Abstract: The present teachings relate to a method for improving a production process for manufacturing a chemical product using at least one input material at an industrial plant, the industrial plant comprising a plurality of physically separated equipment zones, the method comprising: providing, via an interface, an upstream object identifier comprising input material data; receiving, at a computing unit, real-time process data from one or more of the equipment zones; determining, via the computing unit, a subset of the real-time process data based on the upstream object identifier and a zone presence signal; computing, via the computing unit, at least one zone-specific performance parameter of the chemical product related to the upstream object identifier based on the subset of the real-time process data and historical data; determining, in response to at least one of the performance parameters, a target equipment zone where the input material and/or chemical product is to be sent.

Abstract: A system includes: a high bandwidth memory (HBM) including a first sensing unit configured to generate one or more first environmental signals corresponding to a first transistor in a first memory cell, and a second sensing unit configured to generate one or more second environmental signals corresponding to a second transistor in a second memory cell; and a differentiated dynamic voltage and frequency scaling (DDVFS) device configured to perform the following (1) for a first set of the memory cells which includes the first memory cell, controlling temperature by adjusting one or more first transistor-temperature-affecting (TTA) parameters of the first set based on the one or more first environmental signals, and (2) for a second set of the memory cells which includes the second memory cell, controlling temperature by adjusting one or more second TTA parameters of the second set based on the one or more second environmental signals.

Abstract: An integrated circuit includes a transistor formed in a semiconductor structure, a front-side horizontal conducting line in a first metal layer above the semiconductor structure, and a front-side vertical conducting line in a second metal layer above the first metal layer. The front-side horizontal conducting line is directly connected to a first terminal of the transistor, and the front-side vertical conducting line is directly connected to the front-side horizontal conducting line. In the integrated circuit, a front-side fuse element is conductively connected to the front-side vertical conducting line, and a backside conducting line is directly connected to a second terminal of the transistor. A word connection line extending in the first direction is directly connected to a gate terminal of the transistor.

Abstract: A method of forming a storage cell includes: forming a transistor on a semiconductor substrate; forming a plurality of fuses in at least one conductive layer on the semiconductor substrate to couple a connecting terminal of the transistor; forming a bit line to couple the plurality of fuses; and forming a word line to couple a control terminal of the transistor.

Abstract: A memory integrated circuit is provided. The memory integrated circuit includes a first memory array, a second memory array and a driving circuit. The first and second memory arrays are laterally spaced apart, and respectively include: memory cells, each including an access transistor and a storage capacitor coupled to the access transistor; bit lines, respectively coupled to a row of the memory cells; and word lines, respectively coupled to a column of the memory cells. The driving circuit is disposed below the first and second memory arrays, and includes sense amplifiers. Each of the bit lines in the first memory array and one of the bit lines in the second memory array are routed to input lines of one of the sense amplifiers.

Abstract: The present invention relates to a plant growth regulator of elevating anti-stress ability and use thereof. The plant growth regulator, which is consisted of Lactobacillus fermenting culture solution, has excellent thermostability and safety without any side effect, significantly elevating ability against biotic and abiotic stresses. Therefore, the Lactobacillus fermenting culture solution can be applied as the plant growth regulator or a use in preparation of a composition for elevating anti-stress ability of a plant.

Abstract: The present teachings relate to a method for monitoring a production process for manufacturing a chemical product at an industrial plant, the method comprising: providing an up-stream object identifier comprising input material data, receiving real-time process data from one or more of the equipment zones; determining a subset of the real-time process data based on the upstream object identifier and a zone presence signal; computing at least one zone-specific performance parameter of the chemical product related to the up-stream object identifier based on the subset of the real-time process data and historical data; appending, to the upstream object identifier, the at least one zone-specific performance parameter. The present teachings also relate to a system for monitoring a production process, a dataset, use, a method for generating the dataset and a software program for the same.

Abstract: A memory device includes a semiconductor substrate. The memory device includes a stack of channel layers over the semiconductor substrate, each channel layer including an oxide material. The memory device includes a word line structure interleaved with the stack of channel layers. The memory device includes a source feature and a drain feature on both sides of the stack of channel layers.

Abstract: Disclosed herein are related to a memory array including a set of memory cells and a set of switches to configure the set of memory cells. In one aspect, each switch is connected between a corresponding local line and a corresponding subset of memory cells. The local clines may be connected to a global line. Local lines may be metal rails, for example, local bit lines or local select lines. A global line may be a metal rail, for example, a global bit line or a global select line. A switch may be enabled or disabled to electrically couple a controller to a selected subset of memory cells through the global line. Accordingly, the set of memory cells can be configured through the global line rather than a number of metal rails to achieve area efficiency.

Abstract: An optoelectronic semiconductor device is provided. The optoelectronic semiconductor device includes an epitaxial stack, a trench, a concave portion, a first contact structure, and a first electrode. The epitaxial stack includes a first semiconductor structure, an active structure on the first semiconductor structure, and a second semiconductor structure on the active structure, wherein the epitaxial stack has a first portion and a second portion, and the second semiconductor structure of the first portion is separated from the second semiconductor structure of the second portion. The trench is located between the first portion and the second portion. The concave portion is located in the first portion. The first contact structure is located in the concave portion. The first electrode covers the first contact structure. When the optoelectronic semiconductor device is operating, the first portion does not emit light.

Abstract: A method can be used for controlling a downstream production process for manufacturing an article at a downstream industrial plant, by processing at least one thermoplastic polyurethane (“TPU”) and/or expanded thermoplastic polyurethane (“ETPU”) material using the downstream production process. The method involves providing, at a downstream computing unit, a set of downstream control settings for controlling the production of the article. The downstream control settings are determined based on a downstream object identifier; at least one desired downstream performance parameter related to the article; and downstream historical data. The set of downstream control settings is usable for manufacturing the article at the downstream industrial plant. A corresponding system for downstream production, use, and software product are provided.

Abstract: In an embodiment, a device includes a first gate structure over a substrate, the first gate structure including a first gate electrode over a first side of a first gate dielectric; a first electrode and a second electrode disposed over a second side of the first gate dielectric opposite the first side; a second gate structure disposed between the first electrode and the second electrode, the second gate structure including a second gate electrode and a second gate dielectric, the second gate dielectric at least laterally surrounding the second gate electrode; and a semiconductor film disposed between the first electrode and the second electrode and at least laterally surrounding the second gate structure, wherein at least one of the first gate dielectric or the second gate dielectric is a memory film.

Abstract: A FeFET configured as a 2-bit storage device that includes a gate stack including a ferroelectric layer over a semiconductor substrate; and the ferroelectric layer includes dipoles; and a first set of dipoles at the first end of the ferroelectric layer has a first polarization; and a second set of dipoles at the second end of the ferroelectric layer has a second polarization, the first and second polarizations of the corresponding first and second sets of dipoles representing storage of 2 bits, wherein a first bit of the 2-bit storage device being configured to be read by application of a read voltage to the source region and a do-not-disturb voltage to the drain region; and a second bit of the 2-bit storage device being configured to be read by application of the do-not-disturb voltage to the source region and the read voltage to the drain region.

Abstract: A method for fabricating memory devices includes forming a first portion of a memory device that includes a first device portion and one or more first interface portions. The first device portion includes a plurality of first memory strings, each of which includes a plurality of first memory cells vertically separated from one another. Each of the one or more first interface portions, laterally abutted to one side of the first device portion, includes a plurality of first word lines (WLs). The method further includes forming a plurality of first source lines (SLs) and a plurality of first bit lines (BLs) in the first device portion. The method further includes forming a first seal ring structure that laterally encloses both the first device portion and the first interface portion concurrently with forming the pluralities of SLs and BLs.

Abstract: A semiconductor device includes a word line (WL) structure. The semiconductor device includes a ferroelectric layer over the WL structure. The semiconductor device includes a channel layer over the ferroelectric layer. The semiconductor device includes a source line (SL) structure over the channel layer. The semiconductor device includes a bit line (BL) structure over the channel layer. The BL structure includes a portion that laterally extends toward the SL structure. The semiconductor device further includes a dielectric layer laterally interposed between the SL structure and the BL structure.

Abstract: A memory device includes a first memory array including: a plurality of memory strings spaced from each other along a first lateral direction and a second lateral direction, each of the plurality of memory strings including a plurality of memory cells arranged along a vertical direction; and a plurality of first conductive structures extending along the vertical direction; wherein each of the plurality of first conductive structures includes a first portion and a second portion; wherein the first portion extends across the plurality of memory cells of a corresponding pair of the plurality of memory strings along the vertical direction, and the second portion is disposed over the first portion along the vertical direction; and wherein the second portion extends farther than the first portion along at least one of the first or second lateral direction.

Abstract: A memory device includes a first transistor. The first transistor includes one or more first semiconductor nanostructures spaced apart from one another along a first direction. Each of the one or more first semiconductor nanostructures has a first width along a second direction perpendicular to the first direction. The memory device also includes a second transistor coupled to the first transistor in series. The second transistor includes one or more second semiconductor nanostructures spaced apart from one another along the first direction. Each of the one or more second semiconductor nanostructures has a second, different width along the second direction.

Abstract: A method of operating a memory circuit includes enabling a first row of select transistors, disabling a second row of select transistors, enabling a first row of memory cells in response to a first word line signal, and disabling a second row of memory cells in response to a second word line signal. Enabling the first row of select transistors includes turning on a first select transistor in the first row of select transistors in response to a first select line signal thereby electrically coupling a first local bit line and a global bit line to each other. Disabling the second row of select transistors includes turning off a second select transistor in the second row of select transistors in response to a second select line signal thereby electrically decoupling a second local bit line and the global bit line from each other.

Abstract: Disclosed herein are related to a memory array. In one aspect, the memory array includes a set of resistive storage circuits including a first subset of resistive storage circuits connected between a first local line and a second local line in parallel. The first local line and the second local line may extend along a first direction. In one aspect, for each resistive storage circuit of the first subset of resistive storage circuits, current injected at a first common entry point of the first local line exits through a first common exit point of the second local line, such that each resistive storage circuit of the first subset of resistive storage circuits may have same or substantial equal resistive loading.

Abstract: A memory device includes a substrate, a first transistor and a second transistor, a Schottky diode, a first word line, a second word line, and a bit line. The first transistor and the second transistor are over the substrate, wherein a first source/drain structure of the first transistor is electrically connected to a first source/drain structure of the second transistor. The Schottky diode is electrically connected to a gate structure of the first transistor. The first word line is electrically connected to the gate structure of the first transistor through the Schottky diode. The second word line is electrically connected to a gate structure of the second transistor. The bit line is electrically connected to a second source/drain structure of the second transistor.