Patents by Inventor Emad Aqad

Emad Aqad has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Iodine-containing polymers for chemically amplified resist compositions
    Patent number: 10495968
    Abstract: A monomer having formula (I): wherein in formula (I), groups and variables are the same as described in the specification.
    Type: Grant
    Filed: June 15, 2017
    Date of Patent: December 3, 2019
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, James W. Thackeray, James F. Cameron
  • PHOTOACID GENERATOR
    Publication number: 20190243239
    Abstract: A photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.
    Type: Application
    Filed: April 8, 2019
    Publication date: August 8, 2019
    Inventors: William Williams, III, Emad Aqad, James F. Cameron
  • MONOMERS, POLYMERS AND LITHOGRAPHIC COMPOSITIONS COMPRISING SAME
    Publication number: 20190202955
    Abstract: New monomer and polymer materials that comprise one or more Te atoms. In one aspect, tellurium-containing monomers and polymers are provided that are useful for Extreme Ultraviolet Lithography.
    Type: Application
    Filed: December 31, 2018
    Publication date: July 4, 2019
    Inventors: Emad Aqad, James F. Cameron, James W. Thackeray
  • PROCESS FOR MAKING AN ORGANIC CHARGE TRANSPORTING FILM
    Publication number: 20190207169
    Abstract: A method for producing an organic charge transporting film. The method comprises steps of: (a) applying to a substrate a first polymer resin which has substituents which are sulfonic acids, sulfonic acid salts or esters of sulfonic acids; and (b) applying over the first polymer resin a second polymer resin having Mw at least 3,000 and comprising arylmethoxy linkages.
    Type: Application
    Filed: June 28, 2016
    Publication date: July 4, 2019
    Inventors: Chun LIU, Peter TREFONAS, Shaoguang FENG, Yang LI, Minrong ZHU, Robert David GRIGG, Liam P. SPENCER, David D. DEVORE, Ashley INMAN, Emad AQAD
  • PHOTORESIST COMPOSITIONS AND METHODS
    Publication number: 20190204743
    Abstract: New photoresist and topcoat compositions are provided that are useful in a variety of applications. In one aspect, new photoresist compositions are provided that comprise: (a) a first matrix polymer; (b) one or more acid generators; and (c) one or more additive compounds of Formulae (I) and/or (II).
    Type: Application
    Filed: December 31, 2018
    Publication date: July 4, 2019
    Inventors: Joshua Kaitz, Tomas Marangoni, Emad Aqad, Amy M. Kwok, Mingqi Li, Thomas Cardolaccia, Choong-Bong Lee, Ke Yang, Cong Liu
  • PROCESS FOR MAKING AN ORGANIC CHARGE TRANSPORTING FILM
    Publication number: 20190202975
    Abstract: A single liquid phase formulation useful for producing an organic charge transporting film. The formulation contains: (a) a polymer resin having Mw at least 3,000 and having arylmethoxy linkages; (b) an acid catalyst which is an organic Bronsted acid with pKa?4; a Lewis acid comprising a positive aromatic ion and an anion which is (i) a tetraaryl borate having the formula (I) wherein R represents zero to five non-hydrogen substituents selected from D, F and CF3, (ii) BF4?, (iii) PF6?, (iv) SbF6?, (v) AsF6? or (vi) ClO4?; or a thermal acid generator.
    Type: Application
    Filed: June 28, 2016
    Publication date: July 4, 2019
    Inventors: Chun LIU, Robert David GRIGG, Sukrit MUKHOPADHYAY, Matthew S. REMY, Liam P. SPENCER, Minrong ZHU, Yang LI, Shaoguang FENG, Kenneth L. KEARNS, Bruce M. BELL, Anthony P. GIES, Peter TREFONAS, David D. DEVORE, Emad AQAD, Ashley INMAN
  • Photoacid generator
    Patent number: 10317795
    Abstract: A photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.
    Type: Grant
    Filed: December 22, 2016
    Date of Patent: June 11, 2019
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: William Williams, III, Emad Aqad, James F. Cameron
  • SALTS AND PHOTORESISTS COMPRISING SAME
    Publication number: 20190163058
    Abstract: New Te-salt compounds are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.
    Type: Application
    Filed: November 29, 2018
    Publication date: May 30, 2019
    Inventors: Emad Aqad, James F. Cameron, James W. Thackeray
  • ZWITTERION COMPOUNDS AND PHOTORESISTS COMPRISING SAME
    Publication number: 20190161509
    Abstract: New Te-zwitterion compounds are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.
    Type: Application
    Filed: November 29, 2018
    Publication date: May 30, 2019
    Inventors: Emad Aqad, James F. Cameron, James W. Thackeray
  • SALTS AND PHOTORESISTS COMPRISING SAME
    Publication number: 20190163055
    Abstract: New Te-salts are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.
    Type: Application
    Filed: November 29, 2018
    Publication date: May 30, 2019
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Emad Aqad, James F. Cameron, James W. Thackeray
  • IODINE-CONTAINING PHOTOACID GENERATORS AND COMPOSITIONS COMPRISING THE SAME
    Publication number: 20190155152
    Abstract: A photoacid generator compound having formula (I): wherein, in formula (I), groups and variables are the same as described in the specification.
    Type: Application
    Filed: November 20, 2017
    Publication date: May 23, 2019
    Inventors: Emad Aqad, James W. Thackeray
  • IODINE-CONTAINING POLYMERS FOR CHEMICALLY AMPLIFIED RESIST COMPOSITIONS
    Publication number: 20180362752
    Abstract: A monomer having formula (I): wherein in formula (I), groups and variables are the same as described in the specification.
    Type: Application
    Filed: June 15, 2017
    Publication date: December 20, 2018
    Inventors: Emad Aqad, James W. Thackeray, James F. Cameron
  • Acid-cleavable monomer and polymers including the same
    Patent number: 10095109
    Abstract: A monomer having formula (I): wherein in formula (I), groups and variables are the same as described in the specification.
    Type: Grant
    Filed: March 31, 2017
    Date of Patent: October 9, 2018
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, James W. Thackeray
  • ACID-CLEAVABLE MONOMER AND POLYMERS INCLUDING THE SAME
    Publication number: 20180284605
    Abstract: A monomer having formula (I): wherein in formula (I), groups and variables are the same as described in the specification.
    Type: Application
    Filed: March 31, 2017
    Publication date: October 4, 2018
    Inventors: Emad Aqad, James W. Thackeray
  • Photoacid-generating compound and associated polymer, photoresist composition, and method of forming a photoresist relief image
    Patent number: 10088749
    Abstract: A photoacid-generating compound has the structure wherein m, n, R1, R2, X, Y, and Z? are defined herein. The photoacid-generating compound exhibits strong absorption and chemical sensitivity to extreme ultraviolet radiation, while also absorbing longer wavelengths with desirably reduced chemical sensitivity. Also described are a polymer incorporating the residue of a polymerizable version of the photoacid-generating compound, a photoresist composition that includes the photoacid-generating compound, the polymer, or a combination thereof, and a method of forming a photoresist relief image using the photoresist composition.
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: October 2, 2018
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventor: Emad Aqad
  • PHOTOACID-GENERATING COMPOUND AND ASSOCIATED POLYMER, PHOTORESIST COMPOSITION, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE
    Publication number: 20180095363
    Abstract: A photoacid-generating compound has the structure wherein m, n, R1, R2, X, Y, and Z? are defined herein. The photoacid-generating compound exhibits strong absorption and chemical sensitivity to extreme ultraviolet radiation, while also absorbing longer wavelengths with desirably reduced chemical sensitivity. Also described are a polymer incorporating the residue of a polymerizable version of the photoacid-generating compound, a photoresist composition that includes the photoacid-generating compound, the polymer, or a combination thereof, and a method of forming a photoresist relief image using the photoresist composition.
    Type: Application
    Filed: September 30, 2016
    Publication date: April 5, 2018
    Inventor: Emad Aqad
  • Photoacid-generating compound, polymer derived therefrom, photoresist composition including the photoacid-generating compound or polymer, and method of forming a photoresist relief image
    Patent number: 9921475
    Abstract: A photoacid-generating compound has the structure where R1, R2, R3, R4, Q, and X are defined herein. The photoacid-generating compound can be used as a component of a photoresist composition, or as a monomer incorporated into a polymer useful in a photoresist composition. The photoacid-generating compound provides a desired balance of solubility and line width roughness.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: March 20, 2018
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, William Williams, III, Cong Liu
  • PHOTOACID-GENERATING COMPOUND, POLYMER DERIVED THEREFROM, PHOTORESIST COMPOSITION INCLUDING THE PHOTOACID-GENERATING COMPOUND OR POLYMER, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE
    Publication number: 20180059542
    Abstract: A photoacid-generating compound has the structure where R1, R2, R3, R4, Q, and X are defined herein. The photoacid-generating compound can be used as a component of a photoresist composition, or as a monomer incorporated into a polymer useful in a photoresist composition. The photoacid-generating compound provides a desired balance of solubility and line width roughness.
    Type: Application
    Filed: August 31, 2016
    Publication date: March 1, 2018
    Inventors: Emad Aqad, William Williams, III, Cong Liu
  • Resins for underlayers
    Patent number: 9880469
    Abstract: Polymeric reaction products of certain substituted tetraarylmethane monomers are useful as underlayers in semiconductor manufacturing processes.
    Type: Grant
    Filed: July 7, 2015
    Date of Patent: January 30, 2018
    Assignees: Rohm and Haas Electronic Materials LLC, Rohm and Haas Electronic Materials Korea Ltd
    Inventors: Emad Aqad, Mingqi Li, Shintaro Yamada, Sung Wook Cho
  • CHOLATE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME
    Publication number: 20170285470
    Abstract: New photoacid generator compounds (“PAGs”) are provided that comprise a cholate moiety and photoresist compositions that comprise such PAG compounds.
    Type: Application
    Filed: June 5, 2017
    Publication date: October 5, 2017
    Applicants: Rohm and Haas Electronic Materials LLC, Rohm and Haas Electronic Materials LLC
    Inventors: Emad Aqad, Mingqi Li, Joseph Mattia, Cheng-Bai Xu