Abstract: The present invention relates to a doped semiconductor nanocrystal layer comprising (a) a group IV oxide layer which is free of ion implantation damage, (b) from 30 to 50 atomic percent of a semiconductor nanocrystal distributed in the group IV oxide layer, and (c) from 0.5 to 15 atomic percent of one or more rare earth element, the one or more rare earth element being (i) dispersed on the surface of the semiconductor nanocrystal and (ii) distributed substantially equally through the thickness of the group IV oxide layer. The present invention also relates to a semiconductor structure comprising the above semiconductor nanocrystal layer and to processes for preparing the semiconductor nanocrystal layer.

Abstract: A photographically useful high bromide tabular grain silver halide emulsion is disclosed in which iodide is incorporated in a tabular grain central region to lower contrast and in a peripheral region zone to increase photoefficiency. A further increase in photoefficiency is provided by an annular spacer region interposed between the central region and peripheral region zone having a lower iodide content than either.

Abstract: A SCSI computer system is provided whereby a host computer gains access to a targeted but non-local peripheral device, which device or devices are individually responsive to either SCSI or non-SCSI commands, by sending SCSI commands via a SCSI bus to a connected SCSI target computer which emulates the targeted peripheral device local to the SCSI target computer, whether the targeted peripheral device is responsive to only SCSI or only non-SCSI commands, to cause the targeted peripheral device to carry out the initial SCSI commands.

Abstract: Radiation-sensitive emulsions are disclosed comprised of high bromide tabular grains containing a peripheral band of increased iodide concentration. The tabular grains exhibit an average equivalent circular diameter of at least 2.0 .mu.m and are of a face centered cubic crystal lattice structure of the rock salt type. The tabular grains include central and peripheral regions extending between their major faces. The peripheral region is up to 0.2 .mu.m in width and contains an iodide concentration at least 2 mole percent higher than that of the central region measured at a location adjacent the peripheral region. Dislocations are present in the peripheral region to increase sensitivity and are minimized in the central region to maintain relatively constant sensitivities when pressure is applied locally.

Abstract: A photographic emulsion is disclosed in which radiation-sensitive silver halide grains are present containing (a) a continuous silver halide phase of a face centered cubic rock salt crystal lattice structure and (b) a discontinuous phase in the form of discrete islands separated by and surrounded by the continuous phase, each of the islands exhibiting a silver iodide crystal lattice structure.

Abstract: An emulsion of enhanced photographic sensitivity and reduced contrast is disclosed containing high bromide tabular grains having a non-uniform iodide distribution, including (a) a peripheral zone extending inwardly from edges and corners of the tabular grains and providing (i) a maximum iodide concentration along the edges and (ii) a lower iodide concentration at the corners than elsewhere along the edges, (b) a central zone providing a minimum iodide concentration and accounting for at least 35 percent of total silver forming the tabular grains and, (c) extending from the central zone to the peripheral zone, an intermediate zone (i) containing a higher iodide concentration than the central zone, ranging from greater than 2 to 10 mole percent, based on silver forming the intermediate zone, and (ii) accounting for from 5 to 35 percent of total silver forming the tabular grains.

Abstract: The present invention provides a process for preparing a sulphoxonium salt from the corresponding sulphonium salt which comprises oxidising the sulphonium salt using a peracid, under basic conditions, in a solvent other than a ketone.Some of the sulphoxonium salts are new compounds.

Abstract: A data-carrying laminate such as a credit card or identity card comprises a sheet of cellulosic material or synthetic material and a thermoplastic polymeric film, at least one of said sheet and said thermoplastic film carrying data, said sheet and said thermoplastic film being bonded together by a cured adhesive layer obtained by curing a solid film adhesive comprising (A) a solid polymer of a vinyl carboxylic acid and (B) a curable material having at least one acrylate or methacrylate group.

Abstract: A security card comprises a data-carrying sheet having a gelatin layer thereon and a transparent polymeric film having a gelatin layer thereon, said sheet and said film being bonded together by an adhesive composition polymerized between and in contact with the gelatin layers, the adhesive composition comprising a carboxylic acid having at least one polymerizable acrylic group.

Abstract: Images are formed by the following process:(i) a substrate is treated with a layer of a liquid composition comprising(A) a residue that is polymerizable by means of free radicals, such as an acrylic ester,(B) a radiation-activated polymerization initiator for (A), such as a metallocene or a mixture of a Group IVA organometallic compound with a photoreducible dye.

Abstract: The present invention provides a method for making a metallic pattern on a substrate having a surface comprising bare metal in predetermined areas and metal coated by a resist in remaining areas which comprises (i) protecting the bare metal by coating with a film-forming resin, (ii) removing any film-forming resin from the resist, (iii) removing the resist from said remaining areas using a solvent which will not remove the film-forming resin, thereby exposing metal in said remaining areas, (iv) etching the metal exposed in (iii) using an etchant which does not remove the film-forming resin and (v) removing the film-forming resin with a suitable solvent.

Abstract: Monethylenically unsaturated compounds whose polymers are useful as polymeric photoinitiators are of formula Ar.sup.1 COC(R.sup.1)(R.sup.2)R.sup.3 where R.sup.1 is C.sub.1 -C.sub.10 alkyl or alkoxy, R.sup.2 is C.sub.1 -C.sub.10 alkyl, --X--O--R.sup.4 --OCOC(R.sup.5).dbd.CH.sub.2 (II) --X--NH--R.sup.6 --OCOC(R.sup.5).dbd.CH.sub.2 (III), or --CH.sub.2 [OCH.sub.2 CH(OH)CH.sub.2 ].sub.a OCOC(R.sup.5).dbd.CH.sub.2 (IIIA) or R.sup.1 and R.sup.2, together with the attached carbon, denote C.sub.4 -C.sub.8 cycloalkyl, R.sup.3 is a C.sub.6 -C.sub.20 aromatic group, OH, tert.amino, --OCOC(R.sup.5).dbd.CH.sub.2 (VI) or --OCH.sub.2 CH(OH)CH.sub.2 OCOC(R.sup.5).dbd.CH.sub.2 (VIA), R.sup.4 is C.sub.1 -C.sub.4 alkylene, which may be substituted by --OH or by C.sub.2 -C.sub.20 acyloxy, R.sup.5 is H or C.sub.1 -C.sub.4 alkyl, R.sup.6 is C.sub.1 to C.sub.4 alkylene, X is a group of formula R.sup.7 CO-- or ##STR1## where R.sup.7 is C.sub.1 -C.sub.4 alkylene, R.sup.8 is C.sub.1 to C.sub.4 alkyl, and is 0 or 1, Ar.sup.1 is a C.

Abstract: A method of making a pattern on an electrically conductive material such as a printed circuit comprises(i) electrodepositing on an electrically conductive surface a film of an organic polymer having, per average molecule, more than one reactive functional group,(ii) forming on the electrodeposited film a predetermined pattern of a heat-curable resist having, per average molecule, more than one group reactive with the reactive groups in the electrodeposited film on heating, thereby leaving predetermined areas of the electrodeposited film uncovered,(iii) removing the uncovered areas of the electrodeposited film by treatment with a solvent therefor, thereby forming a surface comprising bare conductive material in predetermined areas and, in other predetermined areas, conductive material coated by areas of the electrodeposited film covered by the resist, and(iv) heating to complete adhesion of the resist to the electrically conductive surface through the areas of the electrodeposited film covered by the resist,st

Abstract: A process for the formation of an image comprises(i) electrodepositing on a conductive surface a photosensitive film from an aqueous composition which is a solution or dispersion comprising a mixture of (A) a photosensitive o-quinone diazide such as an o-naphthoquinone diazide sulfonyl ester of a phenol, and (B) an electrodepositable film-forming resin such as a reaction product of a novolak resin, formaldehyde and diethanolamine in (C) an aqueous medium, the composition being substantially free from a resin having both a quinone diazide residue and a carboxyl, phosphonic or sulfonic acid group or amino group in the same molecule,(ii) subjecting the electrodeposited film to radiation in a predetermined pattern, such that exposed areas of the film become more soluble in aqueous base than unexposed areas, and(iii) removing the exposed areas by treatment with an aqueous base.The process is useful in the production of printing plates and printed circuits.

Abstract: Imides of the formula I ##STR1## In which R.sub.1, R.sub.2 and R.sub.4 independently of one another are hydrogen or methyl, R.sub.3 is a direct bond or a C.sub.2 -C.sub.20 aliphatic radical which can be interrupted by O atoms or a mononuclear or polynuclear C.sub.5 -C.sub.20 cycloaliphatic or C.sub.6 -C.sub.20 aromatic radical or is a group of the formula II ##STR2## in which T is methylene, isopropylidene, CO, O, S or SO.sub.2 and R.sub.5 is hydrogen or phenyl, can be crosslinked either photochemically or by heat and produce polymers having excellent properties, in particular a very high resistance to heat. They are particularly suitable for the production of heat-resistant photolithographs or as matrix resins for the production of composite materials.

Abstract: A method of making a pattern of an electrically conductive material which comprises(i) electrodepositing on an electrically conductive surface a film comprising a photocurable organic resin,(ii) forming on the electrodeposited film a predetermined pattern of a resist co-cured with with underlying areas of the electrodeposited film by exposure to actinic radiation, thereby leaving predetermined areas of the electrodeposited film uncovered, and(iii) removing the uncovered areas of the electrodeposited film by treatment with a solvent therefor, thereby forming a surface comprising bare conductive material in predetermined areas and, in other predetermined areas, photocured resist securely bonded to the electrically conductive surface through the cured areas of the electrodeposited film covered by the resist.The method is useful in the production of printed circuits.

Abstract: Metallic patterns, such as printed circuits, are prepared by immersing metal substrates, bearing electrodeposited films and resist films in patterned areas, into an aqueous solution or dispersion of a hardening agent so that the hardening agent diffuses only into the electrodeposited film. This is followed by curing the hardening agent by heat or irradiation to render it resistant to the solvent used to remove the resist film and to the etchant solution for the metal exposed when the resist film is removed.

Abstract: A process for the formation of an image comprises(i) electrodepositing on a conductive surface a layer of a quinone diazide positive photoresist,(ii) subjecting the layer to radiation in a predetermined pattern,(iii) heating the layer such that areas thereof exposed in stage (ii) are rendered insoluble in an aqueous base developer,(iv) subjecting the layer to radiation such that the areas not exposed in stage (ii) are rendered more soluble in an aqueous base developer than the areas rendered insoluble in stage (iii) and(v) removing the areas not exposed in stage (ii) by treatment with an aqueous base developer.The process is useful in the production of printing plates and printed circuits.

Abstract: A process for the formation of an image comprises(i) applying to a substrate a layer of a liquid composition which comprises(A) a polymerizable material having, on average, more than one polymerizable acrylic group per molecule,(B) a first radiation-activated polymerization initiator for (A) and(C) a second radiation-activated polymerization initiator for (A), the initiator (B) being activatable by radiation of longer wavelength than that of radiation by which (C) is activatable,the composition being substantially free from polymerizable epoxide or vinyl ether groups when (B) or (C) is an aromatic onium salt,(ii) subjecting the composition to radiation having a wavelength at which one of (B) and (C) is activated but the other is not substantially activated, thereby polymerizing (A) such that the layer of liquid composition is solidified but remains curable,(iii) subjecting the solidified layer in a predetermined pattern to radiation having a wavelength at which the initiator not activated in stage (ii) is act

Abstract: Monoethylenically unsaturated compounds whose polymers are useful as polymeric photoinitiators are of formula Ar.sup.1 COC(R.sup.1)(R.sup.2)R.sup.3 where R.sup.1 is (C.sub.1 -C.sub.10 alkyl or alkoxy, R.sup.2 is C.sub.1 -C.sub.10 alkyl, --X--O--R.sup.4 -OCOC(R.sup.5).dbd.CH.sub.2 (II) --X--NH--R.sup.6 --OCOC(R.sup.5).dbd.CH.sub.2 (III), or --CH.sub.2 [OCH.sub.2 CH(OH)CH.sub.2 ].sub.a OCOC(R.sup.5).dbd.CH.sub.2 (IIIA) or R.sup.1 and R.sup.2, together with the attached carbon, denote C.sub.4 -C.sub.8 cycloalkyl, R.sup.3 is a C.sub.6 -C.sub.20 aromatic group, OH tert. amino,--OCOC(R.sup.5).dbd.CH.sub.2 (VI) or --OCH.sub.2 CH(OH)CH.sub.2 OCOC(R.sup.5).dbd.CH.sub.2 (VIA), R.sup.4 is C.sub.1 14 C.sub.4 alkylene, which may be substituted by --OH or by C.sub.2 -C.sub.20 acyloxy, R.sup.5 is H or C.sub.1 -C.sub.4 alkyl, R.sup.6 is C.sub.1 to C.sub.4 alkylene, X is a group of formula R.sup.7 CO-- or ##STR1## where R.sup.7 is C.sub.1 -C.sub.4 alkylene, R.sup.8 is C.sub.1 to C.sub.4 alkyl, and is 0 or 1, Ar.sup.1 is a C.