Patents by Inventor Eiichi Matsumoto

Eiichi Matsumoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210001482
    Abstract: A machine learning device for a robot that allows a human and the robot to work cooperatively, the machine learning device including a state observation unit that observes a state variable representing a state of the robot during a period in that the human and the robot work cooperatively; a determination data obtaining unit that obtains determination data for at least one of a level of burden on the human and a working efficiency; and a learning unit that learns a training data set for setting an action of the robot, based on the state variable and the determination data.
    Type: Application
    Filed: September 17, 2020
    Publication date: January 7, 2021
    Inventors: Taketsugu TSUDA, Daisuke OKANOHARA, Ryosuke OKUTA, Eiichi MATSUMOTO, Keigo KAWAAI
  • Patent number: 10807235
    Abstract: A machine learning device for a robot that allows a human and the robot to work cooperatively, the machine learning device including a state observation unit that observes a state variable representing a state of the robot during a period in that the human and the robot work cooperatively; a determination data obtaining unit that obtains determination data for at least one of a level of burden on the human and a working efficiency; and a learning unit that learns a training data set for setting an action of the robot, based on the state variable and the determination data.
    Type: Grant
    Filed: April 1, 2019
    Date of Patent: October 20, 2020
    Assignees: FANUC CORPORATION, PREFERRED NETWORKS, INC.
    Inventors: Taketsugu Tsuda, Daisuke Okanohara, Ryosuke Okuta, Eiichi Matsumoto, Keigo Kawaai
  • Publication number: 20200254622
    Abstract: A machine learning device that learns an operation of a robot for picking up, by a hand unit, any of a plurality of workpieces placed in a random fashion, including a bulk-loaded state, includes a state variable observation unit that observes a state variable representing a state of the robot, including data output from a three-dimensional measuring device that obtains a three-dimensional map for each workpiece, an operation result obtaining unit that obtains a result of a picking operation of the robot for picking up the workpiece by the hand unit, and a learning unit that learns a manipulated variable including command data for commanding the robot to perform the picking operation of the workpiece, in association with the state variable of the robot and the result of the picking operation, upon receiving output from the state variable observation unit and output from the operation result obtaining unit.
    Type: Application
    Filed: April 28, 2020
    Publication date: August 13, 2020
    Inventors: Takashi YAMAZAKI, Takumi OYAMA, Shun SUYAMA, Kazutaka NAKAYAMA, Hidetoshi KUMIYA, Hiroshi NAKAGAWA, Daisuke OKANOHARA, Ryosuke OKUTA, Eiichi MATSUMOTO, Keigo KAWAAI
  • Patent number: 10717196
    Abstract: A machine learning device that learns an operation of a robot for picking up, by a hand unit, any of a plurality of workpieces placed in a random fashion, including a bulk-loaded state, includes a state variable observation unit that observes a state variable representing a state of the robot, including data output from a three-dimensional measuring device that obtains a three-dimensional map for each workpiece, an operation result obtaining unit that obtains a result of a picking operation of the robot for picking up the workpiece by the hand unit, and a learning unit that learns a manipulated variable including command data for commanding the robot to perform the picking operation of the workpiece, in association with the state variable of the robot and the result of the picking operation, upon receiving output from the state variable observation unit and output from the operation result obtaining unit.
    Type: Grant
    Filed: July 29, 2016
    Date of Patent: July 21, 2020
    Assignees: FANUC CORPORATION, PREFERRED NETWORKS, INC.
    Inventors: Takashi Yamazaki, Takumi Oyama, Shun Suyama, Kazutaka Nakayama, Hidetoshi Kumiya, Hiroshi Nakagawa, Daisuke Okanohara, Ryosuke Okuta, Eiichi Matsumoto, Keigo Kawaai
  • Publication number: 20200094406
    Abstract: An estimation device includes a memory and at least one processor. The at least one processor is configured to acquire information regarding a target object. The at least one processor is configured to estimate information regarding a location and a posture of a gripper relating to where the gripper is able to grasp the target object. The estimation is based on an output of a neural model having as an input the information regarding the target object. The estimated information regarding the posture includes information capable of expressing a rotation angle around a plurality of axes.
    Type: Application
    Filed: November 27, 2019
    Publication date: March 26, 2020
    Applicant: Preferred Networks, Inc.
    Inventors: Hitoshi KUSANO, Ayaka KUME, Eiichi MATSUMOTO
  • Publication number: 20190265657
    Abstract: A fault prediction system includes a machine learning device that learns conditions associated with a fault of an industrial machine. The machine learning device includes a state observation unit that, while the industrial machine is in operation or at rest, observes a state variable including, e.g., data output from a sensor, internal data of control software, or computational data obtained based on these data, a determination data obtaining unit that obtains determination data used to determine whether a fault has occurred in the industrial machine or the degree of fault, and a learning unit that learns the conditions associated with the fault of the industrial machine in accordance with a training data set generated based on a combination of the state variable and the determination data.
    Type: Application
    Filed: May 9, 2019
    Publication date: August 29, 2019
    Inventors: Shougo INAGAKI, Hiroshi NAKAGAWA, Daisuke OKANOHARA, Ryosuke OKUTA, Eiichi MATSUMOTO, Keigo KAWAAI
  • Publication number: 20190224844
    Abstract: A machine learning device for a robot that allows a human and the robot to work cooperatively, the machine learning device including a state observation unit that observes a state variable representing a state of the robot during a period in that the human and the robot work cooperatively; a determination data obtaining unit that obtains determination data for at least one of a level of burden on the human and a working efficiency; and a learning unit that learns a training data set for setting an action of the robot, based on the state variable and the determination data.
    Type: Application
    Filed: April 1, 2019
    Publication date: July 25, 2019
    Inventors: Taketsugu TSUDA, Daisuke OKANOHARA, Ryosuke OKUTA, Eiichi MATSUMOTO, Keigo KAWAAI
  • Patent number: 10317853
    Abstract: A fault prediction system includes a machine learning device that learns conditions associated with a fault of an industrial machine. The machine learning device includes a state observation unit that, while the industrial machine is in operation or at rest, observes a state variable including, e.g., data output from a sensor, internal data of control software, or computational data obtained based on these data, a determination data obtaining unit that obtains determination data used to determine whether a fault has occurred in the industrial machine or the degree of fault, and a learning unit that learns the conditions associated with the fault of the industrial machine in accordance with a training data set generated based on a combination of the state variable and the determination data.
    Type: Grant
    Filed: July 27, 2016
    Date of Patent: June 11, 2019
    Assignees: FANUC CORPORATION, PREFERRED NETWORKS, INC.
    Inventors: Shougo Inagaki, Hiroshi Nakagawa, Daisuke Okanohara, Ryosuke Okuta, Eiichi Matsumoto, Keigo Kawaai
  • Patent number: 10276797
    Abstract: The present invention provides a vapor deposition device including a novel alignment mechanism applicable to a large substrate, a vapor deposition method, and a method for manufacturing an organic electroluminescence element. The vapor deposition device of the present invention is a vapor deposition device for performing vapor deposition while transporting a substrate in a first direction, and includes: a mask; a substrate tray including a substrate-holding portion and a guide portion protruding from the substrate-holding portion to the mask side and disposed along the first direction; at least one distance meter disposed on a first end which is one end of the mask or the guide portion; and at least one driver coupled with a second end which is the other end of the mask. The at least one distance meter is configured to measure a distance between the at least one distance meter and the guide portion or the first end when the guide portion faces the first end.
    Type: Grant
    Filed: November 10, 2015
    Date of Patent: April 30, 2019
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Masahiro Ichihara, Eiichi Matsumoto, Yuhki Kobayashi, Katsuhiro Kikuchi, Shinichi Kawato, Takashi Ochi, Kazuki Matsunaga, Satoshi Inoue
  • Publication number: 20190091869
    Abstract: To select a picking position of a workpiece in a simpler method. A robot system includes a three-dimensional measuring device for generating a range image of a plurality of workpieces, a robot having a hand for picking up at least one of the plurality of workpieces, a display part for displaying the range image generated by the three-dimensional measuring device, and a reception part for receiving a teaching of a picking position for picking-up by the hand on the displayed range image. The robot picks up at least one of the plurality of workpieces by the hand on the basis of the taught picking position.
    Type: Application
    Filed: August 30, 2018
    Publication date: March 28, 2019
    Inventors: Takashi YAMAZAKI, Daisuke OKANOHARA, Eiichi MATSUMOTO
  • Publication number: 20190097135
    Abstract: The present invention provides a vapor deposition device including a novel alignment mechanism applicable to a large substrate, a vapor deposition method, and a method for manufacturing an organic electroluminescence element. The vapor deposition device of the present invention is a vapor deposition device for performing vapor deposition while transporting a substrate in a first direction, and includes: a mask; a substrate tray including a substrate-holding portion and a guide portion protruding from the substrate-holding portion to the mask side and disposed along the first direction; at least one distance meter disposed on a first end which is one end of the mask or the guide portion; and at least one driver coupled with a second end which is the other end of the mask. The at least one distance meter is configured to measure a distance between the at least one distance meter and the guide portion or the first end when the guide portion faces the first end.
    Type: Application
    Filed: November 10, 2015
    Publication date: March 28, 2019
    Inventors: MASAHIRO ICHIHARA, EIICHI MATSUMOTO, YUHKI KOBAYASHI, KATSUHIRO KIKUCHI, SHINICHI KAWATO, TAKASHI OCHI, KAZUKI MATSUNAGA, SATOSHI INOUE
  • Publication number: 20190087982
    Abstract: A line drawing automatic coloring method according to the present disclosure includes: acquiring line drawing data of a target to be colored; receiving at least one local style designation for applying a selected local style to at least one place of the acquired line drawing data; and performing coloring processing reflecting the local style designation on the line drawing data based on a learned model for coloring in which it is learned in advance using the line drawing data and the local style designation as inputs.
    Type: Application
    Filed: September 19, 2018
    Publication date: March 21, 2019
    Applicant: Preferred Networks, Inc.
    Inventor: Eiichi MATSUMOTO
  • Patent number: 10184167
    Abstract: A vapor deposition unit (1) includes a vapor deposition mask (50), a vapor deposition source (10), and a limiting plate unit (20). The limiting plate unit (20) includes (i) a plurality of first limiting plates (32) separated from each other in an X axis direction and (ii) a plurality of second limiting plates (42) disposed directly above the first limiting plates (32) in a plan view and separated from each other in the X axis direction. At least two second limiting plates (42) are arranged in the X axis direction for each first limiting plate (32).
    Type: Grant
    Filed: March 30, 2014
    Date of Patent: January 22, 2019
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Yuhki Kobayashi, Katsuhiro Kikuchi, Shinichi Kawato, Satoshi Inoue, Takashi Ochi, Eiichi Matsumoto, Masahiro Ichihara
  • Patent number: 10103202
    Abstract: In an organic EL element including a positive electrode, a negative electrode, and a light emitting layer (recombination layer) provided between the positive electrode and the negative electrode, an electron transport layer and an electron injection layer are provided between the light emitting layer and the negative electrode, and are sequentially arranged in the direction from the light emitting layer to the negative electrode. A hole injection layer and a hole transport layer are provided between the light emitting layer and the positive electrode, and are sequentially arranged in the direction from the positive electrode to the light emitting layer. A buffer layer for suppressing the electron trapping properties is provided between the light emitting layer and the hole transport layer.
    Type: Grant
    Filed: June 11, 2015
    Date of Patent: October 16, 2018
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Shinichi Kawato, Katsuhiro Kikuchi, Satoshi Inoue, Takashi Ochi, Yuhki Kobayashi, Kazuki Matsunaga, Eiichi Matsumoto, Masahiro Ichihara
  • Publication number: 20180168031
    Abstract: The present disclosure provides an electronic device including a printed board, an electronic component, a solder portion, and a sealing resin body. The electronic component is mounted on the printed board. The solder portion is electrically connecting the printed board and the electronic portion. The sealing resin body covers and seals the electronic component and the solder portion. The solder portion has tensile strength between 100 MPa and 110 MPa inclusive, and has breaking elongation between 21% and 24% inclusive. The sealing resin body has cure shrinkage ratio between 0.05% and 0.20% inclusive, thereby applying a compressive stress in an inward direction of the sealing resin body to the electronic component and the solder portion.
    Type: Application
    Filed: September 22, 2017
    Publication date: June 14, 2018
    Applicant: DENSO CORPORATION
    Inventor: Eiichi MATSUMOTO
  • Patent number: 9893283
    Abstract: The present invention relates to a vapor deposition device for forming a film on a substrate, including: a vapor deposition chamber; a vapor deposition unit including a vapor deposition mask provided with an opening for pattern formation; and a transport mechanism that is configured to transfer at least one of the substrate and the vapor deposition unit relative to the other in a first direction perpendicular to the normal direction of the vapor deposition mask and that is configured to cause the substrate to rest temporarily at a resting position relative to the vapor deposition unit. The substrate includes a vapor-deposition-target region, and the region does not overlap the opening of the vapor deposition mask when the substrate is at the resting position. The vapor deposition chamber is provided with a first vent and a second vent.
    Type: Grant
    Filed: November 27, 2014
    Date of Patent: February 13, 2018
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Yuhki Kobayashi, Katsuhiro Kikuchi, Shinichi Kawato, Takashi Ochi, Satoshi Inoue, Kazuki Matsunaga, Eiichi Matsumoto, Masahiro Ichihara
  • Patent number: 9845530
    Abstract: A mask for a vapor deposition apparatus includes an outer frame; a first bar disposed on an inner side of the outer frame and fixed to the outer frame; and a pattern forming portion disposed on the outer frame and the first bar and fixed to the outer frame. The pattern forming portion includes a plurality of mask openings for pattern formation. Each of the plurality of mask openings is disposed along a first direction. The plurality of mask openings are disposed in a second direction orthogonal to the first direction. The first bar is positioned between adjacent two mask openings among the plurality of mask openings when viewed along a third direction orthogonal to the first direction and the second direction, and is in contact with the pattern forming portion.
    Type: Grant
    Filed: May 7, 2015
    Date of Patent: December 19, 2017
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Satoshi Inoue, Katsuhiro Kikuchi, Shinichi Kawato, Takashi Ochi, Yuhki Kobayashi, Kazuki Matsunaga, Eiichi Matsumoto, Masahiro Ichihara
  • Publication number: 20170218500
    Abstract: A vapor deposition device is provided with first and second vapor deposition sources, a common pipe that is connected to the first and second vapor deposition sources, a vapor deposition particle emission source that is connected to the common pipe and emits vapor deposition particles from each of the first and second vapor deposition sources, an exhaust valve that is connected to the vapor deposition particle emission source, and an exhaust pump that is connected to the exhaust valve.
    Type: Application
    Filed: July 24, 2015
    Publication date: August 3, 2017
    Applicant: Sharp Kabushiki Kaisha
    Inventors: Takashi OCHI, Shinichi KAWATO, Yuhki KOBAYASHI, Kazuki MATSUNAGA, Katsuhiro KIKUCHI, Masahiro ICHIHARA, Eiichi MATSUMOTO
  • Publication number: 20170222185
    Abstract: An organic EL display substrate includes a light-emitting region containing a plurality of pixels and a getter member. The getter member is disposed in at least part of the area around the light-emitting region.
    Type: Application
    Filed: April 17, 2015
    Publication date: August 3, 2017
    Inventors: Kazuki MATSUNAGA, Katsuhiro KIKUCHI, Shinichi KAWATO, Takashi OCHI, Satoshi INOUE, Yuhki KOBAYASHI, Eiichi MATSUMOTO, Masahiro ICHIHARA, Hirokazu SHIMEKI
  • Patent number: 9692156
    Abstract: An electronic device includes a substrate, and a press-fit terminal. The substrate includes a first surface, a second surface opposite to the first surface in a thickness direction of the substrate, a through hole, and an electrode formed in the first surface, the second surface, and a wall of the through hole. The press-fit terminal is fit into the through hole from the first surface while being elastically deformed. The press-fit terminal is connected to the electrode by a reaction force due to the elastic deformation of the press-fit terminal. The substrate includes (i) a core layer that is overlapped, in the thickness direction, with a contact portion of the electrode with the press-fit terminal, and (ii) a flexible layer that is at a position closer to the first surface than the core layer is to. The flexible layer has a lower elastic modulus than the core layer.
    Type: Grant
    Filed: July 1, 2016
    Date of Patent: June 27, 2017
    Assignee: DENSO CORPORATION
    Inventors: Eiichi Matsumoto, Yoshio Hironaka