assembly of the TFT LCD.
    Type: Application
    Filed: June 10, 2002
    Publication date: December 11, 2003
    Inventors: Zon-Zer Yu, Dong-Yuan Goang, Huang-Chung Cheng
  • Publication number: 20030227583
    Abstract: A structure of an organic light-emitting material TFT LCD and the method for making the same are disclosed. The invention provides a glass substrate formed with a plurality of TFT's thereon. A metal layer is formed on top of the TFT's. Afterwards, a planarized film layer covers the TFT's and the metal layer. The planarized film layer is formed with an organic light-emitting material pattern layer with red, blue and green colors. The organic light-emitting material pattern layer is in alignment with the TFT pattern. A transparent conductive glass layer is formed on top of the light-emitting material pattern layer. Finally, a photo mask pattern fills the light-emitting material pattern layer to prevent the mixture of different colors.
    Type: Application
    Filed: June 10, 2002
    Publication date: December 11, 2003
    Inventors: Zon-Zer Yu, Huang-Chung Cheng, Dong-Yuan Goang
  • Publication number: 20030200539
    Abstract: We disclose a function unit based finite state automata data structure for use in computer program compilers. According to an aspect of an embodiment, the data structure comprises a function unit vector, having no more used bits than there are issue ports for any particular microprocessor, and a plurality of valid template assignments for each function unit vector. In a preferred embodiment, the template assignments are constructed so as to account for dispersal rules associated with the particular microprocessor. Further, the template assignments can be sorted according to priority data.
    Type: Application
    Filed: April 12, 2002
    Publication date: October 23, 2003
    Inventors: Chen Fu, Dong-Yuan Chen, Chengyong Wu, Dz-Ching Ju
  • Publication number: 20030196197
    Abstract: A compiler comprising an integrated instruction scheduler and resource management system is provided. According to an aspect of an embodiment, the resource management system includes a function unit based finite state automata system. Instructions to be compiled are modeled through the function unit based finite state automata system based on their function unit usage, before they are emitted as compiled computer code. We also disclose a function unit based finite state automata data structure and computer implemented methods for making the same.
    Type: Application
    Filed: April 12, 2002
    Publication date: October 16, 2003
    Inventors: Chen Fu, Dong-Yuan Chen, Chengyong Wu, Dz-Ching Ju
  • Patent number: 6631465
    Abstract: A method and apparatus that provides instruction re-alignment using a branch on a falsehood of a qualifying predicate. A complementary predicate related to a qualifying predicate is determined to be available. Instructions are re-aligned using a branch on a falsehood of the qualifying predicate if the complementary predicate is not available. Thus, a complementary predicate does not have to be generated to re-align instructions if no complementary predicate is available for the qualifying predicate.
    Type: Grant
    Filed: June 30, 2000
    Date of Patent: October 7, 2003
    Assignee: Intel Corporation
    Inventors: William Y. Chen, Dong-Yuan Chen
  • Patent number: 6571385
    Abstract: The invention is directed to the transformation of software loops having early exit conditions, thereby allowing the loops to be more effectively converted to a single basic block for software pipelining. The invention assigns a predicate register for each early exit condition of the software loop. The predicate registers are set when the corresponding early exit condition is satisfied. In this manner, when the loop terminates the predicate registers can be examined to indicate which early exit conditions were satisfied. The invention produces loops having a lower recurrence II and resource II than conventional techniques.
    Type: Grant
    Filed: March 22, 1999
    Date of Patent: May 27, 2003
    Assignee: Intel Corporation
    Inventors: Kalyan Muthukumar, Dong-Yuan Chen, Youfeng Wu, Daniel M. Lavery
  • Patent number: 6505345
    Abstract: An optimization process is disclosed. The process first finds a parallel compare sequence in a program flow, for example using a flow graph. The guarding predicate (gp) is obtained for the compares. If a new dominating predicate (dp) can be found, the process proceeds to determining if compares for the dp generate the correct or needed initial value for the gp. If there are free result slots available, the proper compares are generated and folded into the initialization. If no free slots are available, it is determined if there is a use of a gp between the dp and gp. If not, the dp is renamed to gp, and the proper compares are generated and folded into the initialization. If there is such a use, the guarding predicate of the compares is found and the process reiterates until it ends with the failure to find a new dominating predicate dp.
    Type: Grant
    Filed: January 18, 2000
    Date of Patent: January 7, 2003
    Assignee: Intel Corporation
    Inventors: William Y. Chen, Dong-Yuan Chen
  • Publication number: 20030005423
    Abstract: According to the invention, hardware assisted dynamic optimization of program execution is disclosed. According to one embodiment, an application process executed by a microprocessor is optimized by selecting one or more microarchitecture events relating to the execution of the application process to be monitored by one or more hardware monitors; establishing parameters regarding the monitoring of the microarchitecture events by setting one or more monitor control vectors; processing profile data captured by the hardware monitors regarding the occurrence of the microarchitecture events; identifying a region of interest in the application process for optimization based at least in part on the captured profile data; and optimizing the region of interest in the application process.
    Type: Application
    Filed: September 28, 2001
    Publication date: January 2, 2003
    Inventors: Dong-Yuan Chen, Hong Wang, Jesse Fang, John Shen, Wen-Hann Wang, Bernard Lint
  • Publication number: 20030004974
    Abstract: According to the invention, an apparatus and method are disclosed for configurable system monitoring for dynamic optimization of program execution. According to one embodiment, an event monitoring apparatus for dynamic optimization comprises an event monitor to capture profiles of events that occur in the processing of an application by a microprocessor; an interface to a software component; monitor control vectors to direct the operation of the event monitor; and a profile buffer. According to the embodiment, the events to be monitored are selected by the software component. Profiles of the selected events are captured and stored in the profile buffer. The profiles are made available to a handler routine selected by the software component, which processes the profiles to identify regions of the application for optimization and invokes optimizers to optimize the identified regions.
    Type: Application
    Filed: September 28, 2001
    Publication date: January 2, 2003
    Inventors: Hong Wang, Dong-Yuan Chen, John Shen, Wen-Hann Wang, Oren Gershon, Gadi Reuven Ziv
  • Patent number: 6162591
    Abstract: The present invention discloses a photolithography process with a gas-phase pretreatment before the development of photoresist to increase the depth of focus (DOF) of an isolated-line pattern on a substrate. A photoresist layer is coated on a substrate by using spin-on technology. Then, an exposure process is performed on the photoresist layer through a reticle to transfer a pattern of the reticle to the photoresist layer. Additionally, a gas-phase pretreatment is performed on the photoresist layer before or after the exposure process to harden the surface of the photoresist layer. Finally, a developing process is performed to form a pattern on the substrate.
    Type: Grant
    Filed: September 1, 1998
    Date of Patent: December 19, 2000
    Assignee: Industrial Technology Research Institute
    Inventors: Tsai-Sheng Gao, Dong-Yuan Goang
  • Patent number: 6106167
    Abstract: The present invention discloses an apparatus for photolithography process with phase-pretreatment. The apparatus comprises several chambers: a vapor prime chamber, a vacuum-bake chamber, a chill-plate chamber, a coater chamber and a stepper chamber. Further, an interface chamber is between the stepper chamber and the apparatus. These chambers are connected together to a track system. A base gas is introduced into one of these chambers to perform a gas-phase pretreatment. The concentration of the base gas can be controlled and the processing time of the pretreatment process is well controlled by operating the apparatus. As a photoresist layer is applied on a substrate, the photoresist layer is hardened in the base gas to increase the depth of focus in photolithography process.
    Type: Grant
    Filed: September 1, 1998
    Date of Patent: August 22, 2000
    Assignee: Industrial Technology Research Institute
    Inventors: Tsai-Sheng Gao, Dong-Yuan Goang
  • Patent number: 5795996
    Abstract: A method for monitoring water quality including deriving calcium hardness and M alkalinity from the linear functional relation between calcium hardness and specific conductivity, and that between log value of M alkalinity and pH value, simplifying the temperature curve into a formula, and calculating directly the saturation index. A multipurpose and inexpensive automatic water quality monitoring apparatus that can be adapted for use in cooling towers, swimming pools, and boilers may be made from a combination of an conductivity meter, pH meter, and oxidation reduction potential meter commonly used in testing, and a simple algorithm of a central processing unit.
    Type: Grant
    Filed: June 30, 1997
    Date of Patent: August 18, 1998
    Assignee: Industrial Technology Research Institute
    Inventors: Chen-Chang Chang, Shu-Fei Chan, Dong-Yuan Lin, Jen-Chung Chen, Guo Chen Chen, Don H. C. Chen
  • Patent number: 5743980
    Abstract: A method of fabricating an optical retardation film having single axis crystal. A polymer material such as polyvinyl alcohol, polystyrene, polycarbonate, or poly methylmethacrylate dissolved in an alkyl solvent forms a polymer solution. A coating of the solution is deposited on a glass substrate by means of a spin coater. The coated substrate is heated in an oven or a heating pad to dry the polymer film. The dried film separated from the glass substrate forms the optical retardation film.
    Type: Grant
    Filed: May 2, 1996
    Date of Patent: April 28, 1998
    Assignee: Industrial Technology Research Institute
    Inventors: Ting-Chiang Hsieh, Dong-Yuan Goang, Ren-Long Chu
  • Patent number: 5714247
    Abstract: A non-specular reflecting surface for use in a Liquid Crystal Display is obtained by randomly embedding particles in a layer of a resin solution and then baking to hardness. The particles' sizes are approximately the same as the layer's thickness, so a randomly uneven surface is the result. The particles are most commonly, but not necessarily, commercially available plastic microspheres. If a photosensitive resin is selected, it may be shaped into a desired pattern without the need for a separate photoresist and etch step. When a high reflectance metal is deposited onto the resin surface it becomes an effective non-specular reflector.
    Type: Grant
    Filed: June 14, 1996
    Date of Patent: February 3, 1998
    Assignee: Industrial Technology Research Institute
    Inventors: Chen-Lung Kuo, Dong-Yuan Goang, Chun-hsia Chen
  • Patent number: 5666177
    Abstract: A liquid crystal display having improved contrast has been developed by providing a black matrix comprising two layers, a metallic underlayer and a top layer of resin in which particles of black pigment have been dispersed. Additionally, said resin is photosensitive so, after exposure to an image having the shape of the desired black matrix, it assumes the form of the black matrix after development. It is then used as a mask during the etching of the underlying metallic layer. The presence of the resin greatly reduces the reflectivity of the black matrix, thereby increasing the contrast level of the overall display, while the underlying metallic layer provides a solid base for it to rest on.
    Type: Grant
    Filed: February 26, 1996
    Date of Patent: September 9, 1997
    Assignee: Industrial Technology Research Institute
    Inventors: Ting-Chiang Hsieh, Dong-Yuan Goang