Abstract: A method for the confidential verification of an electronic identity includes applying block chain. The method allows an acting party to recognize a block-chain identity while at the same time a level of confidentiality of the respective identity and its identity attributes is maintained. A correspondingly adapted identity system and a computer program product with control commands are arranged to implement the method and/or operate the proposed system arrangement.

Abstract: The present invention relates to a method for making available a security key, wherein a smart card adapted according to the invention is employed for the production thereof. In this case, an expedient method sequence is proposed which makes it possible for the smart card to make available, for example, a so-called one-time password or a dynamic check number in interaction with a token server. The present invention further relates to a correspondingly adapted computing arrangement and to a computer program product with control commands which implement the method and/or operate the computing arrangement.

Abstract: The invention relates to a method for carrying out a two-factor authentication between a client and a relying party, wherein, as the second factor, a data carrier is employed which carries out a communication with a token server.

Abstract: A method is provided for carrying out a cryptographically secured authentication which complies with the Universal Authentication Framework (UAF) of the FIDO Alliance. It is thus possible to employ an existing infrastructure of the FIDO Alliance and the method can be embedded into the infrastructure using standard interfaces.

Abstract: The present invention relates to a method for making available a security key, wherein a smart card adapted according to the invention is employed for the production thereof. In this case, an expedient method sequence is proposed which makes it possible for the smart card to make available, for example, a so-called one-time password or a dynamic check number in interaction with a token server. The present invention further relates to a correspondingly adapted computing arrangement and to a computer program product with control commands which implement the method and/or operate the computing arrangement.

Abstract: A method for the confidential verification of an electronic identity includes applying block chain. The method allows an acting party to recognize a block-chain identity while at the same time a level of confidentiality of the respective identity and its identity attributes is maintained. A correspondingly adapted identity system and a computer program product with control commands are arranged to implement the method and/or operate the proposed system arrangement.

Abstract: The invention provides a system for encryptedly storing product data of a product having an attached tag centrally on a product data server, and reading out the centrally stored product data by production stations which are to process the product. The product data are encrypted with a document key which in turn is encrypted with a public key of the tag. The tag contains access information for the centrally stored product data. When a production station accesses product data on the product data server, the tag carries out a re-encryption of the document key from the key system of the tag to that of the accessing production station.

Abstract: A method is provided for carrying out a cryptographically secured authentication which complies with the Universal Authentication Framework (UAF) of the FIDO Alliance. It is thus possible to employ an existing infrastructure of the FIDO Alliance and the method can be embedded into the infrastructure using standard interfaces.

Abstract: The invention relates to a method for carrying out a two-factor authentication between a client and a relying party, wherein, as the second factor, a data carrier is employed which carries out a communication with a token server.

Abstract: The invention provides a system for encryptedly storing product data of a product having an attached tag centrally on a product data server, and reading out the centrally stored product data by production stations which are to process the product. The product data are encrypted with a document key which in turn is encrypted with a public key of the tag. The tag contains access information for the centrally stored product data. When a production station accesses product data on the product data server, the tag carries out a re-encryption of the document key from the key system of the tag to that of the accessing production station.

Abstract: A reflection mask that includes a structure (20) for lithographically transferring a layout onto a target substrate, in particular for use in EUV lithography, and a reflective multilayer structure (11). At least one flare reduction layer (13?, 17) is at least partly arranged on a bright field of the multilayer structure (11).

Abstract: Double patterning a photo sensitive layer stack, is disclosed including providing a substrate being coated with a first and a second photo resist layer, exposing both photo resist layers by employing lithographic projection steps, wherein a second lithographic projection step illuminates a latent image with a focal depth at least partially covering the second photo resist layer.

Abstract: A system for projecting a pattern from a mask onto a substrate comprises a radiation source for emitting a light beam in the extreme ultraviolet wavelength range, a mask including absorbent and reflective structures forming the pattern, a collector mirror and an illumination optical system forming a first part of a beam path in order to direct the light beam onto the mask to produce a patterned light beam, a projection optical system including an arrangement of reflective mirrors forming a second part of the beam path in order to focus the reflected light beam from the mask onto the substrate, and an optical element arranged in the beam path and including at least two regions having different degrees of reflection or transmission. First and second of the regions are assigned to respective different first and second positions on the mask and/or collector mirror in accordance with the beam path.

Abstract: A focused light beam is directed onto a surface patch of a mask and decomposed into partial beams by diffraction at a structure formed on the surface of the mask. Detectors are set such that the intensity of at least two orders of diffraction can be measured. The measured intensities are compared with one another. By way of example, a quotient can be ascertained. The operations are repeated for adjacent surface patches. If the absolute values of the measured intensities fluctuate with a constant quotient, then a variation of the reflection or transmission over the surface of the mask is inferred. If the quotient varies as well, then line width fluctuations within the structure on the mask are inferred.

Abstract: The present invention relates to a method for determining an optimal absorber stack geometry of a lithographic reflection mask comprising a reflection layer and a patterned absorber stack provided on the reflection layer, the absorber stack having a buffer layer and an absorber layer. The method is based on simulating aerial images for different absorber stack geometries in order to determine process windows corresponding to the absorber stack geometries. The optimal absorber stack geometry is identified by the maximum process window size. The invention further relates to a method for fabricating a lithographic reflection mask and to a lithographic reflection mask.

Abstract: Method and device for automatically generating at least one of a mask layout and an illumination pixel pattern, of an imaging system in a process for the manufacturing of a semiconductor device, wherein the mask layout is subdivided into a multitude of discrete tiles, comprising a) generating a first dataset comprising amplitude point spread function (APSF) values for a given imaging system for at least one defocus value z, b) after splitting the illumination pixel pattern into qk pixels, generating a second dataset comprising tile spread functions Vq(r), corresponding to mask tiles and illumination pixels, c) optimizing an intensity distribution I(r) in an image plane for the semiconductor device subject to a merit function, by means of a stochastic variation by at least one of the group of the discrete mask tiles and the illumination pixels using the pre-calculated tile spread functions Vq(r) of the second dataset.

Abstract: A method and device can be used for automatically generating at least one of a mask layout and an illumination pixel pattern of an imaging system in a process for the manufacturing of a semiconductor device. The mask layout is subdivided into a multitude of discrete tiles. A first dataset is generated and includes amplitude point spread function (APSF) values for a given imaging system for at least one defocus value z. A second dataset is generated and includes tile spread functions Vq(r), corresponding to mask tiles and illumination pixels. An intensity distribution I(r) is optimized in an image plane for the semiconductor device subject to a merit function by means of a stochastic variation by at least one of the group of the discrete mask tiles and the illumination pixels using the pre-calculated tile spread functions Vq(r) of the second dataset.

Abstract: A system for projecting a pattern from a mask onto a substrate comprises a radiation source for emitting a light beam in the extreme ultraviolet wavelength range, a mask including absorbent and reflective structures forming the pattern, a collector mirror and an illumination optical system forming a first part of a beam path in order to direct the light beam onto the mask to produce a patterned light beam, a projection optical system including an arrangement of reflective mirrors forming a second part of the beam path in order to focus the reflected light beam from the mask onto the substrate, and an optical element arranged in the beam path and including at least two regions having different degrees of reflection or transmission. First and second of the regions are assigned to respective different first and second positions on the mask and/or collector mirror in accordance with the beam path.

Abstract: An exposure system includes a container in which a radiation source is arranged which emits electromagnetic radiation. Furthermore, an electromagnetic trap, suitable for collecting neutral particles, is arranged inside the container. An ionization unit ionizes the neutral particles emitted during the operation of the radiation source. The electromagnetic trap collects the charged particles. Thereby, the neutral particles are removed which would otherwise impair the lithographic projection by absorption or deposition on components of the exposure system. A method is disclosed for operation of an exposure system.

Abstract: A reflection mask for projecting a structure onto a semiconductor wafer contains a carrier material, a layer stack for reflecting obliquely incident light and formed of an alternating sequence of reflective layers disposed on a front side of the carrier material, and a light-absorbing layer. In the light-absorbing layer at least one opening is formed as the structure to be projected and which is disposed on the alternating layer stack. An electrically conductive layer is buried within the carrier material near a surface of a rear side of the carrier material. The buried electrically conductive layer is produced by ion implantation preferably in a whole-area manner on the rear side of the mask. The depth and the depth extent of the layer are controlled by the ion energy and also the dose.