Patents by Inventor Eiichi Kobayashi
Eiichi Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6729764Abstract: A metal bearing liner is formed by deep drawing press process sequentially subjecting a progressive sheet material (roll material) to a plurality of press processes. This makes it possible to form a metal bearing liner by a press work instead of a cutting work that has been conventionally employed while maintaining a requisite accuracy such as roundness and cylindricality thereby remarkably reducing the manufacturing cost of the metal bearing line thereby.Type: GrantFiled: November 13, 2001Date of Patent: May 4, 2004Assignee: Minebea Co., Ltd.Inventors: Eiichi Kobayashi, Kazunori Sawayama, Kaoru Matsumoto
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Publication number: 20040063024Abstract: Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation and/or possibly other radiation and are developable to form resist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing imaging polymer component comprising an acid-sensitive polymer having a monomeric unit with a pendant group containing a remote acid labile moiety.Type: ApplicationFiled: September 30, 2002Publication date: April 1, 2004Applicants: International Business Machines Corporation, JSR CorporationInventors: Mahmoud H. Khojasteh, Kuang-Jung Chen, Pushkara Rao Varanasi, Yukio Nishimura, Eiichi Kobayashi
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Publication number: 20040041635Abstract: In a parallel multistage band-pass filter, a transmission line having an electrical length substantially equal to half (&lgr;/2) of the wavelength of the transmission signal is incorporated between the port on the input terminal side of the odd number (2n−1)th resonator numbered from the input terminal side and the port on the input terminal side of the even number (2n)th resonator numbered from the input terminal side; and a transmission line having an electrical length substantially equal to &lgr;/2 is incorporated between the port on the output terminal side of the even number (2n)th resonator numbered from the input terminal side and the port on the output terminal side of the odd number (2n+1)th resonator numbered from the input terminal side. Moreover, a transmission line for adjustment of a transmission phase between the input terminal and the output terminal is incorporated between the first resonator numbered from the output terminal side and the output terminal.Type: ApplicationFiled: August 26, 2003Publication date: March 4, 2004Inventors: Yasushi Sano, Eiichi Kobayashi, Shingo Okajima, Jun Hattori
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Patent number: 6677419Abstract: A scaleable and high-yielding method of preparing copolymers that is useful as a component of a radiation sensitive resin composition is provided. The method includes the step of reacting at least one monomer A which is an unsaturated alicyclic monomer and forms a polymer main chain by dissociation of the unsaturated bond, and at least one unsaturated monomer B, which also forms a polymer chain by dissociation of an unsaturated bond, wherein less than two electron-withdrawing groups are directly appended to said unsaturation, and where said monomer B is other than the unsaturated alicyclic monomer and forms a polymer main chain, in the presence of a free radical initiator. The reacting step is carried out in a stoichiometric excess of monomer A as compared to monomer B. By carrying out the reacting step in an excess of monomer A as compared to monomer B, the resultant copolymer will have a greater molar concentration of monomer A than is obtainable using other methods.Type: GrantFiled: November 13, 2002Date of Patent: January 13, 2004Assignees: International Business Machines Corporation, JSR CorporationInventors: Phillip J. Brock, Eiichi Kobayashi, Isao Nishimura, Yukio Nishimura, Thomas I. Wallow, Masafumi Yamamoto
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Publication number: 20030219680Abstract: A radiation-sensitive resin composition suitable as a chemically-amplified resist is provided. The composition comprised (A) a resin insoluble or scarcely soluble in alkali, but becoming alkali soluble by the action of an acid, and (B) a photoacid generator.Type: ApplicationFiled: May 2, 2003Publication date: November 27, 2003Inventors: Yukio Nishimura, Hiroyuki Ishii, Isao Nishimura, Eiichi Kobayashi
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Patent number: 6554766Abstract: An endoscope device includes an inserting portion having a curving portion, electric motors for generating driving forces for curving the curving portion, an operation unit for controlling the drive of the electric motors, a universal cord the base end of which is connected to an endoscope external unit, a coupling member with which the respective one ends of the inserting portion and the universal cord are coupled and which has a treatment tool inserting port, a holding unit for holding the coupling member, and a holding member for disposing the holding unit at a predetermined position of an operation bed. According to this arrangement, the operability of a surgeon can be improved by improving not only a curving operability but also the insertion operability of an inserting portion and the operability of a treatment tool.Type: GrantFiled: May 18, 2001Date of Patent: April 29, 2003Assignee: Olympus Optical Co., Ltd.Inventors: Toshinari Maeda, Hitoshi Mizuno, Yuta Okada, Eiichi Kobayashi, Toshimasa Kawai, Yuichi Ikeda
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Patent number: 6540286Abstract: According to a body structure of the present invention, a floor panel member is reinforced by a pair of first members, and the second member comprised of plural pipes is disposed along the width of a vehicle so as to integrate the first members. An end of the second member is extended along the longitudinal side of the vehicle and is fixed by welding in the state of penetrating into a side sill. There is no necessity of providing any reinforcement material because the second member has a high strength continuously along the width of the vehicle. Moreover, there is no necessity of increasing a board thickness for the purpose of securing the rigidity because the second member penetrates into the side sill. On the other hand, the second member can be manufactured by cutting an existing steel pipe to a predetermined side. It is therefore possible to cope with the change in the width of the vehicle only by changing a cutting size.Type: GrantFiled: February 22, 2001Date of Patent: April 1, 2003Assignees: Mitsubishi Jidosha Kogyo Kabushiki Kaisha, Mitsubishi Jidosha Engineering Kabushiki KaishaInventors: Yorito Takemoto, Kunio Takaoka, Toshiaki Sakurai, Hiroyuki Nagura, Eiichi Kobayashi, Masataka Miura
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Patent number: 6517992Abstract: An N-sulfonyloxyimide compound having the formula (1): wherein X represents a single bond or a double bond, Y and Z represent a hydrogen atom or others and may combine to form a cyclic structure; and R is a group having the formula (2): wherein X1 represents an organic group having an ester linkage, R1 represents an alkyl group or an alkoxyl group; and m is an integer of 1 to 11 and n is an integer of 0 to 10, satisfying m+n≦11; and chemically amplified positive and negative radiation-sensitive resin compositions using the compound are provided. The N-sulfonyloxyimide compound is a good radiation-sensitive acid-generating agent, has no problem of volatilization or side reaction, can keep dark reaction from taking place during the storage. The compound is useful as a component of radiation-sensitive chemically amplified resists.Type: GrantFiled: November 8, 2000Date of Patent: February 11, 2003Assignee: JSR CorporationInventors: Yong Wang, Eiichi Kobayashi, Masaaki Miyaji, Jun Numata, Tsutomu Shimokawa
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Patent number: 6506537Abstract: A positive-type radiation-sensitive resin composition is provided. The composition includes: (A) a low-molecular compound comprising a compound having at least one amino group having one or two hydrogen atom(s) bonded to the nitrogen atom; at least one hydrogen atom the amino group has having been substituted with a t-butoxycarbonyl group; (B) a radiation-sensitive acid generator; and (C) a silicon-atom-containing resin comprising an alkali-insoluble or alkali-slightly-soluble resin having been protected with an acid-cleavable group; the resin being capable of turning soluble in alkali upon cleavage of the acid-cleavable group. This radiation-sensitive resin composition is effectively responsive to radiations of various types, has superior sensitivity and resolution and also a superior long-term storage stability, and is useful as a positive-type chemically amplified resist.Type: GrantFiled: June 12, 2001Date of Patent: January 14, 2003Assignee: JSR CorporationInventors: Eiichi Kobayashi, Jun Numata, Mikio Yamachika, Masafumi Yamamoto
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Publication number: 20020192593Abstract: A radiation-sensitive resin composition comprising (A) a compound of the following formula (1), 1Type: ApplicationFiled: April 26, 2002Publication date: December 19, 2002Inventors: Tomoki Nagai, Jun Numata, Eiichi Kobayashi, Tsutomu Shimokawa
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Patent number: 6493408Abstract: For restraining jitter amount of a transmission clock signal (16) generated by a digital PLL (8), a data transmission apparatus comprises a {fraction (1/24)} clock generator (6) for dividing frequency of a receiving clock signal (4), a clock multiplier (7) for generating a reference frequency signal (18) by multiplying frequency of the output of the {fraction (1/24)} clock generator (6), and a control unit (28) for controlling a frequency multiplying ratio of the clock multiplier (7) and controlling a frequency dividing ratio of a frequency divider provided in the digital PLL (8). According to jitter amount detected by a jitter detection signal generator (19), the frequency of the reference clock signal (18) is selected among {fraction (1/12)}, ⅛ and ⅙ of the frequency of the receiving clock signal.Type: GrantFiled: November 18, 1999Date of Patent: December 10, 2002Assignee: NEC CorporationInventor: Eiichi Kobayashi
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Publication number: 20020172885Abstract: A carbazole derivative of the following formula (1), 1Type: ApplicationFiled: March 5, 2002Publication date: November 21, 2002Inventors: Tomoki Nagai, Jun Numata, Shirou Kusumoto, Eiichi Kobayashi
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Patent number: 6465150Abstract: A radiation-sensitive resin composition exhibiting high sensitivity to various types of radiation and capable of forming a minute pattern with sufficient resolution and depth of field and small surface roughness in various types of patterns such as a dense line pattern, isolated line pattern, or contact holes, particularly in line-type patterns. The resin composition comprises (A) an aromatic sulfonic acid onium salt compound consisting of a 2,4-difluorobenzenesulfonic acid anion, 4-trifluoromethylbenzenesulfonic acid anion, or 2-trifluoromethylbenzenesulfonic acid anion, and an onium cation of sulfur or iodonium, and (B) a copolymer represented by a 4-hydroxystyrene/4-t-butoxystyrene copolymer and a 4-hydroxystyrene/4-(1′-ethoxyethoxy)styrene copolymer.Type: GrantFiled: October 12, 2000Date of Patent: October 15, 2002Assignee: JSR CorporationInventors: Jun Numata, Shirou Kusumoto, Eiichi Kobayashi
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Publication number: 20020103418Abstract: An endoscope device includes an inserting portion having a curving portion, electric motors for generating driving forces for curving the curving portion, an operation unit for controlling the drive of the electric motors, a universal cord the base end of which is connected to an endoscope external unit, a coupling member with which the respective one ends of the inserting portion and the universal cord are coupled and which has a treatment tool inserting port, a holding unit for holding the coupling member, and a holding member for disposing the holding unit at a predetermined position of an operation bed. According to this arrangement, the operability of a surgeon can be improved by improving not only a curving operability but also the insertion operability of an inserting portion and the operability of a treatment tool.Type: ApplicationFiled: May 18, 2001Publication date: August 1, 2002Applicant: OLYMPUS OPTICAL CO., LTD.Inventors: Toshinari Maeda, Hitoshi Mizuno, Yuta Okada, Eiichi Kobayashi, Toshimasa Kawai, Yuichi Ikeda
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Patent number: 6420978Abstract: An object of the present invention is to provide a power generation system and a fuel supply method which are suitable for isolated areas; in order to attain this object, a power generation system comprising an electric power generation facility which is arranged on an isolated area, generates electric power using energy source obtainable on an isolated area, and supplies the electric power to the isolated area and a fuel supply method comprising the steps of: moving a fuel production device between a plurality of isolated areas; producing fuel on the isolated area from the fuel material obtainable on the isolated area; and supplying the fuel to the electric power generation facility are provided.Type: GrantFiled: October 17, 2000Date of Patent: July 16, 2002Assignee: Mitsubishi Heavy Industries, LtdInventors: Osamu Shinada, Akira Yamada, Katsuhiko Shinoda, Eiichi Kobayashi, Shinji Arinaga
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Publication number: 20020090569Abstract: A radiation-sensitive resin composition comprising (A) a photoacid generator such as 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate or 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate and (B) a resin having an acetal structure typified by a poly(p-hydroxystyrene) resin in which a part of hydrogen atoms of phenolic hydroxyl groups have been replaced by 1-ethoxyethyl groups, 1-ethoxyethyl groups and t-butoxycarbonyl groups, or 1-ethoxyethyl groups and t-butyl groups. The resin composition is sensitive to deep ultraviolet rays and charged particles such as electron beams, exhibits excellent resolution performance and pattern shape-forming capability, and suppresses a nano-edge roughness phenomenon to a minimal extent.Type: ApplicationFiled: November 16, 2001Publication date: July 11, 2002Inventors: Aki Suzuki, Makoto Murata, Hiromichi Hara, Eiichi Kobayashi
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Patent number: 6403288Abstract: A method of forming a resist pattern from a chemically amplified positive radiation sensitive resin composition. The film thickness of an unexposed portion of a resist film formed from the chemically amplified positive radiation sensitive resin composition after wet development is 100 to 400 Å smaller than that before wet development. Alternatively, a resist film formed from the chemically amplified positive radiation sensitive resin composition is wet developed at both a temperature and a time enough to ensure that the film thickness of an unexposed portion of the resist film after wet development is 100 to 400 Å smaller than that before wet development. A resist film which is formed from a chemically amplified positive radiation sensitive resin composition and experiences a 100 to 400 Å reduction in the film thickness of an unexposed portion by wet development is useful as a resist film for forming a resist pattern.Type: GrantFiled: March 7, 2000Date of Patent: June 11, 2002Assignee: JSR CorporationInventors: Yukio Nishimura, Toshiyuki Kai, Eiichi Kobayashi, Takeo Shioya
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Publication number: 20020061145Abstract: A metal bearing liner is formed by deep drawing press process sequentially subjecting a progressive sheet material (roll material) to a plurality of press processes. This makes it possible to form a metal bearing liner by a press work instead of a cutting work that has been conventionally employed while maintaining a requisite accuracy such as roundness and cylindricality thereby remarkably reducing the manufacturing cost of the metal bearing line thereby.Type: ApplicationFiled: November 13, 2001Publication date: May 23, 2002Applicant: MINEBEA CO., LTD.Inventors: Eiichi Kobayashi, Kazunori Sawayama, Kaoru Matsumoto
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Publication number: 20020012872Abstract: A positive-type radiation-sensitive resin composition is provided.Type: ApplicationFiled: June 12, 2001Publication date: January 31, 2002Inventors: Eiichi Kobayashi, Jun Numata, Mikio Yamachika, Masafumi Yamamoto
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Patent number: 6337171Abstract: A radiation-sensitive resin composition comprising (A) resin which comprises a recurring unit (1) shown by the following formula (1) and either or both of a recurring unit (2) shown by the following formula (2) and a recurring unit (3) shown by the following formula (3), and (B) a photoacid generator shown by the following formula (4).Type: GrantFiled: November 8, 1999Date of Patent: January 8, 2002Assignee: JSR CorporationInventors: Eiichi Kobayashi, Yukio Nishimura, Takeo Shioya