Abstract: A pair of cylindrical impact absorbing members, which is unintegrated with side members and is formed to have a substantially equilateral octagonal sectional form, is fixed on the side members in such a manner as to extend forward from the side members. Since the impact absorbing members are unintegrated with the side members, the impact absorbing members can be formed of optimum material with an optimum board thickness and can be formed to have an ideal sectional form by an optimum forming process under no restriction from a manufacturing method and the like for the side member.

Abstract: According to a body structure of the present invention, a floor panel member is reinforced by a pair of first members, and the second member comprised of plural pipes is disposed along the width of a vehicle so as to integrate the first members 1. An end of the second member is extended along the longitudinal side of the vehicle and is fixed by welding in the state of penetrating into a side sill. There is no necessity of providing any reinforcement material because the second member has a high strength continuously along the width of the vehicle. Moreover, there is no necessity of increasing a board thickness for the purpose of securing the rigidity because the second member penetrates into the side sill. On the other hand, the second member can be manufactured by cutting an existing steel pipe to a predetermined side, and it is therefore possible to cope with the change in the width of the vehicle only by changing a cutting size.

Abstract: A radiation sensitive resin composition comprising (A) a copolymer possessing recurring units of the formulas (1), (2), and (3), which turns alkali soluble in the presence of acid and (B) a photosensitive acid generator. Because the composition can resolve line-and-space patterns, isolated patterns, and contact hole patterns with satisfactory appearance and high resolution, it is useful as a chemically amplified positive resist for use in the manufacture of semiconductor devices.

Abstract: A novel diazodisulfone compound capable of generating acid having high sensitivity to far ultraviolet rays typified by a KrF excimer laser and the like and capable of providing a resist with superior resolution and patterns when used as a photoacid generator for a chemically amplified resist, and a radiation-sensitive resin composition comprising the diazodisulfone compound. The diazodisulfone compound is represented by the following formulas (1) and (2). ##STR1## The radiation-sensitive resin composition comprises the diazodisulfone compound and resin represented by 4-hydroxystyrene/4-(1'-ethoxyethoxy)styrene copolymer.

Abstract: Positive as well as negative radiation sensitive resin compositions that, in addition to being capable of providing excellent resolution and pattern profile, are particularly excellent in avoiding the problems of "nano-edge roughness" or "coating surface roughness". The positive type radiation sensitive resin composition comprises (A) (a) an acid-decomposable group-containing resin, or (b) an alkali-soluble resin and an alkali dissolution controller, and (B) a photoacid generator comprising "a compound that upon exposure to radiation generates a carboxylic acid having a boiling point of 150.degree. C. or higher", and "a compound that upon exposure to radiation generates an acid other than a carboxylic acid". The negative type radiation sensitive resin composition comprises (C) an alkali-soluble resin, (D) a cross-linking agent, and the component (B) as described above.

Abstract: A radiation-sensitive resin composition comprising (A) a copolymer which comprises (a) a repeating unit (I) formed by cleavage of a carbon--carbon double bond of a monomer having one polymerizable carbon--carbon double bond and (b) a repeating unit (II) formed by cleavage of a carbon--carbon double bond of a monomer having two or more polymerizable carbon--carbon double bonds and at least one divalent group decomposed by an acid of the following formulas (1) or (2), ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are an alkyl group having 1-5 carbon atoms or an aryl group having 6-14 carbon atoms individually, said monomer having a structure in which each carbon--carbon double bond combines via said divalent group, and (B) a photoacid generator.

Abstract: Positive-tone and negative-tone chemically amplified resist compositions comprising: (a-1) a blocked resin, (a-2) a combination of an alkali-soluble resin and a dissolution controlling agents, or (a-3) a combination of an alkali-soluble resin and a crosslinking agent, (b) a photoacid generator, and (c) specific kinds of solvents. The both positive-tone and negative-tone resist compositions exhibits superior sensitivity, high resolution capability, and excellent storage stability, and can be excellently applied especially to large sized substrates by spincoating for producing excellently shaped patterns by irradiation. The compositions can be used with advantage as a chemically amplified resist for the manufacture of semiconductor devices or integrated circuits (ICs).

Abstract: A dielectric filter utilizing a plurality of serially coupled resonators having attenuation maximums at the lower side or higher side, or both, of a pass band frequency region. The filter may include an input element which is coupled with both of a first resonator and a second resonator, and may also include an output element which is coupled with both the last and the next-to-last resonator. In the dielectric filter, it is not necessary to provide an external wire connection to generate such attenuation maximums.

Abstract: The invention permits stacking of seals without possibility of the sticking of their synthetic rubber seal members to one another. Moreover, when assembling the seals to produce anti-friction bearings, the invention permits storing the seals as a stack in a stocker of an automatic assembler and, unlike the case of using silicon or like prior art anti-sticking material, substantially eliminates generation of fine particles or the like adversely affecting precision apparatuses and deteriorating the reliability thereof. In an anti-friction bearing comprising an inner ring (1), an outer ring (2), and rolling elements (3) provided between the inner and outer rings, a side gap between the inner and outer rings is closed by seals (4) of the invention, which each include a synthetic rubber seal member (6) and a surface active material (7) coated thereon.

Abstract: Disclosed is a transmission frame format converter circuit with a first-in-first-out(FIFO) memory where the inputting and outputting of a data signal are conducted at different clock rates, which has: a write control circuit which writes write-in data and a frame pulse which is extracted from a transmission line and indicates a head position of the write-in data in the FIFO memory; and a read control circuit which judges that read-out data are valid only when the frame pulse to be read out from the read control circuit is active and then reads out the read-out data from the FIFO memory, and which judges that the read-out data are invalid and then conducts the resetting of the write control circuit and the FIFO memory.

Abstract: A radiation sensitive resin composition useful as a chemically amplified positive tone resist is provided. The composition comprises (A) a copolymer which becomes soluble in an alkali developing solution by the action of an acid, the copolymer containing a recurring unit (I) having a structure which is decomposed by the action of an acid and increases the solubility in an alkaline developing solution and a recurring unit(II) obtained from a compound having at least two (meth)acryloyl groups in the molecule by the cleavage of the carbon-carbon double bond, and (B) a photoacid generator which produces an acid on being irradiated by a radiation. The composition exhibits high resolution, superb capability of producing superior pattern forms, and excellent resistance to PED, and high process stability, is affected by a standing wave only to a minimum extent, and possessed prominent heat resistance.

Abstract: In a method of inspecting a sample on which a pattern relating to fabrication of a semiconductor device is formed, there are provided a light radiation unit, an acquiring unit, a storage unit, a template, a calculation unit, a correction unit, a defect detection unit and an output unit. Pinhole shape data to be detected of the pattern is stored in the template. The calculation unit calculates the degree of coincidence between the pinhole shape data stored in the template and the measured image data stored in the storage unit in units of a predetermined amount of data. The correction unit corrects a portion of the measured image data corresponding to a value of the degree of coincidence exceeding a second predetermined value in units of the predetermined amount of data, when the degree of coincidence obtained by the calculation unit has exceeded a first predetermined value, thereby correcting the portion of the measured image data including the detected pinhole.

Abstract: To permit stacking of seals without possibility of the stacking of their synthetic rubber seal members to one another, permit, when assembling the seals to produce anti-friction bearings, storing the seals as a stack in a stocker of an automatic assembler and, unlike the case of using silicon or like prior art anti-sticking material, substantially eliminate generation of fine particles or the like adversely affecting precision apparatuses and deteriorating the reliability thereof. In an anti-friction bearing comprising an inner ring (1), an outer ring (2), and rolling elements (3) provided between the inner and outer rings, the side gap between the inner and outer rings is closed by seals (4), which each include a synthetic rubber seal member (6) and a surface active material (7) coated thereon.

Abstract: In a filter device, at least one electrically conductive leaf member is mounted on a coupling loop by soldering or the like. By bending the conductive leaf member and adjusting the bending angle, the number of magnetic lines of force to be blocked, that is, the degree of magnetic coupling, is controlled. Therefore, when the mounting position of the leaf member is predetermined, the parameter of adjustment can be limited to the bending angle, and the adjustment is thereby facilitated.

Abstract: Positive-tone and negative-tone chemically amplified resist compositions comprising: (a-1) a blocked resin, (a-2) a combination of an alkali-soluble resin and a dissolution controlling agents, or (a-3) a combination of an alkali-soluble resin and a crosslinking agent, (b) a photoacid generator, and (c) specific kinds of solvents. The both positive-tone and negative-tone resist compositions exhibits superior sensitivity, high resolution capability, and excellent storage stability, and can be excellently applied especially to large sized substrates by spincoating for producing excellently shaped patterns by irradiation. The compositions can be used with advantage as a chemically amplified resist for the manufacture of semiconductor devices or integrated circuits (ICs).

Abstract: A dielectric filter utilizing a plurality of serially coupled resonators having attenuation maximums at the lower side or higher side, or both, of a pass band frequency region. The filter may include an input element which is coupled with both of a first resonator and a second resonator, and may also include an output element which is coupled with both the last and the next-to-last resonator. In the dielectric filter, it is not necessary to provide an external wire connection to generate such attenuation maximums.

Abstract: A radiation sensitive resin composition which comprises (A) a polymer which becomes alkali-soluble in the presence of an acid and (B) a radiation sensitive acid generator which generates an acid upon irradiation with a radiation, said polymer (A) comprising two recurring units represented by the general formulas (1) and (2) and a recurring unit which acts to reduce the solubility of the polymer in an alkali developer after the irradiation: ##STR1## wherein R.sup.1 represents a hydrogen atom or a methyl group and R.sup.2 represents a hydrogen atom or a methyl group. Said composition provides a chemically amplified positive resist which can give a fine pattern with a good pattern shape, and said resist is freed from volume shrinkage, peeling failure and adhesive failure, is excellent in dry etching resistance and effectively reacts with various radiations to give a good pattern shape which is excellent in photolithographic process stability, said pattern shape having no thinned portion at the upper part.

Abstract: Positive-tone and negative-tone chemically amplified resist compositions comprising: (a-1) a blocked resin, (a-2) a combination of an alkali-soluble resin and a dissolution controlling agents, or (a-3) a combination of an alkali-soluble resin and a crosslinking agent, (b) a photoacid generator, and (c) specific kinds of solvents. The both positive-tone and negative-tone resist compositions exhibits superior sensitivity, high resolution capability, and excellent storage stability, and can be excellently applied especially to large sized substrates by spincoating for producing excellently shaped patterns by irradiation. The compositions can be used with advantage as a chemically amplified resist for the manufacture of semiconductor devices or integrated circuits (ICs).

Abstract: A chemically amplified resist comprising an alkali-soluble resin or a resin having at least one acid-dissociable group which is alkali-insoluble or -sprairingly soluble but becomes alkali-soluble upon dissociation of said acid dissociable group due to an acid; a radiation-sensitive, acid-generating agent; and an optional component in which resist, the radiation-sensitive, acid-generating agent generates an acid upon irradiation with a radiation in the irradiated portion and the solubility of the resin component and optional component in a developing solution is varied in the irradiated portion by a chemical reaction caused by the catalytic action of the acid, whereby a pattern is formed, characterized in that a compound having a nitrogen-containing basic group is contained in the resist.

Abstract: A radiation sensitive resin composition which comprises (A) a polymer which becomes alkali-soluble in the presence of an acid and (B) a radiation sensitive acid generator which generates an acid upon irradiation with a radiation, said polymer (A) comprising two recurring units represented by the general formulas (1) and (2) and a recurring unit which acts to reduce the solubility of the polymer is an alkali developer after the irradiation: wherein R1 represents a hydrogen atom or a methyl group and R2 represents a hydrogen atom or a methyl group. Said composition provides a chemically amplified positive resist which can give a fine pattern with a good pattern shape, and said resist is freed from volume shrinkage, peeling failure and adhesive failure, is excellent in dry etching resistance and effectively reacts with various radiations to give a good pattern shape which is excellent in photolithographic process stability, said pattern shape having no thinned portion at the upper part.