Patents by Inventor Eiji Natori

Eiji Natori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9827786
    Abstract: To suppress deterioration in the quality of a recorded image resulting from the shape of a medium not being stable. There is provided a recording apparatus (1) including a shape adjusting section (11) which adjusts a shape of a medium (M) to a reference shape, a holding section (10) which holds a state of the medium (M) after being adjusted by the shape adjusting section (11), and a recording section (44) which has a discharging section (6) which discharges a liquid to the medium (M) which is held by the holding section (10). With the recording apparatus (1) having this configuration, it is possible to suppress deterioration in the quality of a recorded image resulting from the shape of the medium (M) not being stable.
    Type: Grant
    Filed: July 1, 2015
    Date of Patent: November 28, 2017
    Assignee: Seiko Epson Corporation
    Inventors: Kunihiko Matsuhashi, Eiji Natori, Shinya Momose
  • Publication number: 20170203579
    Abstract: To suppress deterioration in the quality of a recorded image resulting from the shape of a medium not being stable. There is provided a recording apparatus (1) including a shape adjusting section (11) which adjusts a shape of a medium (M) to a reference shape, a holding section (10) which holds a state of the medium (M) after being adjusted by the shape adjusting section (11), and a recording section (44) which has a discharging section (6) which discharges a liquid to the medium (M) which is held by the holding section (10). With the recording apparatus (1) having this configuration, it is possible to suppress deterioration in the quality of a recorded image resulting from the shape of the medium (M) not being stable.
    Type: Application
    Filed: July 1, 2015
    Publication date: July 20, 2017
    Inventors: Kunihiko MATSUHASHI, Eiji NATORI, Shinya MOMOSE
  • Patent number: 9387674
    Abstract: A flow path unit includes a pressure chamber substrate in which a plurality of pressure chambers are arranged in a first direction; and a piezoelectric element that changes a volume of the pressure chamber, in which a plane shape of an active section of the piezoelectric element is contained such that a width on one side thereof in a second direction crossing the first direction is wider than that on the other side in the second direction. The side on which the width of the active section of the piezoelectric element is great and the side on which the width thereof is smaller in the second direction be alternately disposed each other so that the active sections adjacent to each other are arranged differently from each other in the first direction.
    Type: Grant
    Filed: June 9, 2014
    Date of Patent: July 12, 2016
    Assignee: Seiko Epson Corporation
    Inventors: Hajime Nakao, Eiji Natori
  • Publication number: 20160009104
    Abstract: A recording apparatus includes an input unit that inputs a standard shape of a medium, a shape recognizing unit that recognizes an actual shape of the medium, a calculating unit that calculates a correction value based on the standard shape and the actual shape, and a recording unit that includes an ejecting unit which ejects liquid to the medium, in which recording conditions are adjusted based on the correction value. According to the recording apparatus having such a configuration, the recording corresponding to the mediums having various shapes can be performed.
    Type: Application
    Filed: July 10, 2015
    Publication date: January 14, 2016
    Inventors: Kunihiko MATSUHASHI, Eiji NATORI, Shinya MOMOSE
  • Patent number: 9156261
    Abstract: A piezoelectric unit includes a diaphragm made of ceramics, a base portion having a pressure chamber in which the diaphragm is set to a wall and a piezoelectric element having a dielectric layer provided at the opposite side of the base portion with respect to the diaphragm. In the piezoelectric unit, the roughness of a crystal of the outermost interface at the side of the piezoelectric element of the diaphragm is further smoothened than that of a ceramics material which is included in the diaphragm more inside than the interface.
    Type: Grant
    Filed: June 4, 2014
    Date of Patent: October 13, 2015
    Assignee: Seiko Epson Corporation
    Inventors: Hajime Nakao, Eiji Natori
  • Publication number: 20140368582
    Abstract: A piezoelectric unit includes a diaphragm made of ceramics, a base portion having a pressure chamber in which the diaphragm is set to a wall and a piezoelectric element having a dielectric layer provided at the opposite side of the base portion with respect to the diaphragm. In the piezoelectric unit, the roughness of a crystal of the outermost interface at the side of the piezoelectric element of the diaphragm is further smoothened than that of a ceramics material which is included in the diaphragm more inside than the interface.
    Type: Application
    Filed: June 4, 2014
    Publication date: December 18, 2014
    Applicant: Seiko Epson Corporation
    Inventors: Hajime NAKAO, Eiji NATORI
  • Publication number: 20140362141
    Abstract: A flow path unit includes a pressure chamber substrate in which a plurality of pressure chambers are arranged in a first direction; and a piezoelectric element that changes a volume of the pressure chamber, in which a plane shape of an active section of the piezoelectric element is contained such that a width on one side thereof in a second direction crossing the first direction is wider than that on the other side in the second direction. The side on which the width of the active section of the piezoelectric element is great and the side on which the width thereof is smaller in the second direction be alternately disposed each other so that the active sections adjacent to each other are arranged differently from each other in the first direction.
    Type: Application
    Filed: June 9, 2014
    Publication date: December 11, 2014
    Inventors: Hajime NAKAO, Eiji NATORI
  • Patent number: 7960901
    Abstract: A method of manufacturing a ceramic includes forming a film which includes a complex oxide material having an oxygen octahedral structure and a paraelectric material having a catalytic effect for the complex oxide material in a mixed state, and performing a heat treatment to the film, wherein the paraelectric material is one of a layered catalytic substance which includes Si in the constituent elements and a layered catalytic substance which includes Si and Ge in the constituent elements. The heat treatment includes sintering and post-annealing. At least the post-annealing is performed in a pressurized atmosphere including at least one of oxygen and ozone. A ceramic is a complex oxide having an oxygen octahedral structure, and has Si and Ge in the oxygen octahedral structure.
    Type: Grant
    Filed: April 26, 2010
    Date of Patent: June 14, 2011
    Assignee: Seiko Epson Corporation
    Inventors: Eiji Natori, Takeshi Kijima, Koichi Furuyama, Yuzo Tasaki
  • Patent number: 7956519
    Abstract: A method of manufacturing a ceramic includes forming a film which includes a complex oxide material having an oxygen octahedral structure and a paraelectric material having a catalytic effect for the complex oxide material in a mixed state, and performing a heat treatment to the film, wherein the paraelectric material is one of a layered catalytic substance which includes Si in the constituent elements and a layered catalytic substance which includes Si and Ge in the constituent elements. The heat treatment includes sintering and post-annealing. At least the post-annealing is performed in a pressurized atmosphere including at least one of oxygen and ozone. A ceramic is a complex oxide having an oxygen octahedral structure, and has Si and Ge in the oxygen octahedral structure.
    Type: Grant
    Filed: April 26, 2010
    Date of Patent: June 7, 2011
    Assignee: Seiko Epson Corporation
    Inventors: Eiji Natori, Takeshi Kijima, Koichi Furuyama, Yuzo Tasaki
  • Publication number: 20100289384
    Abstract: A method of manufacturing a ceramic includes forming a film which includes a complex oxide material having an oxygen octahedral structure and a paraelectric material having a catalytic effect for the complex oxide material in a mixed state, and performing a heat treatment to the film, wherein the paraelectric material is one of a layered catalytic substance which includes Si in the constituent elements and a layered catalytic substance which includes Si and Ge in the constituent elements. The heat treatment includes sintering and post-annealing. At least the post-annealing is performed in a pressurized atmosphere including at least one of oxygen and ozone. A ceramic is a complex oxide having an oxygen octahedral structure, and has Si and Ge in the oxygen octahedral structure.
    Type: Application
    Filed: April 26, 2010
    Publication date: November 18, 2010
    Applicant: Seiko Epson Corporation
    Inventors: Eiji Natori, Takeshi Kijima, Koichi Furuyama, Yuzo Tasaki
  • Patent number: 7825569
    Abstract: A method of manufacturing a ceramic includes forming a film which includes a complex oxide material having an oxygen octahedral structure and a paraelectric material having a catalytic effect for the complex oxide material in a mixed state, and performing a heat treatment to the film, wherein the paraelectric material is one of a layered catalytic substance which includes Si in the constituent elements and a layered catalytic substance which includes Si and Ge in the constituent elements. The heat treatment includes sintering and post-annealing. At least the post-annealing is performed in a pressurized atmosphere including at least one of oxygen and ozone. A ceramic is a complex oxide having an oxygen octahedral structure, and has Si and Ge in the oxygen octahedral structure.
    Type: Grant
    Filed: April 10, 2009
    Date of Patent: November 2, 2010
    Assignee: Seiko Epson Corporation
    Inventors: Eiji Natori, Takeshi Kijima, Koichi Furuyama, Yuzo Tasaki
  • Publication number: 20100207492
    Abstract: A method of manufacturing a ceramic includes forming a film which includes a complex oxide material having an oxygen octahedral structure and a paraelectric material having a catalytic effect for the complex oxide material in a mixed state, and performing a heat treatment to the film, wherein the paraelectric material is one of a layered catalytic substance which includes Si in the constituent elements and a layered catalytic substance which includes Si and Ge in the constituent elements. The heat treatment includes sintering and post-annealing. At least the post-annealing is performed in a pressurized atmosphere including at least one of oxygen and ozone. A ceramic is a complex oxide having an oxygen octahedral structure, and has Si and Ge in the oxygen octahedral structure.
    Type: Application
    Filed: April 26, 2010
    Publication date: August 19, 2010
    Applicant: Seiko Epson Corporation
    Inventors: Eiji Natori, Takeshi Kijima, Koichi Furuyama, Yuzo Tasaki
  • Patent number: 7689460
    Abstract: A store management system has a merchandise information management apparatus which transmits merchandise information, a merchandise tag which is provided with a first display, and receives the merchandise information which is transmitted from the merchandise information management apparatus to the merchandise tag itself and displays the merchandise information, and a display apparatus for display rack which is provided with a second display, and has a function of receiving the merchandise information which is transmitted from the merchandise information management apparatus to the display apparatus itself and displaying the merchandise information, and checking the merchandise information which is displayed on the display apparatus itself and the merchandise information which is displayed on the merchandise tag by communicating with the merchandise tag.
    Type: Grant
    Filed: March 15, 2005
    Date of Patent: March 30, 2010
    Assignee: Seiko Epson Corporation
    Inventors: Eiji Natori, Yasuhiro Nomura
  • Patent number: 7678241
    Abstract: The invention provides a film forming apparatus that is capable of forming films sequentially with two types of film forming mechanisms in the same chamber. The film forming apparatus according to the present invention includes a Pt target disposed at one side within a film forming chamber, a sputtering output mechanism to supply to the Pt target, a Pt vapor deposition source disposed at an other side within the film forming chamber, a vapor deposition output mechanism to supply to the Pt vapor deposition source, a substrate holder disposed between the Pt target and the Pt vapor deposition source within the film forming chamber to mount a substrate, a rotating mechanism to move the substrate holder so that the substrate directs to the Pt target or to the Pt vapor deposition source, a heating mechanism to heat the substrate when the substrate is subjected to a sputtering film forming, and a cooling mechanism to cool the substrate when the substrate is subjected to vapor deposition film forming.
    Type: Grant
    Filed: March 4, 2005
    Date of Patent: March 16, 2010
    Assignees: Seiko Epson Corporation, Youtec Co., Ltd.
    Inventors: Takeshi Kijima, Eiji Natori, Mitsuhiro Suzuki
  • Publication number: 20090230821
    Abstract: A method of manufacturing a ceramic includes forming a film which includes a complex oxide material having an oxygen octahedral structure and a paraelectric material having a catalytic effect for the complex oxide material in a mixed state, and performing a heat treatment to the film, wherein the paraelectric material is one of a layered catalytic substance which includes Si in the constituent elements and a layered catalytic substance which includes Si and Ge in the constituent elements. The heat treatment includes sintering and post-annealing. At least the post-annealing is performed in a pressurized atmosphere including at least one of oxygen and ozone. A ceramic is a complex oxide having an oxygen octahedral structure, and has Si and Ge in the oxygen octahedral structure.
    Type: Application
    Filed: April 10, 2009
    Publication date: September 17, 2009
    Applicant: Seiko Epson Corporation
    Inventors: Eiji Natori, Takeshi Kijima, Koichi Furuyama, Yuzo Tasaki
  • Publication number: 20090022317
    Abstract: A vehicle security system includes a reception device that is mounted on a vehicle, and a transmission device that remotely operates the vehicle. The transmission device includes an encryption section that encrypts identification information that identifies the transmission device with a first encryption key, and a transmission section that transmits to the reception device instruction information that includes the identification information encrypted and gives an operation instruction to the reception device.
    Type: Application
    Filed: July 8, 2008
    Publication date: January 22, 2009
    Applicant: Seiko Epson Corporation
    Inventors: Isao AKIMA, Tatsuya HARA, Eiji NATORI, Kazuo TANAKA, Masahiro TAKEUCHI
  • Publication number: 20080292098
    Abstract: A communication system includes: a transmission device; and a reception device, wherein the transmission device includes an encryption section that encrypts a plaintext to be transmitted to the reception device with a first encryption key, and a transmission section that transmits the encrypted plaintext to the reception device; and the reception device includes a FeRAM that stores a second encryption key to pair with the first encryption key, wherein, upon reading out the second encryption key from the FeRAM, the second encryption key is erased from the FeRAM, a reception section that receives the encrypted plaintext from the transmission device, and a decoding section that decodes the received plaintext encrypted with the first encryption key with the second encryption key that is supposed to be stored in the FeRAM.
    Type: Application
    Filed: May 21, 2008
    Publication date: November 27, 2008
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Isao AKIMA, Tatsuya HARA, Eiji NATORI, Kazuo TANAKA
  • Publication number: 20080159939
    Abstract: A method of manufacturing a ceramic includes forming a film which includes a complex oxide material having an oxygen octahedral structure and a paraelectric material having a catalytic effect for the complex oxide material in a mixed state, and performing a heat treatment to the film, wherein the paraelectric material is one of a layered catalytic substance which includes Si in the constituent elements and a layered catalytic substance which includes Si and Ge in the constituent elements. The heat treatment includes sintering and post-annealing. At least the post-annealing is performed in a pressurized atmosphere including at least one of oxygen and ozone. A ceramic is a complex oxide having an oxygen octahedral structure, and has Si and Ge in the oxygen octahedral structure.
    Type: Application
    Filed: December 6, 2007
    Publication date: July 3, 2008
    Applicant: Seiko Epson Corporation
    Inventors: Eiji Natori, Takeshi Kijima, Koichi Furuyama, Yuzo Tasaki
  • Patent number: 7371473
    Abstract: A ferroelectric film is formed by an oxide that is described by a general formula AB1-xNbxO3. An A element includes at least Pb, and a B element includes at least one of Zr, Ti, V, W, Hf and Ta. The ferroelectric film includes Nb within the range of: 0.05 ?x<1. The ferroelectric film can be used for any of ferroelectric memories of 1T1C, 2T2C and simple matrix types.
    Type: Grant
    Filed: November 25, 2005
    Date of Patent: May 13, 2008
    Assignee: Seiko Epson Corporation
    Inventors: Takeshi Kijima, Yasuaki Hamada, Eiji Natori, Koji Ohashi
  • Publication number: 20080060381
    Abstract: A ferroelectric film wherein 5 to 40 mol % in total of at least one of Nb, V, and W is included in the B site of a Pb(Zr,Ti)O3 ferroelectric which includes at least four-fold coordinated Si4+ or Ge4+ in the A site ion of a ferroelectric perovskite material in an amount of 1% or more. This enables to significantly improve reliability of the ferroelectric film.
    Type: Application
    Filed: October 23, 2007
    Publication date: March 13, 2008
    Applicant: Seiko Epson Corporation
    Inventors: Takeshi Kijima, Hiromu Miyazawa, Yasuaki Hamada, Eiji Natori