Patents by Inventor Dror Shemesh

Dror Shemesh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200355620
    Abstract: A method for determining a defect material element, the method includes (a) acquiring, by a charged particle beam system and by applying a spectroscopy process, an electromagnetic emission spectrum of a part of a defect; (b) acquiring, by the charged particle beam system, a backscattered electron (BSE) image of an area that includes the defect; and (c) determining a defect material element. The determining of the defect material element includes: determining whether an ambiguity exists in the electromagnetic emission spectrum, and resolving the ambiguity based on the BSE image, when it is determined that the ambiguity exists.
    Type: Application
    Filed: May 7, 2019
    Publication date: November 12, 2020
    Applicant: APPLIED MATERIALS ISRAEL LTD.
    Inventors: Dror Shemesh, Eugene T. Bullock, Adi Boehm, Gurjeet Singh
  • Patent number: 10810879
    Abstract: A system for predicting and preventing car accidents and collisions between vehicles and pedestrians, which comprises a plurality of mobile devices each carried by a pedestrian user or a user riding in a vehicle; a dedicated software application installed on each of the mobile devices adapted to detect the location of the mobile device; one or more geographic servers, each geographic server assigned to a geographic territory and adapted to communicate position and motion information with mobile devices in its geographic territory; and a bridge module adapted to register and sign-in users to the system, and establish and maintain a connection between mobile devices and geographic servers. The geographic server of each territory receives ongoing position and motion updates from all of the mobile devices in its territory and transmits ongoing position and motion updates associated with position and motion of other mobile devices to mobile devices in its territory.
    Type: Grant
    Filed: April 2, 2018
    Date of Patent: October 20, 2020
    Assignee: EYE-NET MOBILE LTD.
    Inventors: Haim Siboni, Nir Shemesh, Dror Elbaz, Tal Lavi
  • Publication number: 20200035103
    Abstract: A system for predicting and preventing car accidents and collisions between vehicles and pedestrians, which comprises a plurality of mobile devices each carried by a pedestrian user or a user riding in a vehicle; a dedicated software application installed on each of the mobile devices adapted to detect the location of the mobile device; one or more geographic servers, each geographic server assigned to a geographic territory and adapted to communicate position and motion information with mobile devices in its geographic territory; and a bridge module adapted to register and sign-in users to the system, and establish and maintain a connection between mobile devices and geographic servers. The geographic server of each territory receives ongoing position and motion updates from all of the mobile devices in its territory and transmits ongoing position and motion updates associated with position and motion of other mobile devices to mobile devices in its territory.
    Type: Application
    Filed: April 2, 2018
    Publication date: January 30, 2020
    Applicant: FORESIGHT AUTOMOTIVE LTD.
    Inventors: Haim Siboni, Nir Shemesh, Dror Elbaz, Tal Lavi
  • Patent number: 10347462
    Abstract: A method for detecting crystal defects includes scanning a first FOV on a first sample using a charged particle beam with a plurality of different tilt angles. BSE emitted from the first sample are detected and a first image of the first FOV is created. A first area within the first image is identified where signals from the BSE are lower than other areas of the first image. A second FOV on a second sample is scanned using approximately the same tilt angles or deflections as those used to scan the first area. The BSE emitted from the second sample are detected and a second image of the second FOV is created. Crystal defects within the second sample are identified by identifying areas within the second image where signals from the BSE are different than other areas of the second image.
    Type: Grant
    Filed: April 17, 2018
    Date of Patent: July 9, 2019
    Assignee: Applied Materials Israel Ltd.
    Inventors: Dror Shemesh, Uri Lev, Benjamin Colombeau, Amir Wachs, Kourosh Nafisi
  • Publication number: 20190180975
    Abstract: A method for detecting crystal defects includes scanning a first FOV on a first sample using a charged particle beam with a plurality of different tilt angles. BSE emitted from the first sample are detected and a first image of the first FOV is created. A first area within the first image is identified where signals from the BSE are lower than other areas of the first image. A second FOV on a second sample is scanned using approximately the same tilt angles or deflections as those used to scan the first area. The BSE emitted from the second sample are detected and a second image of the second FOV is created. Crystal defects within the second sample are identified by identifying areas within the second image where signals from the BSE are different than other areas of the second image.
    Type: Application
    Filed: April 17, 2018
    Publication date: June 13, 2019
    Inventors: Dror Shemesh, Uri Lev, Benjamin Colombeau, Amir Wachs, Kourosh Nafisi
  • Publication number: 20190043183
    Abstract: A method for detecting voids in a metal line of a semiconductor device die includes: scanning an electron beam upon a selected location on the die containing the metal line; determine gray levels in an image produced by collected electrons of the electron beam backscattered from the selected location on the die; and identifying one or more voids in the metal line based on differences between the gray levels in the image.
    Type: Application
    Filed: July 31, 2018
    Publication date: February 7, 2019
    Inventors: Dror Shemesh, Vadim Kuchik, Nicolas L. Breil
  • Patent number: 9899185
    Abstract: A system, computer readable medium and a method for material analysis, the method may include (i) receiving or generating (a) an estimated composition of a microscopic element; wherein the estimated composition is responsive to an energy spectrum of, at least, the microscopic element; wherein the energy spectrum is obtained by an energy dispersive X-ray (EDX) detector; additional information related to, at least, the microscopic element, wherein the additional information is not obtained by the energy dispersive X-ray detector; and (ii) resolving an ambiguity in the estimated composition in response to the additional information, wherein the ambiguity occurs when the energy spectrum comprises a predefined energy peak that is attributed to a predefined material of ambiguous EDX composition determination.
    Type: Grant
    Filed: April 20, 2016
    Date of Patent: February 20, 2018
    Assignee: APPLIED MATERIALS ISRAEL LTD.
    Inventors: Dror Shemesh, Mor Baram
  • Patent number: 9805909
    Abstract: An inspection system that includes charged particle optics that irradiate a bottom of a hole with a charged particle beam propagated along an optical axis, an energy dispersive x-ray detector and a processor. The x-ray detector detects x-ray photons emitted from the bottom of the hole and generates detection signals indicative of the x-ray photons. The processor processes the detection signals to provide an estimate of the bottom of the hole.
    Type: Grant
    Filed: September 20, 2016
    Date of Patent: October 31, 2017
    Assignee: APPLIED MATERIALS ISRAEL LTD.
    Inventors: Dror Shemesh, Lei Zhong
  • Patent number: 9490101
    Abstract: A system for scanning an object, the system may include (a) charged particles optics that is configured to: scan, with a charged particle beam and at a first scan rate, a first region of interest (ROI) of an area of the object; detect first particles that were generated as a result of the scanning of the first ROI; scan, with the charged particle beam and at a second scan rate, a second ROI of the area of the object; wherein the second scan rate is lower than the first scan rate; wherein first ROI differs from the second ROI by at least one parameter; detect second particles that were generated as a result of the scanning of the second ROA; and (b) a processor that is configured to generate at least one image of the area in response to the first and second particles.
    Type: Grant
    Filed: March 16, 2015
    Date of Patent: November 8, 2016
    Assignee: Applied Materials Israel Ltd.
    Inventors: Yuval Gronau, Ishai Schwarzband, Benzion Sender, Dror Shemesh, Ran Schleyen, Ofir Greenberg
  • Publication number: 20160276127
    Abstract: A system for scanning an object, the system may include (a) charged particles optics that is configured to: scan, with a charged particle beam and at a first scan rate, a first region of interest (ROI) of an area of the object; detect first particles that were generated as a result of the scanning of the first ROI; scan, with the charged particle beam and at a second scan rate, a second ROI of the area of the object; wherein the second scan rate is lower than the first scan rate; wherein first ROI differs from the second ROI by at least one parameter; detect second particles that were generated as a result of the scanning of the second ROA; and (b) a processor that is configured to generate at least one image of the area in response to the first and second particles.
    Type: Application
    Filed: March 16, 2015
    Publication date: September 22, 2016
    Inventors: Yuval Gronau, Ishai Schwarzband, Benzion Sender, Dror Shemesh, Ran Schleyen, Ofir Greenberg
  • Patent number: 8723144
    Abstract: An apparatus is disclosed for forming a sample of an object, extracting the sample from the object, and subjecting this sample to microanalysis including surface analysis and electron transparency analysis in a vacuum chamber. In some embodiments, a means is provided for imaging an object cross section surface of an extracted sample. Optionally, the sample is iteratively thinned and imaged within the vacuum chamber. In some embodiments, the sample is situated on a sample support including an optional aperture. Optionally, the sample is situated on a surface of the sample support such that the object cross section surface is substantially parallel to the surface of the sample support. Once mounted on the sample support, the sample is either subjected to microanalysis in the vacuum chamber, or loaded onto a loading station. In some embodiments, the sample is imaged with an electron beam substantially normally incident to the object cross section surface.
    Type: Grant
    Filed: April 28, 2005
    Date of Patent: May 13, 2014
    Assignee: Applied Materials Israel, Ltd.
    Inventors: Eitan Kidron, Dror Shemesh
  • Patent number: 8709269
    Abstract: A method and a system for obtaining an image of a cross section of a specimen, the method includes: milling the specimen so as to expose a cross section of the specimen, in which the cross section comprises at least one first portion made of a first material and at least one second portion made of a second material; smoothing the cross section; performing gas assisted etching of the cross section so as generate a topography difference between the at least one first portion and the at least one second portion of the cross section; coating the cross section with a thin layer of conductive material; and obtaining an image of the cross section; wherein the milling, smoothing, performing, coating and obtaining are performed while the specimen is placed in a vacuum chamber.
    Type: Grant
    Filed: April 15, 2008
    Date of Patent: April 29, 2014
    Assignee: Applied Materials Israel, Ltd.
    Inventor: Dror Shemesh
  • Patent number: 8361814
    Abstract: A method for evaluating a cleanliness of a tool, the method includes: receiving a wafer; cleaning the wafer; placing the wafer into the tool for a predefined period; removing the wafer from the tool, performing a contact angle measurement and determining the cleanliness of the wafer.
    Type: Grant
    Filed: February 9, 2006
    Date of Patent: January 29, 2013
    Assignee: Applied Materials, Israel, Ltd.
    Inventors: Dror Shemesh, Michal Eilon, Hen Doozli, Ekaterina Rechav, Eitan Binyamini
  • Publication number: 20120241605
    Abstract: A method for improving the resolution of a scanning electron microscope, the method including: defining an energy band in response to an expected penetration depth of secondary electrons in an object; illuminating the object with a primary electron beam; and generating images from electrons that arrive at a spectrometer having an energy within the energy band. A scanning electron microscope that includes: a stage for supporting an object; a controller, adapted to receive or define an energy band an energy band in response to an expected penetration depth of secondary electrons in an object; illumination optics adapted to illuminate the object with a primary electron beam; a spectrometer; controlled by the controller so as to selectively reject electrons in response to the defined energy band; and a processor that is adapted to generate images from detection signals provided by the spectrometer.
    Type: Application
    Filed: April 30, 2012
    Publication date: September 27, 2012
    Inventor: Dror Shemesh
  • Patent number: 7912657
    Abstract: A system for providing a compensated Auger spectrum, the system includes: a processor, adapted to generate a compensated Auger spectrum in response to a non-compensated Auger spectrum and in response to an electric potential related parameter, and an interface to an electron detector that is adapted to detect electrons emitted from the first area, wherein the interface is connected to the processor, and wherein the electric potential related parameter reflects a state of a first area of an object that was illuminated by a charged particle beam during the generation of the non-compensated Auger spectrum.
    Type: Grant
    Filed: October 23, 2007
    Date of Patent: March 22, 2011
    Assignee: Applied Materials Israel, Ltd.
    Inventors: Dror Shemesh, Yuri Shirman
  • Patent number: 7847267
    Abstract: A system and method for multi detector detection of electrons, the method includes the steps of directing a primary electron beam, through a column, to interact with an inspected object, directing, by introducing a substantial electrostatic field, electrons reflected or scattered from the inspected objects towards multiple interior detectors, whereas at least some of the directed electrons are reflected or scattered at small angle in relation to the inspected object; and receiving detection signals from at least one interior detector.
    Type: Grant
    Filed: October 22, 2003
    Date of Patent: December 7, 2010
    Assignee: Applied Materials Israel, Ltd.
    Inventors: Dror Shemesh, Pavel Adamec
  • Patent number: 7842930
    Abstract: A charged particle detector assembly comprises a particle detector, which has at least one particle sensitive region for detecting at least a portion of the spatial distribution of charged particles and for generating a two-dimensional optical signal which correlates to the detected spatial distribution. Further, an image conduit has an input coupled to the particle sensitive region of the particle detector for transmitting the two-dimensional optical signal to at least one optical detector. Further, a selecting means is adapted for selecting at least a portion of the two-dimensional optical signal.
    Type: Grant
    Filed: October 24, 2007
    Date of Patent: November 30, 2010
    Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterpruftechnik mbH
    Inventors: Gilad Almogy, Dror Shemesh, Pavel Adamec
  • Patent number: 7838830
    Abstract: A charged particle beam apparatus is provided, which comprises a charged particle beam column for generating a primary charged particle beam; a focusing assembly, such as a charged particle lens, e.g., an electrostatic lens, for focusing the primary charged particle beam on a specimen; a detector for detecting charged signal particles which are emerging from the specimen; and a deflector arrangement for deflecting the primary charged particle beam. The deflector arrangement is arranged downstream of the focusing assembly and is adapted for allowing the charged signal particles passing therethrough. The detector is laterally displaced with respect to the optical axis in a deflection direction defined by the post-focusing deflector arrangement.
    Type: Grant
    Filed: October 24, 2007
    Date of Patent: November 23, 2010
    Assignee: ICT, Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
    Inventors: Juergen Frosien, Helmut Banzhof, Jacob Levin, Dror Shemesh
  • Patent number: 7683317
    Abstract: A method for detecting hidden defects and patterns, the method includes: receiving an object that comprises an opaque layer positioned above an intermediate layer; defining an energy band in response to at least one characteristic of the opaque layer and at least one characteristic of a scanning electron microscope; illuminating the object with a primary electron beam; and generating images from electrons that arrive to a spectrometer having an energy within the energy band.
    Type: Grant
    Filed: September 15, 2006
    Date of Patent: March 23, 2010
    Assignee: Applied Materials Israel, Ltd.
    Inventor: Dror Shemesh
  • Patent number: 7659506
    Abstract: A system and method for generating a thin sample, the method includes: milling an intermediate section of a thin sample such as to enable an upper portion of the thin sample to tilt in relation to a lower portion of the thin sample; wherein the lower portion is connected to a wafer from which the thin sample was formed. A system and method for inspecting a thin sample, the method includes: A method for inspecting a thin sample, the method comprising: illuminating, by a charged particle beam, a tilted upper portion of a thin sample that is connected, via a milled intermediate section, to a lower portion of the thin sample; wherein the lower portion is connected to a wafer from which the thin sample was formed; and collecting particles and photons resulting from the illumination.
    Type: Grant
    Filed: September 25, 2007
    Date of Patent: February 9, 2010
    Assignee: Applied Materials, Israel, Ltd.
    Inventors: Michal Avinun-Kalish, Jacob Levin, Dror Shemesh