Abstract: A semiconductor memory device includes: a memory array including a plurality of memory cells, the memory cells being in any of a high resistance state (HRS) and a low resistance state (LRS); a reference array including a plurality of reference cells, the memory cells and the reference cells having the same impedance-temperature relationship, the reference cells being in a middle resistance state between HRS and LRS; an average circuit configured for averaging respective reference currents from the reference cells of the reference array into an average reference current; and a comparator configured for comparing a plurality of respective memory currents from the memory cells of the memory array with the average reference current to obtain a plurality of output data of the memory cells of the memory array and to determine respective impedance states of the memory cells of the memory array.

Abstract: A method for manufacturing a resistive memory device is disclosed and comprises following steps. Firstly, a bottom electrode is formed over a substrate. Next, an oxidation process is performed to the bottom electrode to form a metal oxide layer, wherein a hydrogen plasma and an oxygen plasma are provided during the oxidation process. Then, a top electrode is formed on the metal oxide layer.

Abstract: A semiconductor device including a memory cell structure is provided, and the memory cell structure includes an insulating layer disposed above a substrate, a bottom electrode embedded in the insulating layer, a resistance switching layer disposed on the bottom electrode, and a top electrode disposed on the resistance switching layer and covering the resistance switching layer. Also, the bottom electrode has a concave top surface lower than a flat upper surface of the insulating layer.

Abstract: A resistance switching memory device is provided, including an insulating layer having a top surface, a bottom electrode embedded in the insulating layer, a resistance switching layer disposed on the bottom electrode, and a top electrode formed on the resistance switching layer and covering the resistance switching layer. Also, the bottom electrode has an upper portion protruding from the top surface of the insulating layer, and the upper portion has round corners at edges.

Abstract: A semiconductor memory device includes programmable resistance memory cells and a controller which applies a forming pulse to first and second groups of the programmable resistance memory cells for inducing a change in the first group from an initial resistance range to an intermediate resistance range, and for inducing the second group having a resistance outside the intermediate range. When a forming rate is lower than a first forming threshold rate, the controller adjusts the forming pulse until the forming rate is higher than the first forming threshold rate. When a forming rate is higher than the first forming threshold rate but lower than a second forming threshold rate, the controller adjusts the forming pulse until the forming rate is higher than the second forming threshold rate. The controller applies a programming pulse to the first and second groups and generates a chip ID of the semiconductor memory device.

Abstract: A method for generating a data set on an integrated circuit including programmable resistance memory cells includes applying a forming pulse to all members of a set of the programmable resistance memory cells. The forming pulse has a forming pulse level characterized by inducing a change in resistance in a first subset of the set from an initial resistance range to an intermediate resistance range, while after the forming pulse a second subset of the set has a resistance outside the intermediate range. The method includes applying a programming pulse to the first and second subsets. The programming pulse has a programming pulse level characterized by inducing a change in resistance of the first subset from the intermediate range to a first final range, while after the programming pulse the second subset has a resistance in a second final range, whereby the first and second subsets store said data set.

Abstract: A memory architecture has improved controllability of operations for bipolar current directions used to write data in programmable resistance memory cells, including ReRAM cells based on metal oxide memory materials. Instead of a fixed gate voltage on a specific decoder transistor or cell selection device, and a control voltage set to values that cause the decoder transistor or cell selection device to operate in a fully-on mode for one current direction or in a current moderating mode with opposite current direction. Using this technology allows symmetrical or close to symmetrical operation in both current directions with little or no effect on the array complexity.

Abstract: A memory structure and a manufacturing method for the same are disclosed. The memory structure comprises a lower electrode, an upper insulating layer, a material layer, a dielectric film, and an upper electrode. The upper insulating layer is on the lower electrode. The material layer is on the upper insulating layer. The upper insulating layer and the material layer have a common opening to expose a portion of the lower electrode. The dielectric film is on the exposed portion of the lower electrode. The dielectric film and the material layer contain a same first transition metal. The upper electrode is on the dielectric film and fills the common opening.

Abstract: A memory structure and a manufacturing method for the same are disclosed. The memory structure comprises a lower electrode, an upper insulating layer, a material layer, a dielectric film, and an upper electrode. The upper insulating layer is on the lower electrode. The material layer is on the upper insulating layer. The upper insulating layer and the material layer have a common opening to expose a portion of the lower electrode. The dielectric film is on the exposed portion of the lower electrode. The dielectric film and the material layer contain a same first transition metal. The upper electrode is on the dielectric film and fills the common opening.

Abstract: The present invention relates to metal oxide based memory devices and methods for manufacturing such devices; and more particularly to memory devices having data storage materials based on metal oxide compounds fabricated with a roughness tuning process including an ion bombardment step of a bottom electrode surface prior to formation of a memory element on the bottom electrode surface. Ion bombardment improves the flatness of the bottom electrode which is beneficial in achieving a more uniform electrical field during operation, which improves device reliability.

Abstract: A method for manufacturing a resistive memory device is disclosed and comprises following steps. Firstly, a bottom electrode is formed over a substrate. Next, an oxidation process is performed to the bottom electrode to form a metal oxide layer, wherein a hydrogen plasma and an oxygen plasma are provided during the oxidation process. Then, a top electrode is formed on the metal oxide layer.

Abstract: A memory structure including an insulating layer, a first electrode layer and a first barrier is provided. The insulating layer has a recess. The first electrode layer is formed in the recess and has a first top surface. The first barrier is formed between the insulating layer and the first electrode layer, and has a second top surface lower than the first top surface. The first top surface and the second top surface are lower than an opening of the recess.

Abstract: Circuitry coupled to a programmable element comprising metal oxide is configured to execute a program-verify operation including: an initial cycle of a program operation and a verify operation, and subsequent cycles. The initial cycle includes an initial instance of the program operation to establish a cell resistance of the programmable element, and an initial instance of the verify operation to determine whether the cell resistance of the memory cell is within the target resistance range. At least one of the subsequent cycles includes an additional pulse having a second polarity to the programmable element, and a subsequent instance of the verify operation. The first polarity of the initial program pulse and the second polarity of the additional pulse have opposite polarities. A subsequent instance of the program operation includes applying a subsequent program pulse having the first polarity to the programmable element.

Abstract: The present invention relates to metal oxide based memory devices and methods for manufacturing such devices, and more particularly to memory devices having data storage materials based on metal oxide compounds fabricated with a biased plasma oxidation process which improves the interface between the memory element and a top electrode for a more a uniform electrical field during operation, which improves device reliability.

Abstract: Circuitry coupled to a programmable element comprising metal oxide is configured to execute a program-verify operation including: an initial cycle of a program operation and a verify operation, and subsequent cycles. The initial cycle includes an initial instance of the program operation to establish a cell resistance of the programmable element, and an initial instance of the verify operation to determine whether the cell resistance of the memory cell is within the target resistance range. At least one of the subsequent cycles includes an additional pulse having a second polarity to the programmable element, and a subsequent instance of the verify operation. The first polarity of the initial program pulse and the second polarity of the additional pulse have opposite polarities. A subsequent instance of the program operation includes applying a subsequent program pulse having the first polarity to the programmable element.

Abstract: A memory device comprises a substrate, a first electrode layer, a spacer, a memory layer and a second electrode layer. The substrate has a recess. The first electrode layer is formed in the recess and has a top surface exposed from an opening of the recess. The spacer covers on a portion of the top surface, so as to define a contact area on the top surface. The memory layer is formed on the contact area. The second electrode layer is formed on the memory layer and electrically connected to the memory layer.

Abstract: A resistive memory device is provided, comprising a bottom electrode, a patterned dielectric layer with a via formed on the bottom electrode, a barrier layer formed at sidewalls and a bottom surface of the via as a liner, a ring-shaped metal layer formed at sidewalls and a bottom surface of the barrier layer, and a ring-shaped metal oxide formed on a top surface of the ring-shaped metal layer.

Abstract: A semiconductor structure and a method for manufacturing the same are provided. The semiconductor structure comprises an access device, a dielectric layer, a barrier layer, a first interlayer conductor, a first barrier liner, a second interlayer conductor, a second barrier liner, a memory element and a top electrode layer. The access device has two terminals. The dielectric layer covers the access device. The barrier layer is disposed on the dielectric layer. The first and second interlayer conductors are connected to the two terminals, respectively. The first and second barrier liners are disposed on sidewalls of the first and second interlayer conductors, respectively. The memory element is disposed on the first interlayer conductor. The top electrode layer is disposed on the barrier layer and the memory element and covers the memory element.

Abstract: A method is provided for manufacturing a memory. An insulating layer is formed over an array of interlayer conductors, and etched to define a first opening corresponding to a first interlayer conductor in the array, where the etching stops at a first top surface of the first interlayer conductor. A metal oxide layer is formed on the first top surface. A first layer of barrier material is deposited conformal with and contacting the metal oxide layer and surfaces of the first opening. Subsequently the insulating layer is etched to define a second opening corresponding to a second interlayer conductor in the array, where the etching stops at a second top surface of the second interlayer conductor. A second layer of barrier material is deposited conformal with and contacting the first layer of barrier material in the first opening. The first opening is filled with a conductive material.

Abstract: A method is provided for manufacturing a memory. An insulating layer is formed over an array of interlayer conductors, and etched to define a first opening corresponding to a first interlayer conductor in the array, where the etching stops at a first top surface of the first interlayer conductor. A metal oxide layer is formed on the first top surface. A first layer of barrier material is deposited conformal with and contacting the metal oxide layer and surfaces of the first opening. Subsequently the insulating layer is etched to define a second opening corresponding to a second interlayer conductor in the array, where the etching stops at a second top surface of the second interlayer conductor. A second layer of barrier material is deposited conformal with and contacting the first layer of barrier material in the first opening. The first opening is filled with a conductive material.