Patents by Inventor Ebin Liao
Ebin Liao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9514986Abstract: A device including a first dielectric layer on a semiconductor substrate, a gate electrode formed in the first dielectric layer, and a through-substrate via (TSV) structure penetrating the first dielectric layer and extending into the semiconductor substrate. The TSV structure includes a conductive layer, a diffusion barrier layer surrounding the conductive layer and an isolation layer surrounding the diffusion barrier layer. A capping layer including cobalt is formed on the top surface of the conductive layer of the TSV structure.Type: GrantFiled: August 28, 2013Date of Patent: December 6, 2016Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Yung-Chi Lin, Yen-Hung Chen, Yin-Hua Chen, Ebin Liao, Ku-Feng Yang, Tsang-Jiuh Wu, Wen-Chih Chiou
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Publication number: 20160329245Abstract: A semiconductor component includes a semiconductor substrate having an opening A first dielectric liner having a first compressive stress is disposed in the opening. A second dielectric liner having a tensile stress is disposed on the first dielectric liner. A third dielectric liner having a second compressive stress disposed on the second dielectric liner.Type: ApplicationFiled: July 20, 2016Publication date: November 10, 2016Inventors: Chen-Hua YU, Cheng-Hung CHANG, Ebin LIAO, Chia-Lin YU, Hsiang-Yi WANG, Chun Hua CHANG, Li-Hsien HUANG, Darryl KUO, Tsang-Jiuh WU, Wen-Chih CHIOU
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Patent number: 9418923Abstract: A semiconductor component includes a semiconductor substrate having an opening A first dielectric liner having a first compressive stress is disposed in the opening. A second dielectric liner having a tensile stress is disposed on the first dielectric liner. A third dielectric liner having a second compressive stress disposed on the second dielectric liner.Type: GrantFiled: September 23, 2013Date of Patent: August 16, 2016Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chen-Hua Yu, Cheng-Hung Chang, Ebin Liao, Chia-Lin Yu, Hsiang-Yi Wang, Chun Hua Chang, Li-Hsien Huang, Darryl Kuo, Tsang-Jiuh Wu, Wen-Chih Chiou
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Patent number: 9263382Abstract: A structure includes a substrate, and an interconnect structure over the substrate. The structure further includes a through-substrate-via (TSV) extending through the interconnect structure and into the substrate, the TSV comprising a conductive material layer. The structure further includes a dielectric layer having a first portion over the interconnect structure and a second portion within the TSV, wherein the first portion and the second portion comprise a same material. The conductive material layer includes a first section separated from substrate by the second portion of the dielectric layer. The conductive material layer further includes a second section over a top surface of the second portion of the dielectric layer. The conductive material layer further includes a third section over the second section, wherein the third section has a width greater than a width of the second section.Type: GrantFiled: July 17, 2014Date of Patent: February 16, 2016Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Ku-Feng Yang, Tsang-Jiuh Wu, Yi-Hsiu Chen, Ebin Liao, Yuan-Hung Liu, Wen-Chih Chiou
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Patent number: 9087878Abstract: A method includes forming an opening extending from a top surface of a silicon substrate into the silicon substrate to a predetermined depth. The method further includes forming an insulation structure on the silicon substrate along the sidewalls and the bottom of the opening and forming a conductive layer on the insulation structure to fill the opening. A first interface between the insulation structure and the silicon substrate has an interface roughness with a peak-to-valley height less than 5 nm, and a second interface between the insulation structure and the conductive layer has an interface roughness with a peak-to-valley height less than 5 nm.Type: GrantFiled: August 6, 2013Date of Patent: July 21, 2015Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chen-Hua Yu, Wen-Chih Chiou, Ebin Liao, Tsang-Jiuh Wu
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Publication number: 20150162397Abstract: Semiconductor devices, methods of manufacture thereof, and capacitors are disclosed. In some embodiments, a semiconductor device includes a first capacitor and a protection device coupled in series with the first capacitor. A second capacitor is coupled in parallel with the first capacitor and the protection device.Type: ApplicationFiled: December 10, 2013Publication date: June 11, 2015Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Wen-Chih Chiou, Shin-Puu Jeng, Ebin Liao
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Publication number: 20150061147Abstract: A device including a first dielectric layer on a semiconductor substrate, a gate electrode formed in the first dielectric layer, and a through-substrate via (TSV) structure penetrating the first dielectric layer and extending into the semiconductor substrate. The TSV structure includes a conductive layer, a diffusion barrier layer surrounding the conductive layer and an isolation layer surrounding the diffusion barrier layer. A capping layer including cobalt is formed on the top surface of the conductive layer of the TSV structure.Type: ApplicationFiled: August 28, 2013Publication date: March 5, 2015Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Yung-Chi Lin, Yen-Hung Chen, Yin-Hua Chen, Ebin Liao, Ku-Feng Yang, Tsang-Jiuh Wu, Wen-Chih Chiou
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Publication number: 20140327151Abstract: A structure includes a substrate, and an interconnect structure over the substrate. The structure further includes a through-substrate-via (TSV) extending through the interconnect structure and into the substrate, the TSV comprising a conductive material layer. The structure further includes a dielectric layer having a first portion over the interconnect structure and a second portion within the TSV, wherein the first portion and the second portion comprise a same material. The conductive material layer includes a first section separated from substrate by the second portion of the dielectric layer. The conductive material layer further includes a second section over a top surface of the second portion of the dielectric layer. The conductive material layer further includes a third section over the second section, wherein the third section has a width greater than a width of the second section.Type: ApplicationFiled: July 17, 2014Publication date: November 6, 2014Inventors: Ku-Feng YANG, Tsang-Jiuh WU, Yi-Hsiu CHEN, Ebin LIAO, Yuan-Hung LIU, Wen-Chih CHIOU
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Patent number: 8803322Abstract: The embodiments of forming a through substrate via (TSV) structure described enable reducing risk of damaging gate structures due to over polishing of an inter-level dielectric layer (ILD) layer. The TSV structure with a wider opening near one end also enables better gapfill.Type: GrantFiled: October 13, 2011Date of Patent: August 12, 2014Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Ku-Feng Yang, Tsang-Jiuh Wu, Yi-Hsiu Chen, Ebin Liao, Yuan-Hung Liu, Wen-Chih Chiou
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Patent number: 8729695Abstract: In an embodiment, a wafer level package may be provided. The wafer level package may include a device wafer including a MEMS device, a cap wafer disposed over the device wafer, at least one first interconnect disposed between the device wafer and the cap wafer and configured to provide an electrical connection between the device wafer and the cap wafer, and a conformal sealing ring disposed between the device wafer and the cap wafer and configured to surround the at least one first interconnect and the MEMS device so as to provide a conformally sealed environment for the at least one first interconnect and the MEMS device, wherein the conformal sealing ring may be configured to conform to a respective suitable surface of the device wafer and the cap wafer when the device wafer may be bonded to the cap wafer. A method of forming a wafer level package may also be provided.Type: GrantFiled: September 25, 2009Date of Patent: May 20, 2014Assignees: Agency for Science, Technology and Research, Seiko Instruments, Inc.Inventors: Chirayarikathu Veedu Sankarapillai Premachandran, Rakesh Kumar, Nagarajan Ranganathan, Won Kyoung Choi, Ebin Liao, Yasuyuki Mitsuoka, Hiroshi Takahashi, Ryuta Mitsusue
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Publication number: 20140015146Abstract: A semiconductor component includes a semiconductor substrate having an opening A first dielectric liner having a first compressive stress is disposed in the opening. A second dielectric liner having a tensile stress is disposed on the first dielectric liner. A third dielectric liner having a second compressive stress disposed on the second dielectric liner.Type: ApplicationFiled: September 23, 2013Publication date: January 16, 2014Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chen-Hua YU, Cheng-Hung CHANG, Ebin LIAO, Chia-Lin YU, Hsiang-Yi WANG, Chun Hua CHANG, Li-Hsien HUANG, Darryl KUO, Tsang-Jiuh WU, Wen-Chih CHIOU
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Publication number: 20130323883Abstract: A method includes forming an opening extending from a top surface of a silicon substrate into the silicon substrate to a predetermined depth. The method further includes forming an insulation structure on the silicon substrate along the sidewalls and the bottom of the opening and forming a conductive layer on the insulation structure to fill the opening. A first interface between the insulation structure and the silicon substrate has an interface roughness with a peak-to-valley height less than 5 nm, and a second interface between the insulation structure and the conductive layer has an interface roughness with a peak-to-valley height less than 5 nm.Type: ApplicationFiled: August 6, 2013Publication date: December 5, 2013Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chen-Hua YU, Wen-Chih CHIOU, Ebin LIAO, Tsang-Jiuh WU
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Patent number: 8575725Abstract: A semiconductor component includes a semiconductor substrate having a top surface. An opening extends from the top surface into the semiconductor substrate. The opening includes an interior surface. A first dielectric liner having a first compressive stress is disposed on the interior surface of the opening. A second dielectric liner having a tensile stress is disposed on the first dielectric liner. A third dielectric liner having a second compressive stress disposed on the second dielectric liner. A metal barrier layer is disposed on the third dielectric liner. A conductive material is disposed on the metal barrier layer and fills the opening.Type: GrantFiled: March 13, 2013Date of Patent: November 5, 2013Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chen-Hua Yu, Cheng-Hung Chang, Ebin Liao, Chia-Lin Yu, Hsiang-Yi Wang, Chun Hua Chang, Li-Hsien Huang, Darryl Kuo, Tsang-Jiuh Wu, Wen-Chih Chiou
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Patent number: 8525343Abstract: A device with through-silicon via (TSV) and a method of forming the same includes the formation of an opening in a silicon substrate, the formation of a first insulation layer on the sidewalls and bottom of the opening, the formation of a second insulation layer on the sidewalls and bottom of the opening. A first interface between the first insulation layer and the silicon substrate has an interface roughness with a peak-to-valley height less than 5 nm. A second interface between the second insulation layer and the conductive layer has an interface roughness with a peak-to-valley height less than 5 nm.Type: GrantFiled: September 28, 2010Date of Patent: September 3, 2013Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chen-Hua Yu, Wen-Chih Chiou, Ebin Liao, Tsang-Jiuh Wu
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Patent number: 8487410Abstract: A semiconductor component includes a semiconductor substrate having a top surface. An opening extends from the top surface into the semiconductor substrate. The opening includes an interior surface. A first dielectric liner having a first compressive stress is disposed on the interior surface of the opening. A second dielectric liner having a tensile stress is disposed on the first dielectric liner. A third dielectric liner having a second compressive stress disposed on the second dielectric liner. A metal barrier layer is disposed on the third dielectric liner. A conductive material is disposed on the metal barrier layer and fills the opening.Type: GrantFiled: April 13, 2011Date of Patent: July 16, 2013Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chen-Hua Yu, Cheng-Hung Chang, Ebin Liao, Chia-Lin Yu, Hsiang-Yi Wang, Chun Hua Chang, Li-Hsien Huang, Darryl Kuo, Tsang-Jiuh Wu, Wen-Chih Chiou
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Publication number: 20130093098Abstract: The embodiments of forming a through substrate via (TSV) structure described enable reducing risk of damaging gate structures due to over polishing of an inter-level dielectric layer (ILD) layer. The TSV structure with a wider opening near one end also enables better gapfill.Type: ApplicationFiled: October 13, 2011Publication date: April 18, 2013Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Ku-Feng YANG, Tsang-Jiuh WU, Yi-Hsiu CHEN, Ebin LIAO, Yuan-Hung LIU, Wen-Chih CHIOU
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Publication number: 20130037603Abstract: In an embodiment, a method of forming a bonded structure is provided. The method may include forming at least one first under bump metallurgy (UBM) structure on a first substrate, forming a first gold layer on the at least one first under bump metallurgy structure; forming a tin layer on the first gold layer, forming an indium layer on the tin layer, forming an inhibition layer configured to inhibit oxygen penetration on the indium layer, and forming at least one second under bump metallurgy structure on a second substrate, forming s second gold layer on the at least one second under bump metallurgy structure; and bringing the inhibition layer into contact with the second gold layer at a predetermined temperature to form a resultant intermetallic structure between the first substrate and the second substrate thereby bonding the first substrate to the second substrate and forming the bonded structure.Type: ApplicationFiled: February 10, 2010Publication date: February 14, 2013Inventors: Won Kyoung Choi, Chiraharikathu Veedu Sankarapillai Premachandran, Ling Xie, Ebin Liao, Siong Chiew Joe Ong, Kewu Bai
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Publication number: 20130020713Abstract: In an embodiment, a wafer level package may be provided. The wafer level package may include a device wafer including a MEMS device, a cap wafer disposed over the device wafer, at least one first interconnect disposed between the device wafer and the cap wafer and configured to provide an electrical connection between the device wafer and the cap wafer, and a conformal sealing ring disposed between the device wafer and the cap wafer and configured to surround the at least one first interconnect and the MEMS device so as to provide a conformally sealed environment for the at least one first interconnect and the MEMS device, wherein the conformal sealing ring may be configured to conform to a respective suitable surface of the device wafer and the cap wafer when the device wafer may be bonded to the cap wafer. A method of forming a wafer level package may also be provided.Type: ApplicationFiled: September 25, 2009Publication date: January 24, 2013Inventors: Chirayarikathu Veedu Sankarapillai Premachandran, Rakesh Kumar, Nagarajan Ranganathan, Won Kyoung Choi, Ebin Liao, Yasuyuki Mitsuoka, Hiroshi Takahashi, Ryuta Mitsusue
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Publication number: 20120261827Abstract: A semiconductor component includes a semiconductor substrate having a top surface. An opening extends from the top surface into the semiconductor substrate. The opening includes an interior surface. A first dielectric liner having a first compressive stress is disposed on the interior surface of the opening. A second dielectric liner having a tensile stress is disposed on the first dielectric liner. A third dielectric liner having a second compressive stress disposed on the second dielectric liner. A metal barrier layer is disposed on the third dielectric liner. A conductive material is disposed on the metal barrier layer and fills the opening.Type: ApplicationFiled: April 13, 2011Publication date: October 18, 2012Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chen-Hua YU, Cheng-Hung CHANG, Ebin LIAO, Chia-Lin YU, Hsiang-Yi WANG, Chun Hua CHANG, Li-Hsien HUANG, Darryl KUO, Tsang-Jiuh WU, Wen-Chih CHIOU
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Publication number: 20120074582Abstract: A device with through-silicon via (TSV) and a method of forming the same includes the formation of an opening in a silicon substrate, the formation of a first insulation layer on the sidewalls and bottom of the opening, the formation of a second insulation layer on the sidewalls and bottom of the opening. A first interface between the first insulation layer and the silicon substrate has an interface roughness with a peak-to-valley height less than 5 nm. A second interface between the second insulation layer and the conductive layer has an interface roughness with a peak-to-valley height less than 5 nm.Type: ApplicationFiled: September 28, 2010Publication date: March 29, 2012Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chen-Hua YU, Wen-Chih CHIOU, Ebin LIAO, Tsang-Jiuh WU