Abstract: A method of post-treating a dielectric film formed on a surface of a substrate includes positioning a substrate having a dielectric film formed thereon in a processing chamber and exposing the dielectric film to microwave radiation in the processing chamber at a frequency between 5 GHz and 7 GHz.

Abstract: Implementations described herein generally relate to an apparatus for forming flowable films. In one implementation, the apparatus is a processing chamber including a first RPS coupled to a lid of the processing chamber and a second RPS coupled to a side wall of the processing chamber. The first RPS is utilized for delivering deposition radicals into a processing region in the processing chamber and the second RPS is utilized for delivering cleaning radicals into the processing region. The processing chamber further includes a radical delivery ring disposed between a showerhead and a substrate support for delivering cleaning radicals from the second RPS into the processing region. Having separate RPSs for deposition and clean along with introducing radicals from the RPSs into the processing region using separate delivery channels minimizes cross contamination and cyclic change on the RPSs, leading to improved deposition rate drifting and particle performance.

Abstract: A method of post-treating a dielectric film formed on a surface of a substrate includes positioning a substrate having a dielectric film formed thereon in a processing chamber and exposing the dielectric film to microwave radiation in the processing chamber at a frequency between 5 GHz and 7 GHz.

Abstract: A method and apparatus for a deposition chamber is provided and includes a twin chamber that includes a first remote plasma system coupled and dedicated to a first processing region, a second remote plasma system coupled and dedicated to a second processing region, and a third remote plasma system shared by the first processing region and the second processing region.

Abstract: The present invention relates to a technical field of display, and discloses a substrate carrying apparatus. The apparatus comprises: a vertical bearing plate and an upper holding base; one side surface of the vertical bearing plate is a bearing surface, the upper holding base is provided at the upside of the bearing surface; the upper holding base is provided with a plurality of holder for holding the substrate; the left and right sides of the bearing surface are provided with a plurality of positioning clips for positioning the substrate from the left and right ends of the substrate. The substrate carrying apparatus of the present invention provides a holder on the upper holding base, and during loading of the substrate, after the substrate is transported in place by a manipulator, the substrate is held and hanged by the holder, and the substrate would not undergo a falling process, reducing the risk of substrate damage.

Abstract: Embodiments of the present application provide an apparatus for carrying a substrate by an off-line vacuum suction and a method for transporting a substrate. The apparatus includes a carrying frame provided with a clamper, a vacuum suction device and a detaching device arranged on the carrying frame, wherein the vacuum suction device is arranged to suck and fix a substrate and is connectable to and detachable from a vacuum pipeline and the detaching device is arranged to detach the vacuum suction device and the vacuum pipeline from each other while keeping the vacuum suction device to continuously suck the substrate to be transported. The apparatus and the method can improve fixing of the substrate and achieve off-line suction to the substrate.

Abstract: Disclosed is an anti-inflammatory lipopeptide, which comprises peptide chains and aliphatic chains, the peptide chain being linked to the aliphatic chain through a peptide bond, and an aliphatic acid being linked to the N-terminus of the peptide chain. The lipopeptide suppresses inflammatory response induced by poly(I:C), so as to prevent inflammation after skin injury and alleviate inflammatory response of skin inflammation such as allergic dermatitis. Also disclosed is a preparing method of the lipopeptide.

Abstract: Embodiments disclosed herein generally relate to a plasma processing system. The plasma processing system includes a processing chamber, a chamber seasoning system, and a remote plasma cleaning system. The processing chamber has a chamber body defining a processing region and a plasma field. The chamber seasoning system is coupled to the processing chamber. The chamber seasoning system is configured to season the processing region and the plasma field. The remote plasma cleaning system is in communication with the processing chamber. The remote plasma cleaning system is configured to clean the processing region and the plasma field.

Abstract: The disclosure provides a substrate supporting pin, a substrate supporting device and a substrate access system. The substrate supporting pin is used to support a substrate and includes a rod body. A supporting end of the rod body is provided with a rotating member that is able to roll along a surface of the substrate. Compared to the prior art, the disclosure can reduce or eliminate the damage of the substrate.

Abstract: Implementations described herein generally relate to an apparatus for forming flowable films. In one implementation, the apparatus is a processing chamber including a first RPS coupled to a lid of the processing chamber and a second RPS coupled to a side wall of the processing chamber. The first RPS is utilized for delivering deposition radicals into a processing region in the processing chamber and the second RPS is utilized for delivering cleaning radicals into the processing region. The processing chamber further includes a radical delivery ring disposed between a showerhead and a substrate support for delivering cleaning radicals from the second RPS into the processing region. Having separate RPSs for deposition and clean along with introducing radicals from the RPSs into the processing region using separate delivery channels minimizes cross contamination and cyclic change on the RPSs, leading to improved deposition rate drifting and particle performance.

Abstract: A method and apparatus for a deposition chamber is provided and includes a twin chamber that includes a first remote plasma system coupled and dedicated to a first processing region, a second remote plasma system coupled and dedicated to a second processing region, and a third remote plasma system shared by the first processing region and the second processing region.

Abstract: Embodiments of the present application provide an apparatus for carrying a substrate by an off-line vacuum suction and a method for transporting a substrate. The apparatus includes a carrying frame provided with a clamper, a vacuum suction device and a detaching device arranged on the carrying frame, wherein the vacuum suction device is arranged to suck and fix a substrate and is connectable to and detachable from a vacuum pipeline and the detaching device is arranged to detach the vacuum suction device and the vacuum pipeline from each other while keeping the vacuum suction device to continuously suck the substrate to be transported. The apparatus and the method can improve fixing of the substrate and achieve off-line suction to the substrate.

Abstract: The present invention relates to a technical field of display, and discloses a substrate carrying apparatus. The apparatus comprises: a vertical bearing plate and an upper holding base; one side surface of the vertical bearing plate is a bearing surface, the upper holding base is provided at the upside of the bearing surface; the upper holding base is provided with a plurality of holder for holding the substrate; the left and right sides of the bearing surface are provided with a plurality of positioning clips for positioning the substrate from the left and right ends of the substrate. The substrate carrying apparatus of the present invention provides a holder on the upper holding base, and during loading of the substrate, after the substrate is transported in place by a manipulator, the substrate is held and hanged by the holder, and the substrate would not undergo a falling process, reducing the risk of substrate damage.

Abstract: Disclosed is an anti-inflammatory lipopeptide, which comprises peptide chains and aliphatic chains, the peptide chain being linked to the aliphatic chain through a peptide bond, and an aliphatic acid being linked to the N-terminus of the peptide chain. The lipopeptide suppresses inflammatory response induced by poly(I:C), so as to prevent inflammation after skin injury and alleviate inflammatory response of skin inflammation such as allergic dermatitis. Also disclosed is a preparing method of the lipopeptide.

Abstract: The present invention provides electrokinetic microfluidic cytometers useful for detecting and/or sorting fluid-borne particles. In some embodiments, the electrokinetic microfluidic flow cytometer apparatus comprises a substrate having a microchannel formed therein, a particle-sensing gate that reduces the cross-sectional area of a portion of the microchannel, a pair of signal- and noise-detection electrodes, and a particle-detection circuit that is electrically connected to the signal- and noise-detection electrodes and is configured to generate a particle-detection signal responsive to differences in resistivity across the particle-sensing gate.

Abstract: Methods of forming gapfill silicon-containing layers are described. The methods may include providing or forming a silicon-and-hydrogen-containing layer on a patterned substrate. The methods include non-thermally treating the silicon-and-hydrogen-containing layer at low substrate temperature to increase the concentration of Si—Si bonds while the silicon-and-hydrogen-containing layer remains soft. The flaccid layer is able to adjust to the departure of hydrogen from the film and retain a high density without developing a stress. Film qualify is further improved by then inserting O between Si—Si bonds to expand the film in the trenches thereby converting the silicon-and-hydrogen-containing layer to a silicon-and-oxygen-containing layer.

Abstract: The present invention provides electrokinetic microfluidic cytometers useful for detecting and/or sorting fluid-borne particles. In some embodiments, the electrokinetic microfluidic flow cytometer apparatus comprises a substrate having a microchannel formed therein, a particle-sensing gate that reduces the cross-sectional area of a portion of the microchannel, a pair of signal- and noise-detection electrodes, and a particle-detection circuit that is electrically connected to the signal- and noise-detection electrodes and is configured to generate a particle-detection signal responsive to differences in resistivity across the particle-sensing gate.

Abstract: Methods, materials, and systems are described for forming conformal dielectric layers containing silicon and nitrogen (e.g., a silicon-nitrogen-hydrogen (Si—N—H) film) from a carbon-free silicon-and-nitrogen precursor and radical-nitrogen precursor. The carbon-free silicon-and-nitrogen precursor is predominantly excited by contact with the radical-nitrogen precursor. Because the silicon-and-nitrogen film is formed without carbon, the conversion of the film into hardened silicon oxide is done with less pore formation and less volume shrinkage. The deposited silicon-and-nitrogen-containing film may be wholly or partially converted to silicon oxide which allows the optical properties of the conformal dielectric layer to be selectable. The deposition of a thin silicon-and-nitrogen-containing film may be performed at low temperature to form a liner layer in a substrate trench.

Abstract: The formation of a gap-filling silicon oxide layer with reduced volume fraction of voids is described. The deposition involves the formation of an oxygen-rich less-flowable liner layer before an oxygen-poor more-flowable gapfill layer. However, the liner layer is deposited within the same chamber as the gapfill layer. The liner layer and the gapfill layer may both be formed by combining a radical component with an unexcited silicon-containing precursor (i.e. not directly excited by application of plasma power). The liner layer has more oxygen content than the gapfill layer and deposits more conformally. The deposition rate of the gapfill layer may be increased by the presence of the liner layer. The gapfill layer may contain silicon, oxygen and nitrogen and be converted at elevated temperature to contain more oxygen and less nitrogen. The presence of the gapfill liner provides a source of oxygen underneath the gapfill layer to augment the gas phase oxygen introduced during the conversion.

Abstract: Methods of forming silicon oxide layers are described. The methods include concurrently combining plasma-excited (radical) steam with an unexcited silicon precursor. Nitrogen may be supplied through the plasma-excited route (e.g. by adding ammonia to the steam) and/or by choosing a nitrogen-containing unexcited silicon precursor. The methods result in depositing a silicon-oxygen-and-nitrogen-containing layer on a substrate. The oxygen content of the silicon-oxygen-and-nitrogen-containing layer is then increased to form a silicon oxide layer which may contain little or no nitrogen. The increase in oxygen content may be brought about by annealing the layer in the presence of an oxygen-containing atmosphere and the density of the film may be increased further by raising the temperature even higher in an inert environment.