Abstract: The present invention relates to a genome amplification module having a branch space adjacent to an inlet through which an extract is introduced, the genome amplification module in which a branch space is formed in a portion adjacent to an inlet and is wider and deeper than an extract moving passage so that the extract can be simultaneously injected along each extract moving passage after the extract is filled in the branch space.

Abstract: A device for controlling plasma characteristics includes one or more processors, and a storage medium storing computer-readable instructions. The computer-readable instructions, when executed by the one or more processors, are configured to cause the one or more processors to obtain an equivalent circuit viewed from a non-sinusoidal generator for applying a plasma control voltage to an electrostatic chuck provided in a processing space of a processing chamber, and to control characteristics of plasma generated in the processing space based on the equivalent circuit obtained. The characteristics of the plasma include at least one of a first sheath thickness from a substrate to the plasma and a second sheath thickness from a shower head spraying process gas into the processing space to the plasma.

Abstract: An apparatus for and a method of processing a substrate are provided. The apparatus for processing a substrate includes a chamber having a processing space therein, a substrate support member disposed inside the chamber and supporting the substrate, an upper plate disposed above the substrate support member and having a plurality of through-holes, a sensor unit disposed inside the upper plate and measuring an induced electromotive force value generated in a measurement through-hole included in the plurality of through-holes, and a detection unit detecting an amount of ions passing through the measurement through-hole based on the induced electromotive force value.

Abstract: Provided is a substrate treating method of removing a thin film formed on a substrate. The substrate treating method includes a reaction process of transferring an etchant to the thin film, and a removal process of removing process by-products generated by reacting the thin film with the etchant, in which the reaction process and the removal process are repeated at least twice or more, and any one of the removal processes is to remove partially the process by-products.

Abstract: The inventive concept provides a substrate treating apparatus.

Abstract: A multilayer ceramic capacitor (MLCC) includes a body including first dielectric layers and second dielectric layers, the body including first to sixth surfaces, a second surface, a third surface, a fourth surface, a fifth surface and a sixth surface; first internal electrodes disposed on the first dielectric layers, exposed to the third surface, the fifth surface, and the sixth surface, and spaced apart from the fourth surface by first spaces; second internal electrodes disposed on the second dielectric layers to oppose the first internal electrodes with the first dielectric layers or the second dielectric layers interposed therebetween, exposed to the fourth surface, the fifth surface, and the sixth surface, and spaced apart from the third surface by second spaces; first dielectric patterns disposed in at least a portion of the first spaces, and second dielectric patterns disposed in at least a portion of the second spaces; and lateral insulating layers.

Abstract: A multilayer ceramic capacitor (MLCC) includes a body including first dielectric layers and second dielectric layers, the body including first to sixth surfaces, a second surface, a third surface, a fourth surface, a fifth surface and a sixth surface; first internal electrodes disposed on the first dielectric layers, exposed to the third surface, the fifth surface, and the sixth surface, and spaced apart from the fourth surface by first spaces; second internal electrodes disposed on the second dielectric layers to oppose the first internal electrodes with the first dielectric layers or the second dielectric layers interposed therebetween, exposed to the fourth surface, the fifth surface, and the sixth surface, and spaced apart from the third surface by second spaces; first dielectric patterns disposed in at least a portion of the first spaces, and second dielectric patterns disposed in at least a portion of the second spaces; and lateral insulating layers.

Abstract: An apparatus and method for processing a substrate using plasma, which has high plasma stability and process reproducibility, is provided. The method includes providing an apparatus for processing a substrate comprising a plasma generating region and a process region separate from the plasma generating region, placing the substrate including a silicon layer and an oxide layer in the process region, forming a hydrogen atmosphere in the process region by providing a hydrogen-based gas to the process region without passing through the plasma generating region, generating plasma by providing a fluorine-based gas to the plasma generating region, and providing the generated plasma to the process region to selectively remove the silicon layer compared to the oxide layer.

Abstract: The present disclosure discloses a battery monitoring data management system. According to an embodiment, the system may comprise charge-discharge apparatuses to be connected to batteries and to collect state information of the batteries; charge-discharge apparatus controllers to control the charge-discharge apparatuses and to generate monitoring data from the collected state information; and a monitoring data management device to receive monitoring data generated by the charge-discharge apparatus controllers, to create message groups based on the received monitoring data, to extract alarm data from the message groups, to generate alarm messages based the extracted alarm data, and to transmit the generated alarm messages to at least one of a monitoring server and an administrator terminal.

Abstract: Provided is a genome extraction device to which a dual chamber structure of an outer chamber and an inner chamber is applied, more particularly a genome extraction device to which the above-described dual chamber structure is applied so that the genome extraction device can be stored stably for a long time without the risk of reagent leakage.

Abstract: A substrate processing apparatus using plasma capable of efficiently controlling the selectivity ratio of a silicon layer and an oxide layer is provided. The substrate processing apparatus comprises a first space disposed between an electrode and an ion blocker; a second space disposed between the ion blocker and a shower head; a processing space under the shower head for processing a substrate; a first supply hole for providing a first gas for generating plasma to the first space; a second supply hole for providing a second gas to be mixed with an effluent of the plasma to the second space; and a first coating layer formed on a first surface of the shower head facing the second space, not formed on a second surface of the shower head facing the processing space, and containing nickel.

Abstract: The present disclosure relates to a cooking appliance. In the present disclosure, a cavity may be formed inside the casing, and a plurality of heat source modules may be arranged inside the casing. Additionally, a distance sensor is arranged on an upper surface of the casing to measure a distance to the food placed inside the cavity. In this way, information on the height or thickness of the food may be obtained through the distance sensor disposed in the casing, and the distance sensor may ensure an accurate measurement angle at the upper portion of the casing.

Abstract: The present disclosure discloses a battery monitoring data management system. According to an embodiment, the system may comprise charge-discharge apparatuses to be connected to batteries and to collect state information of the batteries; charge-discharge apparatus controllers to control the charge-discharge apparatuses and to generate monitoring data from the collected state information; and a monitoring data management device to receive monitoring data generated by the charge-discharge apparatus controllers, to create message groups based on the received monitoring data, to extract alarm data from the message groups, to generate alarm messages based the extracted alarm data, and to transmit the generated alarm messages to at least one of a monitoring server and an administrator terminal.

Abstract: An apparatus for treating a substrate includes a process chamber having an inner space, a support unit supporting a substrate in the inner space, a processing gas supply unit for supplying a processing gas to the inner space, and a plasma source that excites the processing gas in a plasma state in the inner space. The processing gas supply unit includes a heater that heats the processing gas.

Abstract: A substrate treating apparatus and a substrate treating system including the same are disclosed, in which the number of heat treatment chambers such as anneal chambers may be varied. The substrate treating apparatus includes a first chamber heat-treating a substrate; and a second chamber treating the substrate in another way different from heat-treatment, wherein the number of the first chambers is varied depending on the number of the second chambers that need heat treatment for the substrate.

Abstract: A method for processing a substrate includes providing the substrate, a film being formed on the substrate, performing pretreatment to surface-treat the film formed on the substrate using a treatment gas in a plasma state, and performing, after the pretreatment, liquid treatment to remove the film from the substrate by supplying a treatment liquid onto the substrate.

Abstract: A substrate treatment apparatus includes a processing chamber including an upper chamber and a lower chamber having a treatment space for treating a substrate, a substrate support unit provided in the treatment space, the substrate support unit fixing the substrate, a gas supply unit supplying a process gas to the inside of the upper chamber and the treatment space, a plasma generation unit including an upper electrode provided in the upper chamber and a high-frequency power source connected to the upper electrode, the high-frequency power source supplying high-frequency power through an impedance matcher, and a filter unit connected to the upper electrode, the filter unit removing charges accumulated on one surface of the upper electrode.

Abstract: The present invention may provide, to quantize data including a definite value and an estimated value, a definite value and estimated value-based data quantization method comprising the steps of: a data quantization apparatus collecting, from at least two information manager-side apparatuses, data corresponding to a pre-set definite value for each period of a previous section pre-set on the basis of a current date, an estimated value and definite value for a current year on the basis of the current date, and an estimated value for each period of a subsequent section pre-set based on the current date; calculating at least one comparison reference value on the basis of a provision value after collecting the provision value that can be compared with the estimated value and the definite value; and quantizing the data for each period and for each section via a method for assigning a weight to the current year for each period, and each period of the previous section and subsequent section, by comparing the definite

Abstract: Provided is an amplification module with a gas moving passage and an extract moving passage, more particularly an amplification module in which, when an extract is input from a genome extraction device in which the amplification module is installed, a quantitative amount of the extract is input to each accommodating portion so that the accuracy of detection can be increased.

Abstract: A photobioreactor fabrication system is disclosed. According to a first embodiment, the photobioreactor fabrication system includes a first unwinder 10 continuously unwinding a first transparent film 1, a second unwinder 20 arranged parallel to the first unwinder 10 and continuously unwinding a second transparent film 2 such that the second film 2 faces the first film 1, a heat sealer 30 pressurizing and heat sealing the first 1 and second films 2 to a baffle 3 arranged between the first 1 and second films 2 facing each other, and a rewinder 40 simultaneously and continuously winding the first 1 and second films 2 having passed through the heat sealer 30.