Patents by Inventor Emad Aqad

Emad Aqad has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME
    Publication number: 20110250538
    Abstract: New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided.
    Type: Application
    Filed: December 10, 2010
    Publication date: October 13, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Mingqi LI, Emad AQAD, Cong LIU, Joseph MATTIA, Cheng-Bai XU, George G. BARCLAY
  • PHOTOSENSITIVE COMPOSITIONS
    Publication number: 20110159429
    Abstract: Provided are radiation-sensitive polymers and compositions which may be used in photolithographic processes. The polymers and compositions provide enhanced sensitivity to activating radiation.
    Type: Application
    Filed: December 30, 2010
    Publication date: June 30, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: James W. THACKERAY, Emad Aqad
  • PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME
    Publication number: 20100323294
    Abstract: This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise a multi cyclic lactone moiety.
    Type: Application
    Filed: June 22, 2010
    Publication date: December 23, 2010
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Mingqi LI, Cheng-Bai XU, Emad AQAD, Cong LIU