Patents by Inventor Frank-Michael Kamm

Frank-Michael Kamm has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Large-area membrane mask and method for fabricating the mask
    Publication number: 20030031939
    Abstract: In order to increase the rigidity of a membrane mask that can be used for ion projection lithography, a second wafer made of the material of the membrane layer is provided in addition to a first wafer. The second wafer is patterned in the same way as the first wafer to form a second carrying ring and is fitted on the membrane layer in a mirror-inverted manner with respect to the first wafer so that the membrane area is arranged between the first and second carrying rings in a centered manner in the direction perpendicular to the membrane plane.
    Type: Application
    Filed: August 8, 2002
    Publication date: February 13, 2003
    Inventors: Jorg Butschke, Albrecht Ehrmann, Ernst Haugeneder, Frank-Michael Kamm, Florian Letzkus, Hans Loschner, Reinhard Springer