Abstract: A variable chiller exhaust system incorporate a plurality of chillers, each chiller having an inlet receiving air from a crown in an aircraft fuselage and an outlet connected to a manifold. A plurality of check valves are connected to the manifold and configured to maintain a differential back pressure on the plurality of chillers of 2? water pressure or less. The check valves vent into the crown. An exhaust conduit is connected to direct air from the manifold to a variable speed fan. An outflow valve exhausts air from the variable speed fan to an exterior of the fuselage.

Abstract: A data analysis and processing method includes forming an initial assembly of datasets comprising multiple entities, where each entity is a collection of variables and relationships that define how entities interact with each other, simulating an evolution of the initial assembly by performing multiple iterations in which a first iteration uses the initial assembly as a starting assembly, and querying, during the simulating, the evolution of the initial assembly, for datasets that meet an optimality criterion.

Abstract: A reactor system and related methods are provided which may include a heating element in a wafer tray. The heating element may be used to heat the wafer tray and a substrate or wafer seated on the wafer tray within a reaction chamber assembly, and may be used to cause sublimation of a native oxide of the wafer.

Abstract: The GPS-locating sports ball comprises a ball, a locating circuit, and software. The locating circuit may determine one or more physical parameters of the ball. As a non-limiting example, the ball may be a golf ball, a tennis ball, a baseball, a softball, or a bowling ball. The locating circuit may communicate the one or more physical parameters to the software running on a smart device. The software may be operable to assist in locating a lost ball and in monitoring improvements in athletic performance based upon an analysis of the one or more physical parameters.

Abstract: A lift pin and a substrate support assembly and reactor including the lift pin are disclosed. The lift pin includes first section comprising a material having a first transparency and a second section comprising a material having a second transparency. The lift pin can provide improved temperature uniformity across substrate support assembly including the lift pin during substrate processing.

Abstract: An improved exhaust system for a gas-phase reactor and a reactor and system including the exhaust system are disclosed. The exhaust system includes a channel fluidly coupled to an exhaust plenum. The improved exhaust system allows operation of a gas-phase reactor with desired flow characteristics while taking up relatively little space within a reaction chamber.

Abstract: A laundry appliance includes a cabinet defining a front opening in a front panel. The front opening is defined by a lip having a curved edge. The lip defines a plurality of apertures spaced-apart around the front opening. A tub is disposed within the cabinet. The tub defines an access opening aligned with the front opening. A drum is disposed within the tub. A bellows assembly extends between the cabinet and the tub. The bellows assembly includes a projection coupled to the curved edge of the cabinet. A deflector has a rim and a chute wherein the chute extends toward the drum. The rim is configured to snap-fit over the projection of the bellows assembly. The rim includes a plurality of hooks where each hook is configured to extend through an aperture and interlock with the cabinet.

Abstract: A substrate support assembly suitable for use in a reactor including a common processing and substrate transfer region is disclosed. The substrate support assembly includes a susceptor and one or more lift pins that can be used to lower a substrate onto a surface of the susceptor and raise the substrate from the surface, to allow transfer of the substrate from the processing region, without raising or lowering the susceptor.

Abstract: A system and method for providing intermediate reactive species to a reaction chamber are disclosed. The system includes an intermediate reactive species formation chamber fluidly coupled to the reaction chamber to provide intermediate reactive species to the reaction chamber. A pressure control device can be used to control an operating pressure of the intermediate reactive species formation chamber, and a heater can be used to heat the intermediate reactive species formation chamber to a desired temperature.

Abstract: A substrate support assembly suitable for use in a reactor including a common processing and substrate transfer region is disclosed. The substrate support assembly includes a susceptor and one or more lift pins that can be used to lower a substrate onto a surface of the susceptor and raise the substrate from the surface, to allow transfer of the substrate from the processing region, without raising or lowering the susceptor.

Abstract: A water treatment apparatus that includes: at least one module which operatively and selectively treats one or both of an original household hot water received from the household hot water line and water flowing through the module and treats cold water received from an original household cold water line that flows through; a process control unit whereby a user selects a desired treatment option for the water flowing through the apparatus to be dispensed to the user; one or more plumbing connections which operatively divert the original household hot and cold water flow to the user selected water treatment module so as to dispense to the user the selected treated water; and one or more valves which operatively cooperate with the process control unit to direct the water flow within the apparatus so as to provide the user with the selected treated water.

Abstract: A laundry appliance includes a body that houses a motor that selectively operates a drum for processing laundry, wherein the body includes an aperture for selectively accessing the drum. A door panel provides selective access to the aperture. A controller is configured to operate at least the motor. A user interface is in communication with the controller for selecting a laundry-processing operation to be performed. An outer panel at least partially conceals the body from view. An outer selector is positioned proximate the outer panel, wherein the outer selector is in communication with the controller via the user interface.

Abstract: A reactor system and related methods are provided which may include a heating element in a wafer tray. The heating element may be used to heat the wafer tray and a substrate or wafer seated on the wafer tray within a reaction chamber assembly, and may be used to cause sublimation of a native oxide of the wafer.

Abstract: Improved impedance matching is provided in vertical probe arrays having conductive guide plates by providing ground pins connecting the guide plates that do not mechanically touch the device under test or the input test apparatus. Such ground pins can be disposed in predetermined patterns around corresponding signal probes to improve an impedance match between the probes and the test apparatus and/or the device under test. Preferably all impedances are matched to 50? as is customary for high frequency work.

Abstract: A reactor system and related methods are provided which may include a heating element in a wafer tray. The heating element may be used to heat the wafer tray and a substrate or wafer seated on the wafer tray within a reaction chamber assembly, and may be used to cause sublimation of a native oxide of the wafer.

Abstract: A lift pin and a substrate support assembly and reactor including the lift pin are disclosed. The lift pin includes first section comprising a material having a first transparency and a second section comprising a material having a second transparency. The lift pin can provide improved temperature uniformity across substrate support assembly including the lift pin during substrate processing.

Abstract: Systems and methods for on-wafer dynamic testing of electronic devices. The systems include a probe head assembly, a probe-side contacting structure, a chuck, and a chuck-side contacting structure. The probe head assembly includes a probe configured to electrically contact a first side of a device under test (DUT). The probe-side contacting structure includes a probe-side contacting region. The chuck includes an electrically conductive support surface configured to support a substrate that includes the DUT and to electrically contact a second side of the DUT. The probe head assembly and the chuck are configured to translate relative to one another to selectively establish electrical contact between the probe and the DUT. The chuck-side contacting structure includes a chuck-side contacting region that is in electrical communication with the electrically conductive support surface and opposed to the probe-side contacting structure. The methods may include methods of operating the system or systems.

Abstract: Improved electrically conductive guide plates for vertical probe arrays are provided by patterning a thin metal layer disposed on an insulating substrate. Holes passing through the guide plate for guiding probes can be electrically connected or isolated from each other in any pattern according to the deposition of the metal. Such structures can include several distinct ground and/or voltage planes. Furthermore, passive electrical components can be included in the guide plate, by patterning of the deposited metal and/or by integration of passive electrical components with the deposited metal traces.

Abstract: A substrate support assembly suitable for use in a reactor including a common processing and substrate transfer region is disclosed. The substrate support assembly includes a susceptor and one or more lift pins that can be used to lower a substrate onto a surface of the susceptor and raise the substrate from the surface, to allow transfer of the substrate from the processing region, without raising or lowering the susceptor.

Abstract: A system and method for removing both carbon-based contaminants and oxygen-based contaminants from a semiconductor substrate within a single process chamber is disclosed. The invention may comprise utilization of remote plasma units and multiple gas sources to perform the process within the single process chamber.