Patents by Inventor Frank Best
Frank Best has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20080085462Abstract: A device manufacturing method is disclosed that includes providing a substrate on a substrate table, the substrate having a target region comprising a plurality of generally planar surfaces, each surface having a different height relative to the substrate table, determining the relative heights of each generally planar surface, projecting a patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of one of the generally planar surfaces, moving the substrate table in a direction substantially parallel to the axis of the beam, and projecting the patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of another of the generally planar surfaces.Type: ApplicationFiled: September 29, 2006Publication date: April 10, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Keith Frank Best, Enno Van Den Brink, Cheng-Qun Gui, Budiman Sutedja, Peter Ten Berge
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Patent number: 7336497Abstract: An electronics housing for placement on a support rail includes a base part and an upper part. The base part and the upper part can be detachably connected to one another, and the base part can be snapped to the support rail. Two housing side walls having fasteners are disposed opposite to each other and are disposed parallel to each other. The housing side walls are also disposed perpendicular to the support rail. A circuit board is disposed parallel to the support rail using the fasteners. At least two connection terminals or plug-in connectors are provided for connecting the electrical conductors. The connection terminals are electrically connectable to the circuit board.Type: GrantFiled: April 20, 2007Date of Patent: February 26, 2008Assignee: Phoenix Contact GmbH & Co. KGInventors: Helmut Eusterholz, Frank Best
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Patent number: 7320847Abstract: A device manufacturing method capable of imaging structures on one side of a substrate aligned to markers on the other side, is presented herein. One embodiment of the present invention comprises providing a first substrate having first and second surfaces, patterning the first surface of the substrate with at least one reversed alignment marker, providing a protective layer over the alignment marker, and bonding the first surface of the first substrate to a second substrate. The embodiment further includes locally etching the first substrate as far as the protective layer to form a trench around the reversed alignment marker, and forming at least one patterned layer on the second surface using a lithographic projection apparatus having a front-to-backside alignment system while aligning the substrate to the alignment markers revealed in each trench.Type: GrantFiled: November 12, 2003Date of Patent: January 22, 2008Assignee: ASML Netherlands B.V.Inventors: Keith Frank Best, Joseph J. Consolini, Alexander Friz
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Publication number: 20070246256Abstract: An electronics housing for placement on a support rail includes a base part and an upper part. The base part and the upper part can be detachably connected to one another, and the base part can be snapped to the support rail. Two housing side walls having fasteners are disposed opposite to each other and are disposed parallel to each other. The housing side walls are also disposed perpendicular to the support rail. A circuit board is disposed parallel to the support rail using the fasteners. At least two connection terminals or plug-in connectors are provided for connecting the electrical conductors. The connection terminals are electrically connectable to the circuit board.Type: ApplicationFiled: April 20, 2007Publication date: October 25, 2007Applicant: PHOENIX CONTACT GMBH & CO. KGInventors: Helmut Eusterholz, Frank Best
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Patent number: 7133117Abstract: A device manufacturing method capable of imaging structures on both sides of a substrate, is presented herein. One embodiment of the present invention comprises a device manufacturing method that etches reversed alignment markers on a first side of a substrate to a depth of 10 ?m, the substrate is flipped over, and bonded to a carrier wafer and then lapped or ground to a thickness of 10 ?m to reveal the reversed alignment markers as normal alignment markers. The reversed alignment markers may comprise normal alignment patterns overlaid with mirror imaged alignment patterns.Type: GrantFiled: November 24, 2004Date of Patent: November 7, 2006Assignee: ASML Netherlands B.V.Inventors: Keith Frank Best, Joseph J. Consolini, Shyam Shinde
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Patent number: 7130049Abstract: In a method of measurement according to one embodiment of the invention, a relative position of a temporary alignment mark on one side of a substrate and an alignment mark on the other side of the substrate is determined, and the temporary alignment mark is removed. Before removal of the temporary alignment mark, a relative position of that mark and another mark on the same side of the substrate may be determined. The temporary alignment mark may be formed in, e.g., an oxide layer.Type: GrantFiled: December 24, 2003Date of Patent: October 31, 2006Assignee: ASML Netherlands B.V.Inventors: Joseph J. Consolini, Keith Frank Best, Alexander Friz
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Patent number: 7113258Abstract: A lithographic projection apparatus is provided with an optical system built into the wafer table for producing an image of a wafer mark that is provided on the back side of the wafer. The image is located at the plane of the front side of the wafer and can be viewed by an alignment system from the front side of the wafer. Simultaneous alignment between marks on the back and front of the wafer and a mask can be performed using a pre-existing alignment system. The lithographic projection apparatus is further provided with immersion system for providing a fluid between the lens and the substrate.Type: GrantFiled: September 14, 2004Date of Patent: September 26, 2006Assignee: ASML Netherlands B.V.Inventors: Henricus Wilhelmus Maria Van Buel, Keith Frank Best, Joseph J. Consolini, Joeri Lof, Edwin Ross Shafer
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Patent number: 7041996Abstract: While the alignment beam is focused on a mark on the substrate table, the substrate table is moved substantially perpendicularly to the alignment beam. If the image of the mark moves relative to a reference mark, then the substrate and the alignment beam are not perpendicular. The mark on the substrate table is aligned to a plurality of reference marks. At least two substrate marks are then aligned with a single reference mark. Errors due to the inclination of the alignment beam are eliminated from the expansion and rotation values calculated for the substrate.Type: GrantFiled: September 11, 2003Date of Patent: May 9, 2006Assignee: ASML Netherlands B.V.Inventors: Keith Frank Best, Joseph Consolini, Alexander Friz, Henricus Wilhelmus Maria Van Buel
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Patent number: 7019814Abstract: A method according to one embodiment of the invention may be used in determining relative positions of developed patterns on a substrate (exposed e.g. using the step mode). Such a method uses reference marks which are located within or even superimposed on device patterns. Also disclosed is a mask of a lithographic projection apparatus including reference marks that may be used in such a method.Type: GrantFiled: December 19, 2003Date of Patent: March 28, 2006Assignee: ASML Netherlands B.V.Inventors: Keith Frank Best, Joseph J. Consolini, Alexander Friz
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Patent number: 6914664Abstract: To align between layers having a large Z separation, an alignment system which illuminates reference markers with normally incident radiation is used. The alignment system has an illumination system that is telecentric on the substrate side.Type: GrantFiled: February 13, 2003Date of Patent: July 5, 2005Assignee: ASML Netherlands B.V.Inventors: Keith Frank Best, Alexander Friz, Joseph J. Consolini, Henricus Wilhelmus Maria Van Buel, Cheng-Qun Gui
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Patent number: 6844244Abstract: A device manufacturing method capable of imaging structures on both sides of a substrate, is presented herein. One embodiment of the present invention comprises a device manufacturing method that etches reversed alignment markers on a first side of a substrate to a depth of 10 ?m, the substrate is flipped over, and bonded to a carrier wafer and then lapped or ground to a thickness of 10 ?m to reveal the reversed alignment markers as normal alignment markers. The reversed alignment markers may comprise normal alignment patterns overlaid with mirror imaged alignment patterns.Type: GrantFiled: December 19, 2003Date of Patent: January 18, 2005Assignee: ASML Netherlands B.V.Inventors: Keith Frank Best, Joseph J. Consolini, Shyam Shinde
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Publication number: 20040156027Abstract: A method according to one embodiment of the invention may be used in determining relative positions of developed patterns on a substrate (exposed e.g. using the step mode). Such a method uses reference marks which are located within or even superimposed on device patterns. Also disclosed is a mask of a lithographic projection apparatus including reference marks that may be used in such a method.Type: ApplicationFiled: December 19, 2003Publication date: August 12, 2004Applicant: ASML NETHERLANDS B.V.Inventors: Keith Frank Best, Joseph J. Consolini, Alexander Friz
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Publication number: 20040157408Abstract: A device manufacturing method capable of imaging structures on both sides of a substrate, is presented herein. One embodiment of the present invention comprises a device manufacturing method that etches reversed alignment markers on a first side of a substrate to a depth of 10 &mgr;m, the substrate is flipped over, and bonded to a carrier wafer and then lapped or ground to a thickness of 10 &mgr;m to reveal the reversed alignment markers as normal alignment markers. The reversed alignment markers may comprise normal alignment patterns overlaid with mirror imaged alignment patterns.Type: ApplicationFiled: December 19, 2003Publication date: August 12, 2004Applicant: ASML NETHERLANDS B.V.Inventors: Keith Frank Best, Joseph J. Consolini, Shyam Shinde
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Publication number: 20040142256Abstract: A device manufacturing method capable of imaging structures on one side of a substrate aligned to markers on the other side, is presented herein. One embodiment of the present invention comprises providing a first substrate having first and second surfaces, patterning the first surface of the substrate with at least one reversed alignment marker, providing a protective layer over the alignment marker, and bonding the first surface of the first substrate to a second substrate. The embodiment further includes locally etching the first substrate as far as the protective layer to form a trench around the reversed alignment marker, and forming at least one patterned layer on the second surface using a lithographic projection apparatus having a front-to-backside alignment system while aligning the substrate to the alignment markers revealed in each trench.Type: ApplicationFiled: November 12, 2003Publication date: July 22, 2004Applicant: ASML NETHERLANDS B.V.Inventors: Keith Frank Best, Joseph J. Consolini, Alexander Friz
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Publication number: 20040124375Abstract: While the alignment beam is focused on a mark on the substrate table, the substrate table is moved substantially perpendicularly to the alignment beam. If the image of the mark moves relative to a reference mark, then the substrate and the alignment beam are not perpendicular. The mark on the substrate table is aligned to a plurality of reference marks. At least two substrate marks are then aligned with a single reference mark. Errors due to the inclination of the alignment beam are eliminated from the expansion and rotation values calculated for the substrate.Type: ApplicationFiled: September 11, 2003Publication date: July 1, 2004Applicant: ASML NETHERLANDS B.V.Inventors: Keith Frank Best, Joseph Consolini, Alexander Friz, Henricus Wilhelmus Maria Van Buel
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Publication number: 20030227604Abstract: To align between layers having a large Z separation, an alignment system which illuminates reference markers with normally incident radiation is used. The alignment system has an illumination system that is telecentric on the substrate side.Type: ApplicationFiled: February 13, 2003Publication date: December 11, 2003Applicant: ASML NETHERLANDS, B.VInventors: Keith Frank Best, Alexander Friz, Joseph J. Consolini, Henricus Wilhelmus Maria Van Buel, Cheng-Qun Gui