Patents by Inventor Emmerich Bertagnolli
Emmerich Bertagnolli has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20150114294Abstract: A processing system for processing an object (3) is provided, wherein the processing system is adapted, to focus a first energy beam, in particular an electron beam (11), and a second energy beam, in particular an ion beam (21), on a focusing region (29) in which a object (3) to be processed is arrangeable. A processing chamber wall (35) having two openings (38, 39) for traversal of both energy beams and a connector (37) for supplying process gas delimits a processing chamber (45) from a vacuum chamber (2) of the processing system. Processing the object by activating the process gas through one of the energy beams and inspecting the object via one of the energy beams is enabled for different orientations of the object relative to a propagation direction of one of the energy beams.Type: ApplicationFiled: January 6, 2015Publication date: April 30, 2015Inventors: Emmerich Bertagnolli, Heinz Wanzenboeck, Wolfram Buehler, Camille Stebler, Ulrike Zeile, Alexander Rosenthal
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Patent number: 9006681Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.Type: GrantFiled: March 10, 2014Date of Patent: April 14, 2015Assignee: Carl Zeiss Microscopy GmbHInventors: Heinz Wanzenboeck, Wolfram Buehler, Holger Doemer, Carl Kuebler, Daniel Fischer, Gottfried Hochleitner, Emmerich Bertagnolli
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Patent number: 8939108Abstract: A processing system for processing an object (3) is provided, wherein the processing system is adapted, to focus a first energy beam, in particular an electron beam (11), and a second energy beam, in particular an ion beam (21), on a focusing region (29) in which a object (3) to be processed is arrangeable. A processing chamber wall (35) having two openings (38, 39) for traversal of both energy beams and a connector (37) for supplying process gas delimits a processing chamber (45) from a vacuum chamber (2) of the processing system. Processing the object by activating the process gas through one of the energy beams and inspecting the object via one of the energy beams is enabled for different orientations of the object relative to a propagation direction of one of the energy beams.Type: GrantFiled: December 8, 2012Date of Patent: January 27, 2015Assignee: Carl Zeiss Microscopy GmbHInventors: Emmerich Bertagnolli, Heinz Wanzenboeck, Wolfram Buehler, Camille Stebler, Ulrike Zeile, Alexander Rosenthal
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Publication number: 20140191126Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.Type: ApplicationFiled: March 10, 2014Publication date: July 10, 2014Applicant: Carl Zeiss Microscopy GmbHInventors: Heinz Wanzenboeck, Wolfram Buehler, Holger Doemer, Carl Kuebler, Daniel Fischer, Gottfried Hochleitner, Emmerich Bertagnolli
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Patent number: 8507854Abstract: A particle beam system 1 for cleaning itself comprises an irradiation system to direct electromagnetic radiation onto the surfaces to be cleaned and a supply system 61 to supply a precursor gas to the interior of the vacuum chamber 11 of the particle beam system 1. The precursor gas is activated in a vicinity of the surfaces to be cleaned and is converted into a reaction gas which reacts with the contaminants present on the irradiated surfaces such that said contaminants may be pumped out then.Type: GrantFiled: July 13, 2010Date of Patent: August 13, 2013Assignee: Carl Zeiss Microscopy GmbHInventors: Wolfram Buehler, Holger Doemer, Matthias Lang, Joerg Stodolka, Peter Roediger, Emmerich Bertagnolli, Heinz Wanzenboeck
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Publication number: 20130098292Abstract: A processing system for processing an object (3) is provided, wherein the processing system is adapted, to focus a first energy beam, in particular an electron beam (11), and a second energy beam, in particular an ion beam (21), on a focusing region (29) in which a object (3) to be processed is arrangeable. A processing chamber wall (35) having two openings (38, 39) for traversal of both energy beams and a connector (37) for supplying process gas delimits a processing chamber (45) from a vacuum chamber (2) of the processing system. Processing the object by activating the process gas through one of the energy beams and inspecting the object via one of the energy beams is enabled for different orientations of the object relative to a propagation direction of one of the energy beams.Type: ApplicationFiled: December 8, 2012Publication date: April 25, 2013Applicant: Carl Zeiss NTS GmbHInventors: Emmerich Bertagnolli, Heinz Wanzenboeck, Wolfram Buehler, Camille Stebler, Ulrike Zeile, Alexander Rosenthal
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Publication number: 20120187291Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.Type: ApplicationFiled: March 23, 2012Publication date: July 26, 2012Applicant: CARL ZEISS NTS GMBHInventors: Heinz Wanzenboeck, Wolfram Buehler, Holger Doemer, Carl Kuebler, Daniel Fischer, Gottfried Hochleitner, Emmerich Bertagnolli
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Patent number: 8143594Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.Type: GrantFiled: February 5, 2010Date of Patent: March 27, 2012Inventors: Heinz Wanzenboeck, Wolfram Buehler, Holger Doemer, Carl Kuebler, Daniel Fischer, Gottfried Hochleitner, Emmerich Bertagnolli
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Patent number: 8008639Abstract: A processing system comprises a gas supply apparatus with which process gas is supplied to an object. An activation beam activates the gas thereby inducing a chemical reaction between material at the surface of the object and the process gas causing ablation of material from the surface or deposition of material at the surface. The gas supply apparatus is formed from a stack of plates providing a gas conduit system between at least one gas inlet and at least one gas outlet.Type: GrantFiled: November 11, 2008Date of Patent: August 30, 2011Assignee: Carl Zeiss NTS GmbHInventors: Wolfram Buhler, Alexander Rosenthal, Camille Stebler, Emmerich Bertagnolli, Heinz Wanzenbock
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Patent number: 7923702Abstract: A system and a method for processing and inspecting an object are provided, wherein the system comprises a particle beam column, an object holder and a gas supply apparatus. Thereby, the object holder is formed comprising a base, a first table displaceable relative to the base, a second table displaceable relative to the first table and a third table rotatable relative to the second table, wherein the cannula of the gas supply apparatus is fixed at the first table.Type: GrantFiled: November 11, 2008Date of Patent: April 12, 2011Assignee: Carl Zeiss NTS GmbHInventors: Wolfram Buhler, Alexander Rosenthal, Emmerich Bertagnolli, Heinz Wanzenbock, Markus Fischer, Gottfried Hochleitner
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Publication number: 20110079711Abstract: A particle beam system 1 for cleaning itself comprises an irradiation system to direct electromagnetic radiation onto the surfaces to be cleaned and a supply system 61 to supply a precursor gas to the interior of the vacuum chamber 11 of the particle beam system 1. The precursor gas is activated in a vicinity of the surfaces to be cleaned and is converted into a reaction gas which reacts with the contaminants present on the irradiated surfaces such that said contaminants may be pumped out then.Type: ApplicationFiled: July 13, 2010Publication date: April 7, 2011Inventors: Wolfram Buehler, Holger Doemer, Matthias Lang, Joerg Stodolka, Peter Roediger, Emmerich Bertagnolli, Heinz Wanzenboeck
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Publication number: 20100276607Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.Type: ApplicationFiled: February 5, 2010Publication date: November 4, 2010Inventors: Heinz Wanzenboeck, Wolfram Buehler, Holger Doemer, Carl Kuebler, Daniel Fischer, Gottfried Hochleitner, Emmerich Bertagnolli
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Publication number: 20100024730Abstract: A processing system for processing an object (3) is provided, wherein the processing system is adapted, to focus a first energy beam, in particular an electron beam (11), and a second energy beam, in particular an ion beam (21), on a focusing region (29) in which a object (3) to be processed is arrangeable. A processing chamber wall (35) having two openings (38, 39) for traversal of both energy beams and a connector (37) for supplying process gas delimits a processing chamber (45) from a vacuum chamber (2) of the processing system. Processing the object by activating the process gas through one of the energy beams and inspecting the object via one of the energy beams is enabled for different orientations of the object relative to a propagation direction of one of the energy beams.Type: ApplicationFiled: February 18, 2009Publication date: February 4, 2010Inventors: Emmerich Bertagnolli, Heinz Wanzenboeck, Wolfram Buehler, Camille Stebler, Ulrike Zeile, Alexander Rosenthal
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Publication number: 20090152459Abstract: A system and a method for processing and inspecting an object are provided, wherein the system comprises a particle beam column, an object holder and a gas supply apparatus. Thereby, the object holder is formed comprising a base, a first table displaceable relative to the base, a second table displaceable relative to the first table and a third table rotatable relative to the second table, wherein the cannula of the gas supply apparatus is fixed at the first table.Type: ApplicationFiled: November 11, 2008Publication date: June 18, 2009Applicant: Carl Zeiss NTS GmbHInventors: Wolfram Buhler, Alexander Rosenthal, Emmerich Bertagnolli, Heinz Wanzenbock, Markus Fischer, Gottfried Hochleitner
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Publication number: 20090152460Abstract: A processing system comprises a gas supply apparatus with which process gas is supplied to an object. An activation beam activates the gas thereby inducing a chemical reaction between material at the surface of the object and the process gas causing ablation of material from the surface or deposition of material at the surface. The gas supply apparatus is formed from a stack of plates providing a gas conduit system between at least one gas inlet and at least one gas outlet.Type: ApplicationFiled: November 11, 2008Publication date: June 18, 2009Applicant: Carl Zeiss NTS GmbHInventors: Wolfram Buhler, Alexander Rosenthal, Camille Stebler, Emmerich Bertagnolli, Heinz Wanzenbock
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Patent number: 7084442Abstract: The invention involves an array to couple a live cell, in particular a nerve cell, with an electronic circuit to pick up directly or indirectly electrically active cell signals and/or to electronically stimulate the cell, where the coupling array comprises a transistor (T1) with a double gate, where one of the gates is designed as a control gate (CG) to select the transistor via external control signals, and the other gate (FG) is connected to an electrically conducting contact element (1) which may be brought into contact with the cell (2) to register changes in the electric properties of the cell.Type: GrantFiled: August 19, 2004Date of Patent: August 1, 2006Assignee: Austria Wirtschaftsservice Gesellschaft mit beschrankter HaftungInventor: Emmerich Bertagnolli
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Patent number: 7074340Abstract: A method of producing a device for simultaneously carrying out an electrochemical and a topographical near field microscopy is disclosed, which is characterized in that a probe suitable for topographic near field microscopy is covered by a conductive material, the conductive material is covered by an insulating layer, and the conductive material and the insulating layer are removed in the region of the immediate tip of the probe.Type: GrantFiled: June 11, 2001Date of Patent: July 11, 2006Assignee: Innovationsagentur GesellschaftInventors: Alois Lugstein, Emmerich Bertagnolli, Christine Kranz, Boris Mizaikoff
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Patent number: 6894272Abstract: A device for simultaneously carrying out an electro-chemical and a topographical near field microscopy is described, which device comprises a region for topographical near field measurement and a region for electrochemical near field measurement, with the region for topographical near field measurement extending completely as far as to the immediate tip of the arrangement, characterized in that the region for electrochemical near field measurement starts at a defined distance from the immediate tip.Type: GrantFiled: June 11, 2001Date of Patent: May 17, 2005Assignee: Innovationsagentur Gesellschaft mbHInventors: Christine Kranz, Boris Mizaikoff, Alois Lugstein, Emmerich Bertagnolli
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Publication number: 20050101995Abstract: The invention involves an array to couple a live cell, in particular a nerve cell, with an electronic circuit to pick up directly or indirectly electrically active cell signals and/or to electronically stimulate the cell, with a passive electronic element (C1, R1), where one terminal is connected to a reference potential (M), and the other terminal is connected to a switched output of an electronic switch (T1) the input of which can be connected to a signal or voltage source (point B), where an electrically conducting contact element (1) can be brought into contact with the cell (2) and is connected between the output of the electric switch (point P) and the associated terminal of the passive electronic component (C1, R1).Type: ApplicationFiled: August 19, 2004Publication date: May 12, 2005Applicant: INNOVATIONSAGENTUR GESELLSCHAFTInventor: Emmerich Bertagnolli
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Publication number: 20050024953Abstract: The invention involves an array to couple a live cell, in particular a nerve cell, with an electronic circuit to pick up directly or indirectly electrically active cell signals and/or to electronically stimulate the cell, where the coupling array comprises a transistor (T1) with a double gate, where one of the gates is designed as a control gate (CG) to select the transistor via external control signals, and the other gate (FG) is connected to an electrically conducting contact element (1) which may be brought into contact with the cell (2) to register changes in the electric properties of the cell.Type: ApplicationFiled: August 19, 2004Publication date: February 3, 2005Applicant: INNOVATIONSAGENTUR GESELLSCHAFTInventor: Emmerich Bertagnolli