Abstract: A method for programming a non-volatile memory (NVM) and an integrated circuit is disclosed. In an embodiment an integrated circuit includes a memory plane organized into rows and columns of memory words, each memory word comprising memory cells and each memory cell including a state transistor having a control gate and a floating gate and write circuitry configured to program a selected memory word during a programming phase by applying a first nonzero positive voltage to control gates of the state transistors of the memory cells that do not belong to the selected memory word.

Abstract: A method for encoding a data value to be transmitted on an SPI serial bus includes an operation to modify a status register of a memory, at least at one chosen time instant, as a function of all or part of the data value to be transmitted.

Abstract: A method for writing to electrically erasable and programmable non-volatile memory and a corresponding integrated circuit are disclosed. In an embodiment a method includes operatively connecting a filter circuit belonging to a communication interface to an oscillator circuit, wherein the communication interface is physically connected to a bus, generating, by the oscillator circuit, an oscillation signal and regulating the oscillation signal by the filter circuit so as to generate a clock signal for timing a write cycle.

Abstract: An EEPROM includes a floating gate transistor having a source region, a channel region and a drain region. A first capa implant zone on a drain-side of the floating gate transistor has a first dopant concentration level. A second capa implant zone in the first capa implant zone adjacent the drain region has a second dopant concentration level that is greater than the first dopant concentration level. A gate oxide region insulates the floating gate electrode from the channel region, first capa implant zone and second capa implant zone. A thickness of the gate oxide region is thinner at the second capa implant zone than at the channel region and first capa implant zone.

Abstract: A method of writing in a memory of the EEPROM type includes, in the presence of a string of new bytes to be written in the memory plane in at least one destination memory word already containing old bytes, a verification for each destination memory word whether or not the old bytes of this destination memory word must all be replaced with new bytes. The method also includes a reading of the old bytes of this destination memory word only if the old bytes must not all be replaced with new bytes.

Abstract: An EEPROM memory integrated circuit includes memory cells arranged in a memory plane. Each memory cell includes an access transistor in series with a state transistor. Each access transistor is coupled, via its source region, to the corresponding source line and each state transistor is coupled, via its drain region, to the corresponding bit line. The floating gate of each state transistor rests on a dielectric layer having a first part with a first thickness, and a second part with a second thickness that is less than the first thickness. The second part is located on the source side of the state transistor.

Abstract: Disclosed herein is a method of operating a non-volatile static random access NVSRAM memory formed from words. Each word includes NVSRAM cells, each of those NVSRAM cells having an SRAM cell and an electronically erasable programmable read only memory EEPROM cell. If the SRAM cells of a word have been accessed since powerup, data is read from the NVSRAM cells of that word through the SRAM cells. However, if the SRAM cells of that word have not been written since powerup, data is read from the NVSRAM cells of that word through the EEPROM cells.

Abstract: A read amplifier of a memory device has two current generators, an inverter, and five transistors. The inverter is connected to the second current generator. The first transistor has a gate connected to the read amplifier, a drain connected to the first current generator, and a source connected to a reference ground. The second transistor has a gate connected to the first current generator, a drain connected to a reference voltage, and a source connected to the gate of the first transistor. The third transistor has a drain connected to the first current generator and a source connected to the reference ground. The fourth transistor has a gate connected to the first current generator, a drain connected to the second current generator, and a source connected to the reference ground. The fifth transistor has a drain connected to the second current generator and a source connected to the reference voltage.

Abstract: An EEPROM includes a floating gate transistor having a source region, a channel region and a drain region. A first capa implant zone on a drain-side of the floating gate transistor has a first dopant concentration level. A second capa implant zone in the first capa implant zone adjacent the drain region has a second dopant concentration level that is greater than the first dopant concentration level. A gate oxide region insulates the floating gate electrode from the channel region, first capa implant zone and second capa implant zone. A thickness of the gate oxide region is thinner at the second capa implant zone than at the channel region and first capa implant zone.

Abstract: A value representative of a duration of the low state of a synchronization signal on a bus is measured and then compared with a threshold value. The threshold value is stored in a memory and the measured value represents, in a first comparison, a longest duration of the low states of the synchronization signal.

Abstract: Disclosed herein is a method of performing a non-volatile write to a memory containing a plurality of volatile memory cells grouped into words, with each volatile memory cell having at least one non-volatile memory cell associated therewith. The method includes steps of a) receiving a non-volatile write instruction including at least one address and at least one data word to be written to that at least one address, b) writing the at least one data word to the volatile memory cells of a word at the at least one address, and c) writing data from the volatile memory cells written to during step b) to the non-volatile memory cells associated to those volatile memory cells by individually addressing those non-volatile memory cells for non-volatile writing, but not writing data from other volatile memory cells to their associated non-volatile memory cells because those non-volatile memory cells are not addressed.

Abstract: In an embodiment, an electronic device for filtering an incoming digital signal includes several elementary filtering modules that include an elementary input configured to receive an incident elementary signal extracted from an incoming signal, an elementary output, and a dedicated capacitive circuit. The device further includes a resistive circuit common to all the elementary filtering modules and configured for cooperating with the capacitive circuit of each elementary filtering module in such a manner as to filter, on the respective elementary output, pulses of the incident elementary signal having a first voltage level and a duration less than a time constant and to deliver a filtered elementary signal on the elementary output.

Abstract: A memory device includes a memory plane including a succession of neighboring semiconductor recesses of a first type of conductivity, wherein each semiconductor recess houses a plurality of memory words including a plurality of memory cells, wherein each memory cell includes a state transistor having a floating gate and a control gate. The memory device further includes a plurality of control gate selection transistors respectively allocated to each memory word of the plurality of memory words, wherein each control gate selection transistor is coupled to the control gates of the state transistors of the memory word to which the control gate selection transistor is allocated, wherein each control gate selection transistor is situated in and on a neighbor semiconductor recess of the semiconductor recess housing the memory word to which the control gate selection transistor is allocated.

Abstract: In some embodiments, a buffer stage device includes a data input for receiving a data signal, a clock input for receiving a clock signal, a data output and a processor that is configured to deliver, to the data output, the data from the data signal in synchronism with clock cycles of the clock signal. The processor includes a first buffer module configured to deliver, to the data output, each datum in synchronism with a first edge of the clock signal and during a first half of a clock cycle, and a second buffer module configured to hold the datum at the data output during the second half of the clock cycle.

Abstract: Disclosed herein is a method of operating a non-volatile static random access NVSRAM memory formed from words. Each word includes NVSRAM cells, each of those NVSRAM cells having an SRAM cell and an electronically erasable programmable read only memory EEPROM cell. If the SRAM cells of a word have been accessed since powerup, data is read from the NVSRAM cells of that word through the SRAM cells. However, if the SRAM cells of that word have not been written since powerup, data is read from the NVSRAM cells of that word through the EEPROM cells.

Abstract: An EEPROM includes a floating gate transistor having a source region, a channel region and a drain region. A first capa implant zone on a drain-side of the floating gate transistor has a first dopant concentration level. A second capa implant zone in the first capa implant zone adjacent the drain region has a second dopant concentration level that is greater than the first dopant concentration level. A gate oxide region insulates the floating gate electrode from the channel region, first capa implant zone and second capa implant zone. A thickness of the gate oxide region is thinner at the second capa implant zone than at the channel region and first capa implant zone.

Abstract: Disclosed herein is a method of performing a non-volatile write to a memory containing a plurality of volatile memory cells grouped into words, with each volatile memory cell having at least one non-volatile memory cell associated therewith. The method includes steps of a) receiving a non-volatile write instruction including at least one address and at least one data word to be written to that at least one address, b) writing the at least one data word to the volatile memory cells of a word at the at least one address, and c) writing data from the volatile memory cells written to during step b) to the non-volatile memory cells associated to those volatile memory cells by individually addressing those non-volatile memory cells for non-volatile writing, but not writing data from other volatile memory cells to their associated non-volatile memory cells because those non-volatile memory cells are not addressed.

Abstract: In an embodiment, a method is provided for controlling a level of a read current in a non-volatile memory that is powered by a supply voltage includes. A model current representative of an actual current able to flow during a readout through a read path of the memory is determined based on the value of the supply voltage. The model current is compared to a reference current having a reference value. A control signal is generated. The control signal is to control the generation of the read current having a level equal to the lowest value between a fraction of the value of the model current and the reference value.

Abstract: A non-volatile memory device includes a substrate, a plurality of memory words, a control block, a first electrically-conducting link, and a plurality of second electrically-conducting links. The substrate includes a substantially planar surface. The memory words include B memory words disposed at the substantially planar surface. The control block includes B control elements disposed at the substantially planar surface. The first electrically-conducting link is disposed in a first plane parallel to the substantially planar surface. The first electrically-conducting link connects one of the B control elements to a memory word of the memory words. The plurality of second electrically-conducting links includes B-1 second electrically-conducting links respectively connecting B-1 remaining control elements to B-1 corresponding memory words of the plurality of memory words.

Abstract: A method can be used for writing in a memory location of the electrically-erasable and programmable memory type. The memory location includes a first memory cell with a first transistor having a first gate dielectric underlying a first floating gate and a second memory cell with a second transistor having a second gate dielectric underlying a second floating gate that is connected to the first floating gate. In a first writing phase, an identical tunnel effect is implemented through the first gate dielectric and the second gate dielectric. In a second writing phase, a voltage across the first gate dielectric but not the second gate dielectric is increased.