Patents by Inventor Frank Hille

Frank Hille has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11315892
    Abstract: A power semiconductor device, a power semiconductor module and a power semiconductor device processing method are provided. The power semiconductor device includes a first load terminal structure, a second load terminal structure, and a semiconductor structure electrically coupled to each load terminal structure and configured to carry a load current. The first load terminal structure includes a conductive layer in contact with the semiconductor structure, a bonding block configured to be contacted by at least one bond wire and to receive at least a part of the load current from the at least one bond wire and/or the conductive layer, a support block having a hardness greater than the hardness of the conductive layer and the bonding block. The bonding block is mounted on the conductive layer via the support block, and a zone is arranged within the conductive layer and/or the bonding block, the zone exhibiting nitrogen atoms.
    Type: Grant
    Filed: August 9, 2018
    Date of Patent: April 26, 2022
    Inventors: Roman Roth, Frank Hille, Hans-Joachim Schulze
  • Patent number: 10978418
    Abstract: A method of forming an electrical contact and a method of forming a chip package are provided. The methods may include arranging a metal contact structure including a non-noble metal and electrically contacting the chip, arranging a packaging material, and a protective layer including or essentially consisting of a portion formed at an interface between a portion of the metal contact structure and the packaging material, wherein the protective layer may include a noble metal, wherein the portion of the protective layer may include a plurality of regions free from the noble metal, and wherein the regions free from the noble metal may provide an interface between the packaging material and the non-noble metal of the metal contact structure.
    Type: Grant
    Filed: September 17, 2019
    Date of Patent: April 13, 2021
    Assignee: INFINEON TECHNOLOGIES AG
    Inventors: Joachim Mahler, Michael Bauer, Jochen Dangelmaier, Reimund Engl, Johann Gatterbauer, Frank Hille, Michael Huettinger, Werner Kanert, Heinrich Koerner, Brigitte Ruehle, Francisco Javier Santos Rodriguez, Antonio Vellei
  • Publication number: 20210082861
    Abstract: In various embodiments, a method of forming an electrical contact is provided. The method may include depositing, by atomic layer deposition, a passivation layer over at least a region of a metal surface, wherein the passivation layer may include aluminum oxide, and electrically contacting the region of the metal surface with a metal contact structure, wherein the metal contact structure may include copper.
    Type: Application
    Filed: November 6, 2020
    Publication date: March 18, 2021
    Inventors: Joachim Mahler, Michael Bauer, Jochen Dangelmaier, Reimund Engl, Johann Gatterbauer, Frank Hille, Michael Huettinger, Werner Kanert, Heinrich Koerner, Brigitte Ruehle, Francisco Javier Santos Rodriguez, Antonio Vellei
  • Patent number: 10777506
    Abstract: According to an embodiment of a semiconductor device, the semiconductor devices includes a metal structure electrically connected to a silicon carbide semiconductor body and a metal adhesion and barrier structure between the metal structure and the silicon carbide semiconductor body. The metal adhesion and barrier structure includes a layer comprising titanium and tungsten.
    Type: Grant
    Filed: September 20, 2019
    Date of Patent: September 15, 2020
    Assignee: Infineon Technologies AG
    Inventors: Frank Hille, Ravi Keshav Joshi, Michael Fugger, Oliver Humbel, Thomas Laska, Matthias Müller, Roman Roth, Carsten Schaeffer, Hans-Joachim Schulze, Holger Schulze, Juergen Steinbrenner, Frank Umbach
  • Patent number: 10636900
    Abstract: A power semiconductor transistor includes an electrically conductive contact structure including a plurality of contacts. A first one of the contacts is electrically connected to both a first load terminal and a first zone of a doped semiconductor structure. A second one of the contacts is electrically coupled to one of the first load terminal and a control electrode. The second contact laterally overlaps with both a second zone of the doped semiconductor structure, and a gap is formed between two adjacent field plates. The second zone of the doped semiconductor structure terminates in a section laterally overlapping with the gap.
    Type: Grant
    Filed: October 5, 2018
    Date of Patent: April 28, 2020
    Assignee: Infineon Technologies Austria AG
    Inventors: Viktoryia Uhnevionak, Philip Christoph Brandt, Frank Hille, Alexandra Ludsteck-Pechloff, Frank Dieter Pfirsch
  • Patent number: 10535743
    Abstract: A vertical power semiconductor component includes a semiconductor chip, the semiconductor chip having a top main surface and a bottom main surface. Each of said top main surface and said bottom main surface is in a heat exchanging relationship with a top metallization layer and a bottom metallization each of which serving as a heat sink. Each of said top metallization layer and said bottom metallization layer have a layer thickness of at least 15 ?m and have a specific heat capacity per volume that is at least a factor of 1.3 higher than the specific heat capacity per volume of the semiconductor chip. Each of said top metallization layer and said bottom metallization layer serving as a heat sink contacts the respective main surface via a respective diffusion barrier layer.
    Type: Grant
    Filed: September 19, 2017
    Date of Patent: January 14, 2020
    Assignee: Infineon Technologies AG
    Inventors: Frank Hille, Hans-Joachim Schulze
  • Publication number: 20200013749
    Abstract: In various embodiments, a chip package is provided. The chip package may include a chip, a metal contact structure including a non-noble metal and electrically contacting the chip, a packaging material, and a protective layer including or essentially consisting of a portion formed at an interface between a portion of the metal contact structure and the packaging material, wherein the protective layer may include a noble metal, wherein the portion of the protective layer may include a plurality of regions free from the noble metal, and wherein the regions free from the noble metal may provide an interface between the packaging material and the non-noble metal of the metal contact structure.
    Type: Application
    Filed: September 17, 2019
    Publication date: January 9, 2020
    Inventors: Joachim Mahler, Michael Bauer, Jochen Dangelmaier, Reimund Engl, Johann Gatterbauer, Frank Hille, Michael Huettinger, Werner Kanert, Heinrich Koerner, Brigitte Ruehle, Francisco Javier Santos Rodriguez, Antonio Vellei
  • Publication number: 20200013722
    Abstract: According to an embodiment of a semiconductor device, the semiconductor devices includes a metal structure electrically connected to a silicon carbide semiconductor body and a metal adhesion and barrier structure between the metal structure and the silicon carbide semiconductor body. The metal adhesion and barrier structure includes a layer comprising titanium and tungsten.
    Type: Application
    Filed: September 20, 2019
    Publication date: January 9, 2020
    Inventors: Frank Hille, Ravi Keshav Joshi, Michael Fugger, Oliver Humbel, Thomas Laska, Matthias Müller, Roman Roth, Carsten Schaeffer, Hans-Joachim Schulze, Holger Schulze, Juergen Steinbrenner, Frank Umbach
  • Patent number: 10475743
    Abstract: According to an embodiment of a semiconductor device, the semiconductor devices includes a metal structure electrically connected to a semiconductor body and a metal adhesion and barrier structure between the metal structure and the semiconductor body. The metal adhesion and barrier structure includes a first layer having titanium and tungsten, and a second layer having titanium, tungsten, and nitrogen on the first layer having titanium and tungsten.
    Type: Grant
    Filed: March 14, 2017
    Date of Patent: November 12, 2019
    Assignee: Infineon Technologies AG
    Inventors: Frank Hille, Ravi Keshav Joshi, Michael Fugger, Oliver Humbel, Thomas Laska, Matthias Mueller, Roman Roth, Carsten Schaeffer, Hans-Joachim Schulze, Holger Schulze, Juergen Steinbrenner, Frank Umbach
  • Patent number: 10461056
    Abstract: In various embodiments, a chip package is provided. The chip package may include a chip, a metal contact structure including a non-noble metal and electrically contacting the chip, a packaging material, and a protective layer including or essentially consisting of a portion formed at an interface between a portion of the metal contact structure and the packaging material, wherein the protective layer may include a noble metal, wherein the portion of the protective layer may include a plurality of regions free from the noble metal, and wherein the regions free from the noble metal may provide an interface between the packaging material and the non-noble metal of the metal contact structure.
    Type: Grant
    Filed: May 22, 2017
    Date of Patent: October 29, 2019
    Assignee: Infineon Technologies AG
    Inventors: Joachim Mahler, Michael Bauer, Jochen Dangelmaier, Reimund Engl, Johann Gatterbauer, Frank Hille, Michael Huettinger, Werner Kanert, Heinrich Koerner, Brigitte Ruehle, Francisco Javier Santos Rodriguez, Antonio Vellei
  • Patent number: 10276656
    Abstract: Epitaxy troughs are formed in a semiconductor substrate, wherein a matrix section of the semiconductor substrate laterally separates the epitaxy troughs and comprises a first semiconductor material. Crystalline epitaxy regions of a second semiconductor material are formed in the epitaxy troughs, wherein the second semiconductor material differs from the first semiconductor material in at least one of porosity, impurity content or defect density. From the epitaxy regions at least main body portions of semiconductor bodies of the semiconductor devices are formed.
    Type: Grant
    Filed: January 31, 2018
    Date of Patent: April 30, 2019
    Assignee: INFINEON TECHNOLOGIES AG
    Inventors: Frank Hille, Andre Brockmeier, Francisco Javier Santos Rodriguez, Daniel Schloegl, Hans-Joachim Schulze
  • Publication number: 20190109230
    Abstract: A power semiconductor transistor includes an electrically conductive contact structure including a plurality of contacts. A first one of the contacts is electrically connected to both a first load terminal and a first zone of a doped semiconductor structure. A second one of the contacts is electrically coupled to one of the first load terminal and a control electrode. The second contact laterally overlaps with both a second zone of the doped semiconductor structure, and a gap is formed between two adjacent field plates. The second zone of the doped semiconductor structure terminates in a section laterally overlapping with the gap.
    Type: Application
    Filed: October 5, 2018
    Publication date: April 11, 2019
    Inventors: Viktoryia Uhnevionak, Philip Christoph Brandt, Frank Hille, Alexandra Ludsteck-Pechloff, Frank Dieter Pfirsch
  • Publication number: 20180366428
    Abstract: A power semiconductor device, a power semiconductor module and a power semiconductor device processing method are provided. The power semiconductor device includes a first load terminal structure, a second load terminal structure, and a semiconductor structure electrically coupled to each load terminal structure and configured to carry a load current. The first load terminal structure includes a conductive layer in contact with the semiconductor structure, a bonding block configured to be contacted by at least one bond wire and to receive at least a part of the load current from the at least one bond wire and/or the conductive layer, a support block having a hardness greater than the hardness of the conductive layer and the bonding block. The bonding block is mounted on the conductive layer via the support block, and a zone is arranged within the conductive layer and/or the bonding block, the zone exhibiting nitrogen atoms.
    Type: Application
    Filed: August 9, 2018
    Publication date: December 20, 2018
    Applicant: Infineon Technologies AG
    Inventors: Roman ROTH, Frank HILLE, Hans-Joachim SCHULZE
  • Patent number: 10079217
    Abstract: A power semiconductor device, a power semiconductor module and a power semiconductor device processing method are provided. The power semiconductor device includes a first load terminal structure, a second load terminal structure, and a semiconductor structure electrically coupled to each load terminal structure and configured to carry a load current. The first load terminal structure includes a conductive layer in contact with the semiconductor structure, a bonding block configured to be contacted by at least one bond wire and to receive at least a part of the load current from the at least one bond wire and/or the conductive layer, a support block having a hardness greater than the hardness of the conductive layer and the bonding block. The bonding block is mounted on the conductive layer via the support block, and a zone is arranged within the conductive layer and/or the bonding block, the zone exhibiting nitrogen atoms.
    Type: Grant
    Filed: January 31, 2017
    Date of Patent: September 18, 2018
    Assignee: Infineon Technologies AG
    Inventors: Roman Roth, Frank Hille, Hans-Joachim Schulze
  • Publication number: 20180226471
    Abstract: Epitaxy troughs are formed in a semiconductor substrate, wherein a matrix section of the semiconductor substrate laterally separates the epitaxy troughs and comprises a first semiconductor material. Crystalline epitaxy regions of a second semiconductor material are formed in the epitaxy troughs, wherein the second semiconductor material differs from the first semiconductor material in at least one of porosity, impurity content or defect density. From the epitaxy regions at least main body portions of semiconductor bodies of the semiconductor devices are formed.
    Type: Application
    Filed: January 31, 2018
    Publication date: August 9, 2018
    Inventors: Frank Hille, Andre Brockmeier, Francisco Javier Santos Rodriguez, Daniel Schloegl, Hans-Joachim Schulze
  • Publication number: 20180047815
    Abstract: A vertical power semiconductor component includes a semiconductor chip, the semiconductor chip having a top main surface and a bottom main surface. Each of said top main surface and said bottom main surface is in a heat exchanging relationship with a top metallization layer and a bottom metallization each of which serving as a heat sink. Each of said top metallization layer and said bottom metallization layer have a layer thickness of at least 15 ?m and have a specific heat capacity per volume that is at least a factor of 1.3 higher than the specific heat capacity per volume of the semiconductor chip. Each of said top metallization layer and said bottom metallization layer serving as a heat sink contacts the respective main surface via a respective diffusion barrier layer.
    Type: Application
    Filed: September 19, 2017
    Publication date: February 15, 2018
    Inventors: Frank Hille, Hans-Joachim Schulze
  • Publication number: 20170338169
    Abstract: In various embodiments, a chip package is provided. The chip package may include a chip, a metal contact structure including a non-noble metal and electrically contacting the chip, a packaging material, and a protective layer including or essentially consisting of a portion formed at an interface between a portion of the metal contact structure and the packaging material, wherein the protective layer may include a noble metal, wherein the portion of the protective layer may include a plurality of regions free from the noble metal, and wherein the regions free from the noble metal may provide an interface between the packaging material and the non-noble metal of the metal contact structure.
    Type: Application
    Filed: May 22, 2017
    Publication date: November 23, 2017
    Inventors: Joachim Mahler, Michael Bauer, Jochen Dangelmaier, Reimund Engl, Johann Gatterbauer, Frank Hille, Michael Huettinger, Werner Kanert, Heinrich Koerner, Brigitte Ruehle, Francisco Javier Santos Rodriguez, Antonio Vellei
  • Publication number: 20170271268
    Abstract: According to an embodiment of a semiconductor device, the semiconductor devices includes a metal structure electrically connected to a semiconductor body and a metal adhesion and barrier structure between the metal structure and the semiconductor body. The metal adhesion and barrier structure includes a first layer having titanium and tungsten, and a second layer having titanium, tungsten, and nitrogen on the first layer having titanium and tungsten.
    Type: Application
    Filed: March 14, 2017
    Publication date: September 21, 2017
    Inventors: Frank Hille, Ravi Keshav Joshi, Michael Fugger, Oliver Humbel, Thomas Laska, Matthias Mueller, Roman Roth, Carsten Schaeffer, Hans-Joachim Schulze, Holger Schulze, Juergen Steinbrenner, Frank Umbach
  • Publication number: 20170221842
    Abstract: A power semiconductor device, a power semiconductor module and a power semiconductor device processing method are provided. The power semiconductor device includes a first load terminal structure, a second load terminal structure, and a semiconductor structure electrically coupled to each load terminal structure and configured to carry a load current. The first load terminal structure includes a conductive layer in contact with the semiconductor structure, a bonding block configured to be contacted by at least one bond wire and to receive at least a part of the load current from the at least one bond wire and/or the conductive layer, a support block having a hardness greater than the hardness of the conductive layer and the bonding block. The bonding block is mounted on the conductive layer via the support block, and a zone is arranged within the conductive layer and/or the bonding block, the zone exhibiting nitrogen atoms.
    Type: Application
    Filed: January 31, 2017
    Publication date: August 3, 2017
    Applicant: Infineon Technologies AG
    Inventors: Roman ROTH, Frank HILLE, Hans-Joachim SCHULZE
  • Patent number: 9685504
    Abstract: A semiconductor device includes a first semiconductor region having first charge carriers of a first conductivity type and a second semiconductor region having second charge carriers. The first semiconductor region includes a transition region in contact with the second semiconductor region, the transition region having a first concentration of the first charge carriers, a contact region having a second concentration of the first charge carriers, wherein the second concentration is higher than the first concentration, and a damage region between the contact region and the transition region. The damage region is configured for reducing lifetime and/or mobility of the first charge carriers of the damage region as compared to the lifetime and/or the mobility of the first charge carriers of the contact region and the transition region.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: June 20, 2017
    Assignee: Infineon Technologies AG
    Inventors: Andreas Haertl, Frank Hille, Francisco Javier Santos Rodriguez, Daniel Schloegl, Andre Rainer Stegner, Christoph Weiss