Patents by Inventor Eiichi Kobayashi

Eiichi Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6729764
    Abstract: A metal bearing liner is formed by deep drawing press process sequentially subjecting a progressive sheet material (roll material) to a plurality of press processes. This makes it possible to form a metal bearing liner by a press work instead of a cutting work that has been conventionally employed while maintaining a requisite accuracy such as roundness and cylindricality thereby remarkably reducing the manufacturing cost of the metal bearing line thereby.
    Type: Grant
    Filed: November 13, 2001
    Date of Patent: May 4, 2004
    Assignee: Minebea Co., Ltd.
    Inventors: Eiichi Kobayashi, Kazunori Sawayama, Kaoru Matsumoto
  • Publication number: 20040063024
    Abstract: Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation and/or possibly other radiation and are developable to form resist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing imaging polymer component comprising an acid-sensitive polymer having a monomeric unit with a pendant group containing a remote acid labile moiety.
    Type: Application
    Filed: September 30, 2002
    Publication date: April 1, 2004
    Applicants: International Business Machines Corporation, JSR Corporation
    Inventors: Mahmoud H. Khojasteh, Kuang-Jung Chen, Pushkara Rao Varanasi, Yukio Nishimura, Eiichi Kobayashi
  • Publication number: 20040041635
    Abstract: In a parallel multistage band-pass filter, a transmission line having an electrical length substantially equal to half (&lgr;/2) of the wavelength of the transmission signal is incorporated between the port on the input terminal side of the odd number (2n−1)th resonator numbered from the input terminal side and the port on the input terminal side of the even number (2n)th resonator numbered from the input terminal side; and a transmission line having an electrical length substantially equal to &lgr;/2 is incorporated between the port on the output terminal side of the even number (2n)th resonator numbered from the input terminal side and the port on the output terminal side of the odd number (2n+1)th resonator numbered from the input terminal side. Moreover, a transmission line for adjustment of a transmission phase between the input terminal and the output terminal is incorporated between the first resonator numbered from the output terminal side and the output terminal.
    Type: Application
    Filed: August 26, 2003
    Publication date: March 4, 2004
    Inventors: Yasushi Sano, Eiichi Kobayashi, Shingo Okajima, Jun Hattori
  • Patent number: 6677419
    Abstract: A scaleable and high-yielding method of preparing copolymers that is useful as a component of a radiation sensitive resin composition is provided. The method includes the step of reacting at least one monomer A which is an unsaturated alicyclic monomer and forms a polymer main chain by dissociation of the unsaturated bond, and at least one unsaturated monomer B, which also forms a polymer chain by dissociation of an unsaturated bond, wherein less than two electron-withdrawing groups are directly appended to said unsaturation, and where said monomer B is other than the unsaturated alicyclic monomer and forms a polymer main chain, in the presence of a free radical initiator. The reacting step is carried out in a stoichiometric excess of monomer A as compared to monomer B. By carrying out the reacting step in an excess of monomer A as compared to monomer B, the resultant copolymer will have a greater molar concentration of monomer A than is obtainable using other methods.
    Type: Grant
    Filed: November 13, 2002
    Date of Patent: January 13, 2004
    Assignees: International Business Machines Corporation, JSR Corporation
    Inventors: Phillip J. Brock, Eiichi Kobayashi, Isao Nishimura, Yukio Nishimura, Thomas I. Wallow, Masafumi Yamamoto
  • Publication number: 20030219680
    Abstract: A radiation-sensitive resin composition suitable as a chemically-amplified resist is provided. The composition comprised (A) a resin insoluble or scarcely soluble in alkali, but becoming alkali soluble by the action of an acid, and (B) a photoacid generator.
    Type: Application
    Filed: May 2, 2003
    Publication date: November 27, 2003
    Inventors: Yukio Nishimura, Hiroyuki Ishii, Isao Nishimura, Eiichi Kobayashi
  • Patent number: 6554766
    Abstract: An endoscope device includes an inserting portion having a curving portion, electric motors for generating driving forces for curving the curving portion, an operation unit for controlling the drive of the electric motors, a universal cord the base end of which is connected to an endoscope external unit, a coupling member with which the respective one ends of the inserting portion and the universal cord are coupled and which has a treatment tool inserting port, a holding unit for holding the coupling member, and a holding member for disposing the holding unit at a predetermined position of an operation bed. According to this arrangement, the operability of a surgeon can be improved by improving not only a curving operability but also the insertion operability of an inserting portion and the operability of a treatment tool.
    Type: Grant
    Filed: May 18, 2001
    Date of Patent: April 29, 2003
    Assignee: Olympus Optical Co., Ltd.
    Inventors: Toshinari Maeda, Hitoshi Mizuno, Yuta Okada, Eiichi Kobayashi, Toshimasa Kawai, Yuichi Ikeda
  • Patent number: 6540286
    Abstract: According to a body structure of the present invention, a floor panel member is reinforced by a pair of first members, and the second member comprised of plural pipes is disposed along the width of a vehicle so as to integrate the first members. An end of the second member is extended along the longitudinal side of the vehicle and is fixed by welding in the state of penetrating into a side sill. There is no necessity of providing any reinforcement material because the second member has a high strength continuously along the width of the vehicle. Moreover, there is no necessity of increasing a board thickness for the purpose of securing the rigidity because the second member penetrates into the side sill. On the other hand, the second member can be manufactured by cutting an existing steel pipe to a predetermined side. It is therefore possible to cope with the change in the width of the vehicle only by changing a cutting size.
    Type: Grant
    Filed: February 22, 2001
    Date of Patent: April 1, 2003
    Assignees: Mitsubishi Jidosha Kogyo Kabushiki Kaisha, Mitsubishi Jidosha Engineering Kabushiki Kaisha
    Inventors: Yorito Takemoto, Kunio Takaoka, Toshiaki Sakurai, Hiroyuki Nagura, Eiichi Kobayashi, Masataka Miura
  • Patent number: 6517992
    Abstract: An N-sulfonyloxyimide compound having the formula (1): wherein X represents a single bond or a double bond, Y and Z represent a hydrogen atom or others and may combine to form a cyclic structure; and R is a group having the formula (2): wherein X1 represents an organic group having an ester linkage, R1 represents an alkyl group or an alkoxyl group; and m is an integer of 1 to 11 and n is an integer of 0 to 10, satisfying m+n≦11; and chemically amplified positive and negative radiation-sensitive resin compositions using the compound are provided. The N-sulfonyloxyimide compound is a good radiation-sensitive acid-generating agent, has no problem of volatilization or side reaction, can keep dark reaction from taking place during the storage. The compound is useful as a component of radiation-sensitive chemically amplified resists.
    Type: Grant
    Filed: November 8, 2000
    Date of Patent: February 11, 2003
    Assignee: JSR Corporation
    Inventors: Yong Wang, Eiichi Kobayashi, Masaaki Miyaji, Jun Numata, Tsutomu Shimokawa
  • Patent number: 6506537
    Abstract: A positive-type radiation-sensitive resin composition is provided. The composition includes: (A) a low-molecular compound comprising a compound having at least one amino group having one or two hydrogen atom(s) bonded to the nitrogen atom; at least one hydrogen atom the amino group has having been substituted with a t-butoxycarbonyl group; (B) a radiation-sensitive acid generator; and (C) a silicon-atom-containing resin comprising an alkali-insoluble or alkali-slightly-soluble resin having been protected with an acid-cleavable group; the resin being capable of turning soluble in alkali upon cleavage of the acid-cleavable group. This radiation-sensitive resin composition is effectively responsive to radiations of various types, has superior sensitivity and resolution and also a superior long-term storage stability, and is useful as a positive-type chemically amplified resist.
    Type: Grant
    Filed: June 12, 2001
    Date of Patent: January 14, 2003
    Assignee: JSR Corporation
    Inventors: Eiichi Kobayashi, Jun Numata, Mikio Yamachika, Masafumi Yamamoto
  • Publication number: 20020192593
    Abstract: A radiation-sensitive resin composition comprising (A) a compound of the following formula (1), 1
    Type: Application
    Filed: April 26, 2002
    Publication date: December 19, 2002
    Inventors: Tomoki Nagai, Jun Numata, Eiichi Kobayashi, Tsutomu Shimokawa
  • Patent number: 6493408
    Abstract: For restraining jitter amount of a transmission clock signal (16) generated by a digital PLL (8), a data transmission apparatus comprises a {fraction (1/24)} clock generator (6) for dividing frequency of a receiving clock signal (4), a clock multiplier (7) for generating a reference frequency signal (18) by multiplying frequency of the output of the {fraction (1/24)} clock generator (6), and a control unit (28) for controlling a frequency multiplying ratio of the clock multiplier (7) and controlling a frequency dividing ratio of a frequency divider provided in the digital PLL (8). According to jitter amount detected by a jitter detection signal generator (19), the frequency of the reference clock signal (18) is selected among {fraction (1/12)}, ⅛ and ⅙ of the frequency of the receiving clock signal.
    Type: Grant
    Filed: November 18, 1999
    Date of Patent: December 10, 2002
    Assignee: NEC Corporation
    Inventor: Eiichi Kobayashi
  • Publication number: 20020172885
    Abstract: A carbazole derivative of the following formula (1), 1
    Type: Application
    Filed: March 5, 2002
    Publication date: November 21, 2002
    Inventors: Tomoki Nagai, Jun Numata, Shirou Kusumoto, Eiichi Kobayashi
  • Patent number: 6465150
    Abstract: A radiation-sensitive resin composition exhibiting high sensitivity to various types of radiation and capable of forming a minute pattern with sufficient resolution and depth of field and small surface roughness in various types of patterns such as a dense line pattern, isolated line pattern, or contact holes, particularly in line-type patterns. The resin composition comprises (A) an aromatic sulfonic acid onium salt compound consisting of a 2,4-difluorobenzenesulfonic acid anion, 4-trifluoromethylbenzenesulfonic acid anion, or 2-trifluoromethylbenzenesulfonic acid anion, and an onium cation of sulfur or iodonium, and (B) a copolymer represented by a 4-hydroxystyrene/4-t-butoxystyrene copolymer and a 4-hydroxystyrene/4-(1′-ethoxyethoxy)styrene copolymer.
    Type: Grant
    Filed: October 12, 2000
    Date of Patent: October 15, 2002
    Assignee: JSR Corporation
    Inventors: Jun Numata, Shirou Kusumoto, Eiichi Kobayashi
  • Publication number: 20020103418
    Abstract: An endoscope device includes an inserting portion having a curving portion, electric motors for generating driving forces for curving the curving portion, an operation unit for controlling the drive of the electric motors, a universal cord the base end of which is connected to an endoscope external unit, a coupling member with which the respective one ends of the inserting portion and the universal cord are coupled and which has a treatment tool inserting port, a holding unit for holding the coupling member, and a holding member for disposing the holding unit at a predetermined position of an operation bed. According to this arrangement, the operability of a surgeon can be improved by improving not only a curving operability but also the insertion operability of an inserting portion and the operability of a treatment tool.
    Type: Application
    Filed: May 18, 2001
    Publication date: August 1, 2002
    Applicant: OLYMPUS OPTICAL CO., LTD.
    Inventors: Toshinari Maeda, Hitoshi Mizuno, Yuta Okada, Eiichi Kobayashi, Toshimasa Kawai, Yuichi Ikeda
  • Patent number: 6420978
    Abstract: An object of the present invention is to provide a power generation system and a fuel supply method which are suitable for isolated areas; in order to attain this object, a power generation system comprising an electric power generation facility which is arranged on an isolated area, generates electric power using energy source obtainable on an isolated area, and supplies the electric power to the isolated area and a fuel supply method comprising the steps of: moving a fuel production device between a plurality of isolated areas; producing fuel on the isolated area from the fuel material obtainable on the isolated area; and supplying the fuel to the electric power generation facility are provided.
    Type: Grant
    Filed: October 17, 2000
    Date of Patent: July 16, 2002
    Assignee: Mitsubishi Heavy Industries, Ltd
    Inventors: Osamu Shinada, Akira Yamada, Katsuhiko Shinoda, Eiichi Kobayashi, Shinji Arinaga
  • Publication number: 20020090569
    Abstract: A radiation-sensitive resin composition comprising (A) a photoacid generator such as 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate or 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate and (B) a resin having an acetal structure typified by a poly(p-hydroxystyrene) resin in which a part of hydrogen atoms of phenolic hydroxyl groups have been replaced by 1-ethoxyethyl groups, 1-ethoxyethyl groups and t-butoxycarbonyl groups, or 1-ethoxyethyl groups and t-butyl groups. The resin composition is sensitive to deep ultraviolet rays and charged particles such as electron beams, exhibits excellent resolution performance and pattern shape-forming capability, and suppresses a nano-edge roughness phenomenon to a minimal extent.
    Type: Application
    Filed: November 16, 2001
    Publication date: July 11, 2002
    Inventors: Aki Suzuki, Makoto Murata, Hiromichi Hara, Eiichi Kobayashi
  • Patent number: 6403288
    Abstract: A method of forming a resist pattern from a chemically amplified positive radiation sensitive resin composition. The film thickness of an unexposed portion of a resist film formed from the chemically amplified positive radiation sensitive resin composition after wet development is 100 to 400 Å smaller than that before wet development. Alternatively, a resist film formed from the chemically amplified positive radiation sensitive resin composition is wet developed at both a temperature and a time enough to ensure that the film thickness of an unexposed portion of the resist film after wet development is 100 to 400 Å smaller than that before wet development. A resist film which is formed from a chemically amplified positive radiation sensitive resin composition and experiences a 100 to 400 Å reduction in the film thickness of an unexposed portion by wet development is useful as a resist film for forming a resist pattern.
    Type: Grant
    Filed: March 7, 2000
    Date of Patent: June 11, 2002
    Assignee: JSR Corporation
    Inventors: Yukio Nishimura, Toshiyuki Kai, Eiichi Kobayashi, Takeo Shioya
  • Publication number: 20020061145
    Abstract: A metal bearing liner is formed by deep drawing press process sequentially subjecting a progressive sheet material (roll material) to a plurality of press processes. This makes it possible to form a metal bearing liner by a press work instead of a cutting work that has been conventionally employed while maintaining a requisite accuracy such as roundness and cylindricality thereby remarkably reducing the manufacturing cost of the metal bearing line thereby.
    Type: Application
    Filed: November 13, 2001
    Publication date: May 23, 2002
    Applicant: MINEBEA CO., LTD.
    Inventors: Eiichi Kobayashi, Kazunori Sawayama, Kaoru Matsumoto
  • Publication number: 20020012872
    Abstract: A positive-type radiation-sensitive resin composition is provided.
    Type: Application
    Filed: June 12, 2001
    Publication date: January 31, 2002
    Inventors: Eiichi Kobayashi, Jun Numata, Mikio Yamachika, Masafumi Yamamoto
  • Patent number: 6337171
    Abstract: A radiation-sensitive resin composition comprising (A) resin which comprises a recurring unit (1) shown by the following formula (1) and either or both of a recurring unit (2) shown by the following formula (2) and a recurring unit (3) shown by the following formula (3), and (B) a photoacid generator shown by the following formula (4).
    Type: Grant
    Filed: November 8, 1999
    Date of Patent: January 8, 2002
    Assignee: JSR Corporation
    Inventors: Eiichi Kobayashi, Yukio Nishimura, Takeo Shioya